JP5910494B2 - スプレー塗布用の反射防止被膜形成用塗布液 - Google Patents

スプレー塗布用の反射防止被膜形成用塗布液 Download PDF

Info

Publication number
JP5910494B2
JP5910494B2 JP2012512925A JP2012512925A JP5910494B2 JP 5910494 B2 JP5910494 B2 JP 5910494B2 JP 2012512925 A JP2012512925 A JP 2012512925A JP 2012512925 A JP2012512925 A JP 2012512925A JP 5910494 B2 JP5910494 B2 JP 5910494B2
Authority
JP
Japan
Prior art keywords
coating
component
film
alkoxysilane
antireflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012512925A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2011136370A1 (ja
Inventor
隆之 根木
隆之 根木
賢一 元山
賢一 元山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of JPWO2011136370A1 publication Critical patent/JPWO2011136370A1/ja
Application granted granted Critical
Publication of JP5910494B2 publication Critical patent/JP5910494B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2012512925A 2010-04-30 2011-04-28 スプレー塗布用の反射防止被膜形成用塗布液 Active JP5910494B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010105344 2010-04-30
JP2010105344 2010-04-30
PCT/JP2011/060460 WO2011136370A1 (ja) 2010-04-30 2011-04-28 スプレー塗布用の被膜形成用塗布液及び被膜

Publications (2)

Publication Number Publication Date
JPWO2011136370A1 JPWO2011136370A1 (ja) 2013-07-22
JP5910494B2 true JP5910494B2 (ja) 2016-04-27

Family

ID=44861662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012512925A Active JP5910494B2 (ja) 2010-04-30 2011-04-28 スプレー塗布用の反射防止被膜形成用塗布液

Country Status (5)

Country Link
JP (1) JP5910494B2 (zh)
KR (2) KR101970934B1 (zh)
CN (1) CN102869735B (zh)
TW (1) TWI496849B (zh)
WO (1) WO2011136370A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103579389B (zh) * 2012-07-30 2016-12-21 比亚迪股份有限公司 一种太阳能电池组件及其制备方法
JP6755951B2 (ja) * 2016-07-12 2020-09-16 シャープ株式会社 防汚性フィルムの製造方法
KR102119717B1 (ko) 2020-03-17 2020-06-08 주식회사 나온씨에스 태양광 모듈의 오염방지를 위한 옥외 환경의 코팅장치와 그 방법
KR102510059B1 (ko) 2021-01-29 2023-03-14 주식회사 나온씨에스 친환경 세척방식 적용을 위한 태양광 패널 클리닝장치

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06192575A (ja) * 1992-12-25 1994-07-12 Nippon Unicar Co Ltd 噴射剤組成物
JP2000212514A (ja) * 1999-01-13 2000-08-02 Samsung Sdi Co Ltd スプレ―膜形成用組成物、及びそれを用いて形成されたスプレ―膜を具備している透明導電膜
JP2002173571A (ja) * 2000-12-04 2002-06-21 Omura Toryo Kk 易分解性樹脂組成物、および易分解性高分子の処理方法
JP2003202813A (ja) * 2000-11-09 2003-07-18 Matsushita Electric Ind Co Ltd 画像表示装置用フェースパネルの表面処理方法、およびこの表面処理を施されたフェースパネルを備えた画像表示装置
JP2005342973A (ja) * 2004-06-02 2005-12-15 Pilot Ink Co Ltd 感温変色性色彩記憶性積層体
JP2007016096A (ja) * 2005-07-06 2007-01-25 Chugoku Marine Paints Ltd 硬化性組成物、コーティング用組成物、塗料、防汚塗料、その硬化物、並びに基材の防汚方法
JP2008064423A (ja) * 2006-09-11 2008-03-21 Osaka Gas Co Ltd 耐高アルカリ性調理器具用部材及び該部材を有する耐高アルカリ性調理器具
WO2008059844A1 (fr) * 2006-11-14 2008-05-22 Nissan Chemical Industries, Ltd. Liquide de revêtement destiné à former un film d'indice de réfraction faible, son procédé de fabrication et élément antiréfléchisseur

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6110043A (ja) 1984-06-26 1986-01-17 Asahi Glass Co Ltd 防汚性を有する低反射率ガラス
JPH05105424A (ja) 1991-10-14 1993-04-27 Toshiba Corp 反射防止膜の製造方法
JP2716330B2 (ja) 1992-11-13 1998-02-18 セントラル硝子株式会社 低反射ガラスおよびその製法
JP4032185B2 (ja) 1995-12-01 2008-01-16 日産化学工業株式会社 低屈折率及び撥水性を有する被膜
US6225434B1 (en) * 1997-08-01 2001-05-01 Ppg Industries Ohio, Inc. Film-forming compositions having improved scratch resistance
JP3797037B2 (ja) * 1998-12-04 2006-07-12 東陶機器株式会社 光触媒性親水性コーティング組成物
CN101240142B (zh) * 2008-01-24 2010-12-08 东莞市诺奇纳米科技有限公司 一种镜面喷镀专用涂料及其制备方法和应用

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06192575A (ja) * 1992-12-25 1994-07-12 Nippon Unicar Co Ltd 噴射剤組成物
JP2000212514A (ja) * 1999-01-13 2000-08-02 Samsung Sdi Co Ltd スプレ―膜形成用組成物、及びそれを用いて形成されたスプレ―膜を具備している透明導電膜
JP2003202813A (ja) * 2000-11-09 2003-07-18 Matsushita Electric Ind Co Ltd 画像表示装置用フェースパネルの表面処理方法、およびこの表面処理を施されたフェースパネルを備えた画像表示装置
JP2002173571A (ja) * 2000-12-04 2002-06-21 Omura Toryo Kk 易分解性樹脂組成物、および易分解性高分子の処理方法
JP2005342973A (ja) * 2004-06-02 2005-12-15 Pilot Ink Co Ltd 感温変色性色彩記憶性積層体
JP2007016096A (ja) * 2005-07-06 2007-01-25 Chugoku Marine Paints Ltd 硬化性組成物、コーティング用組成物、塗料、防汚塗料、その硬化物、並びに基材の防汚方法
JP2008064423A (ja) * 2006-09-11 2008-03-21 Osaka Gas Co Ltd 耐高アルカリ性調理器具用部材及び該部材を有する耐高アルカリ性調理器具
WO2008059844A1 (fr) * 2006-11-14 2008-05-22 Nissan Chemical Industries, Ltd. Liquide de revêtement destiné à former un film d'indice de réfraction faible, son procédé de fabrication et élément antiréfléchisseur

Also Published As

Publication number Publication date
WO2011136370A1 (ja) 2011-11-03
TW201204791A (en) 2012-02-01
TWI496849B (zh) 2015-08-21
CN102869735A (zh) 2013-01-09
KR20180087466A (ko) 2018-08-01
KR20130096145A (ko) 2013-08-29
KR101970934B1 (ko) 2019-04-19
CN102869735B (zh) 2016-03-30
JPWO2011136370A1 (ja) 2013-07-22

Similar Documents

Publication Publication Date Title
KR101864458B1 (ko) 저굴절률막 형성용 조성물 및 이것을 사용한 저굴절률막의 형성 방법
JP4032185B2 (ja) 低屈折率及び撥水性を有する被膜
JP5382310B2 (ja) 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材
JP5262722B2 (ja) 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JP4887783B2 (ja) 低屈折率及び撥水性を有する被膜
WO2017022638A1 (ja) モバイルディスプレイ機器のカバーガラス等に好適なガラス基板
JP5910494B2 (ja) スプレー塗布用の反射防止被膜形成用塗布液
JPWO2005059051A1 (ja) 低屈折率及び大きい水接触角を有する被膜
JP5458575B2 (ja) 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JP5293180B2 (ja) リン酸エステル化合物を含有する被膜形成用塗布液及び反射防止膜
JP4893103B2 (ja) 被膜形成用塗布液及びその被膜並びに被膜形成方法
KR102188211B1 (ko) 저굴절률막 형성용 조성물 및 그 제조 방법 그리고 저굴절률막의 형성 방법
JP5310549B2 (ja) 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JPWO2014203951A1 (ja) 金属酸化物膜形成用組成物及び金属酸化物膜
JP5531614B2 (ja) メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液
EP2937319B1 (en) Method of manufacturing a composition for forming a thin layer with low refractive index, and method of manufacturing a thin layer with low refractive index
KR20080105056A (ko) 피막 형성용 도포액, 그 제조 방법, 그 피막 및 반사 방지재

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140402

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150210

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150410

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150901

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151030

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160301

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160314

R151 Written notification of patent or utility model registration

Ref document number: 5910494

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350