JP6243616B2 - 露光装置および物品の製造方法 - Google Patents

露光装置および物品の製造方法 Download PDF

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Publication number
JP6243616B2
JP6243616B2 JP2013064919A JP2013064919A JP6243616B2 JP 6243616 B2 JP6243616 B2 JP 6243616B2 JP 2013064919 A JP2013064919 A JP 2013064919A JP 2013064919 A JP2013064919 A JP 2013064919A JP 6243616 B2 JP6243616 B2 JP 6243616B2
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region
shape
shielding plate
light shielding
exposure apparatus
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JP2013064919A
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English (en)
Japanese (ja)
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JP2014192255A5 (https=
JP2014192255A (ja
Inventor
淳生 遠藤
淳生 遠藤
雄己 内田
雄己 内田
宏明 板橋
宏明 板橋
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013064919A priority Critical patent/JP6243616B2/ja
Priority to KR1020140031370A priority patent/KR101662882B1/ko
Publication of JP2014192255A publication Critical patent/JP2014192255A/ja
Publication of JP2014192255A5 publication Critical patent/JP2014192255A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2043—Photolithographic processes using an anti-reflective coating

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013064919A 2013-03-26 2013-03-26 露光装置および物品の製造方法 Active JP6243616B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013064919A JP6243616B2 (ja) 2013-03-26 2013-03-26 露光装置および物品の製造方法
KR1020140031370A KR101662882B1 (ko) 2013-03-26 2014-03-18 노광 장치 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013064919A JP6243616B2 (ja) 2013-03-26 2013-03-26 露光装置および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014192255A JP2014192255A (ja) 2014-10-06
JP2014192255A5 JP2014192255A5 (https=) 2016-05-19
JP6243616B2 true JP6243616B2 (ja) 2017-12-06

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ID=51838271

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JP2013064919A Active JP6243616B2 (ja) 2013-03-26 2013-03-26 露光装置および物品の製造方法

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JP (1) JP6243616B2 (https=)
KR (1) KR101662882B1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017150388A1 (ja) * 2016-02-29 2017-09-08 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、遮光装置、及び露光方法
CN105511236B (zh) * 2016-02-29 2018-01-09 深圳市华星光电技术有限公司 光传导装置和曝光机
KR102567319B1 (ko) 2016-04-28 2023-08-16 엘지디스플레이 주식회사 분할노광 장치 및 이를 이용한 액정표시장치의 제조방법
CN113840891B (zh) * 2019-05-22 2023-08-29 株式会社力森诺科 半导体装置的制造方法
JP7550559B2 (ja) * 2020-07-27 2024-09-13 キヤノン株式会社 走査露光装置、走査露光方法および物品製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3316697B2 (ja) * 1992-10-22 2002-08-19 株式会社ニコン 投影光学装置、レーザ装置、走査型露光装置、走査露光方法、及び該方法を用いたデバイス製造方法
JP3316710B2 (ja) * 1993-12-22 2002-08-19 株式会社ニコン 露光装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3711586B2 (ja) * 1995-06-02 2005-11-02 株式会社ニコン 走査露光装置
JP4135824B2 (ja) * 1998-03-04 2008-08-20 学校法人東京電機大学 スキャン投影露光方法およびスキャン投影露光装置
JP2000284494A (ja) * 1999-03-31 2000-10-13 Seiko Epson Corp 露光装置
JP2001215718A (ja) 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2002025897A (ja) * 2000-07-10 2002-01-25 Nikon Corp 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法
JP2004335864A (ja) * 2003-05-09 2004-11-25 Nikon Corp 露光装置及び露光方法
KR101006435B1 (ko) * 2003-09-01 2011-01-06 삼성전자주식회사 노광 마스크, 이를 포함하는 노광 장치 및 이를 이용한표시 장치용 표시판의 제조 방법
JP4838698B2 (ja) * 2006-12-19 2011-12-14 キヤノン株式会社 露光装置およびデバイス製造方法
JP5853343B2 (ja) * 2011-07-29 2016-02-09 株式会社ブイ・テクノロジー マイクロレンズアレイを使用したスキャン露光装置
JP2013238670A (ja) * 2012-05-11 2013-11-28 Canon Inc 露光装置、露光方法、デバイスの製造方法及び開口板

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Publication number Publication date
KR101662882B1 (ko) 2016-10-05
KR20140117280A (ko) 2014-10-07
JP2014192255A (ja) 2014-10-06

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