JP5542749B2 - 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置 - Google Patents

試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置 Download PDF

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Publication number
JP5542749B2
JP5542749B2 JP2011145161A JP2011145161A JP5542749B2 JP 5542749 B2 JP5542749 B2 JP 5542749B2 JP 2011145161 A JP2011145161 A JP 2011145161A JP 2011145161 A JP2011145161 A JP 2011145161A JP 5542749 B2 JP5542749 B2 JP 5542749B2
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Japan
Prior art keywords
sample
liquid
particle beam
charged particle
vacuum chamber
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JP2011145161A
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English (en)
Japanese (ja)
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JP2013011540A5 (enExample
JP2013011540A (ja
Inventor
秀一 竹内
久幸 高須
朝子 金子
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2011145161A priority Critical patent/JP5542749B2/ja
Priority to PCT/JP2012/002820 priority patent/WO2013001700A1/ja
Priority to US14/128,646 priority patent/US20140124367A1/en
Priority to DE112012002450.8T priority patent/DE112012002450T5/de
Priority to CN201280032123.2A priority patent/CN103635987B/zh
Publication of JP2013011540A publication Critical patent/JP2013011540A/ja
Publication of JP2013011540A5 publication Critical patent/JP2013011540A5/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011145161A 2011-06-30 2011-06-30 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置 Active JP5542749B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011145161A JP5542749B2 (ja) 2011-06-30 2011-06-30 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置
PCT/JP2012/002820 WO2013001700A1 (ja) 2011-06-30 2012-04-25 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置
US14/128,646 US20140124367A1 (en) 2011-06-30 2012-04-25 Sample preparation apparatus, sample preparation method, and charged particle beam apparatus using the same
DE112012002450.8T DE112012002450T5 (de) 2011-06-30 2012-04-25 Probenvorbereitungsvorrichtung, Probenvorbereitungsverfahren und Ladungsteilchenstrahlvorrichtung damit
CN201280032123.2A CN103635987B (zh) 2011-06-30 2012-04-25 试料的制作装置、制作方法以及使用该制作装置和制作方法的带电粒子线装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011145161A JP5542749B2 (ja) 2011-06-30 2011-06-30 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2013011540A JP2013011540A (ja) 2013-01-17
JP2013011540A5 JP2013011540A5 (enExample) 2014-01-09
JP5542749B2 true JP5542749B2 (ja) 2014-07-09

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011145161A Active JP5542749B2 (ja) 2011-06-30 2011-06-30 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置

Country Status (5)

Country Link
US (1) US20140124367A1 (enExample)
JP (1) JP5542749B2 (enExample)
CN (1) CN103635987B (enExample)
DE (1) DE112012002450T5 (enExample)
WO (1) WO2013001700A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5723801B2 (ja) 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
JP6024485B2 (ja) * 2013-01-29 2016-11-16 住友金属鉱山株式会社 電子顕微鏡観察用試料台、並びに試料の断面観察方法
EP3043372B1 (en) * 2015-01-12 2017-01-04 Fei Company Method of modifying a sample surface layer from a microscopic sample
WO2016121079A1 (ja) * 2015-01-30 2016-08-04 株式会社 日立ハイテクノロジーズ イオンミリング装置を備えた電子顕微鏡、および三次元再構築方法
CN105108393B (zh) * 2015-09-25 2016-08-24 宁波中和汽配有限公司 一种三四档拨叉轴的焊接装置
WO2017051469A1 (ja) * 2015-09-25 2017-03-30 株式会社日立ハイテクノロジーズ イオンミリング装置
WO2017158806A1 (ja) * 2016-03-18 2017-09-21 株式会社 日立ハイテクノロジーズ 標本の観察方法
WO2019244331A1 (ja) * 2018-06-22 2019-12-26 株式会社日立ハイテクノロジーズ イオンミリング装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04272643A (ja) * 1991-01-31 1992-09-29 Mitsubishi Electric Corp イオン注入装置およびイオン注入方法
JPH06208841A (ja) * 1991-09-20 1994-07-26 Hitachi Ltd 走査電子顕微鏡のクライオ装置
JP3412859B2 (ja) * 1993-04-09 2003-06-03 キヤノン株式会社 切断研削装置
WO2003006184A1 (fr) * 2001-07-13 2003-01-23 Sharp Kabushiki Kaisha Dispositif de lavage et procede de lavage
EP1388883B1 (en) * 2002-08-07 2013-06-05 Fei Company Coaxial FIB-SEM column
JP2006010397A (ja) * 2004-06-23 2006-01-12 Tdk Corp 試料作製方法および試料解析方法
JP2006140070A (ja) * 2004-11-15 2006-06-01 Hitachi High-Technologies Corp 荷電粒子線装置
JP4369887B2 (ja) * 2005-03-17 2009-11-25 株式会社みくに工業 超音波洗浄方法および超音波洗浄装置
CN101177261B (zh) * 2007-11-08 2010-05-19 上海交通大学 生物相容性的纤维素功能化碳纳米管的制备方法
JP2010025656A (ja) * 2008-07-17 2010-02-04 Jeol Ltd イオン液体を用いた試料の処理方法及び処理システム

Also Published As

Publication number Publication date
US20140124367A1 (en) 2014-05-08
DE112012002450T5 (de) 2014-03-27
JP2013011540A (ja) 2013-01-17
CN103635987B (zh) 2015-07-15
WO2013001700A1 (ja) 2013-01-03
CN103635987A (zh) 2014-03-12

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