JP5556137B2 - 半導体レーザ装置 - Google Patents
半導体レーザ装置 Download PDFInfo
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- JP5556137B2 JP5556137B2 JP2009263341A JP2009263341A JP5556137B2 JP 5556137 B2 JP5556137 B2 JP 5556137B2 JP 2009263341 A JP2009263341 A JP 2009263341A JP 2009263341 A JP2009263341 A JP 2009263341A JP 5556137 B2 JP5556137 B2 JP 5556137B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06258—Controlling the frequency of the radiation with DFB-structure
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/03—Suppression of nonlinear conversion, e.g. specific design to suppress for example stimulated brillouin scattering [SBS], mainly in optical fibres in combination with multimode pumping
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02415—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling by using a thermo-electric cooler [TEC], e.g. Peltier element
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
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- H—ELECTRICITY
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0617—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium using memorised or pre-programmed laser characteristics
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- H—ELECTRICITY
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/0622—Controlling the frequency of the radiation
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06226—Modulation at ultra-high frequencies
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1209—Sampled grating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1212—Chirped grating
Description
図1(a)は、第1の実施形態に係る半導体レーザ装置100の全体構成を示す模式図である。図1(a)に示すように、半導体レーザ装置100は、半導体レーザ10、温度制御装置20およびコントローラ30を備える。半導体レーザ10は、温度制御装置20上に配置されている。次に、各部の詳細を説明する。
第1の実施形態においては、セグメントの等価屈折率を制御するためにヒータを用いたが、それに限られない。実施例2においては、各セグメントへの電流注入によって等価屈折率を制御する例である。図8は、第2の実施形態に係る半導体レーザ装置100aの全体構成を示す模式図である。半導体レーザ装置100aにおいては、ヒータ14a〜14cの代わりに、電極17a〜17cが設けられている。電極17a〜17cは、金属層およびオーミックコンタクト層を含み、ヒータ14a〜14cの位置に設けられている。
11 CSG−DBR領域
12 SG−DFB領域
13 SOA領域
14 ヒータ
15,16,17 電極
20 温度制御装置
30 コントローラ
40 変調信号発生器
50 クロックジェネレータ
60 フィルタ回路
70 振幅調整回路
100 半導体レーザ装置
Claims (2)
- 回折格子部とスペース部とが連結されたセグメントが複数設けられ、且つ、前記複数のセグメントが、同じ光学的長さでグループ分けされた、複数のセグメント群を構成してなる反射領域と、レーザ発振のための利得領域と、前記複数のセグメント群のそれぞれに対応して設けられ、その等価屈折率を制御する複数の屈折率制御部と、を備える半導体レーザと、
前記複数の屈折率制御部を制御パラメータの少なくとも1つとして制御することで、前記半導体レーザの発振波長を制御する波長制御部と、
前記複数のセグメント群のうち、内在するセグメント数が最も多いセグメント群の1つのみに対し、それに対応する前記屈折率制御部により、ディザー入力をなすディザー制御回路と、を備え、
前記屈折率制御部は、前記セグメント群の温度を制御するためのヒータであることを特徴とする半導体レーザ装置。 - 前記ディザー入力がなされるセグメント群には、前記複数の屈折率制御部のうち、もっとも低い温度が付与される屈折率制御部以外の屈折率制御部が対応してなることを特徴とする請求項1記載の半導体レーザ装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009263341A JP5556137B2 (ja) | 2009-11-18 | 2009-11-18 | 半導体レーザ装置 |
US12/948,040 US8279907B2 (en) | 2009-11-18 | 2010-11-17 | Semiconductor laser device and method for controlling semiconductor laser |
CN2010105592021A CN102074891B (zh) | 2009-11-18 | 2010-11-18 | 半导体激光器装置以及控制半导体激光器装置的方法 |
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JP2009263341A JP5556137B2 (ja) | 2009-11-18 | 2009-11-18 | 半導体レーザ装置 |
Publications (2)
Publication Number | Publication Date |
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JP2011108896A JP2011108896A (ja) | 2011-06-02 |
JP5556137B2 true JP5556137B2 (ja) | 2014-07-23 |
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JP2009263341A Active JP5556137B2 (ja) | 2009-11-18 | 2009-11-18 | 半導体レーザ装置 |
Country Status (3)
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US (1) | US8279907B2 (ja) |
JP (1) | JP5556137B2 (ja) |
CN (1) | CN102074891B (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5853599B2 (ja) * | 2011-11-01 | 2016-02-09 | 富士通株式会社 | 発光装置及びその制御方法 |
JP2018046210A (ja) * | 2016-09-15 | 2018-03-22 | 住友電工デバイス・イノベーション株式会社 | 光半導体装置及び光半導体装置の制御方法 |
GB2554653B (en) | 2016-09-30 | 2021-12-29 | Lumentum Tech Uk Limited | Lockerless tuneable DBR laser |
CN106410604B (zh) * | 2016-10-21 | 2019-05-07 | 北京信息科技大学 | 蝶形封装sg-dbr可调谐半导体激光器模块控制方法 |
CN107168401B (zh) * | 2017-06-30 | 2018-02-27 | 华中科技大学 | 一种时分复用闭环反馈热控制方法及系统 |
CN111344917B (zh) * | 2017-12-15 | 2023-09-12 | 株式会社堀场制作所 | 半导体激光器、驱动控制装置和半导体激光器的控制方法 |
JP7259562B2 (ja) * | 2018-07-19 | 2023-04-18 | 住友電気工業株式会社 | 波長可変光源及びその波長制御方法 |
CN112448266B (zh) * | 2019-08-30 | 2022-03-25 | 华为技术有限公司 | 一种多波长激光器以及波长控制方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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FR2716303B1 (fr) * | 1994-02-11 | 1996-04-05 | Franck Delorme | Laser à réflecteurs de Bragg distribués, accordable en longueur d'onde, à réseaux de diffraction virtuels activés sélectivement. |
US5473625A (en) * | 1994-09-26 | 1995-12-05 | At&T Corp. | Tunable distributed Bragg reflector laser for wavelength dithering |
JPH09214038A (ja) * | 1996-01-29 | 1997-08-15 | Fujitsu Ltd | 光送信機、光通信システム及び光通信方法 |
JP3689483B2 (ja) * | 1996-03-29 | 2005-08-31 | アンリツ株式会社 | 多重波長発振レーザ |
US5991061A (en) * | 1997-10-20 | 1999-11-23 | Lucent Technologies Inc. | Laser transmitter for reduced SBS |
JP3729170B2 (ja) * | 2002-10-18 | 2005-12-21 | 住友電気工業株式会社 | 半導体レーザ |
JP4657853B2 (ja) * | 2005-08-11 | 2011-03-23 | 住友電工デバイス・イノベーション株式会社 | 半導体レーザ、レーザモジュール、光学部品、レーザ装置、半導体レーザの製造方法および半導体レーザの制御方法 |
JP4283869B2 (ja) * | 2007-04-05 | 2009-06-24 | ユーディナデバイス株式会社 | 光半導体装置および光半導体装置の制御方法 |
US7869473B2 (en) * | 2008-03-21 | 2011-01-11 | Finisar Corporation | Directly modulated laser with isolated modulated gain electrode for improved frequency modulation |
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2009
- 2009-11-18 JP JP2009263341A patent/JP5556137B2/ja active Active
-
2010
- 2010-11-17 US US12/948,040 patent/US8279907B2/en not_active Expired - Fee Related
- 2010-11-18 CN CN2010105592021A patent/CN102074891B/zh active Active
Also Published As
Publication number | Publication date |
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US8279907B2 (en) | 2012-10-02 |
CN102074891B (zh) | 2013-03-20 |
US20110116524A1 (en) | 2011-05-19 |
JP2011108896A (ja) | 2011-06-02 |
CN102074891A (zh) | 2011-05-25 |
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