JP5590906B2 - 液体吐出ヘッド用基板の製造方法 - Google Patents

液体吐出ヘッド用基板の製造方法 Download PDF

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Publication number
JP5590906B2
JP5590906B2 JP2010026488A JP2010026488A JP5590906B2 JP 5590906 B2 JP5590906 B2 JP 5590906B2 JP 2010026488 A JP2010026488 A JP 2010026488A JP 2010026488 A JP2010026488 A JP 2010026488A JP 5590906 B2 JP5590906 B2 JP 5590906B2
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Japan
Prior art keywords
layer
protective layer
substrate
manufacturing
discharge head
Prior art date
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Expired - Fee Related
Application number
JP2010026488A
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English (en)
Japanese (ja)
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JP2011161760A (ja
JP2011161760A5 (enExample
Inventor
誠 櫻井
一郎 斉藤
孝浩 松居
譲 石田
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010026488A priority Critical patent/JP5590906B2/ja
Priority to US13/022,975 priority patent/US8846162B2/en
Publication of JP2011161760A publication Critical patent/JP2011161760A/ja
Publication of JP2011161760A5 publication Critical patent/JP2011161760A5/ja
Application granted granted Critical
Publication of JP5590906B2 publication Critical patent/JP5590906B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP2010026488A 2010-02-09 2010-02-09 液体吐出ヘッド用基板の製造方法 Expired - Fee Related JP5590906B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010026488A JP5590906B2 (ja) 2010-02-09 2010-02-09 液体吐出ヘッド用基板の製造方法
US13/022,975 US8846162B2 (en) 2010-02-09 2011-02-08 Manufacturing method for liquid-discharge head substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010026488A JP5590906B2 (ja) 2010-02-09 2010-02-09 液体吐出ヘッド用基板の製造方法

Publications (3)

Publication Number Publication Date
JP2011161760A JP2011161760A (ja) 2011-08-25
JP2011161760A5 JP2011161760A5 (enExample) 2013-03-28
JP5590906B2 true JP5590906B2 (ja) 2014-09-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010026488A Expired - Fee Related JP5590906B2 (ja) 2010-02-09 2010-02-09 液体吐出ヘッド用基板の製造方法

Country Status (2)

Country Link
US (1) US8846162B2 (enExample)
JP (1) JP5590906B2 (enExample)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3247426B2 (ja) * 1991-07-11 2002-01-15 キヤノン株式会社 ヘッドおよびその製造方法
JP3229146B2 (ja) * 1994-12-28 2001-11-12 キヤノン株式会社 液体噴射ヘッドおよびその製造方法
JP3402865B2 (ja) * 1995-08-09 2003-05-06 キヤノン株式会社 液体噴射記録ヘッドの製造方法
US5999379A (en) * 1997-12-11 1999-12-07 International Business Machines Corporation Spin valve read head with plasma produced metal oxide insulation layer between lead and shield layers and method of making
US6265318B1 (en) * 1998-01-13 2001-07-24 Applied Materials, Inc. Iridium etchant methods for anisotropic profile
US6398349B1 (en) * 1998-03-04 2002-06-04 Seiko Epson Corporation Piezoelectric device, ink-jet printing head, and method for manufacturing same, and printer
JP2001246753A (ja) * 2000-03-02 2001-09-11 Casio Comput Co Ltd インクジェットプリンタヘッドとその製造方法
JP2004146614A (ja) * 2002-10-24 2004-05-20 Sony Corp 磁気抵抗効果素子および磁気メモリ装置
US6893978B1 (en) * 2002-12-03 2005-05-17 Silicon Magnetic Systems Method for oxidizing a metal layer
US7195343B2 (en) * 2004-08-27 2007-03-27 Lexmark International, Inc. Low ejection energy micro-fluid ejection heads
JP2007052311A (ja) * 2005-08-19 2007-03-01 Sanyo Epson Imaging Devices Corp 電気光学装置および電子機器
JP4926669B2 (ja) * 2005-12-09 2012-05-09 キヤノン株式会社 インクジェットヘッドのクリーニング方法、インクジェットヘッドおよびインクジェット記録装置
JP2007230127A (ja) * 2006-03-02 2007-09-13 Canon Inc インクジェット記録ヘッド用基体の製造方法
JP2008270380A (ja) * 2007-04-18 2008-11-06 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
JP5312202B2 (ja) * 2008-06-20 2013-10-09 キヤノン株式会社 液体吐出ヘッド及びその製造方法

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Publication number Publication date
JP2011161760A (ja) 2011-08-25
US20110192498A1 (en) 2011-08-11
US8846162B2 (en) 2014-09-30

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