JP5793299B2 - プロセス監視診断装置 - Google Patents
プロセス監視診断装置 Download PDFInfo
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- JP5793299B2 JP5793299B2 JP2010293048A JP2010293048A JP5793299B2 JP 5793299 B2 JP5793299 B2 JP 5793299B2 JP 2010293048 A JP2010293048 A JP 2010293048A JP 2010293048 A JP2010293048 A JP 2010293048A JP 5793299 B2 JP5793299 B2 JP 5793299B2
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/006—Regulation methods for biological treatment
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
- G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
- G05B23/024—Quantitative history assessment, e.g. mathematical relationships between available data; Functions therefor; Principal component analysis [PCA]; Partial least square [PLS]; Statistical classifiers, e.g. Bayesian networks, linear regression or correlation analysis; Neural networks
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
- G05B23/0243—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults model based detection method, e.g. first-principles knowledge model
- G05B23/0254—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults model based detection method, e.g. first-principles knowledge model based on a quantitative model, e.g. mathematical relationships between inputs and outputs; functions: observer, Kalman filter, residual calculation, Neural Networks
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/36—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture of organic compounds
- C02F2103/365—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture of organic compounds from petrochemical industry (e.g. refineries)
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/001—Upstream control, i.e. monitoring for predictive control
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/04—Oxidation reduction potential [ORP]
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/08—Chemical Oxygen Demand [COD]; Biological Oxygen Demand [BOD]
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/14—NH3-N
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/16—Total nitrogen (tkN-N)
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/18—PO4-P
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/20—Total organic carbon [TOC]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/22—O2
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/28—CH4
- C02F2209/285—CH4 in the gas phase
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/42—Liquid level
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mathematical Physics (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Evolutionary Computation (AREA)
- Artificial Intelligence (AREA)
- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Health & Medical Sciences (AREA)
- Microbiology (AREA)
- Biodiversity & Conservation Biology (AREA)
- Molecular Biology (AREA)
- Testing And Monitoring For Control Systems (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010293048A JP5793299B2 (ja) | 2010-12-28 | 2010-12-28 | プロセス監視診断装置 |
CN201180062681.9A CN103534658B (zh) | 2010-12-28 | 2011-12-27 | 工序监视诊断装置 |
PCT/JP2011/007313 WO2012090492A1 (fr) | 2010-12-28 | 2011-12-27 | Système de surveillance et de diagnostic de processus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010293048A JP5793299B2 (ja) | 2010-12-28 | 2010-12-28 | プロセス監視診断装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012141712A JP2012141712A (ja) | 2012-07-26 |
JP5793299B2 true JP5793299B2 (ja) | 2015-10-14 |
Family
ID=46382624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010293048A Active JP5793299B2 (ja) | 2010-12-28 | 2010-12-28 | プロセス監視診断装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5793299B2 (fr) |
CN (1) | CN103534658B (fr) |
WO (1) | WO2012090492A1 (fr) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5939439B2 (ja) * | 2012-08-09 | 2016-06-22 | 株式会社Ihi | 異常診断装置 |
JP5996384B2 (ja) * | 2012-11-09 | 2016-09-21 | 株式会社東芝 | プロセス監視診断装置、プロセス監視診断プログラム |
JP6214889B2 (ja) * | 2013-03-14 | 2017-10-18 | 株式会社東芝 | プロセス監視診断装置 |
JP6364800B2 (ja) * | 2014-02-10 | 2018-08-01 | オムロン株式会社 | 監視装置及び監視方法 |
KR101581425B1 (ko) * | 2014-09-15 | 2015-12-30 | 한국외국어대학교 연구산학협력단 | 제품 제조 공정에서의 이상 감지 방법, 장치 및 기록매체 |
JP6328036B2 (ja) * | 2014-11-28 | 2018-05-23 | 三菱電機ビルテクノサービス株式会社 | 計量メータの状態変化検出装置及びプログラム |
JP6530182B2 (ja) * | 2014-12-08 | 2019-06-12 | 株式会社東芝 | プラント監視装置、プラント監視方法、およびプログラム |
FI130301B (en) * | 2015-01-30 | 2023-06-09 | Metsae Fibre Oy | Monitoring of the chemical load on waste water in an industrial process |
JP6733164B2 (ja) * | 2015-02-26 | 2020-07-29 | 富士電機株式会社 | プロセス監視装置、プロセス監視方法及びプログラム |
JP2016192000A (ja) * | 2015-03-31 | 2016-11-10 | 横河電機株式会社 | 業務支援装置及び業務支援方法 |
JP6501593B2 (ja) * | 2015-04-03 | 2019-04-17 | 住友化学株式会社 | 予測ルール生成システム、予測システム、予測ルール生成方法及び予測方法 |
EP3112959B1 (fr) * | 2015-06-29 | 2021-12-22 | SUEZ Groupe | Procédé de détection d'anomalies dans un système de distribution d'eau |
KR102436629B1 (ko) * | 2016-01-28 | 2022-08-25 | 한화정밀기계 주식회사 | 부품 실장기의 공정 라인 오류의 원인을 자동으로 식별하는 방법, 그리고 이에 적용되는 장치 |
JP6613175B2 (ja) * | 2016-03-03 | 2019-11-27 | 株式会社日立製作所 | 異常検出装置、系統安定度監視装置、及びそのシステム |
JP6620056B2 (ja) * | 2016-03-31 | 2019-12-11 | 三菱日立パワーシステムズ株式会社 | 機器の異常診断方法及び機器の異常診断装置 |
SG11201808401QA (en) * | 2016-04-04 | 2018-10-30 | Boehringer Ingelheim Rcv Gmbh | Real time monitoring of product purification |
WO2017184073A1 (fr) * | 2016-04-18 | 2017-10-26 | Sembcorp Industries Ltd | Système et procédé de commande de processus de traitement des eaux usées |
JP6655847B2 (ja) * | 2016-05-26 | 2020-02-26 | メタウォーター株式会社 | 最終沈澱池からの返送汚泥量・余剰汚泥量の調節方法 |
US20180121889A1 (en) * | 2016-10-28 | 2018-05-03 | Wipro Limited | Method and system for dynamically managing waste water treatment process for optimizing power consumption |
EP3575908B1 (fr) * | 2017-01-25 | 2021-08-04 | NTN Corporation | Procédé de contrôle d'état et appareil de contrôle d'état |
JP7019364B2 (ja) * | 2017-09-29 | 2022-02-15 | エヌ・ティ・ティ・コミュニケーションズ株式会社 | 監視装置、監視方法、監視プログラム、表示装置、表示方法および表示プログラム |
US11275975B2 (en) * | 2017-10-05 | 2022-03-15 | Applied Materials, Inc. | Fault detection classification |
JP7014686B2 (ja) * | 2018-08-06 | 2022-02-01 | 三菱パワー株式会社 | 性能評価装置、性能評価方法及び性能影響度出力方法 |
CN112955839B (zh) * | 2018-10-30 | 2024-08-20 | 国立研究开发法人宇宙航空研究开发机构 | 异常检测装置、异常检测方法和程序 |
CN109524069B (zh) * | 2018-11-09 | 2021-09-10 | 南京医渡云医学技术有限公司 | 医疗数据处理方法、装置、电子设备和存储介质 |
JP6933630B2 (ja) * | 2018-12-06 | 2021-09-08 | ファナック株式会社 | 処理時間監視装置 |
TWI734330B (zh) | 2019-01-31 | 2021-07-21 | 日商住友重機械工業股份有限公司 | 支援裝置、支援方法及記錄媒體 |
CN110529746B (zh) * | 2019-09-05 | 2020-12-25 | 北京化工大学 | 管道泄漏的检测方法、装置和设备 |
WO2021059302A2 (fr) | 2019-09-27 | 2021-04-01 | Tata Consultancy Services Limited | Procédé et système pour diagnostiquer une anomalie dans une installation de fabrication |
CN112016800B (zh) * | 2020-07-17 | 2024-03-08 | 北京天泽智云科技有限公司 | 一种基于有效性指标的特征选择方法与系统 |
WO2022185771A1 (fr) * | 2021-03-04 | 2022-09-09 | 三菱ケミカルエンジニアリング株式会社 | Dispositif de diagnostic, procédé de diagnostic et programme de diagnostic |
CN113239187B (zh) * | 2021-04-13 | 2024-05-14 | 鹏城实验室 | 一种基于多层级工业结构知识块划分的监测方法 |
KR102425177B1 (ko) * | 2022-02-18 | 2022-07-27 | 주식회사 유앤유 | 하수처리시설을 관리하기 위한 방법 및 이를 수행하는 스마트 중앙제어 분석시스템 |
CN115536088A (zh) * | 2022-09-28 | 2022-12-30 | 南京晓庄学院 | 一种基于数据分析的污水生化处理流程优化管控系统 |
CN117342689B (zh) * | 2023-12-06 | 2024-02-02 | 安徽新宇环保科技股份有限公司 | 一种污水厂智能脱氮方法及系统 |
CN117725542B (zh) * | 2024-02-18 | 2024-04-12 | 北京林业大学 | 一种杨树根系微生物状态实时监测方法 |
CN117964024A (zh) * | 2024-04-02 | 2024-05-03 | 车泊喜智能科技(山东)有限公司 | 一种基于人工智能的洗车废水净化处理控制系统 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3495129B2 (ja) * | 1995-03-03 | 2004-02-09 | 株式会社東芝 | プラント異常検知装置 |
JP4289602B2 (ja) * | 2003-03-31 | 2009-07-01 | 三菱化学株式会社 | プロセス監視方法 |
JP4468269B2 (ja) * | 2005-08-30 | 2010-05-26 | 株式会社東芝 | プロセス監視装置及びその方法 |
JP2007257190A (ja) * | 2006-03-22 | 2007-10-04 | Toshiba Corp | 総合監視診断装置 |
JP2009199545A (ja) * | 2008-02-25 | 2009-09-03 | Toshiba Corp | 遠隔監視システム |
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2010
- 2010-12-28 JP JP2010293048A patent/JP5793299B2/ja active Active
-
2011
- 2011-12-27 WO PCT/JP2011/007313 patent/WO2012090492A1/fr active Application Filing
- 2011-12-27 CN CN201180062681.9A patent/CN103534658B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012141712A (ja) | 2012-07-26 |
WO2012090492A1 (fr) | 2012-07-05 |
CN103534658A (zh) | 2014-01-22 |
CN103534658B (zh) | 2017-03-01 |
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