JP6117593B2 - 描画装置および描画方法 - Google Patents

描画装置および描画方法 Download PDF

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Publication number
JP6117593B2
JP6117593B2 JP2013072739A JP2013072739A JP6117593B2 JP 6117593 B2 JP6117593 B2 JP 6117593B2 JP 2013072739 A JP2013072739 A JP 2013072739A JP 2013072739 A JP2013072739 A JP 2013072739A JP 6117593 B2 JP6117593 B2 JP 6117593B2
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JP
Japan
Prior art keywords
substrate
sub
scanning direction
optical head
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
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JP2013072739A
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English (en)
Japanese (ja)
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JP2014197125A (ja
Inventor
城田　浩行
浩行 城田
憲 重本
憲 重本
妥由 永井
妥由 永井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2013072739A priority Critical patent/JP6117593B2/ja
Priority to TW103101193A priority patent/TWI542955B/zh
Priority to KR1020140024337A priority patent/KR101588946B1/ko
Priority to CN201410125769.6A priority patent/CN104076621B/zh
Publication of JP2014197125A publication Critical patent/JP2014197125A/ja
Application granted granted Critical
Publication of JP6117593B2 publication Critical patent/JP6117593B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013072739A 2013-03-29 2013-03-29 描画装置および描画方法 Active JP6117593B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013072739A JP6117593B2 (ja) 2013-03-29 2013-03-29 描画装置および描画方法
TW103101193A TWI542955B (zh) 2013-03-29 2014-01-13 描繪裝置及描繪方法
KR1020140024337A KR101588946B1 (ko) 2013-03-29 2014-02-28 묘화 장치 및 묘화 방법
CN201410125769.6A CN104076621B (zh) 2013-03-29 2014-03-31 描画装置以及描画方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013072739A JP6117593B2 (ja) 2013-03-29 2013-03-29 描画装置および描画方法

Publications (2)

Publication Number Publication Date
JP2014197125A JP2014197125A (ja) 2014-10-16
JP6117593B2 true JP6117593B2 (ja) 2017-04-19

Family

ID=51597979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013072739A Active JP6117593B2 (ja) 2013-03-29 2013-03-29 描画装置および描画方法

Country Status (4)

Country Link
JP (1) JP6117593B2 (zh)
KR (1) KR101588946B1 (zh)
CN (1) CN104076621B (zh)
TW (1) TWI542955B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016123432A (ja) * 2014-12-26 2016-07-11 カシオ計算機株式会社 描画装置及び描画装置の描画制御方法
CN106647184B (zh) * 2016-12-31 2019-06-14 江苏九迪激光装备科技有限公司 一种直写式丝网制版设备的曝光方法
JP2020052075A (ja) * 2018-09-21 2020-04-02 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320943A (ja) * 1996-05-31 1997-12-12 Dainippon Screen Mfg Co Ltd 描画装置および自動焦点制御方法
US6031597A (en) * 1996-10-15 2000-02-29 Knirck; Jeffrey G. Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
JP4597675B2 (ja) * 2002-08-24 2010-12-15 マスクレス・リソグラフィー・インコーポレーテッド 連続直接書込み光リソグラフィ
JP2005266779A (ja) * 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法
JP2006220858A (ja) * 2005-02-09 2006-08-24 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2008129248A (ja) * 2006-11-20 2008-06-05 Dainippon Screen Mfg Co Ltd パターン描画装置及びパターン描画方法
JP4954930B2 (ja) 2008-03-27 2012-06-20 大日本スクリーン製造株式会社 データ変換方法、描画システムおよびプログラム
JP5215018B2 (ja) * 2008-03-28 2013-06-19 大日本スクリーン製造株式会社 画像記録装置
JP5205101B2 (ja) * 2008-03-28 2013-06-05 大日本スクリーン製造株式会社 パターン描画装置およびパターン描画方法
JP2009244808A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 距離計測方法及び露光装置
JP2011049409A (ja) * 2009-08-28 2011-03-10 Dainippon Screen Mfg Co Ltd パターン描画装置およびパターン描画方法
JP5371663B2 (ja) * 2009-09-29 2013-12-18 大日本スクリーン製造株式会社 パターン描画装置およびパターン描画方法

Also Published As

Publication number Publication date
CN104076621A (zh) 2014-10-01
CN104076621B (zh) 2016-09-14
TWI542955B (zh) 2016-07-21
KR20140118743A (ko) 2014-10-08
JP2014197125A (ja) 2014-10-16
TW201439689A (zh) 2014-10-16
KR101588946B1 (ko) 2016-01-26

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