JP6110107B2 - パターン形成方法 - Google Patents

パターン形成方法 Download PDF

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Publication number
JP6110107B2
JP6110107B2 JP2012249630A JP2012249630A JP6110107B2 JP 6110107 B2 JP6110107 B2 JP 6110107B2 JP 2012249630 A JP2012249630 A JP 2012249630A JP 2012249630 A JP2012249630 A JP 2012249630A JP 6110107 B2 JP6110107 B2 JP 6110107B2
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Japan
Prior art keywords
resist film
represented
group
resist
following formula
Prior art date
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JP2012249630A
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English (en)
Japanese (ja)
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JP2013218269A (ja
Inventor
浩明 富田
浩明 富田
靖博 吉井
靖博 吉井
平井 隆昭
隆昭 平井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2012249630A priority Critical patent/JP6110107B2/ja
Priority to TW102106721A priority patent/TWI585524B/zh
Priority to CN201310076590.1A priority patent/CN103309152B/zh
Publication of JP2013218269A publication Critical patent/JP2013218269A/ja
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Publication of JP6110107B2 publication Critical patent/JP6110107B2/ja
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Materials For Photolithography (AREA)
  • Photovoltaic Devices (AREA)
JP2012249630A 2012-03-13 2012-11-13 パターン形成方法 Active JP6110107B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012249630A JP6110107B2 (ja) 2012-03-13 2012-11-13 パターン形成方法
TW102106721A TWI585524B (zh) 2012-03-13 2013-02-26 A method for forming a resist pattern, a pattern forming method, a solar cell, and a positive resist composition
CN201310076590.1A CN103309152B (zh) 2012-03-13 2013-03-11 抗蚀图形的形成方法、图形形成方法、太阳能电池以及正型抗蚀组合物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012056395 2012-03-13
JP2012056395 2012-03-13
JP2012249630A JP6110107B2 (ja) 2012-03-13 2012-11-13 パターン形成方法

Publications (2)

Publication Number Publication Date
JP2013218269A JP2013218269A (ja) 2013-10-24
JP6110107B2 true JP6110107B2 (ja) 2017-04-05

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ID=49590390

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012249630A Active JP6110107B2 (ja) 2012-03-13 2012-11-13 パターン形成方法

Country Status (2)

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JP (1) JP6110107B2 (zh)
TW (1) TWI585524B (zh)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1115151A (ja) * 1997-05-01 1999-01-22 Tokyo Ohka Kogyo Co Ltd コンタクトホール形成用ポジ型ホトレジスト組成物およびコンタクトホールの形成方法
JP3710717B2 (ja) * 2001-03-06 2005-10-26 東京応化工業株式会社 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法
JP4239134B2 (ja) * 2001-06-26 2009-03-18 株式会社Sumco 太陽電池用の誘電体分離ウェーハの製造方法
JP2004219536A (ja) * 2003-01-10 2004-08-05 Hitachi Chem Co Ltd 感光性樹脂組成物、回路形成用基板、レジストパターンの製造法、プリント配線板の製造法
JP2005258175A (ja) * 2004-03-12 2005-09-22 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
EP1724640B1 (en) * 2004-03-12 2015-11-18 Toray Industries, Inc. Positive light-sensitive resin composition and relief pattern using the same
JP2006156646A (ja) * 2004-11-29 2006-06-15 Sharp Corp 太陽電池の製造方法
JP2009133924A (ja) * 2007-11-28 2009-06-18 Jsr Corp 被膜形成方法及びそれに用いるポジ型感光性樹脂組成物
JP2010118473A (ja) * 2008-11-12 2010-05-27 PVG Solutions株式会社 太陽電池セルおよびその製造方法
JP2010147102A (ja) * 2008-12-16 2010-07-01 Sharp Corp 太陽電池セルの製造方法

Also Published As

Publication number Publication date
JP2013218269A (ja) 2013-10-24
TWI585524B (zh) 2017-06-01
TW201348868A (zh) 2013-12-01

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