JP6254445B2 - 荷電粒子ビーム装置 - Google Patents

荷電粒子ビーム装置 Download PDF

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Publication number
JP6254445B2
JP6254445B2 JP2014002260A JP2014002260A JP6254445B2 JP 6254445 B2 JP6254445 B2 JP 6254445B2 JP 2014002260 A JP2014002260 A JP 2014002260A JP 2014002260 A JP2014002260 A JP 2014002260A JP 6254445 B2 JP6254445 B2 JP 6254445B2
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Japan
Prior art keywords
voltage
deflector
electric field
magnetic field
source circuit
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JP2014002260A
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English (en)
Japanese (ja)
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JP2015130309A (ja
JP2015130309A5 (https=
Inventor
李　ウェン
ウェン 李
涼 門井
涼 門井
一樹 池田
一樹 池田
弘之 高橋
弘之 高橋
源 川野
川野　　源
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2014002260A priority Critical patent/JP6254445B2/ja
Priority to US15/109,230 priority patent/US9679740B2/en
Priority to PCT/JP2014/083200 priority patent/WO2015104959A1/ja
Publication of JP2015130309A publication Critical patent/JP2015130309A/ja
Publication of JP2015130309A5 publication Critical patent/JP2015130309A5/ja
Priority to US15/613,941 priority patent/US10424459B2/en
Application granted granted Critical
Publication of JP6254445B2 publication Critical patent/JP6254445B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1504—Associated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1508—Combined electrostatic-electromagnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2014002260A 2014-01-09 2014-01-09 荷電粒子ビーム装置 Active JP6254445B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014002260A JP6254445B2 (ja) 2014-01-09 2014-01-09 荷電粒子ビーム装置
US15/109,230 US9679740B2 (en) 2014-01-09 2014-12-16 Charged particle beam device
PCT/JP2014/083200 WO2015104959A1 (ja) 2014-01-09 2014-12-16 荷電粒子ビーム装置
US15/613,941 US10424459B2 (en) 2014-01-09 2017-06-05 Charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014002260A JP6254445B2 (ja) 2014-01-09 2014-01-09 荷電粒子ビーム装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017230024A Division JP6408116B2 (ja) 2017-11-30 2017-11-30 荷電粒子ビーム装置

Publications (3)

Publication Number Publication Date
JP2015130309A JP2015130309A (ja) 2015-07-16
JP2015130309A5 JP2015130309A5 (https=) 2017-02-09
JP6254445B2 true JP6254445B2 (ja) 2017-12-27

Family

ID=53523797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014002260A Active JP6254445B2 (ja) 2014-01-09 2014-01-09 荷電粒子ビーム装置

Country Status (3)

Country Link
US (2) US9679740B2 (https=)
JP (1) JP6254445B2 (https=)
WO (1) WO2015104959A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6254445B2 (ja) * 2014-01-09 2017-12-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
US10393509B2 (en) * 2014-07-30 2019-08-27 Hitachi High-Technologies Corporation Pattern height measurement device and charged particle beam device
US10090131B2 (en) * 2016-12-07 2018-10-02 Kla-Tencor Corporation Method and system for aberration correction in an electron beam system
WO2019043946A1 (ja) * 2017-09-04 2019-03-07 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2019187118A1 (ja) * 2018-03-30 2019-10-03 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
KR102660825B1 (ko) * 2018-10-19 2024-04-26 에이에스엠엘 네델란즈 비.브이. 멀티 빔 검사 장치에서 전자 빔들을 정렬하기 위한 시스템 및 방법
JP7155393B2 (ja) * 2019-03-08 2022-10-18 株式会社日立ハイテク 荷電粒子ビーム装置
JP2021197263A (ja) * 2020-06-12 2021-12-27 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム画像取得方法
CN112071732B (zh) * 2020-07-28 2021-11-19 西安交通大学 一种可编码阵列式静电偏转器、聚焦偏转系统及设计方法
WO2022135842A1 (en) * 2020-12-22 2022-06-30 Asml Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample
EP4086934A1 (en) * 2021-05-04 2022-11-09 ASML Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0260042A (ja) * 1988-08-24 1990-02-28 Hitachi Ltd 荷電粒子線応用装置の駆動電源
JP2821153B2 (ja) * 1988-11-24 1998-11-05 株式会社日立製作所 荷電粒子線応用装置
JP3867048B2 (ja) * 2003-01-08 2007-01-10 株式会社日立ハイテクノロジーズ モノクロメータ及びそれを用いた走査電子顕微鏡
JP4943733B2 (ja) 2005-04-28 2012-05-30 株式会社日立ハイテクノロジーズ 荷電粒子ビームを用いた検査方法及び検査装置
US7462828B2 (en) 2005-04-28 2008-12-09 Hitachi High-Technologies Corporation Inspection method and inspection system using charged particle beam
JP4988216B2 (ja) 2006-02-03 2012-08-01 株式会社日立ハイテクノロジーズ 収差補正装置を搭載した荷電粒子線装置
JP2008181786A (ja) 2007-01-25 2008-08-07 Hitachi High-Technologies Corp 荷電粒子線装置
JP2010519697A (ja) 2007-02-22 2010-06-03 アプライド マテリアルズ イスラエル リミテッド 高スループットｓｅｍツール
JP4977509B2 (ja) * 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5237734B2 (ja) 2008-09-24 2013-07-17 日本電子株式会社 収差補正装置および該収差補正装置を備える荷電粒子線装置
JP6254445B2 (ja) * 2014-01-09 2017-12-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置

Also Published As

Publication number Publication date
JP2015130309A (ja) 2015-07-16
WO2015104959A1 (ja) 2015-07-16
US10424459B2 (en) 2019-09-24
US20170271121A1 (en) 2017-09-21
US20160329186A1 (en) 2016-11-10
US9679740B2 (en) 2017-06-13

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