JP5601686B2 - Fto/ito積層体を有する透明導電膜 - Google Patents
Fto/ito積層体を有する透明導電膜 Download PDFInfo
- Publication number
- JP5601686B2 JP5601686B2 JP2010517752A JP2010517752A JP5601686B2 JP 5601686 B2 JP5601686 B2 JP 5601686B2 JP 2010517752 A JP2010517752 A JP 2010517752A JP 2010517752 A JP2010517752 A JP 2010517752A JP 5601686 B2 JP5601686 B2 JP 5601686B2
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- Prior art keywords
- film
- fto
- ito
- transparent conductive
- conductive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims description 27
- 239000013078 crystal Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 20
- 230000008859 change Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000009751 slip forming Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 159
- 239000011521 glass Substances 0.000 description 18
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 4
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- -1 polyethylene terephthalate Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 150000003606 tin compounds Chemical class 0.000 description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052809 inorganic oxide Inorganic materials 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 150000002472 indium compounds Chemical class 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- ZJDCLINAWYFEFQ-UHFFFAOYSA-N indium;pentane-2,4-dione Chemical compound [In].CC(=O)CC(C)=O ZJDCLINAWYFEFQ-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 229920000548 poly(silane) polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 238000005118 spray pyrolysis Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical compound CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- XURCIPRUUASYLR-UHFFFAOYSA-N Omeprazole sulfide Chemical compound N=1C2=CC(OC)=CC=C2NC=1SCC1=NC=C(C)C(OC)=C1C XURCIPRUUASYLR-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052795 boron group element Inorganic materials 0.000 description 1
- RJCQBQGAPKAMLL-UHFFFAOYSA-N bromotrifluoromethane Chemical compound FC(F)(F)Br RJCQBQGAPKAMLL-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052800 carbon group element Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- RJGHQTVXGKYATR-UHFFFAOYSA-L dibutyl(dichloro)stannane Chemical compound CCCC[Sn](Cl)(Cl)CCCC RJGHQTVXGKYATR-UHFFFAOYSA-L 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910001849 group 12 element Inorganic materials 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 229910021476 group 6 element Inorganic materials 0.000 description 1
- 229910021474 group 7 element Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- OCVXZQOKBHXGRU-UHFFFAOYSA-N iodine(1+) Chemical compound [I+] OCVXZQOKBHXGRU-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000001683 neutron diffraction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 125000005474 octanoate group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052696 pnictogen Inorganic materials 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- AFCAKJKUYFLYFK-UHFFFAOYSA-N tetrabutyltin Chemical compound CCCC[Sn](CCCC)(CCCC)CCCC AFCAKJKUYFLYFK-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OVZUSPADPSOQQN-UHFFFAOYSA-N tri(propan-2-yloxy)indigane Chemical compound [In+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] OVZUSPADPSOQQN-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1258—Spray pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022475—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of indium tin oxide [ITO]
-
- H—ELECTRICITY
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Description
本願は、2008年6月24日に、日本に出願された特願2008−164417号に基づき優先権を主張し、その内容をここに援用する。
特許文献1には、ITO膜の膜厚が100nm〜1000nm、FTO膜の膜厚は少なくとも30nm〜350nmが良いこと、及び、FTO膜がこの膜厚であると、温度250〜700℃での1時間の加熱によっても導電性は低下しないことが記載されている。また、FTO膜の成膜はITO膜の成膜後に連続して行う必要があることが記載されている。そのため、ITO膜を形成した直後の、いまだ400〜500℃程度にある硝子板に直ちにFTO膜となる原料化合物溶液を噴霧して、ITO膜が劣化する前にスプレー熱分解法(SPD法)によってFTO膜を成膜する必要があると記載されている。
しかしながら、上記方法では、膜全体が厚いためにコスト上の課題があること、FTO膜の膜厚が厚いためにITOの有するメリットが十分生かせないなどの点で十分ではなかった。
(1)基材上に積層するためのITO膜及びFTO膜からなる透明導電膜であって、前記FTO膜の膜厚が5nm〜20nmであり、前記FTO膜の表面の結晶構造の一部又は全部が斜方晶であることを特徴とする透明導電膜、
(2)350℃で1時間加熱後のシート抵抗値の変化率が1.5倍以下であることを特徴とする(1)に記載の透明導電膜、
(3)シート抵抗値が300Ω/□以下であることを特徴とする(1)又は(2)に記載の透明導電膜、
(4)前記FTO膜が連続膜であることを特徴とする(1)から(3)のいずれか一に記載の透明導電膜に関する。
また、本発明は、
(5)パイロゾル法によりITO膜を基材上に成膜した後、連続的にITO膜上にFTO膜を成膜することを特徴とする(1)から(4)のいずれか一に記載の透明導電膜の製造方法に関する。
本発明の透明導電膜は、基材側にITO膜が設けられ、その上にFTO膜が積層されている。FTO膜の表面の一部又は全部が斜方晶の結晶構造を有している。
本発明において、表面の一部が斜方晶とは、少なくとも、シート抵抗値の変化率が1.5倍以下となるために必要な量だけ斜方晶が含まれている状態をいう。結晶構造の一部が斜方晶を有している場合、残りは正方晶又はその他の結晶系であり、通常、混晶状態となる。
斜方晶とは、結晶学の分野で一般に用いられている7つの結晶系(立方晶、六方晶、菱面体晶、正方晶、斜方晶、単斜晶、三斜晶)のうち、軸長の関係がa≠b≠cであり、軸角の関係がα=β=γ=90°であるものをいう。結晶系の同定は、単結晶および粉末のX線回折、中性子線回折、電子線回折等により行われる。
FTO膜及びITO膜は各々、少なくとも1層からなり、前記膜厚を越えない限り、多層に積層できる。
本発明の透明導電膜は基材上に積層される。基材は、通常、透明基材が使用されるが、透明でなくてもよい。
透明基材は、具体的には、アルカリガラス、石英ガラス等のガラス、ポリカーボネート、ポリエチレンテレフタレート、ポリアリレート等のポリエステル、ポリエーテルスルホン系樹脂、アモルファスポリオレフィン、ポリスチレン、アクリル樹脂等が挙げられる。これらの材質は、最終的に用いる製品の用途に応じて最適なものが適宜選択される。
基材と透明導電膜との間には必要に応じて透明導電膜にアルカリ成分等が侵入するのを防止するために無機酸化物膜を形成することができる。無機酸化物膜として具体的には、ケイ素酸化物(SiOX),アルミニウム酸化物(Al2OX),チタン酸化物(TiOX),ジルコニウム酸化物(ZrOX),イットリウム酸化物(Y2OX),イッテルビウム酸化物(Yb2OX),マグネシウム酸化物(MgOX),タンタル酸化物(Ta2OX),セリウム酸化物(CeOX)またはハフニウム酸化物(HfOX)、有機ポリシラン化合物から形成されるポリシラン膜、MgF2膜、CaF2膜、SiOXとTiOXの複合酸化物等からなる膜を例示することができる。
透明導電膜の製造方法としては、本発明の目的とする物性値を有する膜を成膜できる方法であればよく、具体的には、スパッター法、電子ビーム法、イオンプレーテイング法、スクリーン印刷法又は化学的気相成長法(CVD法)、スプレー熱分解法(SPD法)、パイロゾル法等を例示することができるが、特にパイロゾル法を好ましく例示することができる。
ITO膜形成溶液に用いられるインジウム化合物としては、熱分解して酸化インジウムになる物質が好ましく、具体的には、インジウムトリスアセチルアセトナート(In(CH3COCHCOCH3)3)、インジウムトリスベンゾイルメタネート(In(C6H5COCHCOC6H5)3)、三塩化インジウム(InCl3)、硝酸インジウム(In(NO3)3)、インジウムトリイソプロポキシド(In(OPr−i)3)等を例示することができる。
予め400〜750℃、好ましくは400〜550℃に加熱したコンベア式成膜炉を複数基連結し、基材を炉内に投入する。第1基目の炉内でITO膜形成溶液を、第2基目の炉内でFTO膜形成溶液を、それぞれ超音波で霧滴状にして空気をキャリアガスとしてコンベア炉の中に吹き込み、基材の表面に接触させて熱分解させることにより、膜を作製する。膜厚はコンベアの速度を変えることにより調整することができる。
成膜炉を3基以上連結することにより、ITO膜、FTO膜の少なくともいずれかを多層膜とすることもできる。また、第1基目でSiO2膜などの他の無機酸化物膜を成膜することもできる。
500℃に加熱したコンベアー炉を3基(炉(1)〜(3))連結し、ソーダライムガラス基材(320×420×0.7mm)をコンベアー炉内に投入し、第1基においてはSiO2膜形成溶液(テトラエトキシシラン(溶液I))、第2基においてはITO膜形成溶液(塩化第2スズを5モル%含むインジウムアセチルアセトンを0.2モル/L含むアセチルアセトン溶液(溶液II))、第3基においてはFTO膜形成溶液(フッ素を150モル%含むジブチルスズジアセテートを0.5モル/L含むエタノール溶液(溶液III))をそれぞれ用い、超音波で霧滴状にして空気をキャリアガスとしてコンベアー炉の中に吹き込み、ガラス基材の表面に接触させて熱分解させることにより、積層体を連続的に作製した。得られた積層体は、ガラス/SiO2膜(40nm)/ITO膜(40nm)/FTO膜(13nm)であった。
比較のために、実施例と同じ組成のITO膜をガラス基材に成膜後、一旦ガラス基材を取り出し、その後再度成膜炉にガラス基材を投入してITO膜の上にFTO膜を成膜して実施例とほぼ同じ膜厚の積層体を作製した。
1回目の成膜では、500℃に加熱したコンベアー炉を2基(炉(1)〜(2))連結し、ソーダライムガラス基材(320×420×0.7mm)をコンベアー炉内に投入し、第1基においてはSiO2膜形成溶液(テトラエトキシシラン(溶液I))、第2基においてはITO膜形成溶液(塩化第2スズを5モル%含むインジウムアセチルアセトンを0.2モル/L含むアセチルアセトン溶液(溶液II))をそれぞれ用いた以外は実施例1と同じ方法で積層体を作製した。得られた積層体は、ガラス/SiO2膜(40nm)/ITO膜(40nm)であった。
2回目の成膜では500℃に過熱したコンベアー炉1基を使用し、1回目で得られたガラス/SiO2/ITO積層体をコンベアー炉に投入し、FTO膜形成溶液(フッ素を150モル%含むジブチルスズジアセテートを0.5モル/L含むエタノール溶液(溶液III))を用いた以外は実施例1と同じ方法で積層体を作製した。得られた積層体は、ガラス/SiO2膜(40nm)/ITO膜(40nm)/FTO膜(17nm)であった。
1回目の成膜は、比較例1と同じ方法で積層体を作製した。得られた積層体は、ガラス/SiO2膜(40nm)/ITO膜(40nm)であった。
2回目の成膜は、搬送速度を比較例1よりも遅くした以外は同じ方法で積層体を作製した。得られた積層体は、ガラス/SiO2膜(40nm)/ITO膜(40nm)/FTO膜(54nm)であった。
尚、膜厚はエリプソメータ(アイメック社製SE800)を用い、シート抵抗値は4端子法により、可視光透過率(550nm)は分光光度計(日立社製U4000)を用い、結晶系は薄膜評価用試料水平型X線回折装置(リガク社製SmartLab)を用い、断面構造は断面TEM法によりそれぞれ評価した。
その結果、本発明品は、従来品と比較して、FTO膜厚が薄いにも関わらず耐熱性が向上していることがわかった(表1)。
また、本発明品のFTO膜の結晶系は斜方晶となり、従来品のFTO膜の結晶系(正方晶)とは異なることがわかった(図1)。さらに本発明品のFTO膜の表面は、微細凹凸はあるものの、表面平坦性が良好であったが(図2)、従来品のFTO膜の表面は、表面凹凸があり、表面平坦性が良くないことがわかった(図3)。
Claims (5)
- 基材上に積層したITO膜及びFTO膜からなる透明導電膜であって、パイロゾル法によって連続成膜され、前記FTO膜の膜厚が5nm〜20nmであり、前記FTO膜の結晶構造の一部又は全部が斜方晶であることを特徴とする透明導電膜。
- 350℃で1時間加熱後のシート抵抗値の変化率が1.5倍以下であることを特徴とする請求項1に記載の透明導電膜。
- シート抵抗値が300Ω/□以下であることを特徴とする請求項1又は2に記載の透明導電膜。
- 前記FTO膜が連続膜であることを特徴とする請求項1から3のいずれか一項に記載の透明導電膜。
- パイロゾル法によりITO膜を基材上に成膜した後、連結した成膜炉内で連続的にITO膜上にパイロゾル法によりFTO膜を成膜することを特徴とする請求項1から4のいずれか一項に記載の透明導電膜の製造方法。
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- 2009-06-22 KR KR1020107028431A patent/KR101467018B1/ko not_active IP Right Cessation
- 2009-06-22 TW TW098120798A patent/TWI391520B/zh not_active IP Right Cessation
- 2009-06-22 KR KR1020137016698A patent/KR20130088886A/ko not_active Application Discontinuation
- 2009-06-22 WO PCT/JP2009/002844 patent/WO2009157177A1/ja active Application Filing
- 2009-06-22 US US13/000,206 patent/US8557404B2/en not_active Expired - Fee Related
- 2009-06-22 CN CN2009801235213A patent/CN102067243B/zh not_active Expired - Fee Related
- 2009-06-22 JP JP2010517752A patent/JP5601686B2/ja not_active Expired - Fee Related
- 2009-06-22 EP EP20090769887 patent/EP2296154A4/en not_active Withdrawn
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CN106191775A (zh) * | 2015-09-18 | 2016-12-07 | 北京大学深圳研究生院 | 一种透明导电薄膜及其制备方法和应用 |
Also Published As
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US8557404B2 (en) | 2013-10-15 |
US20110111215A1 (en) | 2011-05-12 |
TW201002858A (en) | 2010-01-16 |
JPWO2009157177A1 (ja) | 2011-12-08 |
EP2296154A4 (en) | 2011-07-20 |
TWI391520B (zh) | 2013-04-01 |
EP2296154A1 (en) | 2011-03-16 |
KR101467018B1 (ko) | 2014-12-02 |
CN102067243A (zh) | 2011-05-18 |
KR20130088886A (ko) | 2013-08-08 |
KR20110009713A (ko) | 2011-01-28 |
WO2009157177A1 (ja) | 2009-12-30 |
CN102067243B (zh) | 2012-06-13 |
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