JP6254445B2 - 荷電粒子ビーム装置 - Google Patents

荷電粒子ビーム装置 Download PDF

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Publication number
JP6254445B2
JP6254445B2 JP2014002260A JP2014002260A JP6254445B2 JP 6254445 B2 JP6254445 B2 JP 6254445B2 JP 2014002260 A JP2014002260 A JP 2014002260A JP 2014002260 A JP2014002260 A JP 2014002260A JP 6254445 B2 JP6254445 B2 JP 6254445B2
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JP
Japan
Prior art keywords
voltage
deflector
electric field
magnetic field
source circuit
Prior art date
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Application number
JP2014002260A
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English (en)
Japanese (ja)
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JP2015130309A5 (enExample
JP2015130309A (ja
Inventor
李　ウェン
ウェン 李
涼 門井
涼 門井
一樹 池田
一樹 池田
弘之 高橋
弘之 高橋
源 川野
川野　　源
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2014002260A priority Critical patent/JP6254445B2/ja
Priority to PCT/JP2014/083200 priority patent/WO2015104959A1/ja
Priority to US15/109,230 priority patent/US9679740B2/en
Publication of JP2015130309A publication Critical patent/JP2015130309A/ja
Publication of JP2015130309A5 publication Critical patent/JP2015130309A5/ja
Priority to US15/613,941 priority patent/US10424459B2/en
Application granted granted Critical
Publication of JP6254445B2 publication Critical patent/JP6254445B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1504—Associated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1508—Combined electrostatic-electromagnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2014002260A 2014-01-09 2014-01-09 荷電粒子ビーム装置 Active JP6254445B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014002260A JP6254445B2 (ja) 2014-01-09 2014-01-09 荷電粒子ビーム装置
PCT/JP2014/083200 WO2015104959A1 (ja) 2014-01-09 2014-12-16 荷電粒子ビーム装置
US15/109,230 US9679740B2 (en) 2014-01-09 2014-12-16 Charged particle beam device
US15/613,941 US10424459B2 (en) 2014-01-09 2017-06-05 Charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014002260A JP6254445B2 (ja) 2014-01-09 2014-01-09 荷電粒子ビーム装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017230024A Division JP6408116B2 (ja) 2017-11-30 2017-11-30 荷電粒子ビーム装置

Publications (3)

Publication Number Publication Date
JP2015130309A JP2015130309A (ja) 2015-07-16
JP2015130309A5 JP2015130309A5 (enExample) 2017-02-09
JP6254445B2 true JP6254445B2 (ja) 2017-12-27

Family

ID=53523797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014002260A Active JP6254445B2 (ja) 2014-01-09 2014-01-09 荷電粒子ビーム装置

Country Status (3)

Country Link
US (2) US9679740B2 (enExample)
JP (1) JP6254445B2 (enExample)
WO (1) WO2015104959A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6254445B2 (ja) * 2014-01-09 2017-12-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
WO2016016957A1 (ja) * 2014-07-30 2016-02-04 株式会社 日立ハイテクノロジーズ パターン高さ測定装置、及び荷電粒子線装置
US10090131B2 (en) * 2016-12-07 2018-10-02 Kla-Tencor Corporation Method and system for aberration correction in an electron beam system
CN111033677B (zh) * 2017-09-04 2022-08-23 株式会社日立高新技术 带电粒子线装置
JP6919063B2 (ja) * 2018-03-30 2021-08-11 株式会社日立ハイテク 荷電粒子線応用装置
WO2020078660A1 (en) * 2018-10-19 2020-04-23 Asml Netherlands B.V. System and method for aligning electron beams in multi-beam inspection apparatus
WO2020183551A1 (ja) * 2019-03-08 2020-09-17 株式会社日立ハイテク 荷電粒子ビーム装置
JP2021197263A (ja) * 2020-06-12 2021-12-27 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム画像取得方法
CN112071732B (zh) * 2020-07-28 2021-11-19 西安交通大学 一种可编码阵列式静电偏转器、聚焦偏转系统及设计方法
EP4086934A1 (en) * 2021-05-04 2022-11-09 ASML Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample
EP4268257A1 (en) * 2020-12-22 2023-11-01 ASML Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0260042A (ja) * 1988-08-24 1990-02-28 Hitachi Ltd 荷電粒子線応用装置の駆動電源
JP2821153B2 (ja) * 1988-11-24 1998-11-05 株式会社日立製作所 荷電粒子線応用装置
JP3867048B2 (ja) * 2003-01-08 2007-01-10 株式会社日立ハイテクノロジーズ モノクロメータ及びそれを用いた走査電子顕微鏡
US7462828B2 (en) 2005-04-28 2008-12-09 Hitachi High-Technologies Corporation Inspection method and inspection system using charged particle beam
JP4943733B2 (ja) * 2005-04-28 2012-05-30 株式会社日立ハイテクノロジーズ 荷電粒子ビームを用いた検査方法及び検査装置
JP4988216B2 (ja) 2006-02-03 2012-08-01 株式会社日立ハイテクノロジーズ 収差補正装置を搭載した荷電粒子線装置
JP2008181786A (ja) 2007-01-25 2008-08-07 Hitachi High-Technologies Corp 荷電粒子線装置
EP2132763B1 (en) 2007-02-22 2014-05-07 Applied Materials Israel Ltd. High throughput sem tool
JP4977509B2 (ja) * 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5237734B2 (ja) 2008-09-24 2013-07-17 日本電子株式会社 収差補正装置および該収差補正装置を備える荷電粒子線装置
JP6254445B2 (ja) * 2014-01-09 2017-12-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置

Also Published As

Publication number Publication date
US20170271121A1 (en) 2017-09-21
US9679740B2 (en) 2017-06-13
US10424459B2 (en) 2019-09-24
US20160329186A1 (en) 2016-11-10
WO2015104959A1 (ja) 2015-07-16
JP2015130309A (ja) 2015-07-16

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