JP5580870B2 - 誘電体セラミックス組成物 - Google Patents
誘電体セラミックス組成物 Download PDFInfo
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Description
M2+N4+B2O6 (1)
但し、Mは、例えばBa、Ca、Srなどを含む2価の金属元素中のいずれか一つになることができるし、いかなる2価の金属原子にもなることができる。Nは、例えばSn、Zr、Tiなどを含む4価の金属元素中のいずれか一つになることができるし、同じようにいかなる4価の金属原子にもなることができる。本発明者たちは上記マイクロ波誘電体セラミックスがドロマイト(Dolomite:白雲石)構造を持ち異方性熱膨脹特性を持つことを見つけた。
(M1−x 2+Mx 2+)N4+B2O6 (2)
M2+(N1−y 4+Ny 4+)B2O6 (3)
(M1−x 2+Mx 2+)(N1−y 4+Ny 4+)B2O6 (4)
この時、上記式(2)〜(4)において、x及びyはそれぞれ0<x<1及び0<y<1であり、式(1)の組成と同じく、上記2個のMは、例えばBa、Ca、Srなどを含む2価の金属元素として互いに異なる元素から選択されることができるし、いかなる2価の金属元素からも選択されることができる。また、Nは、例えばSn、Zr、Tiなどを含む4価の金属元素として互いに異なる元素から選択されることができるし、同じようにいかなる4価の金属元素からも選択されることができる。
αwt%(0.12CuO+0.88Bi2O3) (5)
(但し、1≦α≦7である。)
すなわち、前述したように、式(1)〜(4)によるマイクロ波誘電体セラミックスは、おおよそ1100℃以上の高い焼結温度によってLTCCの材料として困難であるが、これに焼結剤としておおよそ600±20℃の共融点(eutectic point)を持つCuO及びBi2O3になる焼結剤を添加することによって上記のような高い焼結温度を、好ましくは875〜1000℃、もっと好ましくは875〜925℃、さらにもっと好ましくは875℃に低下させることができる。このようなCuO及びBi2O3は、上記セラミックスの焼結の時セラミックスの内部界面に液状を形成することによってセラミックスの緻密化を促進するので、これによって低温の焼結温度が可能になり、尚且つ良好なマイクロ波誘電特性を得ることができるようになる。
本実施例等では、上記式(1)によってBaZr(BO3)2セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定した。
本実施例等では上記式(1)によってCaZr(BO3)2セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定した。その出発試料としてはCaCO3、ZrO2と、B2O3またはH3BO3を使って、焼結温度だけを除き実施例1〜5と等しく製造及び測定した。上記焼結条件は1000〜1150℃で2時間とした。
本実施例等では上記式(1)によってSrZr(BO3)2セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定しており、その出発試料としてはSrCO3、ZrO2と、B2O3またはH3BO3を使って実施例6〜9と等しく製造及び測定した。
本実施例等では上記式(1)によってSrSn(BO3)2セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定した。その出発試料としてはSrCO3、SnO2と、B2O3またはH3BO3を使って実施例6〜9と等しく製造及び測定した。
本実施例等では上記式(1)によってCaSn(BO3)2セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定した。その出発試料としてはCaCO3、SnO2と、B2O3またはH3BO3を使って実施例6〜9と等しく製造及び測定した。
本実施例等では上記式(3)によってBa(Zr1−xTix)B2O6(但し、0<x<1)セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定した。その出発試料としてはBaCO3、ZrO2及びTiO2と、B2O3またはH3BO3の試料を使って実施例6〜9と等しく製造及び測定した。
本実施例等では上記式(3)によってBa(Sn1−xZrx)B2O6(但し、0<x<1)セラミックスを製造して各焼結温度によるマイクロ波誘電特性を測定した。その出発試料としてはBaCO3、SnO2及びZrO2と、B2O3またはH3BO3の試料を使って実施例6〜9と等しく製造及び測定した。
本実施例等では1000℃以下の低温焼結を果たすために、実施例1〜5の組成である、BaZr(BO3)2セラミックスにCuO及びBi2O3のような低温焼結用の焼結剤を添加した。
本実施例等では上記式(1)によってBaSnB2O6、CaZrB2O6、SrZrB2O6、BaZrB2O6、CaSnB2O6、SrSnB2O6セラミックス組成等を焼結温度だけを除き実施例1〜5と等しく製造及び測定した。この時、上記焼結温度は1100℃に固定した。
本実施例等では上記式(2)によって(Ba1−xCax)ZrB2O6(但し、0<x<1)セラミックスを製造してマイクロ波誘電特性を測定した。その出発試料としてはBaCO3、CaCO3及びZrO2と、B2O3またはH3BO3の試料を使って実施例6〜9と等しく製造及び測定した。
本実施例では、上記式(4)によって(Ba1−xCax)(Zr1−yTiy)B2O6(但し、0<x<1、0<y<1)セラミックスを製造してマイクロ波誘電特性を測定した。その出発試料としてはBaCO3、CaCO3、ZrO2及びTiO2と、B2O3またはH3BO3の試料を使って実施例6〜9と等しく製造及び測定した。
本実施例では上記式(2)〜(4)による(Ba1−xCax)ZrB2O6、Ba(Zr1−xTix)B2O6及び(Ba1−xCax)(Zr1−yTiy)B2O6(但し、0<x<1、0<y<0)セラミックスに、それぞれ3wt%の0.88Bi2O3+0.12CuOの焼結剤を添加して900〜925℃で焼結しており、これによって製造及び測定された、これらのセラミックスのマイクロ波誘電特性を下の表13に示す:
Claims (4)
- M 2+ (Sn 1-y 4+ Zr y 4+ )B 2 O 6 の組成式で表現される組成物を含むことを特徴とする誘電体セラミックス組成物。
(但し、MはBa、Ca及びSrの中のいずれか一つであり、0<y<1) - 前記誘電体セラミックス組成物にCuO及びBi2O3を含む焼結剤が添加された組成物を含むことを特徴とする請求項1に記載の誘電体セラミックス組成物。
- 前記焼結剤の組成式は0.88Bi 2 O 3 +0.12CuOであることを特徴とする請求項2に記載の誘電体セラミックス組成物。
- 前記焼結剤は、前記誘電体セラミックス組成物の総重量に対し1wt%ないし7wt%添加されることを特徴とする請求項3に記載の誘電体セラミックス組成物。
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KR10-2006-0120128 | 2006-11-30 | ||
KR20060120128 | 2006-11-30 |
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CN106032318B (zh) * | 2015-03-12 | 2018-06-22 | 中国科学院上海硅酸盐研究所 | 一种低温共烧陶瓷材料及其制备方法 |
JP2017022232A (ja) | 2015-07-09 | 2017-01-26 | 株式会社村田製作所 | 電子部品およびその製造方法 |
TWI634092B (zh) * | 2015-07-23 | 2018-09-01 | 菲洛公司 | 與鎳電極倂用之cog介電組成物及形成電子組件之方法 |
US10065894B2 (en) | 2015-08-05 | 2018-09-04 | Ferro Corporation | High-K LTCC dielectric compositions and devices |
CN107614460A (zh) * | 2015-12-30 | 2018-01-19 | 深圳市大富科技股份有限公司 | 陶瓷材料及其制备方法、谐振器、滤波器及射频拉远设备 |
WO2017113218A1 (zh) * | 2015-12-30 | 2017-07-06 | 深圳市大富科技股份有限公司 | 陶瓷材料及其制备方法、谐振器、滤波器及射频拉远设备 |
WO2017113221A1 (zh) * | 2015-12-30 | 2017-07-06 | 深圳市大富科技股份有限公司 | 陶瓷材料及其制备方法、谐振器、滤波器及射频拉远设备 |
CN112142459A (zh) * | 2020-09-04 | 2020-12-29 | 临沂金成电子有限公司 | 一种具有高介电常数的微波陶瓷材料的制备方法 |
CN113563052A (zh) * | 2021-08-20 | 2021-10-29 | 华中科技大学温州先进制造技术研究院 | 一种硼酸盐基低介微波介质陶瓷及其制备方法 |
CN116396074B (zh) * | 2023-04-10 | 2024-06-07 | 江苏科技大学 | 一种低损耗介电材料及其制备方法和应用 |
CN118184335B (zh) * | 2024-03-19 | 2024-10-15 | 齐鲁工业大学(山东省科学院) | 一种近零温度系数的硼酸锡盐微波介质陶瓷材料及其制备方法 |
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DE3476010D1 (en) * | 1983-09-09 | 1989-02-09 | Toshiba Kk | Circuit substrate and producing method of the same |
JPS60180953A (ja) * | 1984-02-27 | 1985-09-14 | 株式会社東芝 | 回路基板 |
JPS60246255A (ja) * | 1984-05-18 | 1985-12-05 | 株式会社東芝 | 回路基板およびその製造方法 |
JPS60118666A (ja) * | 1983-11-30 | 1985-06-26 | 太陽誘電株式会社 | 誘電体磁器組成物 |
JPS6191528A (ja) * | 1984-10-12 | 1986-05-09 | Toshiba Corp | 焦電形赤外線検出素子 |
JPS63280488A (ja) * | 1987-05-12 | 1988-11-17 | Toshiba Corp | 回路基板 |
JPH01183448A (ja) * | 1988-01-19 | 1989-07-21 | Toshiba Corp | 回路基板 |
JPH09241070A (ja) * | 1996-03-11 | 1997-09-16 | Mitsubishi Materials Corp | 誘電体磁器組成物 |
JP3595090B2 (ja) * | 1996-11-29 | 2004-12-02 | 京セラ株式会社 | 誘電体磁器組成物 |
JP3411190B2 (ja) * | 1997-06-30 | 2003-05-26 | 京セラ株式会社 | 誘電体磁器組成物 |
JP2000203878A (ja) | 1999-01-13 | 2000-07-25 | Asahi Glass Co Ltd | ガラスセラミックス組成物 |
JP2000252106A (ja) | 1999-03-03 | 2000-09-14 | Marcon Electronics Co Ltd | セラミックバリスタ |
CN1079384C (zh) * | 1999-07-28 | 2002-02-20 | 浙江大学 | 铅基微波介质陶瓷及其制造方法 |
JP4066312B2 (ja) * | 2001-11-20 | 2008-03-26 | 日立金属株式会社 | 誘電体磁器組成物 |
JP2003229669A (ja) * | 2002-02-01 | 2003-08-15 | Tdk Corp | 多層セラミック基板、その製造方法および製造装置 |
JP2004083310A (ja) * | 2002-08-23 | 2004-03-18 | Nagoya Industrial Science Research Inst | 低温焼成誘電体磁器組成物 |
CN1181010C (zh) * | 2003-05-23 | 2004-12-22 | 华中科技大学 | 微波调谐钛酸锶钡复合陶瓷 |
CN100429173C (zh) * | 2005-07-04 | 2008-10-29 | 浙江大学 | 低温烧结(Ca,Mg)TiO3系微波介质陶瓷及制备工艺 |
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US8101536B2 (en) | 2012-01-24 |
JP2013091599A (ja) | 2013-05-16 |
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CN101583579B (zh) | 2012-12-05 |
US20100120607A1 (en) | 2010-05-13 |
KR20090091795A (ko) | 2009-08-28 |
CN101583579A (zh) | 2009-11-18 |
WO2008066282A1 (en) | 2008-06-05 |
KR101161614B1 (ko) | 2012-07-03 |
JP5410982B2 (ja) | 2014-02-05 |
JP5580871B2 (ja) | 2014-08-27 |
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