CN103635987B - 试料的制作装置、制作方法以及使用该制作装置和制作方法的带电粒子线装置 - Google Patents

试料的制作装置、制作方法以及使用该制作装置和制作方法的带电粒子线装置 Download PDF

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Publication number
CN103635987B
CN103635987B CN201280032123.2A CN201280032123A CN103635987B CN 103635987 B CN103635987 B CN 103635987B CN 201280032123 A CN201280032123 A CN 201280032123A CN 103635987 B CN103635987 B CN 103635987B
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CN
China
Prior art keywords
sample
liquid
charged particle
vacuum chamber
particle beam
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Expired - Fee Related
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CN201280032123.2A
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English (en)
Chinese (zh)
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CN103635987A (zh
Inventor
竹内秀一
高须久幸
金子朝子
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Hitachi Ltd
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Hitachi Ltd
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Publication date
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Publication of CN103635987A publication Critical patent/CN103635987A/zh
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Expired - Fee Related legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201280032123.2A 2011-06-30 2012-04-25 试料的制作装置、制作方法以及使用该制作装置和制作方法的带电粒子线装置 Expired - Fee Related CN103635987B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011145161A JP5542749B2 (ja) 2011-06-30 2011-06-30 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置
JP2011-145161 2011-06-30
PCT/JP2012/002820 WO2013001700A1 (ja) 2011-06-30 2012-04-25 試料の作製装置，作製方法、及びそれを用いた荷電粒子線装置

Publications (2)

Publication Number Publication Date
CN103635987A CN103635987A (zh) 2014-03-12
CN103635987B true CN103635987B (zh) 2015-07-15

Family

ID=47423633

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280032123.2A Expired - Fee Related CN103635987B (zh) 2011-06-30 2012-04-25 试料的制作装置、制作方法以及使用该制作装置和制作方法的带电粒子线装置

Country Status (5)

Country Link
US (1) US20140124367A1 (enExample)
JP (1) JP5542749B2 (enExample)
CN (1) CN103635987B (enExample)
DE (1) DE112012002450T5 (enExample)
WO (1) WO2013001700A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI707375B (zh) 2018-06-22 2020-10-11 日商日立全球先端科技股份有限公司 離子磨削裝置

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5723801B2 (ja) 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
JP6024485B2 (ja) * 2013-01-29 2016-11-16 住友金属鉱山株式会社 電子顕微鏡観察用試料台、並びに試料の断面観察方法
EP3043372B1 (en) * 2015-01-12 2017-01-04 Fei Company Method of modifying a sample surface layer from a microscopic sample
WO2016121079A1 (ja) * 2015-01-30 2016-08-04 株式会社 日立ハイテクノロジーズ イオンミリング装置を備えた電子顕微鏡、および三次元再構築方法
CN105108393B (zh) * 2015-09-25 2016-08-24 宁波中和汽配有限公司 一种三四档拨叉轴的焊接装置
WO2017051469A1 (ja) * 2015-09-25 2017-03-30 株式会社日立ハイテクノロジーズ イオンミリング装置
WO2017158806A1 (ja) * 2016-03-18 2017-09-21 株式会社 日立ハイテクノロジーズ 標本の観察方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06208841A (ja) * 1991-09-20 1994-07-26 Hitachi Ltd 走査電子顕微鏡のクライオ装置
CN1527749A (zh) * 2001-07-13 2004-09-08 夏普株式会社 洗净装置及洗净方法
JP2006140070A (ja) * 2004-11-15 2006-06-01 Hitachi High-Technologies Corp 荷電粒子線装置
CN101177261A (zh) * 2007-11-08 2008-05-14 上海交通大学 生物相容性的纤维素功能化碳纳米管的制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04272643A (ja) * 1991-01-31 1992-09-29 Mitsubishi Electric Corp イオン注入装置およびイオン注入方法
JP3412859B2 (ja) * 1993-04-09 2003-06-03 キヤノン株式会社 切断研削装置
EP1388883B1 (en) * 2002-08-07 2013-06-05 Fei Company Coaxial FIB-SEM column
JP2006010397A (ja) * 2004-06-23 2006-01-12 Tdk Corp 試料作製方法および試料解析方法
JP4369887B2 (ja) * 2005-03-17 2009-11-25 株式会社みくに工業 超音波洗浄方法および超音波洗浄装置
JP2010025656A (ja) * 2008-07-17 2010-02-04 Jeol Ltd イオン液体を用いた試料の処理方法及び処理システム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06208841A (ja) * 1991-09-20 1994-07-26 Hitachi Ltd 走査電子顕微鏡のクライオ装置
CN1527749A (zh) * 2001-07-13 2004-09-08 夏普株式会社 洗净装置及洗净方法
JP2006140070A (ja) * 2004-11-15 2006-06-01 Hitachi High-Technologies Corp 荷電粒子線装置
CN101177261A (zh) * 2007-11-08 2008-05-14 上海交通大学 生物相容性的纤维素功能化碳纳米管的制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI707375B (zh) 2018-06-22 2020-10-11 日商日立全球先端科技股份有限公司 離子磨削裝置

Also Published As

Publication number Publication date
US20140124367A1 (en) 2014-05-08
JP5542749B2 (ja) 2014-07-09
DE112012002450T5 (de) 2014-03-27
JP2013011540A (ja) 2013-01-17
WO2013001700A1 (ja) 2013-01-03
CN103635987A (zh) 2014-03-12

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Granted publication date: 20150715

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