JP5591125B2 - フルオロ平滑化剤 - Google Patents
フルオロ平滑化剤 Download PDFInfo
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- JP5591125B2 JP5591125B2 JP2010547141A JP2010547141A JP5591125B2 JP 5591125 B2 JP5591125 B2 JP 5591125B2 JP 2010547141 A JP2010547141 A JP 2010547141A JP 2010547141 A JP2010547141 A JP 2010547141A JP 5591125 B2 JP5591125 B2 JP 5591125B2
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- Prior art keywords
- meth
- alkyl
- monomers
- copolymer
- group
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- 238000009499 grossing Methods 0.000 title claims description 18
- 125000001153 fluoro group Chemical group F* 0.000 title description 6
- 239000000178 monomer Substances 0.000 claims abstract description 61
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- 238000006116 polymerization reaction Methods 0.000 claims abstract description 25
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- 239000008199 coating composition Substances 0.000 claims abstract description 19
- 238000010526 radical polymerization reaction Methods 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 239000011230 binding agent Substances 0.000 claims abstract description 8
- 150000003926 acrylamides Chemical class 0.000 claims abstract description 4
- -1 nitroxyl free radical Chemical class 0.000 claims description 30
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 26
- 239000003999 initiator Substances 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 239000003973 paint Substances 0.000 claims description 20
- 229920000642 polymer Polymers 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 18
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 claims description 15
- 150000003254 radicals Chemical class 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 230000001404 mediated effect Effects 0.000 claims description 8
- 239000012634 fragment Substances 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 150000002431 hydrogen Chemical group 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims description 4
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- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
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- 125000005262 alkoxyamine group Chemical group 0.000 claims description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 2
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- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- LCIYFINKFGDAHD-UHFFFAOYSA-N azepane;3-nitrobenzoic acid Chemical compound C1CCCNCC1.OC(=O)C1=CC=CC([N+]([O-])=O)=C1 LCIYFINKFGDAHD-UHFFFAOYSA-N 0.000 claims description 2
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- 238000003379 elimination reaction Methods 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
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- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 2
- CLISWDZSTWQFNX-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)C(F)(F)F CLISWDZSTWQFNX-UHFFFAOYSA-N 0.000 description 2
- DFVPUWGVOPDJTC-UHFFFAOYSA-N 2,2,3,4,4,4-hexafluorobutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)C(F)C(F)(F)F DFVPUWGVOPDJTC-UHFFFAOYSA-N 0.000 description 2
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 2
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- ZWWCURLKEXEFQT-UHFFFAOYSA-N dinitrogen pentaoxide Chemical compound [O-][N+](=O)O[N+]([O-])=O ZWWCURLKEXEFQT-UHFFFAOYSA-N 0.000 description 2
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- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 2
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- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
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- AQQNNAXBGPWALO-UHFFFAOYSA-N 2-[butyl(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctylsulfonyl)amino]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN(CCCC)S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AQQNNAXBGPWALO-UHFFFAOYSA-N 0.000 description 1
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- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/24—Homopolymers or copolymers of amides or imides
- C09D133/26—Homopolymers or copolymers of acrylamide or methacrylamide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/47—Levelling agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2312/00—Crosslinking
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
- C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Graft Or Block Polymers (AREA)
- Polymerization Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08151780 | 2008-02-22 | ||
| EP08151780.7 | 2008-02-22 | ||
| PCT/EP2009/051180 WO2009103613A1 (en) | 2008-02-22 | 2009-02-03 | Fluoro levelling agents |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011514920A JP2011514920A (ja) | 2011-05-12 |
| JP2011514920A5 JP2011514920A5 (enExample) | 2012-03-22 |
| JP5591125B2 true JP5591125B2 (ja) | 2014-09-17 |
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| JP2010547141A Expired - Fee Related JP5591125B2 (ja) | 2008-02-22 | 2009-02-03 | フルオロ平滑化剤 |
Country Status (9)
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| US (1) | US8669336B2 (enExample) |
| EP (1) | EP2247678B1 (enExample) |
| JP (1) | JP5591125B2 (enExample) |
| KR (1) | KR101560854B1 (enExample) |
| CN (1) | CN101952379B (enExample) |
| AT (1) | ATE535581T1 (enExample) |
| BR (1) | BRPI0907194A2 (enExample) |
| RU (1) | RU2519730C2 (enExample) |
| WO (1) | WO2009103613A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2387589B1 (en) | 2009-01-14 | 2015-09-23 | Basf Se | Liquid photoinitiator blend |
| KR101773621B1 (ko) | 2009-01-19 | 2017-08-31 | 바스프 에스이 | 유기 흑색 안료 및 이의 제조 방법 |
| JP2013527286A (ja) * | 2010-05-19 | 2013-06-27 | エヴォニク ゴールドシュミット ゲーエムベーハー | ポリシロキサンブロックコポリマーおよび化粧料配合物におけるその使用 |
| KR101922430B1 (ko) * | 2011-02-09 | 2018-11-27 | 바스프 코팅스 게엠베하 | 멀티-코트 칼라 및/또는 이펙트 페인트 시스템을 생산하는 방법 |
| CN102153902B (zh) * | 2011-03-11 | 2013-05-29 | 安徽嘉智信诺化工有限公司 | 一种涂料油墨用氟碳抗缩孔流平剂 |
| CN102268108B (zh) * | 2011-05-13 | 2013-04-10 | 中科院广州化学有限公司 | 一种含氟丙烯酸酯型atrp小分子引发剂及其制备方法 |
| FR2986004B1 (fr) * | 2012-01-25 | 2014-03-14 | Seppic Sa | Nouveau polymere epaississant reduisant le caractere collant des formules cosmetiques a base de glycerine |
| EP2817370B1 (en) | 2012-02-23 | 2020-08-19 | Basf Se | Fluorinated acrylate block copolymers with low dynamic surface tension |
| KR20150065775A (ko) * | 2012-10-04 | 2015-06-15 | 바스프 코팅스 게엠베하 | 불소-포함 비수성 코팅 조성물, 코팅 방법, 및 코팅 조성물의 용도 |
| JP2015214614A (ja) * | 2014-05-08 | 2015-12-03 | 日立化成株式会社 | ブロックポリマ及びその製造方法 |
| EP3233785A1 (de) * | 2014-12-19 | 2017-10-25 | Merck Patent GmbH | Fluorverbindungen |
| CN106366233B (zh) * | 2016-08-24 | 2019-04-05 | 六安科瑞达新型材料有限公司 | 一种疏水耐污功能固体丙烯酸消光树脂 |
| CN106279500A (zh) * | 2016-08-24 | 2017-01-04 | 六安科瑞达新型材料有限公司 | 一种高光疏水耐污功能固体丙烯酸树脂 |
| CN111278934B (zh) | 2017-10-23 | 2022-04-12 | 巴斯夫欧洲公司 | 硅氧烷聚合物水乳液 |
| CN109627403B (zh) * | 2018-12-11 | 2021-01-05 | 三明学院 | 一种短碳链含氟嵌段聚合物、制备方法及其应用 |
| CN110357996B (zh) * | 2019-07-31 | 2021-11-09 | 三明学院 | 一种用作流平剂的聚合物及其制备方法和应用 |
| CN110818826B (zh) * | 2019-10-29 | 2021-06-01 | 六安捷通达新材料有限公司 | 一种有机硅氟类流平剂及其制备工艺 |
| BE1027888B1 (nl) * | 2019-12-19 | 2021-07-27 | Unilin Bv | Gebruik van een coating materiaal op de randen van decoratieve panelen en werkwijze |
| WO2022043234A1 (en) | 2020-08-25 | 2022-03-03 | Merck Patent Gmbh | Fluorine containing polymers |
| CN113176707B (zh) * | 2021-04-29 | 2024-08-16 | 湖南朝泰建材有限公司 | 一种感光干膜及其制备方法 |
| MX2023013396A (es) | 2021-05-12 | 2023-11-27 | Basf Se | Composiciones que comprenden particulas de metal de transicion con forma de plaqueta. |
| WO2023072740A1 (en) | 2021-10-26 | 2023-05-04 | Basf Se | A method for producing interference elements |
| CN115260803A (zh) * | 2022-08-02 | 2022-11-01 | 百草边大生物科技(青岛)有限公司 | 一种植物改性抗菌抗病毒大生物无机装饰涂料制备方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52155679A (en) * | 1976-06-21 | 1977-12-24 | Mitsubishi Rayon Co | Plastic moulding with metallic film and method of its manufacturing |
| US6841641B2 (en) | 2001-09-27 | 2005-01-11 | Ppg Industries Ohio, Inc. | Copolymers comprising low surface tension (meth) acrylates |
| WO2003027159A2 (en) | 2001-09-27 | 2003-04-03 | Ppg Industries Ohio, Inc. | Compositions containing a low surface tension (meth)acrylate containing block copolymer |
| AT410944B (de) | 2001-11-30 | 2003-08-25 | Solutia Austria Gmbh | Additive für pulverlacke |
| EP1333072A3 (en) * | 2002-01-30 | 2003-11-12 | Rohm And Haas Company | Ink composition |
| JP4147245B2 (ja) * | 2003-07-08 | 2008-09-10 | 共栄社化学株式会社 | コーティング剤用表面張力制御剤およびそれを含有するコーティング剤 |
| JP4926716B2 (ja) * | 2003-12-10 | 2012-05-09 | チバ ホールディング インコーポレーテッド | ニトロキシル媒介重合により製造したレベリング剤を含有するコーティング組成物 |
| JP2006063132A (ja) * | 2004-08-25 | 2006-03-09 | Fuji Photo Film Co Ltd | 有機溶剤系塗布改良剤 |
| BRPI0606305A2 (pt) * | 2005-01-11 | 2009-06-16 | Ciba Sc Holding Inc | processo para preparação de um polìmero ou copolìmero modificado, bem como uso concentrado de pigmento e composição compreendendo o polìmero ou copolìmero assim obtido |
| US20080312377A1 (en) * | 2005-12-16 | 2008-12-18 | Arkema, Inc. | Low Surface Energy Block Copolymer Preparation Methods and Applications |
| JP2007191507A (ja) * | 2006-01-17 | 2007-08-02 | Kyoeisha Chem Co Ltd | コーティング剤組成物 |
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2009
- 2009-02-03 RU RU2010138842/04A patent/RU2519730C2/ru not_active IP Right Cessation
- 2009-02-03 EP EP09713532A patent/EP2247678B1/en not_active Not-in-force
- 2009-02-03 KR KR1020107021094A patent/KR101560854B1/ko not_active Expired - Fee Related
- 2009-02-03 CN CN200980106000.7A patent/CN101952379B/zh not_active Expired - Fee Related
- 2009-02-03 US US12/867,770 patent/US8669336B2/en active Active
- 2009-02-03 AT AT09713532T patent/ATE535581T1/de active
- 2009-02-03 WO PCT/EP2009/051180 patent/WO2009103613A1/en not_active Ceased
- 2009-02-03 BR BRPI0907194-6A patent/BRPI0907194A2/pt not_active IP Right Cessation
- 2009-02-03 JP JP2010547141A patent/JP5591125B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| BRPI0907194A2 (pt) | 2015-07-14 |
| US20110040018A1 (en) | 2011-02-17 |
| JP2011514920A (ja) | 2011-05-12 |
| RU2010138842A (ru) | 2012-03-27 |
| EP2247678B1 (en) | 2011-11-30 |
| WO2009103613A1 (en) | 2009-08-27 |
| CN101952379A (zh) | 2011-01-19 |
| ATE535581T1 (de) | 2011-12-15 |
| EP2247678A1 (en) | 2010-11-10 |
| RU2519730C2 (ru) | 2014-06-20 |
| CN101952379B (zh) | 2014-02-26 |
| US8669336B2 (en) | 2014-03-11 |
| KR101560854B1 (ko) | 2015-10-15 |
| KR20100117126A (ko) | 2010-11-02 |
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