JP5651477B2 - ハイブリッドビヒクル系 - Google Patents
ハイブリッドビヒクル系 Download PDFInfo
- Publication number
- JP5651477B2 JP5651477B2 JP2010539909A JP2010539909A JP5651477B2 JP 5651477 B2 JP5651477 B2 JP 5651477B2 JP 2010539909 A JP2010539909 A JP 2010539909A JP 2010539909 A JP2010539909 A JP 2010539909A JP 5651477 B2 JP5651477 B2 JP 5651477B2
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- JP
- Japan
- Prior art keywords
- composition
- peroxide
- mixture
- silicon
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000203 mixture Substances 0.000 claims description 410
- 238000000576 coating method Methods 0.000 claims description 170
- 239000011248 coating agent Substances 0.000 claims description 131
- 239000000758 substrate Substances 0.000 claims description 111
- 239000002245 particle Substances 0.000 claims description 90
- -1 siloxy compound Chemical class 0.000 claims description 89
- 239000000725 suspension Substances 0.000 claims description 83
- 238000000034 method Methods 0.000 claims description 71
- 229910052723 transition metal Inorganic materials 0.000 claims description 63
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 62
- 229910052751 metal Inorganic materials 0.000 claims description 62
- 239000002184 metal Substances 0.000 claims description 62
- 229910044991 metal oxide Inorganic materials 0.000 claims description 62
- 150000004706 metal oxides Chemical class 0.000 claims description 62
- 229910000077 silane Inorganic materials 0.000 claims description 61
- 229910052710 silicon Inorganic materials 0.000 claims description 60
- 239000010703 silicon Substances 0.000 claims description 60
- 150000003624 transition metals Chemical class 0.000 claims description 59
- 239000008365 aqueous carrier Substances 0.000 claims description 55
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 53
- 150000004692 metal hydroxides Chemical class 0.000 claims description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 52
- 239000002105 nanoparticle Substances 0.000 claims description 47
- 239000010936 titanium Substances 0.000 claims description 41
- 239000005300 metallic glass Substances 0.000 claims description 40
- 239000000843 powder Substances 0.000 claims description 40
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 39
- 239000000243 solution Substances 0.000 claims description 39
- 150000004972 metal peroxides Chemical class 0.000 claims description 38
- 150000002978 peroxides Chemical class 0.000 claims description 38
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 36
- 229910052719 titanium Inorganic materials 0.000 claims description 35
- 239000007859 condensation product Substances 0.000 claims description 31
- 229910000314 transition metal oxide Inorganic materials 0.000 claims description 28
- 238000009835 boiling Methods 0.000 claims description 27
- 150000002902 organometallic compounds Chemical class 0.000 claims description 25
- 239000000945 filler Substances 0.000 claims description 24
- 239000002253 acid Substances 0.000 claims description 23
- 238000001914 filtration Methods 0.000 claims description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 22
- 239000011135 tin Substances 0.000 claims description 22
- 239000011701 zinc Substances 0.000 claims description 22
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 21
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 21
- 229910052718 tin Inorganic materials 0.000 claims description 21
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 20
- 229910052725 zinc Inorganic materials 0.000 claims description 20
- 230000002209 hydrophobic effect Effects 0.000 claims description 18
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 17
- 229910052726 zirconium Inorganic materials 0.000 claims description 17
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 16
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 13
- 229910052733 gallium Inorganic materials 0.000 claims description 13
- 229910001510 metal chloride Inorganic materials 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 11
- 229910052735 hafnium Inorganic materials 0.000 claims description 10
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 10
- 229910052714 tellurium Inorganic materials 0.000 claims description 10
- 229910052732 germanium Inorganic materials 0.000 claims description 9
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 9
- 229910052741 iridium Inorganic materials 0.000 claims description 9
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 9
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229910052702 rhenium Inorganic materials 0.000 claims description 8
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 8
- 229910052720 vanadium Inorganic materials 0.000 claims description 7
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 7
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 6
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 4
- 230000003472 neutralizing effect Effects 0.000 claims description 4
- 229910021381 transition metal chloride Inorganic materials 0.000 claims description 4
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 claims description 3
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 3
- 150000001805 chlorine compounds Chemical class 0.000 claims description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims 8
- 235000005074 zinc chloride Nutrition 0.000 claims 4
- 239000011592 zinc chloride Substances 0.000 claims 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims 2
- 230000007704 transition Effects 0.000 claims 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 133
- 239000010408 film Substances 0.000 description 82
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 77
- 239000003981 vehicle Substances 0.000 description 68
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 33
- 230000007797 corrosion Effects 0.000 description 30
- 238000005260 corrosion Methods 0.000 description 30
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 28
- 150000004756 silanes Chemical class 0.000 description 28
- 230000015572 biosynthetic process Effects 0.000 description 27
- 239000000654 additive Substances 0.000 description 24
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 22
- 230000001699 photocatalysis Effects 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 19
- 239000011521 glass Substances 0.000 description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 239000012528 membrane Substances 0.000 description 18
- 150000002739 metals Chemical class 0.000 description 18
- 239000000080 wetting agent Substances 0.000 description 18
- 239000002131 composite material Substances 0.000 description 17
- 239000000178 monomer Substances 0.000 description 17
- 238000006386 neutralization reaction Methods 0.000 description 17
- 239000006185 dispersion Substances 0.000 description 16
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 14
- 239000010949 copper Substances 0.000 description 14
- 238000006460 hydrolysis reaction Methods 0.000 description 14
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 14
- 239000011858 nanopowder Substances 0.000 description 14
- 239000000049 pigment Substances 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 14
- 150000003839 salts Chemical class 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 14
- 239000007787 solid Substances 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 13
- 229910052802 copper Inorganic materials 0.000 description 13
- 239000010410 layer Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 12
- 239000010409 thin film Substances 0.000 description 12
- 230000003197 catalytic effect Effects 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 11
- 230000007062 hydrolysis Effects 0.000 description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 11
- 229910052721 tungsten Inorganic materials 0.000 description 11
- 239000010937 tungsten Substances 0.000 description 11
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 238000000231 atomic layer deposition Methods 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 238000009472 formulation Methods 0.000 description 10
- 229910052742 iron Inorganic materials 0.000 description 10
- 229910052744 lithium Inorganic materials 0.000 description 10
- 239000000395 magnesium oxide Substances 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- 229910052727 yttrium Inorganic materials 0.000 description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 9
- 239000004698 Polyethylene Substances 0.000 description 9
- 238000013019 agitation Methods 0.000 description 9
- 239000004927 clay Substances 0.000 description 9
- 238000010908 decantation Methods 0.000 description 9
- 239000000499 gel Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000011777 magnesium Substances 0.000 description 9
- 229910052749 magnesium Inorganic materials 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 9
- 229910001928 zirconium oxide Inorganic materials 0.000 description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
- 239000011651 chromium Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000009833 condensation Methods 0.000 description 8
- 230000005494 condensation Effects 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 8
- 229910052750 molybdenum Inorganic materials 0.000 description 8
- 239000011733 molybdenum Substances 0.000 description 8
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- 241000894007 species Species 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
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- 230000000996 additive effect Effects 0.000 description 7
- 229910052787 antimony Inorganic materials 0.000 description 7
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
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- 229910052738 indium Inorganic materials 0.000 description 7
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- 239000011133 lead Substances 0.000 description 7
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 7
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- 229910000416 bismuth oxide Inorganic materials 0.000 description 6
- 229910052793 cadmium Inorganic materials 0.000 description 6
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- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 6
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 6
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- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 5
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- XQAXGZLFSSPBMK-UHFFFAOYSA-M [7-(dimethylamino)phenothiazin-3-ylidene]-dimethylazanium;chloride;trihydrate Chemical compound O.O.O.[Cl-].C1=CC(=[N+](C)C)C=C2SC3=CC(N(C)C)=CC=C3N=C21 XQAXGZLFSSPBMK-UHFFFAOYSA-M 0.000 description 5
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- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 5
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
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- 125000001424 substituent group Chemical group 0.000 description 5
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- GNBPMOQUHWCSGK-UHFFFAOYSA-N trimethoxy(1-trimethoxysilyldecan-2-yl)silane Chemical compound CCCCCCCCC([Si](OC)(OC)OC)C[Si](OC)(OC)OC GNBPMOQUHWCSGK-UHFFFAOYSA-N 0.000 description 5
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/04—Metal peroxides or peroxyhydrates thereof; Metal superoxides; Metal ozonides; Peroxyhydrates thereof
- C01B15/047—Metal peroxides or peroxyhydrates thereof; Metal superoxides; Metal ozonides; Peroxyhydrates thereof of heavy metals
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
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Description
本出願は、2007年12月21日に出願の米国特許出願第11/963,380号の一部継続出願である、2008年7月3日に出願の米国特許出願第12/167,863号の一部継続出願である、2008年8月29日に出願の米国特許出願第12/202,076号の一部継続出願であり、前記出願の全ては、その全体が引用により本明細書に組み込まれる。
ポリマー分子ハイブリッドナノ結晶の溶液又は水性分散液は、特定の反応条件下で、選択された反応物及び添加剤を合わせる一連の工程に従い調製できる。ポリマー分子ハイブリッドナノ結晶の溶液又は水性分散液を含む組成物を、マクロ又はミクロ表面(ミクロ粒子パウダーなど)に塗布して、金属酸化物、金属、及び他の任意成分を含む保護性及び/又は機能性のコーティングを形成することができる。該コーティングは、ナノ粒子を分散するための無機ビヒクル系としても使用可能なナノハイブリッド結晶を有するビヒクル系から形成されるナノ膜及び複合膜を含むことができる。該組成物を使用して、コーティングの他に、ナノパウダー及びナノ複合パウダー、並びに気化ナノ粒子を調製できる。
酸化エルビウムは、2,4-ペンタンジオン酸エルビウムの添加により作られたビヒクル系から製造された膜に、桃色を与える。
PMHNC組成物に2,4-ペンタンジオン酸銅(II)及び銅(II)エトキシドを加えると、電気化学用途及び超伝導用途に有用な膜が生じる。
いくつかの実施態様において、2,4-ペンタンジオン酸バリウムから誘導される酸化バリウムを含むPMHNC膜は、ゾルゲル誘導超伝導体の中間体として有用である。
2,4-ペンタンジオン酸カドミウムの添加から誘導される酸化カドミウムを含むPMHNC膜は、赤外放射に対して透明であり、発光性および導電性を示す。
2,4-ペンタンジオン酸イリジウム(III)の添加によりPMHNCコーティングに酸化イリジウムを混和すると、触媒性及び/又は光還元性を持つ膜が生じる。
酸化タングステンを、顔料、不透明化剤、及び/又は触媒としてPMHNC組成物に加えることができる。それは、オプティカルコーティング、溶接棒フラックス、セラミック仕上げ塗り、プラスチック、エラストマー、被覆布地、印刷インク、屋根用グラニュール、ガラス、及び釉薬において望ましい。
PMHNC組成物において、酸化ニッケルは、腐食防止剤及び/又は酸素ドナーとして作用し、モリブデン化合物と反応してモリブデン酸ニッケルを形成できる。酸化ニッケルを含む膜は、サーミスター、バリスタ、サーメット、抵抗加熱素子、セラミック釉薬、エナメル、及び顔料に有用である。
PMHNC組成物に雲母状酸化鉄を加えると、紫外光を反射する、耐久性があり耐食性を持つコーティングが生じる。雲母状酸化鉄を含むPMHNCナノパウダーを、塗料、プライマー、又は他のコーティング組成物に分散させ、向上した耐食性及び耐候性を加えることができる。薄板状の(雲母状)粒子の水平な積み重ね及び重ね合わせはコーティング組成物を強化し、腐食性要素及び紫外光の侵入に対するバリアとして作用する。
磁性/黒色酸化鉄パウダーは天然の酸化鉄磁石である。PMHNC組成物に加えられると、得られるコーティングは、耐熱性材料、吸収性コーティング、触媒コーティング、及び触媒担体として有用である。酸化鉄を含むPMHNCナノパウダーは、セメント、肥料、ガス洗浄用途などにも使用できる。
いくつかの実施態様において、PMHNC組成物に酸化ゲルマニウムパウダーを加えると、光学ガラス用のコーティングが生じる。
二酸化クロムパウダーを含むPMHNCを、レンガ、顔料、及びモルタルへの添加剤として使用し、これらの材料の寿命を延ばすことができる。
PMHNCコーティング及びナノパウダー中に存在すると、酸化ホウ素パウダーは、難燃剤及び腐食防止剤として作用する。酸化ホウ素パウダーは、種々のホウ素化合物の製造における酸触媒又は化学中間体として作用する。
溶融酸化アルミニウムパウダーを含むPMHNC組成物からできたコーティングは、向上した耐摩耗性を示す。これらの組成物は、耐熱性コーティングとしても有用である。
M(OH)4 + 3H2O2 + 4NH4 + (aq)→M(OO)4 + + 5H2 +3O2 +4NH4 +
図6は、この反応で形成され溶液中で安定化されているケイ素過酸化物のモデルを表し、アンモニウムイオンはペルオキシド基のすぐ近くにある。水溶液中の水との水素結合は、ケイ素過酸化物及びアンモニウムイオンの配置を安定化させると考えられる。過酸化物の添加及び冷却(例えば、約24時間の間)の後、混合物は、pHが約5から約6であり(例えば、約5.6)、室温にされる。pHは上昇し、約6.5から約7.5(例えば、約7.0から約7.3)又は約6.5から約11.5で安定化する。混合物を、GF/B(1ミクロンのフィルター)を通して濾過し、フラスコに入れてよい。約50〜80%の混合物が濾過された後、シリカ含有メソポーラスナノゼラチン状メンブランがフィルターの上に形成する。ペルオキソ基が金属上でアンモニウムイオンにより安定化されると濾液中で二次的な反応が起こるが、これは濾液からの気泡の発生(例えば、水素及び酸素ガス)により証明される。
SiCl4を、酸及び他の金属塩化物を含むチタン系溶液の水性混合物に混和した。図1に示した方法により、アンモニア系溶液による酸性混合物の中和も含んで、有機金属をビヒクル系に混和した。その後溶液は水ガラス又は液体シリカの外観を有した。濾過、金属水酸化物の再構成、及び過酸化物系溶液の添加後、ビス(トリエトキシシリル)エタンをアモルファス金属過酸化物溶液に加えた。ビス(トリエトキシシリル)エタンは、基材と6つの結合を形成する能力のあるダイポーダルシランである。これらの結合が形成されると、加水分解に対する耐性は、基材と3つの結合のみ形成する能力のある従来のカップリング剤の約10万倍、又は基材と4つの結合を形成できるシラン(テトラエトキシシランなど)の約7万5千倍であると推定される。
ハイブリッド金属酸化物中の相対的なSi :Ti :Zr : Snの酸化物のパーセンテージが0.63:90.68:3.31:4.48である、図1の方法に関して本明細書に記載のとおり製造した組成物Aで、非多孔質セラミックタイルを被覆した。
Claims (34)
- 以下の工程を含む、組成物の調製方法:
(a)(i)ビス(トリエトキシシリル)エタンを含む有機官能性シラン;
(ii)チタン塩化物及び亜鉛塩化物の混合物、又はチタン塩化物、亜鉛塩化物及びスズ塩化物の混合物を含む金属塩化物;及び
(iii)酸;
を含む水性混合物を形成する工程;
(b)該水性混合物を沸騰させる工程;
(c)該水性混合物に塩基を加え、該混合物を中和し、該金属の水酸化物を形成する工程;
(d)該金属水酸化物及びシロキシ化合物を含むコロイド状懸濁液を形成する工程;
(e)過酸化物系溶液を加え、該金属の過酸化物を含む懸濁液を形成する工程;
(f)該懸濁液を室温で平衡に達するようにする工程;及び
(g)該懸濁液を、大気圧より高い圧力で沸騰させ、シロキシ化合物と金属過酸化物との縮合生成物を含むハイブリッド皮膜形成組成物を形成する工程。 - (a)及び(b)の前記水性混合物のpHが1未満である、請求項1記載の方法。
- (a)で形成される前記水性混合物が、有機金属化合物をさらに含む、請求項1又は2に記載の方法。
- 前記懸濁液の沸騰により形成される組成物が、ハイブリッド金属酸化物を含む、直径が10nm未満の結晶性粒子をさらに含む、請求項1〜3のいずれか一項に記載の方法。
- 前記皮膜形成組成物が、シロキシ化合物と遷移金属過酸化物との縮合生成物を含む、請求項1〜4のいずれか一項に記載の方法。
- 前記金属塩化物が、ケイ素、チタン、ジルコニウム、スズ、バナジウム、ガリウム、ゲルマニウム、テルル、ハフニウム、レニウム、イリジウム、白金の塩化物、又はケイ素、チタン、ジルコニウム、スズ、バナジウム、ガリウム、ゲルマニウム、テルル、ハフニウム、レニウム、イリジウム、若しくは白金の2種以上の塩化物の任意の組み合わせを含む、請求項1〜5のいずれか一項に記載の方法。
- 前記ハイブリッド皮膜形成組成物を基材に塗布する工程及び該組成物を乾燥して該基材上にコーティングを形成する工程をさらに含む、請求項1〜6のいずれか一項に記載の方法。
- 前記コーティングが親水性である、請求項7記載の方法。
- 前記コーティング上の水の接触角が10°未満である、請求項8記載の方法。
- 請求項1〜6のいずれか一項に記載の方法により調製された組成物。
- 請求項7〜9のいずれか一項に記載の方法により調製された被覆された基材。
- 以下の工程を含む、物品の調製方法:
(a)請求項1記載の方法に従って調製された組成物を準備する工程;
(b)該組成物を基材の表面に塗布する工程;及び
(c)該水性キャリアを除去し、基材の表面上に、親水性又は疎水性であるシロキシ−ペルオキシハイブリッド金属コーティングを含む物品を形成する工程。 - 前記組成物が、金属酸化物又はハイブリッド金属酸化物を含む、直径が10nm未満の結晶性粒子をさらに含む、請求項12記載の方法。
- 前記コーティングの厚さが10nm〜1μmである、請求項12又は13に記載の方法。
- 前記コーティング上の水の接触角が10°未満である、請求項12〜14のいずれか一項に記載の方法。
- (a)水性キャリア;及び
(b)ケイ素過酸化物と遷移金属過酸化物との縮合生成物又は有機官能性シランと遷移金属過酸化物との縮合生成物を含む組成物であって、
該組成物が、(a)及び(b)を大気圧より高い圧力で沸騰させることによって調製され、
該遷移金属過酸化物が、(1)チタン及び亜鉛、又は(2)チタン、亜鉛及びスズを含み、かつ該有機官能性シランが、ビス(トリエトキシシリル)エタンを含む、前記組成物。 - 遷移金属酸化物又はハイブリッド金属酸化物を含む、直径が10nm未満の結晶性粒子をさらに含む、請求項16記載の組成物。
- 酸化ケイ素及び遷移金属酸化物をさらに含み、酸化ケイ素の重量パーセンテージが、全金属酸化物に基づいて、少なくとも50重量%である、請求項16又は17に記載の組成物。
- 酸化ケイ素の重量パーセンテージが、全金属酸化物に基づいて、少なくとも95重量%である、請求項18記載の組成物。
- 酸化ケイ素及び遷移金属酸化物をさらに含み、遷移金属酸化物の重量パーセンテージが、全金属酸化物に基づいて、少なくとも95重量%である、請求項16又は17に記載の組成物。
- 前記縮合生成物が、ケイ素及びチタン、ケイ素及びジルコニウム、チタン及びジルコニウム、又はこれらの任意の組み合わせを含む、請求項16〜20のいずれか一項に記載の組成物。
- フィラーをさらに含む、請求項16〜21のいずれか一項に記載の組成物。
- 以下の工程を含む、組成物の調製方法:
(a)(i)ケイ素過酸化物、又はビス(トリエトキシシリル)エタンを含む有機官能性シラン;
(ii)(1)チタン及び亜鉛、又は(2)チタン、亜鉛及びスズを含む遷移金属過酸化物;及び
(iii)水性キャリア
を含む第1混合物を準備する工程:並びに
(b)該第1混合物を、大気圧より高い圧力で沸騰させ:
(i)該水性キャリア;及び
(ii)該ケイ素過酸化物と該遷移金属過酸化物との縮合生成物又は該有機官能性シランと該遷移金属過酸化物との縮合生成物
を含む組成物を形成する工程。 - 大気圧より高い圧力での前記第1混合物の沸騰により形成される前記組成物が、遷移金属酸化物又はハイブリッド金属酸化物を含む、直径が10nm未満の結晶性粒子をさらに含む、請求項23記載の方法。
- 前記第1混合物がコロイド状懸濁液の形態である、請求項23又は請求項24に記載の方法。
- 過酸化物を含む水溶液(a)を、水性キャリア中にアモルファス金属水酸化物及びケイ素水酸化物を含むコロイド状懸濁液(b)と合わせ、該遷移金属過酸化物及び該ケイ素過酸化物を含むコロイド状懸濁液を形成する工程をさらに含む、請求項23〜25のいずれか一項に記載の方法。
- 以下の工程をさらに含む、請求項23〜26のいずれか一項に記載の方法:
(a)ケイ素塩化物、遷移金属塩化物、及び酸を水性キャリアと合わせ、第2混合物を形成する工程;
(b)該第2混合物を中和する工程;
(c)該第2混合物を濾過し、アモルファス金属水酸化物及びケイ素水酸化物を形成する工程;及び
(d)該アモルファス金属水酸化物及びケイ素水酸化物を水性キャリア中に懸濁させ、該水性キャリアに該アモルファス金属水酸化物及びケイ素水酸化物を含むコロイド状懸濁液を形成する工程。 - 請求項23〜27のいずれか一項に記載の方法により調製された組成物。
- 以下の工程を含む、物品の製造方法:
(a)(i)水性キャリア;及び
(ii)ケイ素過酸化物と遷移金属過酸化物又は有機官能性シランと遷移金属過酸化物の縮合生成物であって、該遷移金属酸化物が、(1)チタン及び亜鉛、又は(2)チタン、亜鉛及びスズを含み、かつ該有機官能性シランが、ビス(トリエトキシシリル)エタンを含む、前記縮合生成物;
を含む組成物を準備する工程であって、該組成物が(i)及び(ii)を大気圧より高い圧力で沸騰させることによって調製される、前記工程;
(b)該組成物を基材の表面に塗布する工程;及び
(c)該水性キャリアを除去し、該基材の表面上にハイブリッド金属酸化物コーティングを含む物品を形成する工程。 - 前記組成物が以下の工程を含む方法により調製される、請求項29記載の方法:
(a)(i)ケイ素過酸化物又は有機官能性シラン;
(ii)遷移金属過酸化物;及び
(iii)水性キャリア;
を含む第1混合物を準備する工程;及び
(b)該第1混合物を、大気圧より高い圧力で沸騰させ
(i)該水性キャリア;及び
(ii)該ケイ素過酸化物と該遷移金属過酸化物又は該有機官能性シランと該遷移金属過酸化物との縮合生成物
を含む組成物を形成する工程。 - 前記組成物が以下の工程を含む方法により調製される、請求項29記載の方法:
(a)(i)ケイ素過酸化物又は有機官能性シラン;
(ii)遷移金属過酸化物;及び
(iii)水性キャリア;
を含む第1混合物を準備する工程;及び
(b)該第1混合物を、大気圧より高い圧力で沸騰させ
(i)該水性キャリア;及び
(ii)該ケイ素過酸化物と該遷移金属過酸化物又は該有機官能性シランと該遷移金属過酸化物との縮合生成物;及び
(iii)遷移金属酸化物を含む結晶性ナノサイズ粒子
を含む組成物を形成する工程。 - 前記コーティングを前記基材から除去し、パウダー形態のナノサイズ粒子を形成する工程をさらに含む、請求項29〜31のいずれか一項に記載の方法。
- 請求項29〜32のいずれか一項に記載の方法により調製された物品。
- 以下の工程を含む、組成物の調製方法:
(a)(i) 有機金属化合物;
(ii)チタン塩化物及び亜鉛塩化物の混合物、又はチタン塩化物、亜鉛塩化物及びスズ塩化物の混合物を含む金属塩化物;及び
(iii)酸;
を含む水性混合物を形成する工程;
(b)該水性混合物を沸騰させる工程;
(c)該水性混合物に塩基を加え、該混合物を中和し、該金属の水酸化物を形成する工程;
(d)該金属水酸化物及びシロキシ化合物を含むコロイド状懸濁液を形成する工程;
(e)過酸化物系溶液を加え、該金属の過酸化物を含む懸濁液を形成する工程;
(f)該懸濁液を室温で平衡に達するようにする工程;及び
(g)該懸濁液を、大気圧より高い圧力で沸騰させ、シロキシ化合物と金属過酸化物との縮合生成物を含むハイブリッド皮膜形成組成物を形成する工程。
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US12/167,863 US20090163647A1 (en) | 2007-12-21 | 2008-07-03 | Hybrid metal oxides |
US12/202,076 US20090162560A1 (en) | 2007-12-21 | 2008-08-29 | Hybrid vehicle systems |
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PCT/US2008/087823 WO2009086193A2 (en) | 2007-12-21 | 2008-12-19 | Hybrid vehicle systems |
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KR (1) | KR101586358B1 (ja) |
CN (1) | CN101945964B (ja) |
AU (1) | AU2008345663B2 (ja) |
CA (1) | CA2710282A1 (ja) |
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- 2008-12-19 CN CN2008801272256A patent/CN101945964B/zh not_active Expired - Fee Related
- 2008-12-19 AU AU2008345663A patent/AU2008345663B2/en not_active Ceased
- 2008-12-19 KR KR1020107016408A patent/KR101586358B1/ko not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
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CA2710282A1 (en) | 2009-07-09 |
JP2011526628A (ja) | 2011-10-13 |
CN101945964B (zh) | 2013-06-05 |
KR101586358B1 (ko) | 2016-01-19 |
WO2009086193A3 (en) | 2009-09-03 |
CN101945964A (zh) | 2011-01-12 |
WO2009086193A2 (en) | 2009-07-09 |
AU2008345663B2 (en) | 2015-01-22 |
EP2231799A4 (en) | 2012-05-09 |
US20090162560A1 (en) | 2009-06-25 |
JP2015007240A (ja) | 2015-01-15 |
KR20100099741A (ko) | 2010-09-13 |
ZA201004477B (en) | 2011-09-28 |
AU2008345663A1 (en) | 2009-07-09 |
EP2231799A2 (en) | 2010-09-29 |
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