JP5597020B2 - 液体処理システム及び液体処理方法 - Google Patents
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Description
記載の実施形態は、読み取りまたは追跡システムに関する。特に、実施形態は、確実且つ適正な読み取りを確保にする構成を採用した読み取りシステムに関する。また、実施形態は、1つの読み取りまたは追跡アイテムから別のアイテムへの特性の変化を捕らえる構成に関する。
半導体デバイスの製造において、様々な目的の材料を半導体基板上に堆積する。半導体基板は二酸化シリコンなどの単結晶シリコン材料のウエハであることが多い。その上に堆積した材料には、半導体基板のトレンチ内に金属線または他の回路構成を形成するための銅、アルミニウムおよび他の金属がある。製造プロセス中に半導体基板上にさらに回路構成および材料層を形成する場合もある。
特許文献1〜5には、スピンオンプロセスにおける液体状のフォトレジスト材料の使用、フォトレジスト材料の塗布の態様、およびフォトレジスト材料の粘度に基づくフォトレジスト材料の塗布について開示されている。
この容器アセンブリは、前記容器アセンブリの前記液体を当初密封するための破断可能膜を有するキャップを含んでもよい。前記コネクタは前記キャップに受容されて結合されてよい。前記コネクタは、前記容器アセンブリの内部に入るように構成されたプローブを備え、前記材料ラインは前記プローブに結合されてよい。当該液体処理システムは、基板上への材料のスピンオンコーティング、メニスカスコーティング、およびステンシル印刷うちのいずれかのためのツールを備える前記プロセスアセンブリに前記容器アセンブリから液体を送達するように動作可能に結合されてよい。前記情報記憶メカニズムは、バーコード、磁気ストリップ、および高周波識別(RFID)装置のうちのいずれかを含んでよい。
また、本発明は、液体を保持するように構成された容器アセンブリに配置された情報記憶メカニズムからの情報を確認ツールで読み取る工程と、前記情報記憶メカニズムから読み出された情報に基づき、前記容器アセンブリ及び前記液体のいずれかが所定の塗布での使用に許容可能であるかどうかを決定する工程と、前記決定工程における肯定的な決定に応じて、前記容器アセンブリからの前記液体の抜き出しを可能にする材料ラインを有するコネクタを前記容器アセンブリに係合させる工程と、を含み、上記液体処理システムで実施される液体処理方法を提供する。この場合、前記情報記憶メカニズムは、バーコード、磁気ストリップ、および高周波識別(RFID)装置のうちのいずれかを含んでよい。当該液体処理方法は、基板上への材料のスピンオンコーティング、メニスカスコーティング、およびステンシル印刷のいずれかのためのツールを備えるプロセスアセンブリに前記容器アセンブリから液体を送達する工程をさらに含んでよい。
また、本発明は、容器アセンブリから抜き出されるべき液体を保持するように構成された容器アセンブリに連結された情報記憶メカニズムに記憶された情報を読み出す工程であって、前記情報は、前記容器アセンブリ内に保持される前記液体の特性を含む、工程と、前記情報記憶メカニズムから読み出された情報から、前記容器アセンブリ内に保持された前記液体が所定の塗布に許容可能な液体であることを確認しようとする工程と、前記情報記憶メカニズムから読み出された前記情報から、前記容器アセンブリ内の前記液体が前記所定の塗布に許容されないことを決定し、前記容器アセンブリからの前記液体の抜き出しを阻止する工程、および、前記情報記憶メカニズムから読み出された前記情報から、前記容器アセンブリ内の前記液体が前記所定の塗布に許容されることを決定し、前記容器アセンブリからの前記液体の抜き出しを可能にする工程、のいずれか1つの工程と、を含み、上記液体処理システムで実施される液体処理方法を提供する。
確実な読み取りシステムの特定の構成を参照して、以下に実施形態を説明する。特に、フォトレジスト材料を含む容器アセンブリの信頼性および保全性を確保するのに役立つ構成を説明する。さらに、塗布パラメータの連続的な補正を可能にして、フォトレジスト材料の1つのバッチまたは容器から次のバッチまたは容器へ変わる際に、フォトレジスト材料タイプの特性のいかなる変化にも対応することを確実にする構成を説明する。
Claims (10)
- 液体を保持するように構成された内部、および、前記内部内に保持された液体に関する情報を記憶する情報記憶メカニズム、を有する、容器アセンブリと、
前記容器アセンブリに受容されて結合されるように構成されたコネクタであって、当該コネクタは、前記容器アセンブリの内部からの前記液体の抜き出しを可能にする材料ラインを有し、所定の塗布に前記液体を用いるためのプロセスアセンブリ、及び、前記塗布を指示するための制御ユニット、に同時に結合されるようにさらに構成されたコネクタと、
前記コネクタを受容して前記容器アセンブリに前記コネクタを結合する前に前記情報記憶メカニズムから前記情報を受け取るように構成された確認ツールであって、前記情報は、前記コネクタが前記容器アセンブリに受容されて結合されるべきかどうかを示すために使用される、確認ツールと、を備える液体処理システム。 - 前記容器アセンブリは、前記容器アセンブリの前記液体を当初密封するための破断可能膜を有するキャップを含む、請求項1に記載の液体処理システム。
- 前記コネクタは前記キャップに受容されて結合される、請求項2に記載の液体処理システム。
- 前記コネクタは、前記容器アセンブリの内部に入るように構成されたプローブを備え、前記材料ラインは前記プローブに結合される、請求項1〜3のいずれか1項に記載の液体処理システム。
- 基板上への材料のスピンオンコーティング、メニスカスコーティング、およびステンシル印刷うちのいずれかのためのツールを備える前記プロセスアセンブリに前記容器アセンブリから前記液体を送達するように動作可能に結合された、請求項1〜4のいずれか1項に記載の液体処理システム。
- 前記情報記憶メカニズムは、バーコード、磁気ストリップ、および高周波識別(RFID)装置のうちのいずれかを含む、請求項1〜5のいずれか1項に記載の液体処理システム。
- 液体を保持するように構成された容器アセンブリに配置された情報記憶メカニズムからの情報を確認ツールで読み取る工程と、
前記情報記憶メカニズムから読み出された情報に基づき、前記容器アセンブリおよび前記液体のいずれかが所定の塗布での使用に許容可能であるかどうかを決定する工程と、
前記決定する工程における肯定的な決定に応じて、前記容器アセンブリからの前記液体の抜き出しを可能にする材料ラインを有するコネクタを前記容器アセンブリに係合させる工程と、を含み、
請求項1に記載の液体処理システムで実施される、液体処理方法。 - 前記情報記憶メカニズムは、バーコード、磁気ストリップ、および高周波識別(RFID)装置のうちのいずれかを含む、請求項7に記載の液体処理方法。
- 基板上への材料のスピンオンコーティング、メニスカスコーティング、およびステンシル印刷のいずれかのためのツールを備えるプロセスアセンブリに前記容器アセンブリから液体を送達する工程をさらに含む、請求項7又は8に記載の液体処理方法。
- 容器アセンブリから抜き出されるべき液体を保持するように構成された容器アセンブリに連結された情報記憶メカニズムに記憶された情報を読み出す工程であって、前記情報は、前記容器アセンブリ内に保持される前記液体の特性を含む、工程と、
前記情報記憶メカニズムから読み出された情報から、前記容器アセンブリ内に保持された前記液体が所定の塗布に許容可能な液体であることを確認しようとする工程と、
前記情報記憶メカニズムから読み出された前記情報から、前記容器アセンブリ内の前記液体が前記所定の塗布に許容されないことを決定し、前記容器アセンブリからの前記液体の抜き出しを阻止する工程、および、
前記情報記憶メカニズムから読み出された前記情報から、前記容器アセンブリ内の前記液体が前記所定の塗布に許容されることを決定し、前記容器アセンブリからの前記液体の抜き出しを可能にする工程、のいずれか1つの工程と、を含み、
請求項1に記載の液体処理システムで実施される、液体処理方法。
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Application Number | Priority Date | Filing Date | Title |
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US10/742,125 US7702418B2 (en) | 2001-06-13 | 2003-12-19 | Secure reader system |
US10/742,125 | 2003-12-19 |
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JP2004111383A Division JP4536409B2 (ja) | 2003-12-19 | 2004-04-05 | 確実な読み取りシステム |
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JP5597020B2 true JP5597020B2 (ja) | 2014-10-01 |
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JP2010092395A Expired - Lifetime JP5597020B2 (ja) | 2003-12-19 | 2010-04-13 | 液体処理システム及び液体処理方法 |
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US (1) | US7702418B2 (ja) |
EP (1) | EP1697856A4 (ja) |
JP (2) | JP4536409B2 (ja) |
KR (1) | KR101123562B1 (ja) |
CN (1) | CN100468387C (ja) |
AU (1) | AU2004313341A1 (ja) |
MY (1) | MY154550A (ja) |
TW (1) | TWI361960B (ja) |
WO (1) | WO2005067516A2 (ja) |
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- 2004-03-12 AU AU2004313341A patent/AU2004313341A1/en not_active Abandoned
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- 2004-12-07 TW TW093137693A patent/TWI361960B/zh active
- 2004-12-16 MY MYPI20045194A patent/MY154550A/en unknown
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CN100468387C (zh) | 2009-03-11 |
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US20040172160A1 (en) | 2004-09-02 |
TWI361960B (en) | 2012-04-11 |
KR20060113749A (ko) | 2006-11-02 |
CN1906606A (zh) | 2007-01-31 |
JP2005178899A (ja) | 2005-07-07 |
MY154550A (en) | 2015-06-30 |
JP2010228813A (ja) | 2010-10-14 |
US7702418B2 (en) | 2010-04-20 |
WO2005067516A2 (en) | 2005-07-28 |
KR101123562B1 (ko) | 2012-03-12 |
JP4536409B2 (ja) | 2010-09-01 |
TW200528946A (en) | 2005-09-01 |
EP1697856A4 (en) | 2012-11-14 |
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