JP5945634B2 - セリア含有廃研磨材の再生方法 - Google Patents
セリア含有廃研磨材の再生方法 Download PDFInfo
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- JP5945634B2 JP5945634B2 JP2015531869A JP2015531869A JP5945634B2 JP 5945634 B2 JP5945634 B2 JP 5945634B2 JP 2015531869 A JP2015531869 A JP 2015531869A JP 2015531869 A JP2015531869 A JP 2015531869A JP 5945634 B2 JP5945634 B2 JP 5945634B2
- Authority
- JP
- Japan
- Prior art keywords
- ceria
- abrasive
- containing waste
- waste sludge
- waste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002699 waste material Substances 0.000 title claims description 120
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 title claims description 99
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 title claims description 99
- 238000000034 method Methods 0.000 title claims description 73
- 238000004064 recycling Methods 0.000 title claims description 10
- 239000010802 sludge Substances 0.000 claims description 62
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 44
- 239000012535 impurity Substances 0.000 claims description 44
- 239000000243 solution Substances 0.000 claims description 40
- 238000011069 regeneration method Methods 0.000 claims description 36
- 239000011521 glass Substances 0.000 claims description 32
- 239000002904 solvent Substances 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 26
- 239000003082 abrasive agent Substances 0.000 claims description 24
- 239000002245 particle Substances 0.000 claims description 22
- 238000001035 drying Methods 0.000 claims description 21
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 20
- 229910052731 fluorine Inorganic materials 0.000 claims description 20
- 239000011737 fluorine Substances 0.000 claims description 20
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 238000005498 polishing Methods 0.000 claims description 18
- 238000010304 firing Methods 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 15
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- 239000002002 slurry Substances 0.000 claims description 13
- 238000001914 filtration Methods 0.000 claims description 12
- 238000005406 washing Methods 0.000 claims description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 11
- 230000001172 regenerating effect Effects 0.000 claims description 10
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 230000004907 flux Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 9
- -1 alkali metal salts Chemical class 0.000 claims description 8
- 235000002639 sodium chloride Nutrition 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 8
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000005119 centrifugation Methods 0.000 claims description 5
- 238000004062 sedimentation Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 235000013024 sodium fluoride Nutrition 0.000 claims description 5
- 239000011775 sodium fluoride Substances 0.000 claims description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 4
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 4
- 239000003125 aqueous solvent Substances 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000003863 ammonium salts Chemical class 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 2
- 235000019270 ammonium chloride Nutrition 0.000 claims description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 2
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 claims description 2
- 229910001626 barium chloride Inorganic materials 0.000 claims description 2
- 229910052810 boron oxide Inorganic materials 0.000 claims description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 2
- 239000001103 potassium chloride Substances 0.000 claims description 2
- 235000011164 potassium chloride Nutrition 0.000 claims description 2
- 239000011780 sodium chloride Substances 0.000 claims description 2
- 238000001354 calcination Methods 0.000 claims 2
- 238000004090 dissolution Methods 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 62
- 230000008569 process Effects 0.000 description 28
- 230000008929 regeneration Effects 0.000 description 24
- 150000002221 fluorine Chemical class 0.000 description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000010494 dissociation reaction Methods 0.000 description 4
- 230000005593 dissociations Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000007667 floating Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 231100000419 toxicity Toxicity 0.000 description 3
- 230000001988 toxicity Effects 0.000 description 3
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 231100000563 toxic property Toxicity 0.000 description 2
- 229920002274 Nalgene Polymers 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2012-0103004 | 2012-09-17 | ||
| KR20120103004 | 2012-09-17 | ||
| KR1020130111552A KR101539421B1 (ko) | 2012-09-17 | 2013-09-17 | 세리아 함유 폐연마재의 재생 방법 |
| KR10-2013-0111552 | 2013-09-17 | ||
| PCT/KR2013/008449 WO2014042494A1 (ko) | 2012-09-17 | 2013-09-17 | 세리아 함유 폐연마재의 재생 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015536830A JP2015536830A (ja) | 2015-12-24 |
| JP5945634B2 true JP5945634B2 (ja) | 2016-07-05 |
Family
ID=50646102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015531869A Active JP5945634B2 (ja) | 2012-09-17 | 2013-09-17 | セリア含有廃研磨材の再生方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5945634B2 (zh) |
| KR (1) | KR101539421B1 (zh) |
| CN (1) | CN104619806A (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101525543B1 (ko) * | 2015-04-14 | 2015-06-03 | 박기태 | 반도체 및 산업용 웨이퍼 절삭 및 연마에 사용된 폐연마재 재생방법 |
| KR101988451B1 (ko) * | 2015-09-16 | 2019-06-12 | 주식회사 엘지화학 | 세리아 함유 폐연마재의 재생 방법 |
| KR102091769B1 (ko) * | 2017-03-13 | 2020-04-23 | 주식회사 엘지화학 | 산화세륨 연마재의 재생방법 |
| CN115785818B (zh) * | 2022-11-10 | 2023-06-20 | 湖北五方光电股份有限公司 | 一种抛光液及其制备方法和应用 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3560121B2 (ja) * | 1997-11-11 | 2004-09-02 | 三井金属鉱業株式会社 | 廃研摩材からの希土類系研摩材原料の製造方法 |
| JP3413394B2 (ja) * | 2000-07-18 | 2003-06-03 | 細川 澄男 | 光学研磨用酸化セリウム研磨剤廃液からの酸化セリウム回収方法及び光学研磨用酸化セリウム研磨剤廃液の無公害化処理方法 |
| JP2004268215A (ja) * | 2003-03-10 | 2004-09-30 | Fujitsu Hitachi Plasma Display Ltd | 研磨材の再生方法 |
| WO2007105714A1 (ja) * | 2006-03-13 | 2007-09-20 | Showa Denko K.K. | 希土類フッ化物を含有する組成物から希土類元素を回収する方法 |
| JP4729428B2 (ja) * | 2006-04-07 | 2011-07-20 | Ａｇｃセイミケミカル株式会社 | セリウム系研磨剤の再生方法 |
| KR101450865B1 (ko) * | 2006-10-24 | 2014-10-14 | 동우 화인켐 주식회사 | 디스플레이용 유리패널의 연마를 위한 폐연마재의 재생방법 |
| CN101343690B (zh) * | 2007-07-13 | 2011-01-05 | 北京方正稀土科技研究所有限公司 | 一种铈与非铈稀土的分离以及铈基抛光粉的制备方法 |
| CA2645991A1 (en) * | 2007-10-30 | 2009-04-30 | Pall Corporation | Method for treating spent abrasive slurry |
| US8771532B2 (en) * | 2009-03-31 | 2014-07-08 | Corning Incorporated | Glass having anti-glare surface and method of making |
| KR101245276B1 (ko) * | 2010-03-12 | 2013-03-19 | 주식회사 엘지화학 | 산화세륨 연마재의 재생 방법 |
| KR101225746B1 (ko) * | 2010-08-03 | 2013-02-15 | 주식회사 랜코 | 세리아계 연마재의 재생방법 |
| WO2012053432A1 (ja) * | 2010-10-18 | 2012-04-26 | Ｄｏｗａエコシステム株式会社 | 酸化セリウム系研磨剤の回収方法、及び酸化セリウム系研磨剤を含有する回収物 |
| JP5894369B2 (ja) * | 2011-02-03 | 2016-03-30 | ステラケミファ株式会社 | 洗浄液及び洗浄方法 |
| KR101051207B1 (ko) * | 2011-02-09 | 2011-07-21 | 윤종훈 | 희토류 금속 산화물을 기반으로 하는 ｌｃｄ 및 ｐｄｐ 유리패널용 재생 무기 연마재 및 이를 제조하기 위한 무기 연마재 폐슬러지 재생 방법 |
| JP2013086204A (ja) * | 2011-10-17 | 2013-05-13 | Shinryo Corp | 酸化セリウム系研磨材スラリーの再生方法及び再生酸化セリウム系研磨材スラリー |
| KR101539419B1 (ko) * | 2012-09-14 | 2015-07-27 | 주식회사 엘지화학 | 세리아 함유 폐연마재의 재생 방법 |
-
2013
- 2013-09-17 CN CN201380047601.1A patent/CN104619806A/zh active Pending
- 2013-09-17 KR KR1020130111552A patent/KR101539421B1/ko active IP Right Grant
- 2013-09-17 JP JP2015531869A patent/JP5945634B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015536830A (ja) | 2015-12-24 |
| KR20140036986A (ko) | 2014-03-26 |
| CN104619806A (zh) | 2015-05-13 |
| KR101539421B1 (ko) | 2015-07-27 |
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