JP6328868B1 - 表面増強ラマン散乱ユニット - Google Patents
表面増強ラマン散乱ユニット Download PDFInfo
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- JP6328868B1 JP6328868B1 JP2018047836A JP2018047836A JP6328868B1 JP 6328868 B1 JP6328868 B1 JP 6328868B1 JP 2018047836 A JP2018047836 A JP 2018047836A JP 2018047836 A JP2018047836 A JP 2018047836A JP 6328868 B1 JP6328868 B1 JP 6328868B1
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- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 title claims abstract description 204
- 239000000758 substrate Substances 0.000 claims abstract description 191
- 230000003287 optical effect Effects 0.000 claims abstract description 139
- 239000004020 conductor Substances 0.000 claims abstract description 35
- 230000009471 action Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 18
- 230000006866 deterioration Effects 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 53
- 238000001069 Raman spectroscopy Methods 0.000 description 47
- 229920005989 resin Polymers 0.000 description 33
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- 229910000679 solder Inorganic materials 0.000 description 12
- 230000005496 eutectics Effects 0.000 description 11
- 238000000465 moulding Methods 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 230000004927 fusion Effects 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 239000011261 inert gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 5
- 210000000078 claw Anatomy 0.000 description 5
- 238000004611 spectroscopical analysis Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 239000006059 cover glass Substances 0.000 description 4
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- 239000004417 polycarbonate Substances 0.000 description 2
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- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000003313 weakening effect Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
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- 229910052697 platinum Inorganic materials 0.000 description 1
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- 229920000573 polyethylene Polymers 0.000 description 1
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- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
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- 239000002344 surface layer Substances 0.000 description 1
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
- G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
- G01J3/4412—Scattering spectrometry
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
- G01N2201/022—Casings
- G01N2201/0227—Sealable enclosure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
Abstract
Description
[第1実施形態]
[第2実施形態]
[第3実施形態]
[第4実施形態]
[第5実施形態]
Claims (5)
- 表面増強ラマン散乱素子と、
前記表面増強ラマン散乱素子を空間中に収容し、前記空間を不可逆的に開放させるパッケージと、を備え、
前記表面増強ラマン散乱素子は、
基板と、
前記基板の表面上に形成された微細構造部を覆う導電体層によって構成され、表面増強ラマン散乱を生じさせる光学機能部と、を有し、
前記基板の厚さは、前記導電体層の厚さよりも大きい、表面増強ラマン散乱ユニット。 - 前記パッケージは、
前記空間を画定する凹部が設けられた収容部材と、
前記凹部の開口を封止するシートと、を有する、請求項1記載の表面増強ラマン散乱ユニット。 - 前記収容部材は、キャップである、請求項2記載の表面増強ラマン散乱ユニット。
- 前記キャップは、前記空間を不可逆的に開放させる際に、外力の作用によって変形させられる、請求項3記載の表面増強ラマン散乱ユニット。
- 前記シートは、前記空間を不可逆的に開放させる際に、前記基板を介して破られる、請求項2〜4のいずれか一項記載の表面増強ラマン散乱ユニット。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012178766 | 2012-08-10 | ||
JP2012178766 | 2012-08-10 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018005745A Division JP6310170B2 (ja) | 2012-08-10 | 2018-01-17 | 表面増強ラマン散乱ユニット |
Publications (2)
Publication Number | Publication Date |
---|---|
JP6328868B1 true JP6328868B1 (ja) | 2018-05-23 |
JP2018141789A JP2018141789A (ja) | 2018-09-13 |
Family
ID=50068249
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014529580A Active JP6126098B2 (ja) | 2012-08-10 | 2013-08-09 | 表面増強ラマン散乱ユニット及びその使用方法 |
JP2017076041A Active JP6282768B2 (ja) | 2012-08-10 | 2017-04-06 | 表面増強ラマン散乱ユニット |
JP2018005745A Active JP6310170B2 (ja) | 2012-08-10 | 2018-01-17 | 表面増強ラマン散乱ユニット |
JP2018047836A Active JP6328868B1 (ja) | 2012-08-10 | 2018-03-15 | 表面増強ラマン散乱ユニット |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014529580A Active JP6126098B2 (ja) | 2012-08-10 | 2013-08-09 | 表面増強ラマン散乱ユニット及びその使用方法 |
JP2017076041A Active JP6282768B2 (ja) | 2012-08-10 | 2017-04-06 | 表面増強ラマン散乱ユニット |
JP2018005745A Active JP6310170B2 (ja) | 2012-08-10 | 2018-01-17 | 表面増強ラマン散乱ユニット |
Country Status (6)
Country | Link |
---|---|
US (3) | US9588049B2 (ja) |
EP (1) | EP2889606A4 (ja) |
JP (4) | JP6126098B2 (ja) |
CN (3) | CN108827928B (ja) |
TW (2) | TWI648531B (ja) |
WO (1) | WO2014025033A1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
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US9267894B2 (en) | 2012-08-10 | 2016-02-23 | Hamamatsu Photonics K.K. | Method for making surface enhanced Raman scattering device |
CN104541158B (zh) | 2012-08-10 | 2017-05-24 | 浜松光子学株式会社 | 表面增强拉曼散射元件、以及制造表面增强拉曼散射元件的方法 |
JP6058313B2 (ja) | 2012-08-10 | 2017-01-11 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
EP2889606A4 (en) | 2012-08-10 | 2016-04-20 | Hamamatsu Photonics Kk | SURFACE-REINFORCED RAM APPLICATION UNIT AND USE METHOD THEREFOR |
JP5908370B2 (ja) | 2012-08-10 | 2016-04-26 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
JP6055234B2 (ja) | 2012-08-10 | 2016-12-27 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
JP6230250B2 (ja) * | 2013-03-29 | 2017-11-15 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット、及びラマン分光分析方法 |
JP5921380B2 (ja) | 2012-08-10 | 2016-05-24 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
JP6151948B2 (ja) | 2013-03-29 | 2017-06-21 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット及びラマン分光分析方法 |
JP5945192B2 (ja) | 2012-08-10 | 2016-07-05 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
US10551322B2 (en) | 2012-08-10 | 2020-02-04 | Hamamatsu Photonics K.K. | Surface-enhanced Raman scattering unit including integrally formed handling board |
EP2884264B1 (en) | 2012-08-10 | 2019-11-20 | Hamamatsu Photonics K.K. | Surface-enhanced raman scattering element, and method for producing same |
CN104508466B (zh) | 2012-08-10 | 2018-07-17 | 浜松光子学株式会社 | 表面增强拉曼散射元件 |
JP6023509B2 (ja) | 2012-08-10 | 2016-11-09 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
JP5921381B2 (ja) | 2012-08-10 | 2016-05-24 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
WO2014156329A1 (ja) | 2013-03-29 | 2014-10-02 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット及びラマン分光分析方法 |
JP6294797B2 (ja) * | 2014-09-10 | 2018-03-14 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
CN107075661B (zh) * | 2014-09-26 | 2020-03-17 | 韩国机械研究院 | 形成有多个纳米间隙的基底及其制备方法 |
CN107615048B (zh) * | 2015-05-29 | 2020-08-21 | 浜松光子学株式会社 | 表面增强拉曼散射单元 |
CN107548454B (zh) | 2015-06-29 | 2020-10-09 | 惠普发展公司,有限责任合伙企业 | 利用集成镜头分析检测封装 |
US10458918B2 (en) | 2015-11-13 | 2019-10-29 | Hewlett-Packard Development Company, L.P. | Substance detection device |
CN109075162A (zh) * | 2016-07-15 | 2018-12-21 | 惠普发展公司,有限责任合伙企业 | 接收基板支撑的表面增强发光台的框架层 |
WO2019045673A1 (en) | 2017-08-28 | 2019-03-07 | Hewlett-Packard Development Company, L.P. | DEFORMABLE COATINGS ON SENSORS AND TANKS |
JP7289066B2 (ja) | 2018-08-28 | 2023-06-09 | パナソニックIpマネジメント株式会社 | センサ基板及びその製造方法 |
CN109827941B (zh) * | 2018-12-28 | 2021-08-13 | 安徽中科赛飞尔科技有限公司 | 一种凸字型高通量高重复性基底结构 |
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US20150204792A1 (en) | 2015-07-23 |
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US9588049B2 (en) | 2017-03-07 |
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US20170089838A1 (en) | 2017-03-30 |
JP6310170B2 (ja) | 2018-04-11 |
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