JP5947284B2 - 銅層を用いた非金属材料からなる基板の表面を被覆する方法 - Google Patents
銅層を用いた非金属材料からなる基板の表面を被覆する方法 Download PDFInfo
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Description
I. 銅層を用いたアクリロニトリル−ブタジエン−スチレン(ABS)及びアクリロニトリル−ブタジエン−スチレン/ポリカーボネート(ABS/PC)の被覆
銅層を用いて非金属材料からなる基板を被覆するための方法は、4つの工程(硝酸を用いた化学的酸化処理/キレート化及び/又は錯体化/還元/無電解槽)で実行された。
純粋の硝酸が50℃まで熱せされた。アクリロニトリル−ブタジエン−スチレン(ABS)及びアクリロニトリル−ブタジエン−スチレン/ポリカーボネート(PC)のシートがこの溶液に浸漬された。このシートはそれから、水槽(1l)で二度洗浄された。
硫酸銅(23.7g)が水(1000ml)及び水酸化アンモニウム(30ml)からなる溶液中に可溶化された。工程I.1の化学的酸化処理が実行された部分がこの溶液中で8分間浸漬された。このABSの部分はそれから0.2Mの水酸化ナトリウム水溶液中で洗浄された。
水酸化ホウ素ナトリウムNaBH4(0.316g、0.8×10−2mol)が25mlの0.1M水酸化ナトリウム溶液に溶解された。この溶液は水槽を用いて80℃まで加熱されてそのサンプルはその中に浸漬された。12分後、そのサンプルは乾燥される前にMilliQ水を用いて洗浄された。
MCopper(登録商標)85B溶液100mlを含有する溶液が準備された。次に、Mcopper(登録商標)85A溶液40ml、それから、Mcopper(登録商標)85D溶液30ml、Mcopper(登録商標)85G溶液40ml、最後に、37%のホルムアルデヒド5mlが加えられた。溶液の水位を溶液1lに到達させた。槽は機械的攪拌によって60℃まで加熱された。ABSシートがそれから導入された。
別の実施形態では、無電解槽は、PegCopper100溶液40ml、PegCopper200溶液100ml、30mlのPegCopper400、及び2mlのPegCopper500(ぺガステックによって供給される製品である)を含有する準備された溶液である。次に、3.5mlのPegCopperが加えられた。1l得るために水位一杯まで水を満たし、その混合物は50℃まで加熱された。処理されるその部分がそれから導入された。
II. 銅層を用いたポリアミド基板の被覆
被覆処理がMinion(登録商標)ポリアミドからなる基板を用いて実行された。
ポリアミド基板が130mlの水、28mlの塩酸(37M)及び55mlのイソプロパノールを含有する水溶液中に、28℃で17分間浸漬された。この基板はそれから水で洗浄された。
実施例1のステップI.2のそれと類似する方法によると、銅イオンは基板の表面にキレートされた。
I.3で上述した動作方法によると、キレートされた銅は基板の表面で還元された。
実施例1で上述されたステップI.4又はI.5のそれに類似する方法によると、ポリアミド基板は化学的銅金属フィルムによって被覆された。
III 銅槽を用いたポリカーボネート基板の被覆
被覆方法がLexan(登録商標)ポリカーボネート基板を用いて実施された。
ポリカーボネート基板は、強酸混合物(34%の硝酸と66%の硫酸)を含有する溶液中に25℃で5分間浸漬され、それから、濃縮された硫酸層に25℃で3分間浸漬された。全体のアセンブリは、5Nの水酸化カリウム溶液に65℃で5分間中和された。ポリカーボネート基板はそれから水を用いて洗浄された。
実施例1で上述したステップI.2のそれに類似する方法によると、銅イオンは基板の表面にキレートされた。
I.3で上述した動作方法によると、キレートされた銅は基板の表面で還元された。
実施例1で上述したステップI.4又はI.5におけるそれと類似する方法によると、ポリカーボネート基板は化学的銅金属フィルムによって被覆された。
NF ISO 2409/NF T30−038標準による接着テスト及びDIN ISO 9227標準による腐食テストが、実施例1から3で得られた基板の上で実施された。その性能はこれらのテストの要件を用いて編集されて、先行技術の方法によって得られた基板を用いて実現された性能に匹敵した。
Claims (13)
- 六価クロムを利用せずに非金属材料からなる基板表面に金属層を用いて被覆する方法であって、
前記非金属材料からなる基板が設けられる工程a)と、
前記基板の少なくとも1つの表面の少なくとも一部が、比表面積を増加させるために、物理的衝撃処理、又はフェントン試薬、アルコール性カリウム水酸化物、強酸、水酸化ナトリウム、強酸化作用剤、及びオゾンからなる群のうちのいずれか1つ若しくはその組み合わせを用いて且つ六価クロムを利用しない化学的酸化処理に晒される工程b)と、
前記工程b)において処理された前記基板の前記表面が、強酸、六価クロムを除く強酸化作用剤、及びそれらの組み合わせからなる群のいずれかを用いて且つ六価クロムを利用しない化学的酸化処理に晒される工程c)と、
前記工程c)において処理された前記基板の前記表面が、アンモニア、少なくとも1つの金属の少なくとも1つのイオン及びその対イオンを含有する塩基性溶液に接触され、前記金属は、元素周期表の第IB族及び第VIII族の金属から構成される群から選択される工程d)と、
少なくとも1つの前記表面の前記少なくとも一部の上で前記基板を構成する前記非金属材料に化学的に付着する少なくとも1つの金属のイオンを含む基板が得られる工程e)と、
少なくとも1つの前記表面の前記少なくとも一部の上で前記基板を構成する前記非金属材料に化学的に付着する少なくとも1つの金属の前記イオンが、還元処理に晒されて、少なくとも1つの前記表面の前記少なくとも一部の上で前記基板を構成する前記非金属材料に化学的に付着する少なくとも1つの金属の原子を含む基板が得られる工程f)と、
前記工程f)において得られた少なくとも1つの金属の原子を含む前記表面が、少なくとも1つの金属のイオンを含有する溶液に接触される工程g)と、
前記基板の前記処理された表面上に、少なくとも1つの金属層によって形成された被覆層が得られる工程h)と、を備え、
前記工程a)〜工程h)は、選択的に、各工程の前又は後に、1つ又は複数の洗浄工程を有する、
ことを特徴とする方法。 - 請求項1に記載の方法において、
前記工程b)及び工程c)は、単一の工程b´)として実行され、前記処理は、強酸、六価クロムを除く強酸化作用剤、及びそれらの組み合わせからなる群のいずれかを用いた化学的酸化処理である、
ことを特徴とする方法。 - 請求項1に記載の方法において、
前記工程f)の前記金属及び前記工程g)の前記イオンの前記金属は、同じものである、
ことを特徴とする方法。 - 請求項1〜3のいずれか1項に記載の方法において、
前記工程f)及び前記工程g)は、単一の工程f´)として実行される、
ことを特徴とする方法。 - 請求項1〜4のいずれか1項に記載の方法において、
前記工程d)で用いられた前記金属イオンの前記金属は、銅イオン、銀イオン、ニッケルイオン、白金イオン、パラジウムイオン、及びコバルトイオンから選択される、
ことを特徴とする方法。 - 請求項1〜5のいずれか1項に記載の方法において、
前記工程d)で用いられた前記金属イオンの前記金属は、銅及びニッケルからなる群から選択される、
ことを特徴とする方法。 - 請求項1〜6のいずれか1項に記載の方法において、
前記強酸は、塩酸、硫黄酸、硝酸、過塩素酸、亜リン酸、リン酸、次亜リン酸、シュウ酸及び酢酸からなる群のうちのいずれか1つ又はそれらの組み合わせである、
ことを特徴とする方法。 - 請求項1〜7のいずれか1項に記載の方法において、
前記強酸化作用剤は、KMnO4及びKClO3からなる群のうちのいずれか1つ又はその組み合わせである、
ことを特徴とする方法。 - 請求項1に記載の方法において、
前記還元溶液は、水酸化ホウ素ナトリウム溶液、ジメチルアミンボラン溶液及びヒドラジン溶液からなる群から選択される還元試薬を含んでいる、
ことを特徴とする方法。 - 請求項4に記載の方法において、
前記工程f´)で用いられる前記溶液は、金属の原子を含む前記表面に接触させるための前記金属のイオン、前記金属のイオンを錯体化する錯化剤、還元剤及びpH調節剤を含んでいる、
ことを特徴とする方法。 - 請求項1に記載の方法において、
前記各工程の前及び間において、前記基板の前記表面及び/又は前記基板は、少なくとも1つの洗浄溶液を用いて洗浄される、
ことを特徴とする方法。 - 請求項11に記載の方法において、
前記洗浄溶液は、前記基板の前記表面及び/又は前記基板と接触している間にかき混ぜられる、
ことを特徴とする方法。 - 請求項1〜12のいずれか1項に記載の方法において、
工程h)の後に電気めっき処理による金属化工程をさらに含む、
ことを特徴とする方法。
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CN103436164B (zh) * | 2013-09-03 | 2015-12-02 | 丽水学院 | 用于abs工程塑料表面处理的混合溶液及处理方法 |
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