JP6190264B2 - 半導体製造装置 - Google Patents
半導体製造装置 Download PDFInfo
- Publication number
- JP6190264B2 JP6190264B2 JP2013257774A JP2013257774A JP6190264B2 JP 6190264 B2 JP6190264 B2 JP 6190264B2 JP 2013257774 A JP2013257774 A JP 2013257774A JP 2013257774 A JP2013257774 A JP 2013257774A JP 6190264 B2 JP6190264 B2 JP 6190264B2
- Authority
- JP
- Japan
- Prior art keywords
- tray
- carrier
- upper lid
- transport
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
- H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
前記上蓋の下面に前記半導体パッケージが接触して前記上蓋が上方に持ち上げられる異常を検出する変位検出部と、を備える半導体製造装置が提供される。
Claims (6)
- 電磁波シールドを行うべき未シールドの半導体パッケージを搬送するアームの基部に取り付けられ半導体パッケージの上面よりも上方に配置される上蓋と、
前記上蓋の下面に前記半導体パッケージが接触して前記上蓋が上方に持ち上げられる異常を検出する変位検出部と、を備え、
前記上蓋は、トレイ収納供給部から半導体パッケージが搭載されたトレイを取り出して第1搬送台に引き渡すためにトレイを把持する第1アームの基部に取り付けられる第1上蓋と、複数のトレイが搭載された搬送キャリアを第2搬送台に引き渡すために搬送キャリアを把持する第2アームの基部に取り付けられる第2上蓋と、を有する、半導体製造装置。 - 前記第1上蓋は、前記第1アームにより前記トレイを把持する際に、前記半導体パッケージの上面から所定間隔を隔てた上方に配置され、
前記第2上蓋は、前記第2アームにより前記搬送キャリアを把持する際に、前記半導体パッケージの上面から所定間隔を隔てた上方に配置される請求項1に記載の半導体製造装置。 - 前記半導体パッケージの上面よりも上方に前記上蓋を配置した状態で前記半導体パッケージを搬送し、搬送途中または搬送待機中に前記変位検出部にて前記異常が検出されると、前記半導体パッケージの搬送を停止する搬送制御部を備える請求項1または2に記載の半導体製造装置。
- 前記変位検出部は、前記上蓋の複数箇所のそれぞれに対応づけて設けられ各箇所が持ち上げられる前記異常をそれぞれ検出する複数の変位センサを有する請求項1乃至3のいずれか一項に記載の半導体製造装置。
- 前記上蓋は、前記複数の半導体パッケージを少なくとも部分的に覆うように前記複数の半導体パッケージの上面より上方に配置される請求項1乃至4のいずれかに記載の半導体製造装置。
- 前記上蓋は、1以上の所定数の前記半導体パッケージの上面の上方にそれぞれ分離して配置される複数の分割上蓋を有する請求項1乃至5のいずれかに記載の半導体製造装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013257774A JP6190264B2 (ja) | 2013-12-13 | 2013-12-13 | 半導体製造装置 |
TW103123684A TWI546883B (zh) | 2013-12-13 | 2014-07-09 | Semiconductor manufacturing device |
CN201410444602.6A CN104716079B (zh) | 2013-12-13 | 2014-09-03 | 半导体制造装置 |
US14/482,489 US9824905B2 (en) | 2013-12-13 | 2014-09-10 | Semiconductor manufacturing device and semiconductor manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013257774A JP6190264B2 (ja) | 2013-12-13 | 2013-12-13 | 半導体製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015115516A JP2015115516A (ja) | 2015-06-22 |
JP6190264B2 true JP6190264B2 (ja) | 2017-08-30 |
Family
ID=53367711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013257774A Active JP6190264B2 (ja) | 2013-12-13 | 2013-12-13 | 半導体製造装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9824905B2 (ja) |
JP (1) | JP6190264B2 (ja) |
CN (1) | CN104716079B (ja) |
TW (1) | TWI546883B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9991276B2 (en) * | 2015-09-11 | 2018-06-05 | Toshiba Memory Corporation | Semiconductor device |
KR20180080794A (ko) * | 2017-01-05 | 2018-07-13 | (주)테크윙 | 전자부품 핸들링 시스템 |
CN109244016B (zh) * | 2018-09-21 | 2020-03-03 | 英特尔产品(成都)有限公司 | 用于检测托盘盖开关机构异常的装置和方法 |
CN112063979B (zh) * | 2019-06-11 | 2023-12-22 | 北京北方华创微电子装备有限公司 | 半导体加工装置及相关磁控溅射装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5742168A (en) * | 1995-08-04 | 1998-04-21 | Advantest Corporation | Test section for use in an IC handler |
JPH1058367A (ja) * | 1996-08-23 | 1998-03-03 | Advantest Corp | Ic搬送装置 |
US6359253B1 (en) * | 2000-07-12 | 2002-03-19 | Advanced Micro Devices, Inc. | Unit-in-tray pocket checker |
KR100495819B1 (ko) * | 2003-06-14 | 2005-06-16 | 미래산업 주식회사 | 반도체 소자 테스트 핸들러의 소자 안착장치 |
JP2006284384A (ja) * | 2005-03-31 | 2006-10-19 | Fujitsu Ltd | 半導体装置の試験装置及び試験方法 |
CN101384913A (zh) * | 2006-01-17 | 2009-03-11 | 株式会社爱德万测试 | 电子部件试验装置以及电子部件的试验方法 |
JP4912080B2 (ja) * | 2006-08-16 | 2012-04-04 | 株式会社アドバンテスト | 電子部品ハンドリング装置およびその運用方法、ならびに試験用トレイおよびプッシャ |
US20080315376A1 (en) * | 2007-06-19 | 2008-12-25 | Jinbang Tang | Conformal EMI shielding with enhanced reliability |
KR101187306B1 (ko) * | 2007-11-06 | 2012-10-05 | 가부시키가이샤 아드반테스트 | 반송장치 및 전자부품 핸들링 장치 |
KR100950798B1 (ko) * | 2008-03-25 | 2010-04-02 | (주)테크윙 | 테스트트레이용 인서트 개방유닛 및 이를 이용한반도체소자의 장착방법 |
KR100877551B1 (ko) * | 2008-05-30 | 2009-01-07 | 윤점채 | 전자파 차폐 기능을 갖는 반도체 패키지, 그 제조방법 및 지그 |
JP4303773B1 (ja) | 2008-06-27 | 2009-07-29 | Tdk株式会社 | 密閉容器の蓋開閉システム及び蓋開閉方法 |
JP2010238878A (ja) | 2009-03-31 | 2010-10-21 | Tokyo Electron Ltd | 搬送室 |
US9362196B2 (en) | 2010-07-15 | 2016-06-07 | Kabushiki Kaisha Toshiba | Semiconductor package and mobile device using the same |
-
2013
- 2013-12-13 JP JP2013257774A patent/JP6190264B2/ja active Active
-
2014
- 2014-07-09 TW TW103123684A patent/TWI546883B/zh active
- 2014-09-03 CN CN201410444602.6A patent/CN104716079B/zh active Active
- 2014-09-10 US US14/482,489 patent/US9824905B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN104716079A (zh) | 2015-06-17 |
JP2015115516A (ja) | 2015-06-22 |
CN104716079B (zh) | 2018-03-27 |
US20150167157A1 (en) | 2015-06-18 |
US9824905B2 (en) | 2017-11-21 |
TWI546883B (zh) | 2016-08-21 |
TW201523775A (zh) | 2015-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5516482B2 (ja) | 基板搬送方法、基板搬送装置、及び塗布現像装置 | |
JP6190264B2 (ja) | 半導体製造装置 | |
KR101815081B1 (ko) | 기판 검사 장치 및 프로브 카드 반송 방법 | |
JP7018784B2 (ja) | コンタクト精度保証方法および検査装置 | |
TWI425590B (zh) | 基板處理裝置及其基板搬送方法 | |
CN106486403B (zh) | 基板处理装置和基板输送方法 | |
JPWO2013088547A1 (ja) | ウエハ搬送装置 | |
TWI462212B (zh) | Processing system and processing methods | |
KR20170064757A (ko) | 반도체 패키지들 수납 방법 | |
CN114467172A (zh) | 元件处理器 | |
JP6088964B2 (ja) | 半導体製造装置 | |
KR20190009508A (ko) | 다이 본딩 장치 | |
JP5369313B2 (ja) | 半導体チップ搭載装置 | |
KR102189288B1 (ko) | 다이 본딩 장치 | |
JP5606546B2 (ja) | ワーク処理装置 | |
KR20110113267A (ko) | 트레이 이송 방법, 이를 적용한 트레이 이송 장치 및 테스트 핸들러 | |
KR20190043731A (ko) | 다이 본딩 장치 | |
JP6016566B2 (ja) | 切削装置 | |
KR20100026748A (ko) | 반도체 패키지 제조용 웨이퍼 프레임 반송 장치 및 방법 | |
KR20130103898A (ko) | 웨이퍼 포장공정장치 및 포장방법 | |
JP2013258342A (ja) | 基板製造装置 | |
GB2419035A (en) | Methods and apparatus for processing the backsides of wafers | |
KR20150029361A (ko) | 소자핸들러 | |
TWM588876U (zh) | 料盤儲存裝置 | |
JP2006228886A (ja) | 基板の製造ライン |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160219 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161219 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170106 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170306 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170425 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20170607 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170616 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170707 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170804 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6190264 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |