JP6278676B2 - 振動低減装置、リソグラフィ装置、および物品の製造方法 - Google Patents

振動低減装置、リソグラフィ装置、および物品の製造方法 Download PDF

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Publication number
JP6278676B2
JP6278676B2 JP2013248342A JP2013248342A JP6278676B2 JP 6278676 B2 JP6278676 B2 JP 6278676B2 JP 2013248342 A JP2013248342 A JP 2013248342A JP 2013248342 A JP2013248342 A JP 2013248342A JP 6278676 B2 JP6278676 B2 JP 6278676B2
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vibration
compensator
elastic body
detector
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JP2013248342A
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Japanese (ja)
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JP2015105711A5 (enExample
JP2015105711A (ja
Inventor
縄田　亮
亮 縄田
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Canon Inc
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Canon Inc
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Priority to JP2013248342A priority Critical patent/JP6278676B2/ja
Priority to US14/546,022 priority patent/US9671704B2/en
Publication of JP2015105711A publication Critical patent/JP2015105711A/ja
Publication of JP2015105711A5 publication Critical patent/JP2015105711A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP2013248342A 2013-11-29 2013-11-29 振動低減装置、リソグラフィ装置、および物品の製造方法 Expired - Fee Related JP6278676B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013248342A JP6278676B2 (ja) 2013-11-29 2013-11-29 振動低減装置、リソグラフィ装置、および物品の製造方法
US14/546,022 US9671704B2 (en) 2013-11-29 2014-11-18 Vibration reduction apparatus, lithography apparatus and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013248342A JP6278676B2 (ja) 2013-11-29 2013-11-29 振動低減装置、リソグラフィ装置、および物品の製造方法

Publications (3)

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JP2015105711A JP2015105711A (ja) 2015-06-08
JP2015105711A5 JP2015105711A5 (enExample) 2017-06-29
JP6278676B2 true JP6278676B2 (ja) 2018-02-14

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JP2013248342A Expired - Fee Related JP6278676B2 (ja) 2013-11-29 2013-11-29 振動低減装置、リソグラフィ装置、および物品の製造方法

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US (1) US9671704B2 (enExample)
JP (1) JP6278676B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014072139A1 (en) * 2012-11-06 2014-05-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP6302305B2 (ja) * 2014-03-18 2018-03-28 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
NL2016330B1 (en) * 2016-02-26 2017-09-20 Mecal Intellectual Property And Standards B V Active inertial damper system and method
US11054739B2 (en) * 2018-07-26 2021-07-06 Canon Kabushiki Kaisha Imprint apparatus, control method, imprint method and manufacturing method
US10991544B2 (en) * 2019-05-29 2021-04-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, objective lens module, electrode device, and method of inspecting a specimen

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07335538A (ja) * 1994-06-03 1995-12-22 Nikon Corp ステージ装置
JP3825869B2 (ja) * 1997-03-19 2006-09-27 キヤノン株式会社 能動除振装置
JPH10269675A (ja) * 1997-03-26 1998-10-09 Hitachi Ltd ディスク記憶装置
JP4165844B2 (ja) * 1998-11-18 2008-10-15 キヤノン株式会社 除振装置
TW468090B (en) * 1998-12-17 2001-12-11 Asm Lithography Bv Servo control method, and its application in a lithographic projection apparatus
JP2002242983A (ja) * 2001-02-19 2002-08-28 Canon Inc 能動的除振装置
US6881963B2 (en) * 2002-11-08 2005-04-19 Canon Kabushiki Kaisha Vibration control of an object
US7084956B2 (en) 2003-06-13 2006-08-01 Asml Netherlands B.V Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device
JP5107575B2 (ja) * 2003-09-05 2012-12-26 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 慣性基準質量を有する能動型防振用アクチュエータ構成
WO2005073592A1 (en) * 2004-01-26 2005-08-11 Koninklijke Philips Electronics N.V. Actuator arrangement for active vibration isolation using a payload as an inertial reference mass
US7726452B2 (en) * 2005-06-02 2010-06-01 Technical Manufacturing Corporation Systems and methods for active vibration damping
WO2007054860A2 (en) * 2005-11-08 2007-05-18 Koninklijke Philips Electronics, N.V. Vibration isolation system and method
JP5036259B2 (ja) * 2006-09-14 2012-09-26 キヤノン株式会社 除振装置、露光装置及びデバイス製造方法
US20090153832A1 (en) * 2007-12-18 2009-06-18 Yosuke Tatsuzaki Apparatus and method for isolating vibrations in a lithography machine using two active control units
EP2075484A1 (en) * 2007-12-31 2009-07-01 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO An active vibration isolation system having an inertial reference mass
NL2003424A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Projection assembly and lithographic apparartus.
NL2003772A (en) * 2008-12-11 2010-06-14 Asml Netherlands Bv Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus.
JP2012044014A (ja) * 2010-08-20 2012-03-01 Canon Inc 除振装置、それを用いた露光装置及びデバイスの製造方法
JP5641878B2 (ja) * 2010-10-29 2014-12-17 キヤノン株式会社 振動制御装置、リソグラフィー装置、および、物品の製造方法
KR102082846B1 (ko) * 2011-01-28 2020-02-28 고쿠리츠다이가쿠호우진 도쿄다이가쿠 구동 시스템과 구동 방법, 노광 장치와 노광 방법, 및 구동 시스템 설계 방법
DE102011007917A1 (de) * 2011-04-21 2012-10-25 Asml Netherlands B.V. Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
JP5963600B2 (ja) * 2011-08-09 2016-08-03 キヤノン株式会社 除振装置
WO2014010233A1 (ja) * 2012-07-09 2014-01-16 株式会社ニコン 駆動システム及び駆動方法、並びに露光装置及び露光方法
JP6302305B2 (ja) * 2014-03-18 2018-03-28 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
JP6333081B2 (ja) * 2014-06-23 2018-05-30 キヤノン株式会社 振動制御装置、リソグラフィ装置、および物品の製造方法

Also Published As

Publication number Publication date
US9671704B2 (en) 2017-06-06
US20150153659A1 (en) 2015-06-04
JP2015105711A (ja) 2015-06-08

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