JP5711748B2 - アルカリ現像型感光性樹脂組成物 - Google Patents

アルカリ現像型感光性樹脂組成物 Download PDF

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Publication number
JP5711748B2
JP5711748B2 JP2012529418A JP2012529418A JP5711748B2 JP 5711748 B2 JP5711748 B2 JP 5711748B2 JP 2012529418 A JP2012529418 A JP 2012529418A JP 2012529418 A JP2012529418 A JP 2012529418A JP 5711748 B2 JP5711748 B2 JP 5711748B2
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JP
Japan
Prior art keywords
resin composition
photosensitive resin
alkali
petroleum
carboxyl group
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JP2012529418A
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English (en)
Japanese (ja)
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JPWO2012023164A1 (ja
Inventor
加藤　賢治
賢治 加藤
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Taiyo Ink Suzhou Co Ltd
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Taiyo Ink Suzhou Co Ltd
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Publication of JPWO2012023164A1 publication Critical patent/JPWO2012023164A1/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
JP2012529418A 2010-08-20 2010-09-13 アルカリ現像型感光性樹脂組成物 Active JP5711748B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201010259634.0A CN102375339B (zh) 2010-08-20 2010-08-20 碱显影型感光性树脂组合物
CN201010259634.0 2010-08-20
PCT/JP2010/005576 WO2012023164A1 (ja) 2010-08-20 2010-09-13 アルカリ現像型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPWO2012023164A1 JPWO2012023164A1 (ja) 2013-10-28
JP5711748B2 true JP5711748B2 (ja) 2015-05-07

Family

ID=45604839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012529418A Active JP5711748B2 (ja) 2010-08-20 2010-09-13 アルカリ現像型感光性樹脂組成物

Country Status (6)

Country Link
US (1) US8932798B2 (zh)
JP (1) JP5711748B2 (zh)
KR (1) KR101559636B1 (zh)
CN (1) CN102375339B (zh)
MY (1) MY159164A (zh)
WO (1) WO2012023164A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5798978B2 (ja) * 2012-05-17 2015-10-21 富士フイルム株式会社 着色感放射線性組成物、これを用いたカラーフィルタ
JP5624184B1 (ja) * 2013-06-28 2014-11-12 太陽インキ製造株式会社 ドライフィルムおよびプリント配線板
US9069294B1 (en) * 2014-01-15 2015-06-30 Xerox Corporation Transfer assist members
JP7310802B2 (ja) * 2018-04-10 2023-07-19 Dic株式会社 感光性樹脂組成物、硬化物、絶縁材料、ソルダーレジスト用樹脂材料及びレジスト部材
FI129797B (en) * 2020-06-29 2022-08-31 Epu Coat Oy A method for producing a durable coating and a durable coating produced by the method
CN113075862A (zh) * 2021-03-03 2021-07-06 长春人造树脂厂股份有限公司 抗蚀刻组合物
KR102412228B1 (ko) * 2021-04-27 2022-06-27 에스케이이노베이션 주식회사 유기용제 조성물 및 이를 포함하는 도료 조성물
KR102576144B1 (ko) * 2022-06-20 2023-09-12 에스케이이노베이션 주식회사 방향족 유기용제 조성물 및 이를 포함하는 도료 조성물

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPH08136712A (ja) * 1994-11-07 1996-05-31 Hitachi Chem Co Ltd カラーフィルタの製造法
JP2003253212A (ja) * 2002-03-01 2003-09-10 Sumitomo Chem Co Ltd 膜形成用塗布液
JP2007003789A (ja) * 2005-06-23 2007-01-11 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物ならびにこれを用いたパターンおよびカラーフィルタ
JP2007316545A (ja) * 2006-05-29 2007-12-06 Nippon Paint Co Ltd フォトソルダーレジストドライフィルム及び該ドライフィルム製造用樹脂組成物並びにソルダーレジスト膜
JP2009237057A (ja) * 2008-03-26 2009-10-15 Taiyo Ink Mfg Ltd 光硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100807697B1 (ko) * 2004-02-25 2008-02-28 간사이 페인트 가부시키가이샤 광도파로 형성용 광경화성 수지 조성물, 광도파로 형성용광경화성 드라이 필름 및 광도파로
JP4762630B2 (ja) 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
CN101277994B (zh) * 2005-10-31 2012-05-16 日本化药株式会社 橡胶改性聚酰胺树脂、环氧树脂组合物及其固化物
JP2008070480A (ja) 2006-09-12 2008-03-27 Az Electronic Materials Kk フォトレジスト用溶媒とそれを用いたスリットコーティング用フォトレジスト組成物
JP5291893B2 (ja) * 2007-05-08 2013-09-18 太陽ホールディングス株式会社 光硬化性樹脂組成物およびその硬化物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPH08136712A (ja) * 1994-11-07 1996-05-31 Hitachi Chem Co Ltd カラーフィルタの製造法
JP2003253212A (ja) * 2002-03-01 2003-09-10 Sumitomo Chem Co Ltd 膜形成用塗布液
JP2007003789A (ja) * 2005-06-23 2007-01-11 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物ならびにこれを用いたパターンおよびカラーフィルタ
JP2007316545A (ja) * 2006-05-29 2007-12-06 Nippon Paint Co Ltd フォトソルダーレジストドライフィルム及び該ドライフィルム製造用樹脂組成物並びにソルダーレジスト膜
JP2009237057A (ja) * 2008-03-26 2009-10-15 Taiyo Ink Mfg Ltd 光硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JPN6014027278; ＳＯＬＶＥＳＳＯ　１００　ＦＬＵＩＤ　安全データシート , 20140624 *
JPN6014027279; ＳＯＬＶＥＳＳＯ　１５０　ＦＬＵＩＤ　安全データシート , 20140624 *

Also Published As

Publication number Publication date
CN102375339A (zh) 2012-03-14
MY159164A (en) 2016-12-30
US8932798B2 (en) 2015-01-13
US20130122420A1 (en) 2013-05-16
KR20140006761A (ko) 2014-01-16
KR101559636B1 (ko) 2015-10-12
JPWO2012023164A1 (ja) 2013-10-28
WO2012023164A1 (ja) 2012-02-23
CN102375339B (zh) 2013-06-12

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