JP6019329B2 - 表示装置および電子機器 - Google Patents

表示装置および電子機器 Download PDF

Info

Publication number
JP6019329B2
JP6019329B2 JP2011078493A JP2011078493A JP6019329B2 JP 6019329 B2 JP6019329 B2 JP 6019329B2 JP 2011078493 A JP2011078493 A JP 2011078493A JP 2011078493 A JP2011078493 A JP 2011078493A JP 6019329 B2 JP6019329 B2 JP 6019329B2
Authority
JP
Japan
Prior art keywords
semiconductor layer
film
storage capacitor
conductive film
capacitor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011078493A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012212077A (ja
JP2012212077A5 (enExample
Inventor
成浩 諸沢
成浩 諸沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Joled Inc
Original Assignee
Joled Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Joled Inc filed Critical Joled Inc
Priority to JP2011078493A priority Critical patent/JP6019329B2/ja
Priority to US13/417,989 priority patent/US9412763B2/en
Priority to KR1020120028244A priority patent/KR20120112045A/ko
Priority to TW101109668A priority patent/TWI552330B/zh
Priority to CN201210080135.4A priority patent/CN102738405B/zh
Publication of JP2012212077A publication Critical patent/JP2012212077A/ja
Publication of JP2012212077A5 publication Critical patent/JP2012212077A5/ja
Priority to US15/201,426 priority patent/US9721977B2/en
Application granted granted Critical
Publication of JP6019329B2 publication Critical patent/JP6019329B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136213—Storage capacitors associated with the pixel electrode
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6757—Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • H10D86/423—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/481—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs integrated with passive devices, e.g. auxiliary capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
    • H10F77/247—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising indium tin oxide [ITO]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H10K10/84—Ohmic electrodes, e.g. source or drain electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1216—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being capacitors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Geometry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2011078493A 2011-03-31 2011-03-31 表示装置および電子機器 Active JP6019329B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011078493A JP6019329B2 (ja) 2011-03-31 2011-03-31 表示装置および電子機器
US13/417,989 US9412763B2 (en) 2011-03-31 2012-03-12 Display device and electronic unit
KR1020120028244A KR20120112045A (ko) 2011-03-31 2012-03-20 표시 장치 및 전자 기기
TW101109668A TWI552330B (zh) 2011-03-31 2012-03-21 顯示裝置及電子單元
CN201210080135.4A CN102738405B (zh) 2011-03-31 2012-03-23 显示装置和电子设备
US15/201,426 US9721977B2 (en) 2011-03-31 2016-07-02 Display device and electronic unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011078493A JP6019329B2 (ja) 2011-03-31 2011-03-31 表示装置および電子機器

Publications (3)

Publication Number Publication Date
JP2012212077A JP2012212077A (ja) 2012-11-01
JP2012212077A5 JP2012212077A5 (enExample) 2014-04-24
JP6019329B2 true JP6019329B2 (ja) 2016-11-02

Family

ID=46926809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011078493A Active JP6019329B2 (ja) 2011-03-31 2011-03-31 表示装置および電子機器

Country Status (5)

Country Link
US (2) US9412763B2 (enExample)
JP (1) JP6019329B2 (enExample)
KR (1) KR20120112045A (enExample)
CN (1) CN102738405B (enExample)
TW (1) TWI552330B (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6005401B2 (ja) 2011-06-10 2016-10-12 株式会社半導体エネルギー研究所 半導体装置の作製方法
TWI596778B (zh) 2012-06-29 2017-08-21 半導體能源研究所股份有限公司 半導體裝置及半導體裝置的製造方法
JP2014093433A (ja) * 2012-11-05 2014-05-19 Sony Corp 半導体装置、表示装置および電子機器
US9246011B2 (en) * 2012-11-30 2016-01-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR101996438B1 (ko) 2012-12-13 2019-07-05 삼성디스플레이 주식회사 표시 장치용 기판, 이를 포함한 표시 장치 및 표시 장치의 제조 방법
US9905585B2 (en) * 2012-12-25 2018-02-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device comprising capacitor
JP6111458B2 (ja) * 2013-03-28 2017-04-12 株式会社Ｊｏｌｅｄ 半導体装置、表示装置および電子機器
US9852687B2 (en) 2013-09-04 2017-12-26 Joled Inc. Display device and driving method
JP2015108731A (ja) * 2013-12-05 2015-06-11 ソニー株式会社 半導体装置およびその製造方法、並びに表示装置および電子機器
JP2015122417A (ja) * 2013-12-24 2015-07-02 ソニー株式会社 半導体装置およびその製造方法、並びに表示装置および電子機器
TWI536464B (zh) 2014-01-15 2016-06-01 友達光電股份有限公司 電晶體及其製造方法
CN106062619B (zh) * 2014-02-28 2019-04-16 凸版印刷株式会社 液晶显示装置
US9640669B2 (en) 2014-03-13 2017-05-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic appliance including the semiconductor device, the display device, and the display module
TWI548067B (zh) 2014-05-22 2016-09-01 友達光電股份有限公司 畫素結構
CN110600486B (zh) * 2014-07-23 2023-04-28 索尼公司 显示装置、制造显示装置的方法以及电子设备
KR102494418B1 (ko) 2015-04-13 2023-01-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 패널, 데이터 처리 장치, 및 표시 패널의 제조방법
KR102412493B1 (ko) * 2015-09-08 2022-06-23 삼성디스플레이 주식회사 액정 표시 장치 및 그 제조방법
JP6850096B2 (ja) * 2015-09-24 2021-03-31 株式会社半導体エネルギー研究所 半導体装置の作製方法及び電子機器の作製方法
US10109650B2 (en) 2016-04-01 2018-10-23 Joled Inc. Semiconductor device and active matrix substrate using semiconductor device
KR20170119801A (ko) * 2016-04-19 2017-10-30 삼성디스플레이 주식회사 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법
KR102854033B1 (ko) * 2016-11-30 2025-09-02 엘지디스플레이 주식회사 유기 발광 표시 장치

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3744227B2 (ja) * 1998-09-24 2006-02-08 セイコーエプソン株式会社 電気光学装置及びその製造方法並びに電子機器
JP4366732B2 (ja) * 1998-09-30 2009-11-18 ソニー株式会社 電気光学装置の製造方法及び電気光学装置用の駆動基板の製造方法
JP3763381B2 (ja) * 1999-03-10 2006-04-05 シャープ株式会社 液晶表示装置の製造方法
JP3464944B2 (ja) * 1999-07-02 2003-11-10 シャープ株式会社 薄膜トランジスタ基板、その製造方法および液晶表示装置
JP4700156B2 (ja) * 1999-09-27 2011-06-15 株式会社半導体エネルギー研究所 半導体装置
US6563559B2 (en) * 2000-02-02 2003-05-13 Sanyo Electric Co., Ltd. Reflective liquid crystal display having increase luminance for each display pixel
US7285459B2 (en) * 2001-08-06 2007-10-23 Samsung Sdi Co., Ltd. Flat panel display with high capacitance and method of manufacturing the same
KR100930916B1 (ko) * 2003-03-20 2009-12-10 엘지디스플레이 주식회사 횡전계형 액정표시장치 및 그 제조방법
KR101039022B1 (ko) * 2004-02-11 2011-06-03 삼성전자주식회사 접촉부 및 그의 제조 방법, 박막 트랜지스터 표시판 및그의 제조방법
JP4444035B2 (ja) * 2004-04-21 2010-03-31 シャープ株式会社 表示装置用アクティブマトリクス基板およびその製造方法
KR101085139B1 (ko) * 2004-12-03 2011-11-21 엘지디스플레이 주식회사 박막 트랜지스터 어레이 기판 및 그 제조 방법
JP2007013013A (ja) * 2005-07-01 2007-01-18 Sharp Corp 半導体装置、半導体装置製造方法、薄膜トランジスタアレイ基板、及び、液晶表示装置
JP2007188936A (ja) * 2006-01-11 2007-07-26 Epson Imaging Devices Corp 表示装置
JP5015471B2 (ja) 2006-02-15 2012-08-29 財団法人高知県産業振興センター 薄膜トランジスタ及びその製法
JP4930704B2 (ja) * 2006-03-14 2012-05-16 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置及び電子機器
KR100782461B1 (ko) * 2006-04-05 2007-12-05 삼성에스디아이 주식회사 Ｔｆｔ패널 및 이의 제조 방법, 그리고 이를 구비하는 유기전계 발광 표시 장치
JP4967631B2 (ja) * 2006-12-07 2012-07-04 三菱電機株式会社 表示装置
EP2096619B1 (en) * 2006-12-22 2016-04-13 Sharp Kabushiki Kaisha Active matrix substrate and display panel equipped with the same
US8354674B2 (en) * 2007-06-29 2013-01-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device wherein a property of a first semiconductor layer is different from a property of a second semiconductor layer
US9176353B2 (en) * 2007-06-29 2015-11-03 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
JP5372435B2 (ja) * 2008-09-02 2013-12-18 株式会社ジャパンディスプレイ 表示装置
JP5491833B2 (ja) * 2008-12-05 2014-05-14 株式会社半導体エネルギー研究所 半導体装置
US8441007B2 (en) * 2008-12-25 2013-05-14 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
JP2010177223A (ja) * 2009-01-27 2010-08-12 Videocon Global Ltd 液晶表示装置及びその製造方法
JP2010204239A (ja) * 2009-03-02 2010-09-16 Seiko Epson Corp 液晶装置および電子機器
KR101041141B1 (ko) * 2009-03-03 2011-06-13 삼성모바일디스플레이주식회사 유기전계발광표시장치 및 그의 제조방법
KR101668380B1 (ko) * 2009-05-19 2016-10-24 삼성디스플레이 주식회사 액정 표시 장치
KR101084233B1 (ko) * 2009-10-13 2011-11-16 삼성모바일디스플레이주식회사 박막트랜지스터 및 그 제조 방법
KR101994632B1 (ko) * 2009-12-25 2019-07-02 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR101084261B1 (ko) * 2010-03-17 2011-11-16 삼성모바일디스플레이주식회사 박막 트랜지스터, 이를 구비한 표시 장치, 및 그 제조 방법들
KR101710179B1 (ko) * 2010-06-03 2017-02-27 삼성디스플레이 주식회사 평판 표시 장치 및 그 제조 방법
KR20120044042A (ko) * 2010-10-27 2012-05-07 삼성모바일디스플레이주식회사 유기 발광 표시 장치 및 그 제조 방법
WO2012073862A1 (ja) * 2010-12-01 2012-06-07 シャープ株式会社 半導体装置、ｔｆｔ基板、ならびに半導体装置およびｔｆｔ基板の製造方法
JP5766481B2 (ja) * 2011-03-29 2015-08-19 株式会社Ｊｏｌｅｄ 表示装置および電子機器
JP6091905B2 (ja) * 2012-01-26 2017-03-08 株式会社半導体エネルギー研究所 半導体装置
TW201338173A (zh) * 2012-02-28 2013-09-16 Sony Corp 電晶體、製造電晶體之方法、顯示裝置及電子機器

Also Published As

Publication number Publication date
US20120249904A1 (en) 2012-10-04
US20160315107A1 (en) 2016-10-27
CN102738405B (zh) 2016-12-14
CN102738405A (zh) 2012-10-17
TW201248846A (en) 2012-12-01
TWI552330B (zh) 2016-10-01
US9721977B2 (en) 2017-08-01
US9412763B2 (en) 2016-08-09
KR20120112045A (ko) 2012-10-11
JP2012212077A (ja) 2012-11-01

Similar Documents

Publication Publication Date Title
JP6019329B2 (ja) 表示装置および電子機器
JP6111398B2 (ja) 表示装置および電子機器
JP5766481B2 (ja) 表示装置および電子機器
JP6111458B2 (ja) 半導体装置、表示装置および電子機器
US20150162399A1 (en) Semiconductor device, method of manufacturing the same, display unit, and electronic apparatus
JP2014093433A (ja) 半導体装置、表示装置および電子機器
JP6142136B2 (ja) トランジスタの製造方法、表示装置の製造方法および電子機器の製造方法
US20150179681A1 (en) Semiconductor device, method of manufacturing the same, display unit, and electronic apparatus
JP2016100585A (ja) 半導体装置およびその製造方法、ならびに表示装置および電子機器
JP6019331B2 (ja) トランジスタ、半導体装置、表示装置および電子機器、並びに半導体装置の製造方法
JP2013207015A (ja) 半導体装置、表示装置および電子機器

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140307

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140307

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20141126

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141224

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150108

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20150327

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150707

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150713

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151222

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160208

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160809

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160826

R150 Certificate of patent or registration of utility model

Ref document number: 6019329

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S303 Written request for registration of pledge or change of pledge

Free format text: JAPANESE INTERMEDIATE CODE: R316303

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S803 Written request for registration of cancellation of provisional registration

Free format text: JAPANESE INTERMEDIATE CODE: R316803

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250