JP5959216B2 - 基板搬送方法および基板搬送装置 - Google Patents

基板搬送方法および基板搬送装置 Download PDF

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Publication number
JP5959216B2
JP5959216B2 JP2012023009A JP2012023009A JP5959216B2 JP 5959216 B2 JP5959216 B2 JP 5959216B2 JP 2012023009 A JP2012023009 A JP 2012023009A JP 2012023009 A JP2012023009 A JP 2012023009A JP 5959216 B2 JP5959216 B2 JP 5959216B2
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Japan
Prior art keywords
substrate
resin
wafer
temperature
suction
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JP2012023009A
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English (en)
Japanese (ja)
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JP2013161958A (ja
JP2013161958A5 (https=
Inventor
山本　雅之
雅之 山本
幸敏 長谷
幸敏 長谷
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Nitto Denko Corp
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Nitto Denko Corp
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Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2012023009A priority Critical patent/JP5959216B2/ja
Priority to PT130003387T priority patent/PT2624292E/pt
Priority to EP20130000338 priority patent/EP2624292B1/en
Priority to KR1020130012729A priority patent/KR20130090827A/ko
Priority to TW102104302A priority patent/TWI584404B/zh
Publication of JP2013161958A publication Critical patent/JP2013161958A/ja
Publication of JP2013161958A5 publication Critical patent/JP2013161958A5/ja
Application granted granted Critical
Publication of JP5959216B2 publication Critical patent/JP5959216B2/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3304—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber characterised by movements or sequence of movements of transfer devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/0198—Manufacture or treatment batch processes

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2012023009A 2012-02-06 2012-02-06 基板搬送方法および基板搬送装置 Active JP5959216B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012023009A JP5959216B2 (ja) 2012-02-06 2012-02-06 基板搬送方法および基板搬送装置
PT130003387T PT2624292E (pt) 2012-02-06 2013-01-23 Método de transporte de substrato e aparelho de transporte de substrato
EP20130000338 EP2624292B1 (en) 2012-02-06 2013-01-23 Substrate transport method and substrate transport apparatus
KR1020130012729A KR20130090827A (ko) 2012-02-06 2013-02-05 기판 반송 방법 및 기판 반송 장치
TW102104302A TWI584404B (zh) 2012-02-06 2013-02-05 基板搬送方法及基板搬送裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012023009A JP5959216B2 (ja) 2012-02-06 2012-02-06 基板搬送方法および基板搬送装置

Publications (3)

Publication Number Publication Date
JP2013161958A JP2013161958A (ja) 2013-08-19
JP2013161958A5 JP2013161958A5 (https=) 2015-01-15
JP5959216B2 true JP5959216B2 (ja) 2016-08-02

Family

ID=47721908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012023009A Active JP5959216B2 (ja) 2012-02-06 2012-02-06 基板搬送方法および基板搬送装置

Country Status (5)

Country Link
EP (1) EP2624292B1 (https=)
JP (1) JP5959216B2 (https=)
KR (1) KR20130090827A (https=)
PT (1) PT2624292E (https=)
TW (1) TWI584404B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101940580B1 (ko) * 2012-05-24 2019-01-22 에이씨엠 리서치 (상하이) 인코포레이티드 로드록 챔버와, 그를 이용하여 기판을 처리하는 방법
KR101455205B1 (ko) * 2014-04-29 2014-10-27 주식회사 다이나테크 교정장치
JP6322083B2 (ja) * 2014-08-08 2018-05-09 日東電工株式会社 半導体ウエハの冷却方法および半導体ウエハの冷却装置
JP6811951B2 (ja) * 2017-02-03 2021-01-13 株式会社ディスコ 搬送機構
JP7112220B2 (ja) * 2017-05-12 2022-08-03 キヤノン株式会社 方法、装置、システム、および物品の製造方法
JP7061012B2 (ja) * 2018-05-01 2022-04-27 株式会社ディスコ 加工装置
JP7282467B2 (ja) * 2019-08-14 2023-05-29 株式会社ディスコ 加工装置
KR102235146B1 (ko) * 2019-10-08 2021-04-02 리얼룩앤컴퍼니 주식회사 냉각 성능이 개선된 3d 포밍필름 제조 장치

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6378546A (ja) * 1986-09-22 1988-04-08 Hitachi Ltd ウエハハンドリング装置
JP2941505B2 (ja) * 1991-08-08 1999-08-25 株式会社東芝 基板位置決め方法
JP3442253B2 (ja) * 1997-03-13 2003-09-02 東京エレクトロン株式会社 基板処理装置
JPH11168131A (ja) * 1997-12-04 1999-06-22 Nec Kyushu Ltd ウエハ搬送チャック
JP4403631B2 (ja) * 2000-04-24 2010-01-27 ソニー株式会社 チップ状電子部品の製造方法、並びにその製造に用いる擬似ウエーハの製造方法
JP4592270B2 (ja) 2003-10-06 2010-12-01 日東電工株式会社 半導体ウエハの支持材からの剥離方法およびこれを用いた装置
JP2007317822A (ja) * 2006-05-25 2007-12-06 Sony Corp 基板処理方法及び半導体装置の製造方法
JP2008053432A (ja) * 2006-08-24 2008-03-06 Disco Abrasive Syst Ltd ウエーハ加工装置
DE102008041250A1 (de) * 2008-08-13 2010-02-25 Ers Electronic Gmbh Verfahren und Vorrichtung zum thermischen Bearbeiten von Kunststoffscheiben, insbesondere Moldwafern
CN102217055B (zh) * 2008-11-21 2013-09-18 芝浦机械电子株式会社 衬底处理方法及衬底处理装置
JP5549185B2 (ja) * 2009-11-06 2014-07-16 株式会社ニコン 半導体デバイスの製造方法および基板貼り合せ装置
JP2011151149A (ja) 2010-01-20 2011-08-04 Tdk Corp 積層型電子部品の製造方法
JP5543813B2 (ja) * 2010-03-23 2014-07-09 日東電工株式会社 ワーク搬送方法およびワーク搬送装置
JP2012186245A (ja) * 2011-03-04 2012-09-27 Tokyo Electron Ltd 接合装置、接合システム、接合方法、プログラム及びコンピュータ記憶媒体
JP2011223014A (ja) * 2011-06-02 2011-11-04 Furukawa Electric Co Ltd:The チップ保護用フィルム

Also Published As

Publication number Publication date
JP2013161958A (ja) 2013-08-19
TWI584404B (zh) 2017-05-21
KR20130090827A (ko) 2013-08-14
TW201351558A (zh) 2013-12-16
EP2624292A1 (en) 2013-08-07
PT2624292E (pt) 2015-05-20
EP2624292B1 (en) 2015-04-22

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