JP6008784B2 - ペリクルフレーム及びその製作方法とペリクル - Google Patents

ペリクルフレーム及びその製作方法とペリクル Download PDF

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Publication number
JP6008784B2
JP6008784B2 JP2013084498A JP2013084498A JP6008784B2 JP 6008784 B2 JP6008784 B2 JP 6008784B2 JP 2013084498 A JP2013084498 A JP 2013084498A JP 2013084498 A JP2013084498 A JP 2013084498A JP 6008784 B2 JP6008784 B2 JP 6008784B2
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JP
Japan
Prior art keywords
pellicle frame
pellicle
film
pure aluminum
aluminum film
Prior art date
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JP2013084498A
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English (en)
Japanese (ja)
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JP2014206661A (ja
Inventor
一敏 関原
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2013084498A priority Critical patent/JP6008784B2/ja
Priority to KR1020140007782A priority patent/KR102155008B1/ko
Priority to EP14152984.2A priority patent/EP2793081B1/en
Priority to US14/169,283 priority patent/US9395634B2/en
Priority to TW103113333A priority patent/TWI536123B/zh
Priority to CN201410150086.6A priority patent/CN104102089A/zh
Publication of JP2014206661A publication Critical patent/JP2014206661A/ja
Priority to HK14111952.7A priority patent/HK1198452A1/xx
Application granted granted Critical
Publication of JP6008784B2 publication Critical patent/JP6008784B2/ja
Active legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Laminated Bodies (AREA)
JP2013084498A 2013-04-15 2013-04-15 ペリクルフレーム及びその製作方法とペリクル Active JP6008784B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2013084498A JP6008784B2 (ja) 2013-04-15 2013-04-15 ペリクルフレーム及びその製作方法とペリクル
KR1020140007782A KR102155008B1 (ko) 2013-04-15 2014-01-22 펠리클 프레임 및 이것을 이용한 펠리클
EP14152984.2A EP2793081B1 (en) 2013-04-15 2014-01-29 A pellicle frame and a pellicle with this
US14/169,283 US9395634B2 (en) 2013-04-15 2014-01-31 Pellicle frame and pellicle with this
TW103113333A TWI536123B (zh) 2013-04-15 2014-04-11 防塵薄膜組件框架以及採用該框架的防塵薄膜組件
CN201410150086.6A CN104102089A (zh) 2013-04-15 2014-04-15 防尘薄膜组件框架以及采用该框架的防尘薄膜组件
HK14111952.7A HK1198452A1 (en) 2013-04-15 2014-11-26 Framework of dust-prevention film assembly and dust-prevention film assembly using the framework

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013084498A JP6008784B2 (ja) 2013-04-15 2013-04-15 ペリクルフレーム及びその製作方法とペリクル

Publications (2)

Publication Number Publication Date
JP2014206661A JP2014206661A (ja) 2014-10-30
JP6008784B2 true JP6008784B2 (ja) 2016-10-19

Family

ID=50000909

Family Applications (1)

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JP2013084498A Active JP6008784B2 (ja) 2013-04-15 2013-04-15 ペリクルフレーム及びその製作方法とペリクル

Country Status (7)

Country Link
US (1) US9395634B2 (ko)
EP (1) EP2793081B1 (ko)
JP (1) JP6008784B2 (ko)
KR (1) KR102155008B1 (ko)
CN (1) CN104102089A (ko)
HK (1) HK1198452A1 (ko)
TW (1) TWI536123B (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD796661S1 (en) * 2013-03-01 2017-09-05 Michael E. Oswald, Jr. Vent cover with frame
WO2016043301A1 (ja) 2014-09-19 2016-03-24 三井化学株式会社 ペリクル、ペリクルの製造方法及びペリクルを用いた露光方法
CN106662806B (zh) * 2014-09-19 2021-11-05 三井化学株式会社 防护膜组件、其制造方法及曝光方法
JP6274079B2 (ja) * 2014-11-04 2018-02-07 日本軽金属株式会社 ペリクル用支持枠および製造方法
TWI724612B (zh) * 2014-11-17 2021-04-11 荷蘭商Ａｓｍｌ荷蘭公司 護膜附接裝置
JP6551837B2 (ja) * 2015-08-17 2019-07-31 三井化学株式会社 ペリクルフレーム、及びこれを含むペリクル
JP6632057B2 (ja) * 2016-01-07 2020-01-15 信越化学工業株式会社 ペリクル
JP6607574B2 (ja) 2016-08-24 2019-11-20 信越化学工業株式会社 ペリクルフレーム及びペリクル
JP6812714B2 (ja) * 2016-09-20 2021-01-13 日本軽金属株式会社 ペリクル用支持枠及びペリクル並びにその製造方法
JP7139133B2 (ja) 2018-04-03 2022-09-20 信越化学工業株式会社 ペリクルフレーム、ペリクル、及びペリクルフレームの製造方法
JP7330245B2 (ja) * 2018-04-03 2023-08-21 信越化学工業株式会社 ペリクルフレーム、ペリクル、ペリクル付フォトマスク、露光方法、及び半導体デバイスの製造方法
JP7082546B2 (ja) * 2018-08-01 2022-06-08 旭化成株式会社 ペリクル及びその製造方法
JP7061288B2 (ja) * 2018-08-28 2022-04-28 日本軽金属株式会社 フラットパネルディスプレイ用ペリクル枠体及びその製造方法
KR20220137023A (ko) * 2020-02-04 2022-10-11 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 프레임, 펠리클, 펠리클 부착 노광 원판 및 노광 방법, 그리고 반도체 장치 또는 액정 표시판의 제조 방법
WO2022030498A1 (ja) * 2020-08-05 2022-02-10 三井化学株式会社 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法
KR102530226B1 (ko) * 2020-10-28 2023-05-09 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
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JPS465305Y1 (ko) 1966-07-07 1971-02-24
JPH0772617A (ja) * 1993-09-02 1995-03-17 Shin Etsu Chem Co Ltd ペリクル
JPH08319573A (ja) * 1995-05-22 1996-12-03 Nitsukooshi Prod Kk プラズマｃｖｄ及びエッチング用陽極酸化アルミニウム電極
JP3777987B2 (ja) 2000-01-25 2006-05-24 日本軽金属株式会社 ペリクル枠およびペリクル枠の製造方法
TWI270504B (en) * 2004-12-15 2007-01-11 Gudeng Prec Ind Co Ltd Photo-mask protection film frame
JP2006184704A (ja) * 2004-12-28 2006-07-13 Asahi Kasei Electronics Co Ltd 液晶用大型ペリクル
JP2007333910A (ja) 2006-06-14 2007-12-27 Shin Etsu Chem Co Ltd ペリクル
KR101287700B1 (ko) * 2008-09-12 2013-07-24 아사히 가세이 이-매터리얼즈 가부시키가이샤 펠리클 프레임, 펠리클 및 펠리클 프레임의 사용 방법
JP2010256609A (ja) * 2009-04-24 2010-11-11 Shin-Etsu Chemical Co Ltd ペリクル
KR101642832B1 (ko) * 2009-09-14 2016-07-27 삼성전자주식회사 펠리클 프레임, 펠리클, 리소그래피 장치 및 펠리클 프레임의 제조방법
JP4889778B2 (ja) * 2009-10-02 2012-03-07 信越化学工業株式会社 ペリクルの製造方法及びリソグラフィ用ペリクル
KR101990345B1 (ko) * 2009-10-02 2019-06-18 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 제조 방법
JP4605305B2 (ja) * 2010-02-19 2011-01-05 日本軽金属株式会社 ペリクル枠
WO2011111801A1 (ja) * 2010-03-10 2011-09-15 旭化成イーマテリアルズ株式会社 大型ペリクル用枠体及び大型ペリクル
JP5621436B2 (ja) * 2010-09-13 2014-11-12 リコーイメージング株式会社 金型及びその製造方法、並びに素子及び光学素子
JP5657407B2 (ja) * 2011-01-31 2015-01-21 旭化成イーマテリアルズ株式会社 ペリクル枠体、ペリクル及びペリクル枠体の製造方法
JP2012201891A (ja) * 2011-03-23 2012-10-22 Fujifilm Corp 絶縁基板ならびにそれを用いた配線基板、半導体パッケージおよびｌｅｄパッケージ

Also Published As

Publication number Publication date
EP2793081B1 (en) 2018-09-12
US9395634B2 (en) 2016-07-19
KR20140123891A (ko) 2014-10-23
CN104102089A (zh) 2014-10-15
EP2793081A1 (en) 2014-10-22
US20140307237A1 (en) 2014-10-16
JP2014206661A (ja) 2014-10-30
HK1198452A1 (en) 2015-04-24
TW201447503A (zh) 2014-12-16
KR102155008B1 (ko) 2020-09-11
TWI536123B (zh) 2016-06-01

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