JP5528190B2 - ペリクル収納容器 - Google Patents

ペリクル収納容器 Download PDF

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Publication number
JP5528190B2
JP5528190B2 JP2010099895A JP2010099895A JP5528190B2 JP 5528190 B2 JP5528190 B2 JP 5528190B2 JP 2010099895 A JP2010099895 A JP 2010099895A JP 2010099895 A JP2010099895 A JP 2010099895A JP 5528190 B2 JP5528190 B2 JP 5528190B2
Authority
JP
Japan
Prior art keywords
storage container
pellicle storage
pellicle
layer
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010099895A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011232388A (ja
Inventor
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2010099895A priority Critical patent/JP5528190B2/ja
Priority to KR1020100136595A priority patent/KR101754835B1/ko
Priority to TW100113696A priority patent/TWI423907B/zh
Priority to CN2011101041518A priority patent/CN102236249B/zh
Publication of JP2011232388A publication Critical patent/JP2011232388A/ja
Priority to HK12103709.2A priority patent/HK1163262A1/xx
Application granted granted Critical
Publication of JP5528190B2 publication Critical patent/JP5528190B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D43/00—Lids or covers for rigid or semi-rigid containers
    • B65D43/02—Removable lids or covers
    • B65D43/08—Removable lids or covers having a peripheral flange fitting over the rim of the container
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • B65D85/38—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for delicate optical, measuring, calculating or control apparatus
    • B65D85/40—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for delicate optical, measuring, calculating or control apparatus for watches or clocks; for components thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67379—Closed carriers characterised by coupling elements, kinematic members, handles or elements to be externally gripped
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packages (AREA)
JP2010099895A 2010-04-23 2010-04-23 ペリクル収納容器 Active JP5528190B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010099895A JP5528190B2 (ja) 2010-04-23 2010-04-23 ペリクル収納容器
KR1020100136595A KR101754835B1 (ko) 2010-04-23 2010-12-28 펠리클 수납 용기
TW100113696A TWI423907B (zh) 2010-04-23 2011-04-20 防塵薄膜組件收納容器
CN2011101041518A CN102236249B (zh) 2010-04-23 2011-04-25 防尘薄膜组件收纳容器
HK12103709.2A HK1163262A1 (en) 2010-04-23 2012-04-16 Pellicle container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010099895A JP5528190B2 (ja) 2010-04-23 2010-04-23 ペリクル収納容器

Publications (2)

Publication Number Publication Date
JP2011232388A JP2011232388A (ja) 2011-11-17
JP5528190B2 true JP5528190B2 (ja) 2014-06-25

Family

ID=44887033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010099895A Active JP5528190B2 (ja) 2010-04-23 2010-04-23 ペリクル収納容器

Country Status (5)

Country Link
JP (1) JP5528190B2 (zh)
KR (1) KR101754835B1 (zh)
CN (1) CN102236249B (zh)
HK (1) HK1163262A1 (zh)
TW (1) TWI423907B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI763738B (zh) * 2016-11-16 2022-05-11 德商休斯微科光罩儀器股份有限公司 用來清潔基材局部區域的裝置以及方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5822401B2 (ja) * 2012-12-25 2015-11-24 信越化学工業株式会社 リソグラフィ用ペリクル
JP6308676B2 (ja) * 2014-12-18 2018-04-11 信越化学工業株式会社 リソグラフィ用ペリクル容器。
JP6320309B2 (ja) * 2015-01-19 2018-05-09 信越化学工業株式会社 ペリクル収納容器
JP2016151633A (ja) * 2015-02-17 2016-08-22 信越化学工業株式会社 ペリクル収納容器
JP6275067B2 (ja) * 2015-02-24 2018-02-07 信越化学工業株式会社 ペリクル収納容器
JP6376601B2 (ja) * 2015-05-18 2018-08-22 信越化学工業株式会社 ペリクル支持手段及びこれを用いたペリクル支持装置とペリクル装着方法
JP6351178B2 (ja) * 2015-07-13 2018-07-04 信越化学工業株式会社 ペリクル収納容器およびペリクルの取り出し方法
JP6494111B2 (ja) * 2015-11-09 2019-04-03 信越化学工業株式会社 ペリクル収納容器の包装構造体及びその包装方法
JP2020033060A (ja) * 2018-08-30 2020-03-05 株式会社吉野工業所 チューブ容器

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3157664B2 (ja) * 1993-11-22 2001-04-16 信越化学工業株式会社 ペリクル収納容器
JP3356897B2 (ja) * 1994-12-16 2002-12-16 信越化学工業株式会社 ペリクル収納容器
JP2001201847A (ja) * 2000-01-19 2001-07-27 Shin Etsu Chem Co Ltd ペリクル容器
JP2005107085A (ja) * 2003-09-30 2005-04-21 Asahi Kasei Electronics Co Ltd 大型ペリクル収納容器の開封方法および蓋開閉治具および大型ペリクル収納容器
JP4391435B2 (ja) * 2005-03-22 2009-12-24 信越化学工業株式会社 ペリクル収納容器
JP2007057624A (ja) * 2005-08-23 2007-03-08 Matsushita Electric Ind Co Ltd レチクル収納ケース
JP2007128030A (ja) * 2005-10-07 2007-05-24 Shin Etsu Polymer Co Ltd ペリクル用収納容器
JP4796946B2 (ja) * 2006-11-30 2011-10-19 信越化学工業株式会社 ペリクル収納容器
JP2008216846A (ja) * 2007-03-07 2008-09-18 Asahi Kasei Electronics Co Ltd ペリクル収納容器
JP5269438B2 (ja) * 2007-03-13 2013-08-21 旭化成イーマテリアルズ株式会社 大型ペリクルの保護フィルム及び大型ペリクルの収納方法
JP4955449B2 (ja) * 2007-05-10 2012-06-20 信越化学工業株式会社 ペリクル収納容器
JP5051840B2 (ja) * 2007-11-22 2012-10-17 信越化学工業株式会社 ペリクル収納容器内にペリクルを保管する方法
JP2010060992A (ja) * 2008-09-05 2010-03-18 Asahi Kasei E-Materials Corp 大型ペリクル構造体及び大型ペリクル収納構造体
JP4493711B2 (ja) * 2008-11-20 2010-06-30 旭化成イーマテリアルズ株式会社 大型ペリクル収納容器及びその製造方法
JP4776721B2 (ja) * 2009-09-18 2011-09-21 旭化成イーマテリアルズ株式会社 大型ペリクル収納容器及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI763738B (zh) * 2016-11-16 2022-05-11 德商休斯微科光罩儀器股份有限公司 用來清潔基材局部區域的裝置以及方法

Also Published As

Publication number Publication date
KR101754835B1 (ko) 2017-07-06
CN102236249A (zh) 2011-11-09
KR20110118558A (ko) 2011-10-31
TWI423907B (zh) 2014-01-21
CN102236249B (zh) 2013-03-13
TW201139233A (en) 2011-11-16
JP2011232388A (ja) 2011-11-17
HK1163262A1 (en) 2012-09-07

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