JP6374989B2 - 荷電粒子線装置、及び荷電粒子線装置用部材の製造方法 - Google Patents
荷電粒子線装置、及び荷電粒子線装置用部材の製造方法 Download PDFInfo
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- 239000002245 particle Substances 0.000 title claims description 123
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 238000000034 method Methods 0.000 title description 24
- 239000011521 glass Substances 0.000 claims description 214
- 229910052720 vanadium Inorganic materials 0.000 claims description 192
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 192
- 239000012212 insulator Substances 0.000 claims description 96
- 230000003287 optical effect Effects 0.000 claims description 34
- 230000004075 alteration Effects 0.000 claims description 32
- 239000011248 coating agent Substances 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 13
- 239000010949 copper Substances 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 description 58
- 239000000919 ceramic Substances 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 22
- 239000002184 metal Substances 0.000 description 22
- 230000001133 acceleration Effects 0.000 description 18
- 230000000694 effects Effects 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- 230000005684 electric field Effects 0.000 description 11
- 208000028659 discharge Diseases 0.000 description 8
- 238000003466 welding Methods 0.000 description 8
- 238000000605 extraction Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- 238000005219 brazing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000005245 sintering Methods 0.000 description 5
- 239000007767 bonding agent Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910000833 kovar Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000004455 differential thermal analysis Methods 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 230000005405 multipole Effects 0.000 description 2
- 229910000986 non-evaporable getter Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000000979 retarding effect Effects 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- -1 steatite Chemical compound 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 241000021559 Dicerandra Species 0.000 description 1
- 235000010654 Melissa officinalis Nutrition 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 239000000865 liniment Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000013526 supercooled liquid Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
- C23D5/00—Coating with enamels or vitreous layers
- C23D5/02—Coating with enamels or vitreous layers by wet methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/38—Mounting, supporting, spacing, or insulating electron-optical or ion-optical arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/18—Assembling together the component parts of electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0213—Avoiding deleterious effects due to interactions between particles and tube elements
-
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- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
- H01J2237/0268—Liner tubes
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- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/03—Mounting, supporting, spacing or insulating electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/027—Construction of the gun or parts thereof
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Description
、含有物の組成率を変えることで、軟化点や熱膨張係数を接合部材の特性に合わせることができるため、接合剤として働き、金属や他の絶縁物、バナジウムを含有するガラス自体を高い気密性を保ったまま接合することができる。
ことになる。
バナジウムを含有するガラスと電極の一体構造物、404 電極1、405 電極2、406 電極3、407 電極4、408 電極5、409 電極6、410 電極7、411 電極8、412 電極3用配線、413 電極4用配線、414 電極5用配線、415 電極6用配線、503 絶縁体碍子、504 バナジウムを含有するガラス、601 試料、602 試料ホルダ、603 バナジウムを含有するガラス、604 駆動機構、610 反射電子や散乱電子などの二次的な電子、611 表面電流
Claims (16)
- 荷電粒子源から放出される荷電粒子ビームを調整する光学素子と、
前記荷電粒子ビームが通過する通路の雰囲気を真空とするための真空容器と、
前記荷電粒子源から荷電粒子を引き出すための第一陽極と、
前記第一陽極によって引き出された荷電粒子を加速させる第二陽極と、
前記第一陽極と第二陽極との間に配置される絶縁体と、
前記荷電粒子源の周辺部を局所的に真空排気する真空ポンプと、
を備え、
前記絶縁体を、バナジウムを含むガラスで構成したことを特徴とする荷電粒子線装置。 - 請求項1において、
前記バナジウムを含有するガラスは、バナジウムを主成分とすることを特徴とする荷電粒子線装置。 - 請求項1において、
前記光学素子は静電レンズであることを特徴とする荷電粒子線装置。 - 請求項1において、前記荷電粒子線装置はさらに、
前記荷電粒子ビームの収差を補正する収差補正器、
前記荷電粒子ビームを偏向する偏向器、
を備え、
前記収差補正器と前記偏向器の少なくとも1つを、バナジウムを含むガラスで構成したことを特徴とする荷電粒子線装置。 - 荷電粒子源から放出される荷電粒子ビームを調整する光学素子と、
前記荷電粒子ビームが通過する通路の雰囲気を真空とするための真空容器と、
前記荷電粒子源から荷電粒子を引き出すための第一陽極と、
前記第一陽極によって引き出された荷電粒子を加速させる第二陽極と、
前記第一陽極と第二陽極との間に配置される絶縁体と、
前記荷電粒子源の周辺部を局所的に真空排気する真空ポンプと、
を備え、
前記真空容器内に位置する前記第一陽極、前記第二陽極、または前記絶縁体のうち少なくともいずれか一つの部位の前記荷電粒子源側の面に、バナジウムを含むガラス層がコーティングされていることを特徴とする荷電粒子線装置。 - 請求項5において、
前記バナジウムを含むガラス層は、バナジウムを主成分とすることを特徴とする荷電粒子線装置。 - 請求項5において、
前記荷電粒子源の周辺部の真空度が10−8〜10−11[Pa]であることを特徴とする荷電粒子線装置。 - 請求項5において、
前記バナジウムを含むガラス層は、4〜20ppmの熱膨張係数を有することを特徴とする荷電粒子線装置。 - 荷電粒子源から放出される荷電粒子ビームを調整する光学素子と、前記荷電粒子ビームが通過する通路の雰囲気を真空とするための真空容器を備えた荷電粒子線装置において、 前記真空容器内に位置する部材に、バナジウムを含むガラス層がコーティングされており、
前記真空容器は、真空室を構成する容器と、当該容器と他部材を接続するための銅ガスケットを含み、前記バナジウムを含むガラス層の塗布範囲は、前記銅ガスケットと、前記バナジウムを含むガラス層との間の距離をEとし、前記バナジウムを含むガラス層の膜厚をdとした場合に、E>dの関係になることを特徴とする荷電粒子線装置。 - 請求項5において、
前記光学素子は静電レンズであることを特徴とする荷電粒子線装置。 - 請求項5において、
前記光学素子は、前記荷電粒子ビームの収差を補正する収差補正器、及び前記荷電粒子ビームを偏向する偏向器の少なくとも1つであることを特徴とする荷電粒子線装置。 - 請求項5において、
荷電粒子線装置の鏡筒内壁に、前記バナジウムを含むガラス層を設けたことを特徴とする荷電粒子線装置。 - 請求項5において、
荷電粒子線装置の鏡筒内部の光学素子に、前記バナジウムを含むガラス層を設けたことを特徴とする荷電粒子線装置。 - 荷電粒子源から放出される荷電粒子ビームを調整する光学素子と、前記荷電粒子ビームが通過する通路の雰囲気を真空とするための真空容器を備える荷電粒子線装置のために用いる荷電粒子線装置用部材の製造方法において、
前記荷電粒子線装置用部材であって、前記荷電粒子線装置の真空空間側に位置する部材の表面に、バナジウムを含むガラス層をコーティングし、
前記真空容器は、真空室を構成する容器と、当該容器と他部材を接続するための銅ガスケットを含み、前記バナジウムを含むガラス層の塗布範囲は、前記銅ガスケットと、前記バナジウムを含むガラス層との間の距離をEとし、前記バナジウムを含むガラス層の膜厚をdとした場合に、E>dの関係となるようにする
ことを特徴とする荷電粒子線装置用部材の製造方法。 - 請求項14において、
前記バナジウムを含むガラス層は、バナジウムを主成分とすることを特徴とする荷電粒子線装置用部材の製造方法。 - 請求項14において、
前記バナジウムを含むガラス層は、バナジウムを含むガラスをペースト状、或いは液状にした上で、前記部材の表面に塗布することを特徴とする荷電粒子線装置用部材の製造方法。
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