JP5499596B2 - パターン形成方法及び半導体素子 - Google Patents
パターン形成方法及び半導体素子 Download PDFInfo
- Publication number
- JP5499596B2 JP5499596B2 JP2009220832A JP2009220832A JP5499596B2 JP 5499596 B2 JP5499596 B2 JP 5499596B2 JP 2009220832 A JP2009220832 A JP 2009220832A JP 2009220832 A JP2009220832 A JP 2009220832A JP 5499596 B2 JP5499596 B2 JP 5499596B2
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acrylate
- substrate
- transfer layer
- stamper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 56
- 239000004065 semiconductor Substances 0.000 title claims description 14
- -1 polysiloxane Polymers 0.000 claims description 84
- 239000000758 substrate Substances 0.000 claims description 50
- 238000012546 transfer Methods 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 35
- 238000003851 corona treatment Methods 0.000 claims description 16
- 230000005865 ionizing radiation Effects 0.000 claims description 14
- 229920001296 polysiloxane Polymers 0.000 claims description 11
- 238000003825 pressing Methods 0.000 claims description 6
- 230000007261 regionalization Effects 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 180
- 239000010410 layer Substances 0.000 description 46
- 150000001875 compounds Chemical class 0.000 description 29
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 27
- 239000003795 chemical substances by application Substances 0.000 description 16
- 238000012545 processing Methods 0.000 description 15
- 229910052731 fluorine Inorganic materials 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 125000001153 fluoro group Chemical group F* 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 239000012948 isocyanate Substances 0.000 description 9
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 7
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 238000001127 nanoimprint lithography Methods 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- WTVXIBRMWGUIMI-UHFFFAOYSA-N trifluoro($l^{1}-oxidanylsulfonyl)methane Chemical group [O]S(=O)(=O)C(F)(F)F WTVXIBRMWGUIMI-UHFFFAOYSA-N 0.000 description 4
- KFMMMYHKGPIRON-UHFFFAOYSA-N (1,3-dioxo-3a,4,7,7a-tetrahydro-octahydro-1h-4,7-epoxyisoindol-2-yl) trifluoromethanesulfonate Chemical compound C1=CC2OC1C1C2C(=O)N(OS(=O)(=O)C(F)(F)F)C1=O KFMMMYHKGPIRON-UHFFFAOYSA-N 0.000 description 3
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- WADCPEMKIBAJHH-UHFFFAOYSA-N 3,4-diphenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 WADCPEMKIBAJHH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 150000002314 glycerols Chemical class 0.000 description 3
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 229940079877 pyrogallol Drugs 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 3
- XUYXBAWNEWOEDI-UHFFFAOYSA-N (1,3-dioxo-3a,4,7,7a-tetrahydro-octahydro-1h-4,7-epoxyisoindol-2-yl) 4,7,7-trimethylbicyclo[2.2.1]heptane-3-sulfonate Chemical compound C1=CC2OC1C(C1=O)C2C(=O)N1OS(=O)(=O)C(C1)C2(C)CCC1C2(C)C XUYXBAWNEWOEDI-UHFFFAOYSA-N 0.000 description 2
- GYXAHUXQRATWDV-UHFFFAOYSA-N (1,3-dioxoisoindol-2-yl) trifluoromethanesulfonate Chemical compound C1=CC=C2C(=O)N(OS(=O)(=O)C(F)(F)F)C(=O)C2=C1 GYXAHUXQRATWDV-UHFFFAOYSA-N 0.000 description 2
- MXFQRSUWYYSPOC-UHFFFAOYSA-N (2,2-dimethyl-3-prop-2-enoyloxypropyl) prop-2-enoate Chemical class C=CC(=O)OCC(C)(C)COC(=O)C=C MXFQRSUWYYSPOC-UHFFFAOYSA-N 0.000 description 2
- YJBHRGZINIFBKJ-UHFFFAOYSA-N (2,5-dioxo-3,4-diphenylpyrrol-1-yl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON1C(=O)C(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)C1=O YJBHRGZINIFBKJ-UHFFFAOYSA-N 0.000 description 2
- RLLFCCPTQOZGOL-UHFFFAOYSA-N (2,5-dioxo-3,4-diphenylpyrrol-1-yl) trifluoromethanesulfonate Chemical compound O=C1N(OS(=O)(=O)C(F)(F)F)C(=O)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 RLLFCCPTQOZGOL-UHFFFAOYSA-N 0.000 description 2
- XMKFJAZDRZNWRC-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)CCC1=O XMKFJAZDRZNWRC-UHFFFAOYSA-N 0.000 description 2
- XFJSTBHMLYKHJF-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON1C(=O)CCC1=O XFJSTBHMLYKHJF-UHFFFAOYSA-N 0.000 description 2
- OKRLWHAZMUFONP-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)ON1C(=O)CCC1=O OKRLWHAZMUFONP-UHFFFAOYSA-N 0.000 description 2
- DLDWUFCUUXXYTB-UHFFFAOYSA-N (2-oxo-1,2-diphenylethyl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 DLDWUFCUUXXYTB-UHFFFAOYSA-N 0.000 description 2
- YSLWIRRLTICCEK-UHFFFAOYSA-N (3,5-dioxo-4-azatricyclo[5.2.1.02,6]dec-8-en-4-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)C2C(C=C3)CC3C2C1=O YSLWIRRLTICCEK-UHFFFAOYSA-N 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 2
- ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 2
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 2
- 229940058015 1,3-butylene glycol Drugs 0.000 description 2
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 2
- GEKIOKHXXBFTEU-UHFFFAOYSA-N 1-benzyl-9,10-diethoxy-3-nitroanthracene-2-sulfonic acid Chemical compound OS(=O)(=O)C1=C([N+]([O-])=O)C=C2C(OCC)=C3C=CC=CC3=C(OCC)C2=C1CC1=CC=CC=C1 GEKIOKHXXBFTEU-UHFFFAOYSA-N 0.000 description 2
- CPEXFJVZFNYXGU-UHFFFAOYSA-N 2,4,6-trihydroxybenzophenone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC=CC=C1 CPEXFJVZFNYXGU-UHFFFAOYSA-N 0.000 description 2
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 2
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 2
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910000676 Si alloy Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- XJHABGPPCLHLLV-UHFFFAOYSA-N benzo[de]isoquinoline-1,3-dione Chemical compound C1=CC(C(=O)NC2=O)=C3C2=CC=CC3=C1 XJHABGPPCLHLLV-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 235000019437 butane-1,3-diol Nutrition 0.000 description 2
- 229960000846 camphor Drugs 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- YCMDNBGUNDHOOD-UHFFFAOYSA-N n -((trifluoromethylsulfonyl)oxy)-5-norbornene-2,3-dicarboximide Chemical compound C1=CC2CC1C1C2C(=O)N(OS(=O)(=O)C(F)(F)F)C1=O YCMDNBGUNDHOOD-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- PTDFYTRMUCOFBP-UHFFFAOYSA-M propyl [4-(thiolan-1-ium-1-yl)naphthalen-1-yl] carbonate;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC(=O)OCCC)=CC=C1[S+]1CCCC1 PTDFYTRMUCOFBP-UHFFFAOYSA-M 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- GWPGIMPAYBUFNS-UHFFFAOYSA-N (1,3-dioxo-3a,4,7,7a-tetrahydro-octahydro-1h-4,7-epoxyisoindol-2-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)C2C(C=C3)OC3C2C1=O GWPGIMPAYBUFNS-UHFFFAOYSA-N 0.000 description 1
- WDICREWFWHNNKX-UHFFFAOYSA-N (1,3-dioxobenzo[de]isoquinolin-2-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON(C1=O)C(=O)C2=C3C1=CC=CC3=CC=C2 WDICREWFWHNNKX-UHFFFAOYSA-N 0.000 description 1
- TVDHBKLSXQTJFI-UHFFFAOYSA-N (1,3-dioxobenzo[de]isoquinolin-2-yl) 4-fluorobenzenesulfonate Chemical compound C1=CC(F)=CC=C1S(=O)(=O)ON(C1=O)C(=O)C2=C3C1=CC=CC3=CC=C2 TVDHBKLSXQTJFI-UHFFFAOYSA-N 0.000 description 1
- FLBURFVEHMDJPO-UHFFFAOYSA-N (1,3-dioxoisoindol-2-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)C2=CC=CC=C2C1=O FLBURFVEHMDJPO-UHFFFAOYSA-N 0.000 description 1
- MMZCYVBYIOUFEO-UHFFFAOYSA-N (1,3-dioxoisoindol-2-yl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON1C(=O)C2=CC=CC=C2C1=O MMZCYVBYIOUFEO-UHFFFAOYSA-N 0.000 description 1
- XEDWWPGWIXPVRQ-UHFFFAOYSA-N (2,3,4-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC(O)=C(O)C(O)=C1 XEDWWPGWIXPVRQ-UHFFFAOYSA-N 0.000 description 1
- QWRVAXMLZCMVSL-UHFFFAOYSA-N (2,4,6-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC(O)=C(O)C(O)=C1 QWRVAXMLZCMVSL-UHFFFAOYSA-N 0.000 description 1
- GBQZZLQKUYLGFT-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O GBQZZLQKUYLGFT-UHFFFAOYSA-N 0.000 description 1
- PRHKHLYZXJWYMP-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-fluorobenzenesulfonate Chemical compound C1=CC(F)=CC=C1S(=O)(=O)ON1C(=O)CCC1=O PRHKHLYZXJWYMP-UHFFFAOYSA-N 0.000 description 1
- NIZXXKXPZFVCAR-UHFFFAOYSA-N (2,6-dihydroxyphenyl)-(5,6,6-trihydroxycyclohexa-2,4-dien-1-yl)methanone Chemical compound OC1(O)C(O)=CC=CC1C(=O)C1=C(O)C=CC=C1O NIZXXKXPZFVCAR-UHFFFAOYSA-N 0.000 description 1
- PCORJEZCUPLHGW-UHFFFAOYSA-N (2-ethyl-1-hydroxy-2-methylhexyl) prop-2-enoate Chemical compound CCCCC(C)(CC)C(O)OC(=O)C=C PCORJEZCUPLHGW-UHFFFAOYSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- APVNRHLATFVPPS-UHFFFAOYSA-N (2-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1O APVNRHLATFVPPS-UHFFFAOYSA-N 0.000 description 1
- DKZFIPFKXAGEBP-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) benzoate Chemical compound OCC(C)(C)COC(=O)C1=CC=CC=C1 DKZFIPFKXAGEBP-UHFFFAOYSA-N 0.000 description 1
- RGZKRJSNZKATOY-UHFFFAOYSA-M (4-cyanonaphthalen-1-yl)-diethylsulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](CC)CC)=CC=C(C#N)C2=C1 RGZKRJSNZKATOY-UHFFFAOYSA-M 0.000 description 1
- KQTKIMROWOIVHW-UHFFFAOYSA-N (4-hydroxynaphthalen-1-yl)-dimethylsulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](C)C)=CC=C(O)C2=C1 KQTKIMROWOIVHW-UHFFFAOYSA-N 0.000 description 1
- GGNPARUPBGZVLO-UHFFFAOYSA-N (4-hydroxyphenyl)-methyl-phenylsulfanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C=1C=C(O)C=CC=1[S+](C)C1=CC=CC=C1 GGNPARUPBGZVLO-UHFFFAOYSA-N 0.000 description 1
- FJALTVCJBKZXKY-UHFFFAOYSA-M (7,7-dimethyl-3-oxo-4-bicyclo[2.2.1]heptanyl)methanesulfonate;triphenylsulfanium Chemical compound C1CC2(CS([O-])(=O)=O)C(=O)CC1C2(C)C.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FJALTVCJBKZXKY-UHFFFAOYSA-M 0.000 description 1
- VLLPVDKADBYKLM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VLLPVDKADBYKLM-UHFFFAOYSA-M 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- URFNSYWAGGETFK-UHFFFAOYSA-N 1,2-bis(4-hydroxyphenyl)ethane Natural products C1=CC(O)=CC=C1CCC1=CC=C(O)C=C1 URFNSYWAGGETFK-UHFFFAOYSA-N 0.000 description 1
- WGYZMNBUZFHYRX-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-ol Chemical compound COCC(C)OCC(C)O WGYZMNBUZFHYRX-UHFFFAOYSA-N 0.000 description 1
- NQUXRXBRYDZZDL-UHFFFAOYSA-N 1-(2-prop-2-enoyloxyethyl)cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1(CCOC(=O)C=C)C(O)=O NQUXRXBRYDZZDL-UHFFFAOYSA-N 0.000 description 1
- JBTKENVGSBMDGU-UHFFFAOYSA-M 1-(4-ethoxynaphthalen-1-yl)thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OCC)=CC=C1[S+]1CCCC1 JBTKENVGSBMDGU-UHFFFAOYSA-M 0.000 description 1
- MAFLFBKPNBVUBH-UHFFFAOYSA-M 1-(4-methoxynaphthalen-1-yl)thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC)=CC=C1[S+]1CCCC1 MAFLFBKPNBVUBH-UHFFFAOYSA-M 0.000 description 1
- XUIXZBXRQFZHIT-UHFFFAOYSA-N 1-[1-(1-hydroxypropan-2-yloxy)propan-2-yloxy]-3-methoxypropan-2-ol Chemical compound COCC(O)COC(C)COC(C)CO XUIXZBXRQFZHIT-UHFFFAOYSA-N 0.000 description 1
- QTEDMWLIVQRHNV-UHFFFAOYSA-M 1-[4-(1-methoxyethoxy)naphthalen-1-yl]thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC(C)OC)=CC=C1[S+]1CCCC1 QTEDMWLIVQRHNV-UHFFFAOYSA-M 0.000 description 1
- DGNWZQUTQWWYLJ-UHFFFAOYSA-M 1-[4-(2-methoxyethoxy)naphthalen-1-yl]thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OCCOC)=CC=C1[S+]1CCCC1 DGNWZQUTQWWYLJ-UHFFFAOYSA-M 0.000 description 1
- NOWKHDSDYKNYDY-UHFFFAOYSA-M 1-[4-(ethoxymethoxy)naphthalen-1-yl]thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OCOCC)=CC=C1[S+]1CCCC1 NOWKHDSDYKNYDY-UHFFFAOYSA-M 0.000 description 1
- IEWUTYMDBXCAGH-UHFFFAOYSA-M 1-[4-(methoxymethoxy)naphthalen-1-yl]thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OCOC)=CC=C1[S+]1CCCC1 IEWUTYMDBXCAGH-UHFFFAOYSA-M 0.000 description 1
- DPOPGHCRRJYPMP-UHFFFAOYSA-N 1-[diazo(methylsulfonyl)methyl]sulfonyl-4-methylbenzene Chemical compound CC1=CC=C(S(=O)(=O)C(=[N+]=[N-])S(C)(=O)=O)C=C1 DPOPGHCRRJYPMP-UHFFFAOYSA-N 0.000 description 1
- GYQQFWWMZYBCIB-UHFFFAOYSA-N 1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1 GYQQFWWMZYBCIB-UHFFFAOYSA-N 0.000 description 1
- BDHGFCVQWMDIQX-UHFFFAOYSA-N 1-ethenyl-2-methylimidazole Chemical compound CC1=NC=CN1C=C BDHGFCVQWMDIQX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- QPAWHGVDCJWYRJ-UHFFFAOYSA-N 1-hydroxypyrrolidine-2,5-dione;trifluoromethanesulfonic acid Chemical compound ON1C(=O)CCC1=O.OS(=O)(=O)C(F)(F)F QPAWHGVDCJWYRJ-UHFFFAOYSA-N 0.000 description 1
- RMZSRCTZBXAEFD-UHFFFAOYSA-N 1-isocyanatobut-3-en-2-one Chemical compound C=CC(=O)CN=C=O RMZSRCTZBXAEFD-UHFFFAOYSA-N 0.000 description 1
- OEYNWAWWSZUGDU-UHFFFAOYSA-N 1-methoxypropane-1,2-diol Chemical compound COC(O)C(C)O OEYNWAWWSZUGDU-UHFFFAOYSA-N 0.000 description 1
- ILMDJKLKHFJJMZ-UHFFFAOYSA-N 1-phenyl-2-(2,4,6-trimethylphenyl)sulfonylethanone Chemical compound CC1=CC(C)=CC(C)=C1S(=O)(=O)CC(=O)C1=CC=CC=C1 ILMDJKLKHFJJMZ-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- CZZVAVMGKRNEAT-UHFFFAOYSA-N 2,2-dimethylpropane-1,3-diol;3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)CO.OCC(C)(C)C(O)=O CZZVAVMGKRNEAT-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
- UECGJSXCVLTIMQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)cyclohexane-1-carboxylic acid Chemical compound OC(=O)C1CCCCC1C(=O)OCCOC(=O)C=C UECGJSXCVLTIMQ-UHFFFAOYSA-N 0.000 description 1
- IEQWWMKDFZUMMU-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethyl)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)CCOC(=O)C=C IEQWWMKDFZUMMU-UHFFFAOYSA-N 0.000 description 1
- RTOMIYMZGQUKIW-UHFFFAOYSA-N 2-(2-prop-2-enoyloxypropoxycarbonyl)benzoic acid Chemical compound C=CC(=O)OC(C)COC(=O)C1=CC=CC=C1C(O)=O RTOMIYMZGQUKIW-UHFFFAOYSA-N 0.000 description 1
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical class ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- XXHDHAPOSIFMIG-UHFFFAOYSA-N 2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]-1-phenoxyethanol Chemical compound OCCOCCOCCOCC(O)OC1=CC=CC=C1 XXHDHAPOSIFMIG-UHFFFAOYSA-N 0.000 description 1
- OBFOSROPNNOGQF-UHFFFAOYSA-N 2-[2-[2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]-1-phenoxyethanol Chemical compound OCCOCCOCCOCCOCCOCC(O)OC1=CC=CC=C1 OBFOSROPNNOGQF-UHFFFAOYSA-N 0.000 description 1
- SIJGDRZLFVNFOL-UHFFFAOYSA-N 2-[2-[4-[1,1-bis(4-hydroxyphenyl)ethyl]phenyl]propan-2-yl]phenol Chemical compound C=1C=CC=C(O)C=1C(C)(C)C(C=C1)=CC=C1C(C)(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 SIJGDRZLFVNFOL-UHFFFAOYSA-N 0.000 description 1
- IJPCTIRMDTVCSZ-UHFFFAOYSA-M 2-[4-(thiolan-1-ium-1-yl)naphthalen-1-yl]oxyoxane;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1CCC[S+]1C(C1=CC=CC=C11)=CC=C1OC1OCCCC1 IJPCTIRMDTVCSZ-UHFFFAOYSA-M 0.000 description 1
- FTCSJQPCZNNGQV-UHFFFAOYSA-M 2-[4-(thiolan-1-ium-1-yl)naphthalen-1-yl]oxyoxolane;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1CCC[S+]1C(C1=CC=CC=C11)=CC=C1OC1OCCC1 FTCSJQPCZNNGQV-UHFFFAOYSA-M 0.000 description 1
- BQBSIHIZDSHADD-UHFFFAOYSA-N 2-ethenyl-4,5-dihydro-1,3-oxazole Chemical compound C=CC1=NCCO1 BQBSIHIZDSHADD-UHFFFAOYSA-N 0.000 description 1
- AUWPYLDHGXPITC-UHFFFAOYSA-N 2-hydroxyethyl 2-prop-2-enoylperoxycarbonylbenzoate Chemical compound C(C=1C(C(=O)OOC(C=C)=O)=CC=CC=1)(=O)OCCO AUWPYLDHGXPITC-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- AGNTUZCMJBTHOG-UHFFFAOYSA-N 3-[3-(2,3-dihydroxypropoxy)-2-hydroxypropoxy]propane-1,2-diol Chemical compound OCC(O)COCC(O)COCC(O)CO AGNTUZCMJBTHOG-UHFFFAOYSA-N 0.000 description 1
- JFUOAGBSDGCVES-UHFFFAOYSA-N 3-but-2-enyl-4-methylpyrrolidine-2,5-dione Chemical compound CC=CCC1C(C)C(=O)NC1=O JFUOAGBSDGCVES-UHFFFAOYSA-N 0.000 description 1
- KEJDZOJSZYVXBU-UHFFFAOYSA-N 3-diazo-2,2,4,4-tetramethylpentane Chemical class CC(C)(C)C(=[N+]=[N-])C(C)(C)C KEJDZOJSZYVXBU-UHFFFAOYSA-N 0.000 description 1
- MXRGSJAOLKBZLU-UHFFFAOYSA-N 3-ethenylazepan-2-one Chemical compound C=CC1CCCCNC1=O MXRGSJAOLKBZLU-UHFFFAOYSA-N 0.000 description 1
- VTLKLYJOUVMHIY-UHFFFAOYSA-N 3-ethenylpenta-1,3-diene;urea Chemical group NC(N)=O.CC=C(C=C)C=C VTLKLYJOUVMHIY-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical class OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- JNAUABNHSLFOCQ-UHFFFAOYSA-N 4-(thiolan-1-ium-1-yl)naphthalen-1-ol;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(O)=CC=C1[S+]1CCCC1 JNAUABNHSLFOCQ-UHFFFAOYSA-N 0.000 description 1
- RSSGMIIGVQRGDS-UHFFFAOYSA-N 4-[(4-hydroxyphenyl)-phenylmethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=CC=C1 RSSGMIIGVQRGDS-UHFFFAOYSA-N 0.000 description 1
- BRPSWMCDEYMRPE-UHFFFAOYSA-N 4-[1,1-bis(4-hydroxyphenyl)ethyl]phenol Chemical compound C=1C=C(O)C=CC=1C(C=1C=CC(O)=CC=1)(C)C1=CC=C(O)C=C1 BRPSWMCDEYMRPE-UHFFFAOYSA-N 0.000 description 1
- BOHACIVBOZRDLK-UHFFFAOYSA-N 4-[1-(2,4-dihydroxyphenyl)ethyl]benzene-1,3-diol Chemical compound C=1C=C(O)C=C(O)C=1C(C)C1=CC=C(O)C=C1O BOHACIVBOZRDLK-UHFFFAOYSA-N 0.000 description 1
- NYIWTDSCYULDTJ-UHFFFAOYSA-N 4-[2-(2,3,4-trihydroxyphenyl)propan-2-yl]benzene-1,2,3-triol Chemical compound C=1C=C(O)C(O)=C(O)C=1C(C)(C)C1=CC=C(O)C(O)=C1O NYIWTDSCYULDTJ-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- HYUSETYODGMBFI-UHFFFAOYSA-N 4-isocyanato-4-methylhex-1-en-3-one Chemical compound C(C=C)(=O)C(C)(CC)N=C=O HYUSETYODGMBFI-UHFFFAOYSA-N 0.000 description 1
- XGEMPCIUTFCQPD-UHFFFAOYSA-N 4-isocyanato-4-methylpent-1-en-3-one Chemical compound C(C=C)(=O)C(C)(C)N=C=O XGEMPCIUTFCQPD-UHFFFAOYSA-N 0.000 description 1
- JAGRUUPXPPLSRX-UHFFFAOYSA-N 4-prop-1-en-2-ylphenol Chemical compound CC(=C)C1=CC=C(O)C=C1 JAGRUUPXPPLSRX-UHFFFAOYSA-N 0.000 description 1
- FOMNBFSRHKJALH-UHFFFAOYSA-N 5-isocyanatopent-1-en-3-one Chemical compound C=CC(=O)CCN=C=O FOMNBFSRHKJALH-UHFFFAOYSA-N 0.000 description 1
- RGBFTXJNZJXFEO-UHFFFAOYSA-N 6-isocyanatohex-1-en-3-one Chemical compound C=CC(=O)CCCN=C=O RGBFTXJNZJXFEO-UHFFFAOYSA-N 0.000 description 1
- GKUZJMPJPBUIRD-UHFFFAOYSA-N 7-isocyanatohept-1-en-3-one Chemical compound C=CC(=O)CCCCN=C=O GKUZJMPJPBUIRD-UHFFFAOYSA-N 0.000 description 1
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 101100434207 Arabidopsis thaliana ACT8 gene Proteins 0.000 description 1
- VOWWYDCFAISREI-UHFFFAOYSA-N Bisphenol AP Chemical compound C=1C=C(O)C=CC=1C(C=1C=CC(O)=CC=1)(C)C1=CC=CC=C1 VOWWYDCFAISREI-UHFFFAOYSA-N 0.000 description 1
- IESAGUUYKYZPGA-UHFFFAOYSA-N C(C(=C)C)(=O)O[Si](OOC(C(=C)C)=O)(C)C Chemical compound C(C(=C)C)(=O)O[Si](OOC(C(=C)C)=O)(C)C IESAGUUYKYZPGA-UHFFFAOYSA-N 0.000 description 1
- FKTXMKOIURBZLK-UHFFFAOYSA-N C(C=C)(=O)CC(C)(C)N=C=O Chemical compound C(C=C)(=O)CC(C)(C)N=C=O FKTXMKOIURBZLK-UHFFFAOYSA-N 0.000 description 1
- WMONOXOCMIPNNU-UHFFFAOYSA-N C=CC(=O)OCCCC(O)COC(=O)C1=CC=CC=C1C(O)=O Chemical compound C=CC(=O)OCCCC(O)COC(=O)C1=CC=CC=C1C(O)=O WMONOXOCMIPNNU-UHFFFAOYSA-N 0.000 description 1
- HALAJFCZGBHGSN-UHFFFAOYSA-N C=COCCOC(CC12CCCC1C3CCC2C3)(C(F)(F)F)C(F)(F)F Chemical compound C=COCCOC(CC12CCCC1C3CCC2C3)(C(F)(F)F)C(F)(F)F HALAJFCZGBHGSN-UHFFFAOYSA-N 0.000 description 1
- RISJJILPNLWEMZ-UHFFFAOYSA-N CC1=CC=C(C=C1)S(=O)(=O)ON1C(=O)C2C3C=CC(C2C1=O)O3.CC3=CC=C(C=C3)S(=O)(=O)ON3C(=O)C1C2C=CC(C1C3=O)C2 Chemical compound CC1=CC=C(C=C1)S(=O)(=O)ON1C(=O)C2C3C=CC(C2C1=O)O3.CC3=CC=C(C=C3)S(=O)(=O)ON3C(=O)C1C2C=CC(C1C3=O)C2 RISJJILPNLWEMZ-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 235000010919 Copernicia prunifera Nutrition 0.000 description 1
- 244000180278 Copernicia prunifera Species 0.000 description 1
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- XVGRUUCGRGSBRJ-UHFFFAOYSA-N FC(C(CC1C2CC3CC(CC1C3)C2)(OCCOC=C)C(F)(F)F)(F)F Chemical compound FC(C(CC1C2CC3CC(CC1C3)C2)(OCCOC=C)C(F)(F)F)(F)F XVGRUUCGRGSBRJ-UHFFFAOYSA-N 0.000 description 1
- KTHLRDDWHAIKQJ-UHFFFAOYSA-N FC(C(CC1C2CCC(C1)C2)(OCCOC=C)C(F)(F)F)(F)F Chemical compound FC(C(CC1C2CCC(C1)C2)(OCCOC=C)C(F)(F)F)(F)F KTHLRDDWHAIKQJ-UHFFFAOYSA-N 0.000 description 1
- GYGJWJZETQQYDC-UHFFFAOYSA-N FC(S(=O)(=O)C12C(C(C(C=C1)C2)S(=O)(=O)O)S(=O)(=O)O)(F)F Chemical class FC(S(=O)(=O)C12C(C(C(C=C1)C2)S(=O)(=O)O)S(=O)(=O)O)(F)F GYGJWJZETQQYDC-UHFFFAOYSA-N 0.000 description 1
- NMEXJGCBDLPOCW-UHFFFAOYSA-L FC(S(=O)(=O)[O-])(F)F.C(#N)C1=CC=C(C2=CC=CC=C12)[S+](C)C.FC(S(=O)(=O)[O-])(F)F.C1(=CC=CC2=CC=CC=C12)[S+](CC)CC Chemical compound FC(S(=O)(=O)[O-])(F)F.C(#N)C1=CC=C(C2=CC=CC=C12)[S+](C)C.FC(S(=O)(=O)[O-])(F)F.C1(=CC=CC2=CC=CC=C12)[S+](CC)CC NMEXJGCBDLPOCW-UHFFFAOYSA-L 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- WLLGXSLBOPFWQV-UHFFFAOYSA-N MGK 264 Chemical compound C1=CC2CC1C1C2C(=O)N(CC(CC)CCCC)C1=O WLLGXSLBOPFWQV-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- DHRYUWTZILQCSH-UHFFFAOYSA-N N#CCC1C=CC(OC)=CC1=NOS(=O)(=O)C1=CC=C(C)C=C1 Chemical compound N#CCC1C=CC(OC)=CC1=NOS(=O)(=O)C1=CC=C(C)C=C1 DHRYUWTZILQCSH-UHFFFAOYSA-N 0.000 description 1
- YCZVNBQAIZENBU-UHFFFAOYSA-N NC(=O)N.C(=C)C=CC=C Chemical compound NC(=O)N.C(=C)C=CC=C YCZVNBQAIZENBU-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical class CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- YYABZERKLBFFCO-UHFFFAOYSA-N [[4-[cyano(phenyl)methylidene]cyclohexa-2,5-dien-1-ylidene]amino] methanesulfonate Chemical compound C1=CC(=NOS(=O)(=O)C)C=CC1=C(C#N)C1=CC=CC=C1 YYABZERKLBFFCO-UHFFFAOYSA-N 0.000 description 1
- WIPZPGYFTHAHEG-UHFFFAOYSA-N [[5-[(2-chlorophenyl)-cyanomethylidene]thiophen-2-ylidene]amino] methanesulfonate Chemical compound C1=CC(=NOS(=O)(=O)C)SC1=C(C#N)C1=CC=CC=C1Cl WIPZPGYFTHAHEG-UHFFFAOYSA-N 0.000 description 1
- WOTRZAJOLWWZNI-UHFFFAOYSA-N [[5-[cyano(phenyl)methylidene]thiophen-2-ylidene]amino] methanesulfonate Chemical compound C1=CC(=NOS(=O)(=O)C)SC1=C(C#N)C1=CC=CC=C1 WOTRZAJOLWWZNI-UHFFFAOYSA-N 0.000 description 1
- GLCCGSHEKBXUGH-UHFFFAOYSA-N [[5-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON=C(S1)C=CC1=C(C#N)C1=CC=CC=C1C GLCCGSHEKBXUGH-UHFFFAOYSA-N 0.000 description 1
- QGJFAQNEJNPWEH-UHFFFAOYSA-N [[5-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] methanesulfonate Chemical compound CC1=CC=CC=C1C(C#N)=C1C=CC(=NOS(C)(=O)=O)S1 QGJFAQNEJNPWEH-UHFFFAOYSA-N 0.000 description 1
- DYRWDFJPJBSKCH-UHFFFAOYSA-N [[6-(cyanomethyl)cyclohexa-2,4-dien-1-ylidene]amino] 4-methylbenzenesulfonate Chemical compound C1(=CC=C(C=C1)S(=O)(=O)ON=C1C(CC#N)C=CC=C1)C DYRWDFJPJBSKCH-UHFFFAOYSA-N 0.000 description 1
- QFKJMDYQKVPGNM-UHFFFAOYSA-N [benzenesulfonyl(diazo)methyl]sulfonylbenzene Chemical compound C=1C=CC=CC=1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=CC=C1 QFKJMDYQKVPGNM-UHFFFAOYSA-N 0.000 description 1
- NVJPBZCLWGTJKD-UHFFFAOYSA-N [bis(4-tert-butylphenyl)-lambda3-iodanyl] trifluoromethanesulfonate Chemical compound CC(C)(C)c1ccc(cc1)[I](OS(=O)(=O)C(F)(F)F)c1ccc(cc1)C(C)(C)C NVJPBZCLWGTJKD-UHFFFAOYSA-N 0.000 description 1
- GLGXSTXZLFQYKJ-UHFFFAOYSA-N [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 GLGXSTXZLFQYKJ-UHFFFAOYSA-N 0.000 description 1
- FDTRPMUFAMGRNM-UHFFFAOYSA-N [diazo(trifluoromethylsulfonyl)methyl]sulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(F)(F)F FDTRPMUFAMGRNM-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- NAHVPECOHACOMR-UHFFFAOYSA-N benzyl-(4-hydroxyphenyl)-methylsulfanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C=1C=C(O)C=CC=1[S+](C)CC1=CC=CC=C1 NAHVPECOHACOMR-UHFFFAOYSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- UCMYAOIWHWZZFL-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium dodecyl benzenesulfonate Chemical compound C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1.CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 UCMYAOIWHWZZFL-UHFFFAOYSA-N 0.000 description 1
- DJBAOXYQCAKLPH-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DJBAOXYQCAKLPH-UHFFFAOYSA-M 0.000 description 1
- VZMRBDFTANFJCG-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 VZMRBDFTANFJCG-UHFFFAOYSA-M 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- KQBTUOVABZLXGP-UHFFFAOYSA-N butane-1,4-diol;ethane-1,2-diol Chemical compound OCCO.OCCCCO KQBTUOVABZLXGP-UHFFFAOYSA-N 0.000 description 1
- DDPAAMHROJBRGE-UHFFFAOYSA-N butane-1,4-diol;propane-1,2-diol Chemical compound CC(O)CO.OCCCCO DDPAAMHROJBRGE-UHFFFAOYSA-N 0.000 description 1
- 125000006226 butoxyethyl group Chemical group 0.000 description 1
- SGGONNJJYBSMKN-UHFFFAOYSA-M butyl [4-(thiolan-1-ium-1-yl)naphthalen-1-yl] carbonate;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC(=O)OCCCC)=CC=C1[S+]1CCCC1 SGGONNJJYBSMKN-UHFFFAOYSA-M 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- CUUCPVNNBQGBRT-UHFFFAOYSA-M cyclohexyl-methyl-(2-oxocyclohexyl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1CCCC(=O)C1[S+](C)C1CCCCC1 CUUCPVNNBQGBRT-UHFFFAOYSA-M 0.000 description 1
- CSYSRRCOBYEGPI-UHFFFAOYSA-N diazo(sulfonyl)methane Chemical compound [N-]=[N+]=C=S(=O)=O CSYSRRCOBYEGPI-UHFFFAOYSA-N 0.000 description 1
- XXTZHYXQVWRADW-UHFFFAOYSA-N diazomethanone Chemical class [N]N=C=O XXTZHYXQVWRADW-UHFFFAOYSA-N 0.000 description 1
- SMFPOMMGLGQVLD-UHFFFAOYSA-M dicyclohexyl-(2-oxocyclohexyl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.O=C1CCCCC1[S+](C1CCCCC1)C1CCCCC1 SMFPOMMGLGQVLD-UHFFFAOYSA-M 0.000 description 1
- UPUDGMOUELFPAC-UHFFFAOYSA-N diethyl-(4-hydroxynaphthalen-1-yl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](CC)CC)=CC=C(O)C2=C1 UPUDGMOUELFPAC-UHFFFAOYSA-N 0.000 description 1
- QLSKPBSBKMPJFH-UHFFFAOYSA-M diethyl-(4-methylnaphthalen-1-yl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](CC)CC)=CC=C(C)C2=C1 QLSKPBSBKMPJFH-UHFFFAOYSA-M 0.000 description 1
- OGTOIEVNWNMXCG-UHFFFAOYSA-N diethyl-(4-nitronaphthalen-1-yl)sulfanium Chemical compound C1=CC=C2C([S+](CC)CC)=CC=C([N+]([O-])=O)C2=C1 OGTOIEVNWNMXCG-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- YANSZSFMGHMKQD-UHFFFAOYSA-M dimethyl(naphthalen-1-yl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](C)C)=CC=CC2=C1 YANSZSFMGHMKQD-UHFFFAOYSA-M 0.000 description 1
- LNKRVKQAWQEHPY-UHFFFAOYSA-M dimethyl-(2-oxocyclohexyl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C[S+](C)C1CCCCC1=O LNKRVKQAWQEHPY-UHFFFAOYSA-M 0.000 description 1
- GJMJYFYGZHXAJI-UHFFFAOYSA-M dimethyl-(4-methylnaphthalen-1-yl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](C)C)=CC=C(C)C2=C1 GJMJYFYGZHXAJI-UHFFFAOYSA-M 0.000 description 1
- YVRBEBITANJQTN-UHFFFAOYSA-M dimethyl-(4-nitronaphthalen-1-yl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=C2C([S+](C)C)=CC=C([N+]([O-])=O)C2=C1 YVRBEBITANJQTN-UHFFFAOYSA-M 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- ORPDKMPYOLFUBA-UHFFFAOYSA-M diphenyliodanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ORPDKMPYOLFUBA-UHFFFAOYSA-M 0.000 description 1
- UUMAFLKWOXKEID-UHFFFAOYSA-N diphenyliodanium;dodecyl benzenesulfonate Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 UUMAFLKWOXKEID-UHFFFAOYSA-N 0.000 description 1
- UYCKKJWMEXKVCE-UHFFFAOYSA-M diphenyliodanium;naphthalene-1-sulfonate Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 UYCKKJWMEXKVCE-UHFFFAOYSA-M 0.000 description 1
- OVAZMTZNAIEREQ-UHFFFAOYSA-M diphenyliodanium;pyrene-1-sulfonate Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.C1=C2C(S(=O)(=O)[O-])=CC=C(C=C3)C2=C2C3=CC=CC2=C1 OVAZMTZNAIEREQ-UHFFFAOYSA-M 0.000 description 1
- SBQIJPBUMNWUKN-UHFFFAOYSA-M diphenyliodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C=1C=CC=CC=1[I+]C1=CC=CC=C1 SBQIJPBUMNWUKN-UHFFFAOYSA-M 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- ABAQRSKVXZGOKY-UHFFFAOYSA-N dodecyl benzenesulfonate triphenylsulfanium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1.CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 ABAQRSKVXZGOKY-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SSXKOJOYOWVNRL-UHFFFAOYSA-M ethyl [4-(thiolan-1-ium-1-yl)naphthalen-1-yl] carbonate;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC(=O)OCC)=CC=C1[S+]1CCCC1 SSXKOJOYOWVNRL-UHFFFAOYSA-M 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N methanesulfonic acid Substances CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WEBFLHSTQYJFHU-UHFFFAOYSA-M methyl [4-(thiolan-1-ium-1-yl)naphthalen-1-yl] carbonate;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC(=O)OC)=CC=C1[S+]1CCCC1 WEBFLHSTQYJFHU-UHFFFAOYSA-M 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- IQTRBJRORQFYLN-UHFFFAOYSA-N molport-019-739-976 Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON1C(=O)C2C(C=C3)CC3C2C1=O IQTRBJRORQFYLN-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- HNHVTXYLRVGMHD-UHFFFAOYSA-N n-butyl isocyanate Chemical compound CCCCN=C=O HNHVTXYLRVGMHD-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- LABYRQOOPPZWDG-UHFFFAOYSA-M naphthalene-1-sulfonate;triphenylsulfanium Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 LABYRQOOPPZWDG-UHFFFAOYSA-M 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003566 oxetanyl group Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000005459 perfluorocyclohexyl group Chemical group 0.000 description 1
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- WZESLRDFSNLECD-UHFFFAOYSA-N phenyl prop-2-eneperoxoate Chemical class C=CC(=O)OOC1=CC=CC=C1 WZESLRDFSNLECD-UHFFFAOYSA-N 0.000 description 1
- MFTPIWFEXJRWQY-UHFFFAOYSA-N phosphoric acid prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OP(O)(O)=O MFTPIWFEXJRWQY-UHFFFAOYSA-N 0.000 description 1
- WDHYRUBXLGOLKR-UHFFFAOYSA-N phosphoric acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OP(O)(O)=O WDHYRUBXLGOLKR-UHFFFAOYSA-N 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- WJOIDZZAGJDMRF-UHFFFAOYSA-N propane-1-sulfonic acid [[2,2,2-trifluoro-1-[4-[3-[4-[N-hydroxy-C-(trifluoromethyl)carbonimidoyl]phenoxy]propoxy]phenyl]ethylidene]amino] propane-1-sulfonate Chemical compound CCCS(O)(=O)=O.C1=CC(C(=NOS(=O)(=O)CCC)C(F)(F)F)=CC=C1OCCCOC1=CC=C(C(=NO)C(F)(F)F)C=C1 WJOIDZZAGJDMRF-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- AEQFSUDEHCCHBT-UHFFFAOYSA-M sodium valproate Chemical compound [Na+].CCCC(C([O-])=O)CCC AEQFSUDEHCCHBT-UHFFFAOYSA-M 0.000 description 1
- 238000003836 solid-state method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- OQVHGJGFGGDKAF-UHFFFAOYSA-N sulfosulfonylbenzene Chemical class OS(=O)(=O)S(=O)(=O)C1=CC=CC=C1 OQVHGJGFGGDKAF-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- UACVJSDAGHJPNP-UHFFFAOYSA-M tert-butyl [4-(thiolan-1-ium-1-yl)naphthalen-1-yl] carbonate;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OC(=O)OC(C)(C)C)=CC=C1[S+]1CCCC1 UACVJSDAGHJPNP-UHFFFAOYSA-M 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- UWIVZLWKBOZJFG-UHFFFAOYSA-N thiolan-1-ium trifluoromethanesulfonate Chemical compound C1CC[SH+]C1.[O-]S(=O)(=O)C(F)(F)F UWIVZLWKBOZJFG-UHFFFAOYSA-N 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- 229940102566 valproate Drugs 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本発明のパターン形成方法は、(1)被加工基板の表面を電離線照射処理し、電離線照射処理面を有する電離線照射処理基板を形成する工程(以下、「電離線照射処理工程」という)と、(2)電離線照射処理面上に、光又は熱の作用により硬化する硬化性組成物からなる被形状転写層を形成する工程(以下、「被形状転写層形成工程」という)と、(3)被形状転写層にスタンパを圧接する工程(以下、「圧接工程」という)と、(4)スタンパを圧接したまま被形状転写層を露光する工程(以下、「露光工程」という)と、(5)スタンパを被形状転写層から剥離して、レジストパターンが形成された基板を得る工程(以下、「剥離工程」という)と、を含む方法であり、剥離工程の後に、エッチングを行う工程(6)(以下、「エッチング工程」ともいう)を更に含む方法であることが好ましい。本発明のパターン形成方法により基板上にレジストパターンを形成することで、パターンの高さのバラツキを抑制することができる。
電離線照射処理工程は、被加工基板の表面を電離線照射処理し、電離線照射処理面を有する電離線照射処理基板を形成する工程である。被加工基板の表面を電離線照射処理することにより、基板面内で均一な表面状態を有する基板が形成できるため、基板に形成されるパターンの高さのバラツキを抑制することができる。
被加工基板としては、通常、シリコンウェハが用いられるが、その他、アルミニウム、チタン−タングステン合金、アルミニウム−ケイ素合金、アルミニウム−銅−ケイ素合金、酸化ケイ素、窒化ケイ素等の半導体デバイス用基板として知られているものの中から任意に選んで用いることができる。なお、被加工基板の電離線照射処理を行う表面には、ポリシロキサンからなる下層膜が形成されていることが好ましい。このような下層膜を形成することにより、電離線照射処理による効果を向上することができる。
本発明における電離線としては、被加工基板を均一な表面状態にするものであり、具体的には、コロナ放電である。コロナ放電処理は、特に限定されなく、スパークギャップ方式、真空管方式、ソリッドステート方式等を利用する、従来公知の装置を用いて行うことができる。このような装置としては、例えば、高周波電源AGF−012(春日電機社製)がある。コロナ放電処理量は、100W・min/m2以上であり、125W・min/m2以上であることが更に好ましい。コロナ放電処理量が100W・min/m2未満であると、基板に形成されるレジストパターンの高さのバラツキの抑制が不十分な場合がある。なお、コロナ放電処理量は下記式(1)から算出することができる。
被形状転写層形成工程は、電離線照射処理工程で形成した電離線照射処理基板の電離線照射処理面上に、光又は熱の作用により硬化する硬化性組成物からなる被形状転写層を形成する工程である。図1は、電離線照射処理基板上に被形状転写層を形成した後の状態の一例を示す模式図である。被形状転写層形成工程は、図1に示すように、電離線照射処理基板1の電離線照射処理面上に被形状転写層2を形成する工程である。
硬化性組成物(1)に含有される(A)少なくとも1つの反応性基を有し、フッ素原子を含有する化合物として、具体的には、トリフルオロメチル(メタ)アクリレート、2,2,2−トリフルオロエチル(メタ)アクリレート、パーフルオロエチル(メタ)アクリレート、パーフルオロn−プロピル(メタ)アクリレート、パーフルオロi−プロピル(メタ)アクリレート、パーフルオロn−ブチル(メタ)アクリレート、パーフルオロi−ブチル(メタ)アクリレート、パーフルオロt−ブチル(メタ)アクリレート、パーフルオロシクロヘキシル(メタ)アクリレート、2−(1,1,1,3,3,3−ヘキサフルオロ)プロピル(メタ)アクリレート、1−(2,2,3,3,4,4,5,5−オクタフルオロ)ペンチル(メタ)アクリレート、1−(2,2,3,3,4,4,5,5−オクタフルオロ)ヘキシル(メタ)アクリレート、パーフルオロシクロヘキシルメチル(メタ)アクリレート、1−(2,2,3,3,3−ペンタフルオロ)プロピル(メタ)アクリレート、1−(2,2,3,3,4,4,4−ヘプタフルオロ)ペンチル(メタ)アクリレート、1−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロ)デシル(メタ)アクリレート、1−(5−トリフルオロメチル−3,3,4,4,5,6,6,6−オクタフルオロ)ヘキシル(メタ)アクリレート等を挙げることができる。
硬化性組成物(2)に含有される25℃、1atmの条件下において、光又は熱により気体を発生する気体発生剤(A)として、具体的には、式(3)で表される化合物や、式(4)で表される化合物を挙げることができる。
硬化性組成物(3)に含有される一般式(2)で表される置換基を有する化合物(A)として、具体的には、2−(3,3,3−トリフルオロ−2−(トリフルオロメチル)−2−(2−(ビニロキシ)エトキシ)プロピル)ビシクロ[2.2.1]ヘプタン、2−(3,3,3−トリフルオロ−2−(トリフルオロメチル)−2−(2−(ビニロキシ)エトキシ)プロピル)アダマンタン、2−(3,3,3−トリフルオロ−2−(トリフルオロメチル)−2−(2−(ビニロキシ)エトキシ)プロピル)トリシクロ[5.2.1.02,6]デカン、2−(3,3,3−トリフルオロ−2−(トリフルオロメチル)−2−(2−(ビニロキシ)エトキシ)プロピル)テトラシクロ[6.2.1.13,6.02,7]ドデカン等を挙げることができる。
圧接工程は、被形状転写層にスタンパを圧接する工程である。図2は、被形状転写層にスタンパを圧接している状態の一例を示す模式図である。図2に示すように、被形状転写層形成工程で形成した被形状転写層2にスタンパ3を圧接することで、被形状転写層2中に、スタンパ3の凹凸パターンが形成される。
露光工程は、スタンパを圧接したまま被形状転写層を露光する工程である。図3は、スタンパを圧接したまま被形状転写層を露光している状態の一例を示す模式図である。図3に示すように、被形状転写層3を露光することにより、スタンパ2の凹凸パターンが被形状転写層3に転写される。このように凹凸パターンが転写されることで、例えば、LSI、システムLSI、DRAM、SDRAM、RDRAM、D−RDRAM等の半導体素子の層間絶縁膜用膜、半導体素子製造時におけるレジスト膜等として利用することができる。
剥離工程は、スタンパ3を被形状転写層2から剥離する工程である。図4は、スタンパを形状転写層から剥離した後の状態の一例を示す模式図である。剥離工程はどのようにして行ってもよく、剥離に際する各種条件等も特に限定されない。即ち、例えば、電離線照射処理基板1を固定してスタンパを電離線照射処理基板1から遠ざかるように移動させて剥離してもよく、スタンパを固定して電離線照射処理基板1をスタンパから遠ざかるように移動させて剥離してもよく、これらの両方を逆方向へ引っ張って剥離してもよい。
エッチング工程は、形状転写層の残部の凹部をエッチングにより取り除く工程である。図5は、エッチングを行った後の状態の一例を示す模式図である。図5に示すように、エッチング処理を行うことで、形状転写層のパターン形状のうち、不要な部分を取り除き、所望のレジストパターン10を形成することができる。
本発明の半導体素子は、「I.パターン形成方法」に記載のパターン形成方法によって得られるレジストパターンが形成された基板を用いたものであり、基板上に形成するレジストパターンの高さのバラツキが改善されているので、歩留まりを抑制することができる。
1,9−ノナンジオールジアクリレート(下記式(5)で表される化合物)50部、トリシクロデカンジメタノールアクリレート(下記式(6)で表される化合物)10部、イソボルニルアクリレート(下記式(7)で表される化合物)40部、2−(ジメチルアミノ)−2−(4−メチルベンジル)−1−(4−モルフォリン−4−イル−フェニル)−ブタン−1−オン(下記式(8)で表される化合物)7.5部、2−メチル−1−[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン(下記式(9)で表される化合物)7.5部を混合することで、硬化性組成物を調製した。なお、調製した硬化性組成物の25℃における粘度は、12mPa・sであった。
コータ/デベロッパ(商品名「CLEAN TRACK ACT8」、東京エレクトロン社製)を用いて、8インチシリコンウエハの表面に、膜厚300nmの有機下層膜(商品名「NFC CT08」、JSR社製)を形成した。次いで、膜厚45nmの無機中間膜(商品名「NFC SOG08」、JSR社製)を形成し、コロナ放電処理装置(商品名「高周波電源AGF−012」、春日電機社製)を用いて、400W・min/m2のコロナ放電処理量で照射し、その後、四分割してコロナ処理基板(電離線照射処理基板)とした。その後、調製した硬化性組成物をコロナ処理基板のコロナ放電面(電離線照射処理面)の中心に約50μLスポットし、簡易インプリント装置(EUN−4200、エンジニアリングシステム社製)のワークステージに設置した。一方、離型剤(商品名「HD−1100Z」、ダイキン化成社製)を所定の方法であらかじめ塗布した石英テンプレート(NIM−PH350、NTT−ATN社製)を、シリコーンゴム(厚さ0.2mm)を接着層として、簡易インプリント装置の石英製露光ヘッドへ貼り付けた。次いで、簡易インプリント装置の圧力を0.2MPaとした後、露光ヘッドを下降し、テンプレートとコロナ処理基板とを、硬化性組成物を介して密着させた後、UV露光を15秒間実施した。15秒後に露光ステージを上昇し、テンプレートを硬化した形状転写層から剥離し、レジストパターンを形成した。形成したレジストパターンのパターンの高さのバラツキの評価は「きわめて良好」であった。
コロナ放電処理量を表1に記載した処理量としたこと以外は実施例1と同様にしてレジストパターンを形成した。形成したレジストパターンのパターンの高さのバラツキの評価を表1に併せて記載する。
Claims (4)
- (1)被加工基板の表面を電離線照射処理し、電離線照射処理面を有する電離線照射処理基板を形成する工程と、
(2)前記電離線照射処理面上に、光又は熱の作用により硬化する硬化性組成物からなる被形状転写層を形成する工程と、
(3)前記被形状転写層にスタンパを圧接する工程と、
(4)前記スタンパを圧接したまま前記被形状転写層を露光する工程と、
(5)前記スタンパを前記被形状転写層から剥離して、レジストパターンが形成された基板を得る工程と、を含み、
前記電離線照射処理がコロナ放電処理であり、前記被加工基板の前記表面を、100W・min/m 2 以上のコロナ放電処理量でコロナ放電処理するパターン形成方法。 - 前記被加工基板の前記表面に、ポリシロキサンからなる下層膜が形成されている請求項1に記載のパターン形成方法。
- 前記硬化性組成物が、光硬化性組成物である請求項1又は2に記載のパターン形成方法。
- 請求項1〜3のいずれか一項に記載のパターン形成方法によって得られるレジストパターンが形成された基板を用いた半導体素子。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009220832A JP5499596B2 (ja) | 2009-09-25 | 2009-09-25 | パターン形成方法及び半導体素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009220832A JP5499596B2 (ja) | 2009-09-25 | 2009-09-25 | パターン形成方法及び半導体素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011071299A JP2011071299A (ja) | 2011-04-07 |
JP5499596B2 true JP5499596B2 (ja) | 2014-05-21 |
Family
ID=44016288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009220832A Active JP5499596B2 (ja) | 2009-09-25 | 2009-09-25 | パターン形成方法及び半導体素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5499596B2 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6012344B2 (ja) * | 2011-10-24 | 2016-10-25 | キヤノン株式会社 | 膜の形成方法 |
JP6278645B2 (ja) * | 2012-09-24 | 2018-02-14 | キヤノン株式会社 | 光硬化性組成物及びこれを用いた膜の製造方法 |
TWI589994B (zh) * | 2012-10-09 | 2017-07-01 | 佳能股份有限公司 | 光可固化的組成物及製造膜的方法 |
JP6305058B2 (ja) * | 2013-03-05 | 2018-04-04 | キヤノン株式会社 | 感光性ガス発生剤、光硬化性組成物 |
US20170066208A1 (en) | 2015-09-08 | 2017-03-09 | Canon Kabushiki Kaisha | Substrate pretreatment for reducing fill time in nanoimprint lithography |
US10488753B2 (en) | 2015-09-08 | 2019-11-26 | Canon Kabushiki Kaisha | Substrate pretreatment and etch uniformity in nanoimprint lithography |
CN108026330B (zh) * | 2015-09-08 | 2020-12-22 | 佳能株式会社 | 在纳米压印光刻中的基材预处理和蚀刻均匀性 |
US10620539B2 (en) | 2016-03-31 | 2020-04-14 | Canon Kabushiki Kaisha | Curing substrate pretreatment compositions in nanoimprint lithography |
US10509313B2 (en) | 2016-06-28 | 2019-12-17 | Canon Kabushiki Kaisha | Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography |
US10317793B2 (en) | 2017-03-03 | 2019-06-11 | Canon Kabushiki Kaisha | Substrate pretreatment compositions for nanoimprint lithography |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6386434A (ja) * | 1986-09-30 | 1988-04-16 | Toshiba Corp | レジストパタ−ン形成方法 |
JP2604691B2 (ja) * | 1987-08-24 | 1997-04-30 | 大日本印刷株式会社 | 艶消フイルムの製造方法 |
JP3608944B2 (ja) * | 1998-06-16 | 2005-01-12 | 株式会社ユポ・コーポレーション | 熱可塑性樹脂フィルムの表面処理方法 |
JP2004103872A (ja) * | 2002-09-10 | 2004-04-02 | Hitachi Chem Co Ltd | 有機ポリマー膜へのパターン形成方法、多層配線の形成方法及び半導体素子の製造方法 |
JP4467611B2 (ja) * | 2007-09-28 | 2010-05-26 | 株式会社日立製作所 | 光インプリント方法 |
JP5065101B2 (ja) * | 2008-03-05 | 2012-10-31 | 東洋合成工業株式会社 | パターン形成方法 |
-
2009
- 2009-09-25 JP JP2009220832A patent/JP5499596B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2011071299A (ja) | 2011-04-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5499596B2 (ja) | パターン形成方法及び半導体素子 | |
JP5665329B2 (ja) | インプリント用硬化性組成物、パターン形成方法およびパターン | |
JP5611519B2 (ja) | ナノインプリント用組成物、パターンおよびその形成方法 | |
JP6484493B2 (ja) | ナノインプリント用組成物及びナノインプリントパターン形成方法 | |
JP5243887B2 (ja) | ナノインプリント用硬化性組成物およびパターン形成方法 | |
JP5564383B2 (ja) | インプリント用硬化性組成物、パターン形成方法およびパターン | |
WO2011125335A1 (ja) | パターン形成方法及びパターン基板製造方法 | |
JP5498729B2 (ja) | インプリント用硬化性組成物、パターン形成方法およびパターン | |
JP2010186979A (ja) | インプリント用硬化性組成物、パターン形成方法およびパターン | |
JP5671377B2 (ja) | インプリント用硬化性組成物、パターン形成方法およびパターン | |
JP2014093385A (ja) | インプリント用密着膜の製造方法およびパターン形成方法 | |
TW200940566A (en) | Curable resin composition for nanoimprint | |
JP2011222647A (ja) | パターン形成方法及びパターン基板製造方法 | |
JPWO2010110121A1 (ja) | ナノインプリント用硬化性組成物及び硬化物 | |
JP5788759B2 (ja) | インプリント用硬化性組成物およびその保存方法 | |
TW201518434A (zh) | 光壓印用硬化性組成物、圖案形成方法、微細圖案、及半導體裝置的製造方法 | |
JP5968933B2 (ja) | インプリント用硬化性組成物、パターン形成方法およびパターン | |
JP2012079782A (ja) | 光ナノインプリント用感光性樹脂組成物、及び当該感光性樹脂組成物を用いたレジスト基板の製造方法、並びに、コピーテンプレートの製造方法 | |
JP2012216700A (ja) | パターン形成方法およびパターン | |
JP5268384B2 (ja) | ナノインプリント用硬化性組成物およびパターン形成方法 | |
JP2010106062A (ja) | ナノインプリント用組成物、パターンおよびその形成方法 | |
JP2013179159A (ja) | インプリント用硬化性組成物、パターン形成方法及びパターン | |
JP4736522B2 (ja) | エッチング処理された処理基板の製造方法 | |
JP5321228B2 (ja) | ナノインプリントリソグラフィー用光硬化性組成物及びナノインプリント方法 | |
TWI643893B (zh) | 光壓印用硬化性組成物、圖案形成方法及圖案 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120406 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130613 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130618 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130812 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140212 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140225 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5499596 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |