JP5154581B2 - レーザ装置およびレーザ装置の制御データ - Google Patents
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- 230000010355 oscillation Effects 0.000 claims description 54
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- 238000002347 injection Methods 0.000 claims 1
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- 238000001514 detection method Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 15
- 238000001228 spectrum Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
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- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
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- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
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- H01S5/00—Semiconductor lasers
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- H01S5/02415—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling by using a thermo-electric cooler [TEC], e.g. Peltier element
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- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
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- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1209—Sampled grating
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
- H01S5/142—External cavity lasers using a wavelength selective device, e.g. a grating or etalon which comprises an additional resonator
Description
Claims (7)
- 利得部と、波長特性に周期的なピークを有する第1波長選択手段と、発振波長の可変帯域よりも狭い帯域に制限された波長範囲において前記第1波長選択手段とは異なる周期で波長特性にピークを有し、屈折率変化によってピーク波長がシフトする第2波長選択手段と、を備え、同じ波長範囲において前記第2波長選択手段の一方向の屈折率変化によって選択される前記発振波長が一方向に変化する複数のレンジを備える共振器と、
前記発振波長を選択するための前記第2波長選択手段の屈折率の設定値として、前記複数のレンジのうち隣接する2つのレンジにまたがった範囲の中から選択された値が格納された記憶部と、
前記記憶部に格納された前記設定値を前記共振器に与えるコントローラと、を備えることを特徴とするレーザ装置。 - 前記記憶部は、前記第2波長選択手段に対して屈折率変化を与えない状態で選択される発振波長を起点とし、前記隣接するレンジにおいて当該起点となる発振波長が再度選択されるまでの範囲において選択された値を格納していることを特徴とする請求項1記載のレーザ装置。
- 前記記憶部は、前記第2波長選択手段に対して屈折率変化を与えない状態で選択される発振波長に隣接する発振波長を起点とし、前記隣接するレンジにおいて当該起点となる発振波長が再度選択されるまでの範囲において選択された値を格納していることを特徴とする請求項1記載のレーザ装置。
- 前記第2波長選択手段の屈折率の設定値は、前記第2波長選択手段の温度または前記第2波長選択手段への電流注入量であることを特徴とする請求項1記載のレーザ装置。
- 前記記憶部は、前記第2波長選択手段の屈折率の設定値を、所望の波長ごとに格納することを特徴とする請求項1〜4のいずれかに記載のレーザ装置。
- 利得部と、波長特性に周期的なピークを有する第1波長選択手段と、発振波長の可変帯域よりも狭い帯域に制限された波長範囲において前記第1波長選択手段とは異なる周期で波長特性にピークを有し、屈折率変化によってピーク波長がシフトする第2波長選択手段と、を備えた共振器を有し、同じ波長範囲において前記第2波長選択手段の一方向の屈折率変化によって選択される前記発振波長が一方向に変化する複数のレンジを備えるレーザ装置の制御データであって、
前記制御データには、前記第2波長選択手段の屈折率を決定するための設定値が、実現するべき発振波長に対応させて、かつ、前記屈折率の最大値と最小値の範囲が前記複数のレンジにまたがった範囲で格納されてなることを特徴とするレーザ装置の制御データ。 - 前記第2波長選択手段の屈折率の設定値は、前記第2波長選択手段の温度または前記第2波長選択手段への電流注入量であることを特徴とする請求項6記載のレーザ装置の制御データ。
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JP2008025410 | 2008-02-05 | ||
JP2009552469A JP5154581B2 (ja) | 2008-02-05 | 2009-02-03 | レーザ装置およびレーザ装置の制御データ |
PCT/JP2009/051763 WO2009099050A1 (ja) | 2008-02-05 | 2009-02-03 | レーザ装置およびレーザ装置の制御データ |
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US (1) | US20100296532A1 (ja) |
EP (1) | EP2244341A4 (ja) |
JP (1) | JP5154581B2 (ja) |
CN (1) | CN101971445B (ja) |
WO (1) | WO2009099050A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5474338B2 (ja) * | 2008-11-28 | 2014-04-16 | 住友電工デバイス・イノベーション株式会社 | 半導体レーザのチューニング方法 |
US8121169B2 (en) * | 2009-04-14 | 2012-02-21 | Corning Incorporated | Split control of front and rear DBR grating portions |
JP5457873B2 (ja) * | 2010-02-18 | 2014-04-02 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザの制御方法 |
CN102253455B (zh) * | 2011-04-14 | 2013-01-30 | 福州高意通讯有限公司 | 一种波长选择结构 |
CN102162913A (zh) * | 2011-04-14 | 2011-08-24 | 福州高意通讯有限公司 | 一种可调滤光片 |
JP2013089754A (ja) * | 2011-10-18 | 2013-05-13 | Sumitomo Electric Ind Ltd | 波長可変半導体レーザの制御方法 |
JP6319721B2 (ja) * | 2014-01-31 | 2018-05-09 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザの制御方法 |
JP2015144191A (ja) * | 2014-01-31 | 2015-08-06 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザの波長切り替え方法 |
US9531155B2 (en) * | 2014-04-09 | 2016-12-27 | Applied Optoelectronics, Inc. | Switched radio frequency (RF) driver for tunable laser with multiple in-line sections |
JP2016100380A (ja) * | 2014-11-19 | 2016-05-30 | 富士通オプティカルコンポーネンツ株式会社 | レーザ装置、及び、光送信機 |
CN107910749A (zh) * | 2017-11-20 | 2018-04-13 | 烽火通信科技股份有限公司 | 无啁啾的增益调制半导体激光器装置及激光强度调制方法 |
CN108011294A (zh) * | 2017-12-30 | 2018-05-08 | 武汉理工光科股份有限公司 | 基于半导体可调谐激光器的脉冲式扫频光源及产生方法 |
JPWO2020166648A1 (ja) * | 2019-02-14 | 2021-12-16 | 古河電気工業株式会社 | 波長可変レーザ装置及び波長制御方法 |
WO2020166615A1 (ja) * | 2019-02-14 | 2020-08-20 | 古河電気工業株式会社 | 波長可変光源装置および波長可変レーザ素子の制御方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1187827A (ja) * | 1997-09-09 | 1999-03-30 | Toshiba Corp | 可変波長半導体レーザ装置 |
JP2007048988A (ja) * | 2005-08-11 | 2007-02-22 | Eudyna Devices Inc | 半導体レーザ、レーザモジュール、光学部品、レーザ装置、半導体レーザの製造方法および半導体レーザの制御方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6853654B2 (en) * | 1999-07-27 | 2005-02-08 | Intel Corporation | Tunable external cavity laser |
US6788719B2 (en) * | 2000-05-04 | 2004-09-07 | Agility Communications, Inc. | Open loop control of SGDBR lasers |
US6868100B2 (en) * | 2001-12-04 | 2005-03-15 | Agility Communications, Inc. | Methods for robust channel switching of widely-tunable sampled-grating distributed bragg reflector lasers |
JP2004273993A (ja) * | 2003-03-12 | 2004-09-30 | Hitachi Ltd | 波長可変分布反射型半導体レーザ装置 |
JP4893026B2 (ja) * | 2005-03-03 | 2012-03-07 | 日本電気株式会社 | 波長可変共振器及びこれを用いた波長可変光源並びに多重共振器の波長可変方法 |
JP2006278769A (ja) * | 2005-03-29 | 2006-10-12 | Nec Corp | 波長可変レーザ |
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- 2009-02-03 JP JP2009552469A patent/JP5154581B2/ja active Active
- 2009-02-03 CN CN2009801042653A patent/CN101971445B/zh active Active
- 2009-02-03 EP EP09708507.0A patent/EP2244341A4/en not_active Withdrawn
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- 2010-07-30 US US12/847,340 patent/US20100296532A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1187827A (ja) * | 1997-09-09 | 1999-03-30 | Toshiba Corp | 可変波長半導体レーザ装置 |
JP2007048988A (ja) * | 2005-08-11 | 2007-02-22 | Eudyna Devices Inc | 半導体レーザ、レーザモジュール、光学部品、レーザ装置、半導体レーザの製造方法および半導体レーザの制御方法 |
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US20100296532A1 (en) | 2010-11-25 |
JPWO2009099050A1 (ja) | 2011-05-26 |
CN101971445A (zh) | 2011-02-09 |
EP2244341A4 (en) | 2014-12-24 |
CN101971445B (zh) | 2012-11-07 |
EP2244341A1 (en) | 2010-10-27 |
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