JP5748272B2 - ヘリウムガスの精製方法および精製装置 - Google Patents
ヘリウムガスの精製方法および精製装置 Download PDFInfo
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- JP5748272B2 JP5748272B2 JP2011134069A JP2011134069A JP5748272B2 JP 5748272 B2 JP5748272 B2 JP 5748272B2 JP 2011134069 A JP2011134069 A JP 2011134069A JP 2011134069 A JP2011134069 A JP 2011134069A JP 5748272 B2 JP5748272 B2 JP 5748272B2
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- JP
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- Prior art keywords
- helium gas
- oxygen
- hydrogen
- reactor
- molar concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000007789 gas Substances 0.000 title claims description 184
- 239000001307 helium Substances 0.000 title claims description 175
- 229910052734 helium Inorganic materials 0.000 title claims description 175
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 title claims description 175
- 238000000034 method Methods 0.000 title claims description 85
- 238000000746 purification Methods 0.000 title claims description 13
- 238000001179 sorption measurement Methods 0.000 claims description 160
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 122
- 239000001301 oxygen Substances 0.000 claims description 122
- 229910052760 oxygen Inorganic materials 0.000 claims description 122
- 239000001257 hydrogen Substances 0.000 claims description 109
- 229910052739 hydrogen Inorganic materials 0.000 claims description 109
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 90
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 76
- 239000012535 impurity Substances 0.000 claims description 53
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 49
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 48
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 40
- 239000003463 adsorbent Substances 0.000 claims description 39
- 229910052757 nitrogen Inorganic materials 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 37
- 229910001868 water Inorganic materials 0.000 claims description 37
- 229910021536 Zeolite Inorganic materials 0.000 claims description 20
- 239000001569 carbon dioxide Substances 0.000 claims description 20
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 20
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 20
- 239000010457 zeolite Substances 0.000 claims description 20
- 239000003054 catalyst Substances 0.000 claims description 19
- 150000002431 hydrogen Chemical class 0.000 claims description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 17
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- 230000018044 dehydration Effects 0.000 claims description 13
- 238000006297 dehydration reaction Methods 0.000 claims description 13
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 description 19
- 239000003507 refrigerant Substances 0.000 description 18
- 238000001816 cooling Methods 0.000 description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 238000003795 desorption Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 8
- 239000002808 molecular sieve Substances 0.000 description 8
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000013307 optical fiber Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000011575 calcium Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 238000012681 fiber drawing Methods 0.000 description 3
- 230000003584 silencer Effects 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000012024 dehydrating agents Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000769 gas chromatography-flame ionisation detection Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- Separation Of Gases By Adsorption (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011134069A JP5748272B2 (ja) | 2010-07-07 | 2011-06-16 | ヘリウムガスの精製方法および精製装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010154811 | 2010-07-07 | ||
| JP2010154811 | 2010-07-07 | ||
| JP2011134069A JP5748272B2 (ja) | 2010-07-07 | 2011-06-16 | ヘリウムガスの精製方法および精製装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012031049A JP2012031049A (ja) | 2012-02-16 |
| JP5748272B2 true JP5748272B2 (ja) | 2015-07-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011134069A Active JP5748272B2 (ja) | 2010-07-07 | 2011-06-16 | ヘリウムガスの精製方法および精製装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5748272B2 (zh) |
| CN (1) | CN102311102B (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102718198B (zh) * | 2012-03-14 | 2014-01-29 | 上海启元空分技术发展股份有限公司 | 冷凝法提纯氦气的方法及其装置 |
| CN102718199B (zh) * | 2012-03-14 | 2014-01-29 | 上海启元空分技术发展股份有限公司 | 结晶法提纯氦气的方法和装置 |
| FR3035656B1 (fr) * | 2015-04-30 | 2019-03-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Production d'helium a partir d'un courant gazeux contenant de l'hydrogene |
| CN106082150A (zh) * | 2016-06-02 | 2016-11-09 | 中国工程物理研究院材料研究所 | 一种用于制备高纯度3He的装置及制备高纯度3He的方法 |
| FR3104564B1 (fr) * | 2019-12-12 | 2022-03-04 | Air Liquide | Procédé et un dispositif de purification de gaz |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL89211C (zh) * | 1952-03-21 | |||
| DE1252187B (de) * | 1962-06-20 | 1967-10-19 | United Kingdom Atomic Energy Authority, London | Verfahren zur Reinigung von Helium |
| JPS5954608A (ja) * | 1982-09-20 | 1984-03-29 | Hoxan Corp | 粗不活性ガス中の酸素分除去方法 |
| JPH0624962B2 (ja) * | 1985-11-15 | 1994-04-06 | 日本酸素株式会社 | 単結晶製造炉の排ガスより高純度アルゴンを回収する方法 |
| JP2640513B2 (ja) * | 1988-10-31 | 1997-08-13 | 日本パイオニクス株式会社 | 不活性ガスの精製装置 |
| ZA915939B (en) * | 1990-08-23 | 1992-06-24 | Boc Group Inc | Process for helium purification |
| JP2510934B2 (ja) * | 1992-09-22 | 1996-06-26 | 日揮株式会社 | 化学励起沃素レ―ザ―装置の排ガスから希ガスを回収する方法 |
| JPH1183309A (ja) * | 1997-09-04 | 1999-03-26 | Nippon Air Rikiide Kk | アルゴン精製方法及び装置 |
| JP4058278B2 (ja) * | 2002-02-26 | 2008-03-05 | 住友精化株式会社 | ヘリウム精製装置 |
| JP4201572B2 (ja) * | 2002-10-29 | 2008-12-24 | 大陽日酸株式会社 | 触媒式酸化処理装置及びこれを使用するガス精製システム |
| KR100873375B1 (ko) * | 2004-09-09 | 2008-12-10 | 조건환 | 폐헬륨가스의 정제 방법과 장치 |
| US7645431B2 (en) * | 2007-10-23 | 2010-01-12 | Air Products And Chemicals, Inc. | Purification of noble gases using online regeneration of getter beds |
| JP2010076972A (ja) * | 2008-09-25 | 2010-04-08 | Taiyo Nippon Sanso Corp | 不純希ガスの処理方法 |
| TWI476038B (zh) * | 2010-02-10 | 2015-03-11 | Sumitomo Seika Chemicals | 氬氣之純化方法及純化裝置 |
| TWI478761B (zh) * | 2010-02-25 | 2015-04-01 | Sumitomo Seika Chemicals | 氬氣之純化方法及純化裝置 |
| JP5614808B2 (ja) * | 2011-01-18 | 2014-10-29 | 住友精化株式会社 | ヘリウムガスの精製方法および精製装置 |
-
2011
- 2011-06-16 JP JP2011134069A patent/JP5748272B2/ja active Active
- 2011-07-01 CN CN201110189742.XA patent/CN102311102B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN102311102B (zh) | 2014-08-20 |
| CN102311102A (zh) | 2012-01-11 |
| JP2012031049A (ja) | 2012-02-16 |
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