JP5721925B2 - 真空めっき装置および該装置における加工物の支持および操作を行う機構 - Google Patents
真空めっき装置および該装置における加工物の支持および操作を行う機構 Download PDFInfo
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- JP5721925B2 JP5721925B2 JP2008055652A JP2008055652A JP5721925B2 JP 5721925 B2 JP5721925 B2 JP 5721925B2 JP 2008055652 A JP2008055652 A JP 2008055652A JP 2008055652 A JP2008055652 A JP 2008055652A JP 5721925 B2 JP5721925 B2 JP 5721925B2
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- 238000007747 plating Methods 0.000 title claims description 111
- 230000007246 mechanism Effects 0.000 title claims description 63
- 239000000463 material Substances 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 230000008878 coupling Effects 0.000 claims description 18
- 238000010168 coupling process Methods 0.000 claims description 18
- 238000005859 coupling reaction Methods 0.000 claims description 18
- 238000010894 electron beam technology Methods 0.000 claims description 15
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000007723 transport mechanism Effects 0.000 description 6
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000012720 thermal barrier coating Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- 244000061458 Solanum melongena Species 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 208000008918 voyeurism Diseases 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Description
12 第1のレーキ装置上に装てんされた加工物
14 めっきチャンバ
16 装てんチャンバ
18 輸送機構(全体)
19 第1の板部材
20 レーキ装置
22 予熱要素
24 粗引きポンプ
26 装てんチャンバとめっきチャンバとの間の二方真空弁
28 装てんチャンバ内の弁
30 第2の板部材
32 結合装置(全体)
34 めっきチャンバ内における加工物の支持および操作を行う機構(全体)
36 めっきチャンバに付随する真空ポンプ
40 めっきチャンバののぞき穴
42 セラミック材料塊
44 電子ビーム
46 電子ビーム銃
50 マニピュレータ・アーム(全体)
52 マニピュレータ・アームの本体部分
54 本体部分の第1の端部
56 本体部分の第2の端部
58 結合機構
60 自在継手
62 中間部材
64 第2の板部材を移動させる装置(全体)
66 所定の垂直面
68 第1のリンク機構
70 第1のリンク機構用駆動装置
72 軸部材
74 めっきチャンバ壁部
76 軸部材の受け口
78 軸部材の端部
80 加工物を回転させる駆動装置
81 軸部材とめっきチャンバ壁部との間の軸受
82 中間部材と第1のリンク機構との間の軸受
84 支持機構を通る中心軸
86 高温シール
88 所定の水平面に対する傾斜角
90 所定の水平面
92 加工物を所定の水平面内において移動させる装置(全体)
94 第2のリンク機構
95 第2のリンク機構用駆動装置
96 所定の垂直面に対する角度
98 継手を所定の垂直面内において移動させる装置(また他の実施例)
100 リンク機構(また他の実施例)
102 ピン部材
104 リンク機構とピン部材との間の軸受
106 第2(内側)の軸部材
108 軸部材間の軸受
110 リンク機構用駆動装置
112 加工物
114 加工物
Claims (10)
- 加工物(12)に真空めっきを施す装置(10)において:
(a)被覆材料(42)を内包するめっきチャンバ(14)であって、高温かつ準大気圧で作用しうるめっきチャンバ(14);
(b)前記めっきチャンバ(14)内および前記被覆材料(42)上に電子ビーム(44)を照射する電子ビーム銃(46)であって、前記被覆材料(42)を溶解させるとともに、溶融被覆材料を気化させるよう作用しうる電子ビーム銃(46);
(c)前記めっきチャンバ(14)内における前記加工物(12)の支持および操作を行う機構(34);および
(d)前記めっきチャンバ(14)に隣接する装てんチャンバ(16)
を有し、
前記機構(34)は、
(1)前記加工物(12)を保持する結合装置(58)と;
(2)前記結合装置(58)に接続し、前記加工物(12)の全方向の移動を可能にする継手(60)と;
(3)前記結合装置(58)と前記継手(60)とを接続する中間部材(62)と;
(4)前記中間部材(62)に接続し、前記加工物(12)を所定の平面(66、90)内において移動させる装置(64)と
(5)前記結合装置(58)を自身に付随させて含み、前記中間部材(62)に接続する第2の板部材(30)と
を含み、
前記加工物(12)は、前記装てんチャンバ(16)内で第1の板部材(19)に保持された後に前記めっきチャンバ(14)に移動され、該第1の板部材(19)が前記第2の板部材(30)に取り付けられることにより、該めっきチャンバ(14)に配置され、
前記加工物(12)を移動させる装置(64)は、
(a)前記中間部材(62)に接続する第1のリンク機構(68)と;
(b)前記第1のリンク機構(68)を制御する駆動装置(70)と
をさらに含み、
前記第1のリンク機構(68)は、前記中間部材(62)を移動させることにより前記加工物(12)を所望の位置に傾斜させる
ことを特徴とする、装置(10)。 - 前記加工物(12)は、所定の垂直面(66)内において移動する、請求項1に記載の加工物(12)を移動させる装置(10)。
- 前記加工物(12)は、所定の水平面(90)内において移動する、請求項1に記載の加工物(12)を移動させる装置(10)。
- 前記支持機構(34)は、前記加工物(12)を、前記めっきチャンバ(14)を通る所定の水平面(90)に対してある角度(88)傾斜させることができる、請求項2に記載の加工物(12)を移動させる装置(10)。
- 前記支持機構(34)は、前記加工物(12)を前記めっきチャンバ(14)内において回転させる駆動装置(80)をさらに含む、請求項1乃至4のいずれか1項に記載の加工物(12)を移動させる装置(10)。
- 前記機構(34)は、さらに、前記めっきチャンバ(14)の壁部(74)を貫通し延在し且つ該めっきチャンバ(14)の壁部(74)に設けられた軸受(81)に回転可能に配置された軸部材(72)を備え、
前記継手(60)は、前記めっきチャンバ(14)内で前記軸部材(72)の端部(78)に接続し、該継手(60)は、該軸部材(72)と共に回転可能であり且つ前記加工物(12)を傾斜させ、
前記中間部材(62)は、中心軸(84)を備え、
前記加工物(12)を移動させる装置(10)は、前記めっきチャンバ(14)の外側に配置され、前記中間部材(62)を回転させる回転駆動装置(80)をさらに備え、該回転駆動装置(80)は前記軸部材(72)及び前記継手(60)を介して該中間部材(62)に接続され、
前記第1のリンク機構(68)及び前記駆動装置(70)は、前記継手(60)を回転中心として前記中間部材(62)及び前記加工物(12)を所定面内においてある傾斜範囲内で所望の傾斜角度に傾斜させ、
前記第1のリンク機構(68)は、前記中間部材(62)が前記中心軸(84)を回転中心として回転できるよう軸受(82)を介して該中間部材(62)に接続している、
請求項1乃至5のいずれか1項に記載の加工物(12)を移動させる装置(10)。 - 前記第1の板部材(19)は、前記装てんチャンバ(16)内でレーキ装置(20)に装てんされ、該レーキ装置(20)が前記装てんチャンバ(16)から前記めっきチャンバ(14)に押し入れられる、請求項1乃至6のいずれか1項に記載の加工物(12)を移動させる装置(10)。
- 前記駆動装置(80)は、前記めっきチャンバ(14)の外側に配置される、請求項5に記載の加工物(12)を移動させる装置(10)。
- 前記支持機構(34)は、前記加工物(12)を操作して前記被覆材料(42)に対して所定の位置に配置することができる、請求項1乃至8のいずれか1項に記載の加工物(12)を移動させる装置(10)。
- 前記中間部材(62)と前記第1のリンク機構(68)との間における接続は、前記めっきチャンバ(14)の内側において行われる、請求項6に記載の加工物(12)を移動させる装置(10)。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/685,354 | 2007-03-13 | ||
US11/685,354 US7997227B2 (en) | 2007-03-13 | 2007-03-13 | Vacuum coater device and mechanism for supporting and manipulating workpieces in same |
Publications (2)
Publication Number | Publication Date |
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JP2008231572A JP2008231572A (ja) | 2008-10-02 |
JP5721925B2 true JP5721925B2 (ja) | 2015-05-20 |
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Application Number | Title | Priority Date | Filing Date |
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JP2008055652A Expired - Fee Related JP5721925B2 (ja) | 2007-03-13 | 2008-03-06 | 真空めっき装置および該装置における加工物の支持および操作を行う機構 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7997227B2 (ja) |
EP (1) | EP1970463B1 (ja) |
JP (1) | JP5721925B2 (ja) |
SG (2) | SG146540A1 (ja) |
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US6923868B2 (en) * | 2003-09-23 | 2005-08-02 | Gba S.A. | Installation for electron-ray coatication of coatings |
US8033245B2 (en) * | 2004-02-12 | 2011-10-11 | Applied Materials, Inc. | Substrate support bushing |
US7030395B2 (en) * | 2004-08-06 | 2006-04-18 | Axcelis Technologies, Inc. | Workpiece support structure for an ion beam implanter featuring spherical sliding seal vacuum feedthrough |
US7997227B2 (en) * | 2007-03-13 | 2011-08-16 | General Electric Company | Vacuum coater device and mechanism for supporting and manipulating workpieces in same |
-
2007
- 2007-03-13 US US11/685,354 patent/US7997227B2/en not_active Expired - Fee Related
-
2008
- 2008-03-04 SG SG200801783-2A patent/SG146540A1/en unknown
- 2008-03-04 SG SG201006500-1A patent/SG165350A1/en unknown
- 2008-03-06 JP JP2008055652A patent/JP5721925B2/ja not_active Expired - Fee Related
- 2008-03-07 EP EP08152436A patent/EP1970463B1/en not_active Expired - Fee Related
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US20080223291A1 (en) | 2008-09-18 |
EP1970463B1 (en) | 2012-09-05 |
SG146540A1 (en) | 2008-10-30 |
SG165350A1 (en) | 2010-10-28 |
JP2008231572A (ja) | 2008-10-02 |
EP1970463A2 (en) | 2008-09-17 |
EP1970463A3 (en) | 2009-02-25 |
US7997227B2 (en) | 2011-08-16 |
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