JP5604398B2 - 平版印刷版原版及び平版印刷版の作製方法 - Google Patents

平版印刷版原版及び平版印刷版の作製方法 Download PDF

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Publication number
JP5604398B2
JP5604398B2 JP2011218547A JP2011218547A JP5604398B2 JP 5604398 B2 JP5604398 B2 JP 5604398B2 JP 2011218547 A JP2011218547 A JP 2011218547A JP 2011218547 A JP2011218547 A JP 2011218547A JP 5604398 B2 JP5604398 B2 JP 5604398B2
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JP
Japan
Prior art keywords
group
printing plate
lithographic printing
developer
plate precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011218547A
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English (en)
Japanese (ja)
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JP2013080003A (ja
Inventor
由利子 石黒
昭太 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2011218547A priority Critical patent/JP5604398B2/ja
Priority to IN2338CHN2014 priority patent/IN2014CN02338A/en
Priority to PCT/JP2012/072254 priority patent/WO2013047089A1/ja
Priority to EP12834928.9A priority patent/EP2762975B1/en
Priority to CN201280046960.0A priority patent/CN103827753B/zh
Publication of JP2013080003A publication Critical patent/JP2013080003A/ja
Priority to US14/227,246 priority patent/US9352602B2/en
Application granted granted Critical
Publication of JP5604398B2 publication Critical patent/JP5604398B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2011218547A 2011-09-30 2011-09-30 平版印刷版原版及び平版印刷版の作製方法 Expired - Fee Related JP5604398B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011218547A JP5604398B2 (ja) 2011-09-30 2011-09-30 平版印刷版原版及び平版印刷版の作製方法
IN2338CHN2014 IN2014CN02338A (enExample) 2011-09-30 2012-08-31
PCT/JP2012/072254 WO2013047089A1 (ja) 2011-09-30 2012-08-31 平版印刷版原版及び平版印刷版の作製方法
EP12834928.9A EP2762975B1 (en) 2011-09-30 2012-08-31 Lithographic printing plate precursor and process for producing lithographic printing plate
CN201280046960.0A CN103827753B (zh) 2011-09-30 2012-08-31 平版印刷版原版和用于制造平版印刷版的方法
US14/227,246 US9352602B2 (en) 2011-09-30 2014-03-27 Lithographic printing plate precursor and method for producing lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011218547A JP5604398B2 (ja) 2011-09-30 2011-09-30 平版印刷版原版及び平版印刷版の作製方法

Publications (2)

Publication Number Publication Date
JP2013080003A JP2013080003A (ja) 2013-05-02
JP5604398B2 true JP5604398B2 (ja) 2014-10-08

Family

ID=47995136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011218547A Expired - Fee Related JP5604398B2 (ja) 2011-09-30 2011-09-30 平版印刷版原版及び平版印刷版の作製方法

Country Status (6)

Country Link
US (1) US9352602B2 (enExample)
EP (1) EP2762975B1 (enExample)
JP (1) JP5604398B2 (enExample)
CN (1) CN103827753B (enExample)
IN (1) IN2014CN02338A (enExample)
WO (1) WO2013047089A1 (enExample)

Families Citing this family (9)

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CN104395834B (zh) * 2012-06-29 2019-07-05 富士胶片株式会社 显影处理废液浓缩方法及显影处理废液的再循环方法
JP6143524B2 (ja) 2013-04-05 2017-06-07 京セラ株式会社 移動通信システム、無線基地局及びユーザ端末
JP6476302B2 (ja) * 2015-08-31 2019-02-27 富士フイルム株式会社 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
EP3429848B1 (en) * 2016-03-16 2021-08-18 Agfa Nv Method for processing a lithographic printing plate
CN108297565B (zh) * 2016-08-27 2020-10-27 乐凯华光印刷科技有限公司 一种具有纳微米结构保护层的在机显影免处理热敏版
EP4275910A3 (en) * 2017-03-31 2024-01-24 FUJIFILM Corporation Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, and lithographic printing method
JP6759323B2 (ja) * 2018-03-28 2020-09-23 太陽インキ製造株式会社 感光性樹脂組成物、２液型感光性樹脂組成物、ドライフィルムおよびプリント配線板
EP3754428B1 (en) * 2018-03-29 2024-04-17 FUJIFILM Corporation Development processing device for planographic printing plate manufacture, and manufacturing method of planographic printing plate
JPWO2020158380A1 (ja) * 2019-01-30 2021-11-25 富士フイルム株式会社 洗出し装置および洗出し方法

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JP5514781B2 (ja) * 2011-08-31 2014-06-04 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作成方法

Also Published As

Publication number Publication date
EP2762975A1 (en) 2014-08-06
IN2014CN02338A (enExample) 2015-06-19
EP2762975B1 (en) 2016-05-25
US20140208971A1 (en) 2014-07-31
JP2013080003A (ja) 2013-05-02
EP2762975A4 (en) 2015-05-06
CN103827753A (zh) 2014-05-28
US9352602B2 (en) 2016-05-31
WO2013047089A1 (ja) 2013-04-04
CN103827753B (zh) 2017-03-29

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