JP6083089B2 - 半導体装置、表示装置および電子機器 - Google Patents
半導体装置、表示装置および電子機器 Download PDFInfo
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- JP6083089B2 JP6083089B2 JP2013066219A JP2013066219A JP6083089B2 JP 6083089 B2 JP6083089 B2 JP 6083089B2 JP 2013066219 A JP2013066219 A JP 2013066219A JP 2013066219 A JP2013066219 A JP 2013066219A JP 6083089 B2 JP6083089 B2 JP 6083089B2
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/13—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body combined with thin-film or thick-film passive components
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H10K59/1216—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being capacitors
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- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
Description
1.第1の実施の形態(酸化物半導体膜および第1導電膜が容量素子の一方の電極を構成する例)
2.第2の実施の形態(酸化物半導体膜および第1導電膜が表示層を間にした一対の電極の一方を構成する例)
図1は第1の実施の形態に係る半導体装置(半導体装置10)の断面構成を表している。半導体装置10は、基板11上の互いに隣り合う位置にトランジスタ10Tおよび容量素子10Cを有するものであり、例えば図2に示したような表示装置1に適用される。
次に、再び図1を参照して、半導体装置10の詳細な構成について説明する。
図10は、本技術の第2の実施の形態に係る表示装置(表示装置2)の断面構成を表したものである。この表示装置2では、第1導電膜12Cおよび半導体膜14Cが有機EL素子の陽極(第1電極21)として用いられている。この点において表示装置2は、上記第1の実施の形態の半導体装置10と異なるものである。
(2L)/λ+Φ/(2π)=m
(式中、Lは一端と他端との間の光学的距離、Φは一端で生じる反射光の位相シフトΦ1 と他端で生じる反射光の位相シフトΦ2 との和(Φ=Φ1 +Φ2 )(rad)、λは他端(第2電極24)の側から取り出したい光のスペクトルのピーク波長、mはLが正となる整数をそれぞれ表す。なお、数1においてLおよびλは単位が共通すればよいが、例えば(nm)を単位とする。)
上記実施の形態の表示装置1,2は、例えば、図12に示したようなモジュールとして、後述する適用例1〜5などの種々の電子機器に組み込まれる。このモジュールは、例えば、基板11の一辺に、対向基板25から露出した領域210を設け、この露出した領域210に、信号線駆動回路120および走査線駆動回路130の配線を延長して外部接続端子(図示せず)を形成したものである。外部接続端子には、信号の入出力のためのフレキシブルプリント配線基板(FPC;Flexible Printed Circuit)220が設けられていてもよい。
図13は、上記実施の形態の表示装置1,2が適用されるテレビジョン装置の外観を表したものである。このテレビジョン装置は、例えば、フロントパネル310およびフィルターガラス320を含む映像表示画面部300を有しており、この映像表示画面部300は、上記各実施の形態に係る表示装置1,2により構成されている。
図14A,14Bは、上記実施の形態の表示装置1,2が適用されるデジタルカメラの外観を表したものである。このデジタルカメラは、例えば、フラッシュ用の発光部410、表示部420、メニュースイッチ430およびシャッターボタン440を有しており、その表示部420は、上記各実施の形態に係る表示装置1,2により構成されている。
図15は、上記実施の形態の表示装置1,2が適用されるノート型パーソナルコンピュータの外観を表したものである。このノート型パーソナルコンピュータは、例えば、本体510,文字等の入力操作のためのキーボード520および画像を表示する表示部530を有しており、その表示部530は、上記各実施の形態に係る表示装置1,2により構成されている。
図16は、上記実施の形態の表示装置1,2が適用されるビデオカメラの外観を表したものである。このビデオカメラは、例えば、本体部610,この本体部610の前方側面に設けられた被写体撮影用のレンズ620,撮影時のスタート/ストップスイッチ630および表示部640を有しており、その表示部640は、上記各実施の形態に係る表示装置1,2により構成されている。
図17A,17Bは、上記実施の形態の表示装置が適用される携帯電話機の外観を表したものである。この携帯電話機は、例えば、上側筐体710と下側筐体720とを連結部(ヒンジ部)730で連結したものであり、ディスプレイ740,サブディスプレイ750,ピクチャーライト760およびカメラ770を有している。そのディスプレイ740またはサブディスプレイ750は、上記各実施の形態に係る表示装置1,2により構成されている。
(1)トランジスタと共に、酸化物半導体膜と、前記酸化物半導体膜に電気的に接続された第1導電膜と、前記第1導電膜と酸化物半導体膜との間の第1絶縁膜とを備えた半導体装置。
(2)容量素子を有し、前記酸化物半導体膜および前記第1導電膜は、前記容量素子の一方の電極である前記(1)記載の半導体装置。
(3)前記容量素子は、前記酸化物半導体膜を間にして前記第1導電膜に対向する他方の電極と、前記他方の電極と前記酸化物半導体膜との間の第2絶縁膜とを有する前記(2)記載の半導体装置。
(4)前記トランジスタのゲート電極と同層に前記第1導電膜、前記トランジスタのチャネル膜と同層に前記酸化物半導体膜がそれぞれ配置され、前記第1絶縁膜は前記ゲート電極と前記チャネル膜との間に延在している前記(1)乃至(3)のうちいずれか1つ記載の半導体装置。
(5)前記トランジスタのゲート電極と前記第1導電膜、前記トランジスタのチャネル膜と前記酸化物半導体膜はそれぞれ同一の構成材料からなる前記(4)記載の半導体装置。
(6)前記第1導電膜は金属材料を含む前記(1)乃至(5)のうちいずれか1つ記載の半導体装置。
(7)前記第1導電膜と前記酸化物半導体膜とは同電位である前記(1)乃至(6)のうちいずれか1つ記載の半導体装置。
(8)表示層および前記表示層を駆動する半導体装置を備え、前記半導体装置は、トランジスタと共に、酸化物半導体膜と、前記酸化物半導体膜に電気的に接続された第1導電膜と、前記第1導電膜と酸化物半導体膜との間の第1絶縁膜とを含む表示装置。
(9)前記酸化物半導体膜および前記第1導電膜は、前記表示層を間にして対向する一対の電極のうちの一方の電極である前記(8)記載の表示装置。
(10)前記表示層は発光層を含む有機層である前記(9)記載の表示装置。
(11)前記半導体装置は容量素子を有し、前記酸化物半導体膜および前記第1導電膜は、前記容量素子の一方の電極である前記(8)記載の表示装置。
(12)表示層および前記表示層を駆動する半導体装置を有する表示装置を備え、前記半導体装置は、トランジスタと共に、酸化物半導体膜と、前記酸化物半導体膜に電気的に接続された第1導電膜と、前記第1導電膜と酸化物半導体膜との間の第1絶縁膜とを有する電子機器。
Claims (12)
- ゲート電極および前記ゲート電極に対向するチャネル膜を有するトランジスタと、
酸化物半導体膜および前記酸化物半導体膜に電気的に接続された第1導電膜が一方の電極、前記酸化物半導体膜を間にして前記第1導電膜に対向する第2導電膜が他方の電極を構成する容量素子と、
前記第1導電膜と前記酸化物半導体膜との間の第1絶縁膜と、
前記第2導電膜と前記酸化物半導体膜との間の第2絶縁膜とを備え、
前記ゲート電極と同層に前記第1導電膜、前記チャネル膜と同層に前記酸化物半導体膜がそれぞれ配置され、前記第1絶縁膜は前記ゲート電極と前記チャネル膜との間に延在している
半導体装置。 - 前記ゲート電極と前記第1導電膜、前記チャネル膜と前記酸化物半導体膜はそれぞれ同一の構成材料からなる
請求項1記載の半導体装置。 - 前記第1導電膜は金属材料を含む
請求項1または2記載の半導体装置。 - 前記第1導電膜と前記酸化物半導体膜とは同電位である
請求項1乃至3のうちいずれか1つ記載の半導体装置。 - 前記第1絶縁膜を貫通し、前記酸化物半導体膜に前記第1導電膜を電気的に接続する配線を有する
請求項1乃至4のうちいずれか1つ記載の半導体装置。 - 前記配線は、前記酸化物半導体膜に接している
請求項5記載の半導体装置。 - 表示層および前記表示層を駆動する半導体装置を備え、
前記半導体装置は、
ゲート電極および前記ゲート電極に対向するチャネル膜を有するトランジスタと、
酸化物半導体膜および前記酸化物半導体膜に電気的に接続された第1導電膜が一方の電極、前記酸化物半導体膜を間にして前記第1導電膜に対向する第2導電膜が他方の電極を構成する容量素子と、
前記第1導電膜と前記酸化物半導体膜との間の第1絶縁膜と、
前記第2導電膜と前記酸化物半導体膜との間の第2絶縁膜とを備え、
前記ゲート電極と同層に前記第1導電膜、前記チャネル膜と同層に前記酸化物半導体膜がそれぞれ配置され、前記第1絶縁膜は前記ゲート電極と前記チャネル膜との間に延在している
表示装置。 - 酸化物半導体膜および前記酸化物半導体膜に電気的に接続された第1導電膜により構成された第1電極と、
前記第1電極に対向する第2電極と、
前記第1電極と前記第2電極との間の表示層と、
ゲート電極および前記ゲート電極に対向するチャネル膜を有し、前記表示層を駆動するトランジスタと、
前記第1導電膜と前記酸化物半導体膜との間の第1絶縁膜とを備え、
前記ゲート電極と同層に前記第1導電膜、前記チャネル膜と同層に前記酸化物半導体膜がそれぞれ配置され、前記第1絶縁膜は前記ゲート電極と前記チャネル膜との間に延在している
表示装置。 - 前記表示層は発光層を含む有機層である
請求項7または8記載の表示装置。 - 前記第1絶縁膜を貫通し、前記酸化物半導体膜に前記第1導電膜を電気的に接続する配線を有する
請求項7乃至9のうちいずれか1つ記載の半導体装置。 - 表示層および前記表示層を駆動する半導体装置を有する表示装置を備え、
前記半導体装置は、
ゲート電極および前記ゲート電極に対向するチャネル膜を有するトランジスタと、
酸化物半導体膜および前記酸化物半導体膜に電気的に接続された第1導電膜が一方の電極、前記酸化物半導体膜を間にして前記第1導電膜に対向する第2導電膜が他方の電極を構成する容量素子と、
前記第1導電膜と前記酸化物半導体膜との間の第1絶縁膜と、
前記第2導電膜と前記酸化物半導体膜との間の第2絶縁膜とを備え、
前記ゲート電極と同層に前記第1導電膜、前記チャネル膜と同層に前記酸化物半導体膜がそれぞれ配置され、前記第1絶縁膜は前記ゲート電極と前記チャネル膜との間に延在している
電子機器。 - 表示装置を備え、
前記表示装置は、
酸化物半導体膜および前記酸化物半導体膜に電気的に接続された第1導電膜により構成された第1電極と、
前記第1電極に対向する第2電極と、
前記第1電極と前記第2電極との間の表示層と、
ゲート電極および前記ゲート電極に対向するチャネル膜を有し、前記表示層を駆動するトランジスタと、
前記第1導電膜と前記酸化物半導体膜との間の第1絶縁膜とを備え、
前記ゲート電極と同層に前記第1導電膜、前記チャネル膜と同層に前記酸化物半導体膜がそれぞれ配置され、前記第1絶縁膜は前記ゲート電極と前記チャネル膜との間に延在している
電子機器。
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TW103105342A TW201438253A (zh) | 2013-03-27 | 2014-02-18 | 半導體裝置、顯示單元及電子設備 |
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US14/202,852 US9178074B2 (en) | 2013-03-27 | 2014-03-10 | Semiconductor device, display unit, and electronic apparatus |
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US9178074B2 (en) | 2015-11-03 |
US20140291639A1 (en) | 2014-10-02 |
TW201438253A (zh) | 2014-10-01 |
JP2014192319A (ja) | 2014-10-06 |
CN104078510A (zh) | 2014-10-01 |
KR20140118739A (ko) | 2014-10-08 |
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