JP5489824B2 - 反射防止膜及び赤外線用光学素子 - Google Patents
反射防止膜及び赤外線用光学素子 Download PDFInfo
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- JP5489824B2 JP5489824B2 JP2010086297A JP2010086297A JP5489824B2 JP 5489824 B2 JP5489824 B2 JP 5489824B2 JP 2010086297 A JP2010086297 A JP 2010086297A JP 2010086297 A JP2010086297 A JP 2010086297A JP 5489824 B2 JP5489824 B2 JP 5489824B2
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- thin film
- antireflection film
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- 230000003287 optical effect Effects 0.000 title claims description 22
- 239000010408 film Substances 0.000 claims description 151
- 239000010409 thin film Substances 0.000 claims description 136
- 239000000463 material Substances 0.000 claims description 111
- 239000000758 substrate Substances 0.000 claims description 43
- 238000010884 ion-beam technique Methods 0.000 claims description 31
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 16
- 238000007735 ion beam assisted deposition Methods 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 4
- 150000004770 chalcogenides Chemical class 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 121
- 238000007740 vapor deposition Methods 0.000 description 33
- 239000005387 chalcogenide glass Substances 0.000 description 28
- 239000011521 glass Substances 0.000 description 16
- 229910052732 germanium Inorganic materials 0.000 description 14
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 13
- 239000013078 crystal Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000003331 infrared imaging Methods 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 229910052714 tellurium Inorganic materials 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- -1 YF 3 Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229940105963 yttrium fluoride Drugs 0.000 description 1
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2551/00—Optical elements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Optical Filters (AREA)
- Surface Treatment Of Glass (AREA)
Description
12 基材
13,51 反射防止膜
16 第1薄膜
17 第2薄膜
21 アシスト層
22 非アシスト層
31 蒸着装置
41 蒸着材料粒子
42 イオンビーム
52 耐候性薄膜
Claims (9)
- カルコゲナイドからなる基材の表面に設けられ、前記基材側から順に、Bi2O3からなる第1薄膜と、YF3からなる第2薄膜とを備えることを特徴とする反射防止膜。
- 前記第1薄膜は、イオンビームアシスト蒸着法によって成膜されることを特徴とする請求項1記載の反射防止膜。
- 前記第2薄膜は、イオンビームアシスト蒸着法によって成膜されたアシスト層と、イオンビームによるアシストを行わずに成膜された非アシスト層とを交互に複数積層して形成されることを特徴とする請求項1または2記載の反射防止膜。
- 前記基材から最も遠い前記第2薄膜の最上層が、前記アシスト層であることを特徴とする請求項3記載の反射防止膜。
- 前記第1薄膜に接する層が、前記アシスト層であることを特徴とする請求項3または4記載の反射防止膜。
- 前記第2薄膜上に、耐候性を向上させる材料からなる耐候性薄膜を備えることを特徴とする請求項1ないし5いずれかに記載の反射防止膜。
- 前記耐候性薄膜は、Si,SiO,SiO2のうちいずれかの材料からなることを特徴とする請求項6記載の反射防止膜。
- 前記耐候性薄膜の膜厚は50nm以上200nm以下であることを特徴とする請求項6または7記載の反射防止膜。
- 請求項1ないし8いずれかに記載の反射防止膜を備えることを特徴とする赤外線用光学素子。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010086297A JP5489824B2 (ja) | 2010-04-02 | 2010-04-02 | 反射防止膜及び赤外線用光学素子 |
TW100111055A TW201140128A (en) | 2010-04-02 | 2011-03-30 | Anti-reflection film and infrared optical element |
KR1020110030121A KR20110111249A (ko) | 2010-04-02 | 2011-04-01 | 반사방지막 및 적외선 광학 소자 |
CN201110085972.1A CN102213777B (zh) | 2010-04-02 | 2011-04-02 | 抗反射膜和红外线光学元件 |
US13/079,502 US8535807B2 (en) | 2010-04-02 | 2011-04-04 | Anti-reflection film and infrared optical element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010086297A JP5489824B2 (ja) | 2010-04-02 | 2010-04-02 | 反射防止膜及び赤外線用光学素子 |
Publications (2)
Publication Number | Publication Date |
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JP2011221048A JP2011221048A (ja) | 2011-11-04 |
JP5489824B2 true JP5489824B2 (ja) | 2014-05-14 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010086297A Active JP5489824B2 (ja) | 2010-04-02 | 2010-04-02 | 反射防止膜及び赤外線用光学素子 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8535807B2 (ja) |
JP (1) | JP5489824B2 (ja) |
KR (1) | KR20110111249A (ja) |
CN (1) | CN102213777B (ja) |
TW (1) | TW201140128A (ja) |
Families Citing this family (24)
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DE102012010291A1 (de) * | 2012-05-18 | 2013-11-21 | Jenoptik Optical Systems Gmbh | Hybride DLC-Beschichtung für IR-Optiken |
PL224744B1 (pl) * | 2012-06-15 | 2017-01-31 | Akademia Górniczo Hutnicza Im Stanisława Staszica W Krakowie | Urządzenie do oceny stanu technicznego powierzchni cięgien wykonanych z gumy lub tworzywa sztucznego |
WO2014045889A1 (ja) * | 2012-09-18 | 2014-03-27 | ギガフォトン株式会社 | スラブ型増幅器、それを含むレーザ装置および極短紫外光生成装置 |
KR20150019854A (ko) * | 2013-08-16 | 2015-02-25 | 삼성전기주식회사 | 초소형 적외선 카메라 모듈 및 그를 채용한 휴대용 기기 |
JP2015172617A (ja) * | 2014-03-11 | 2015-10-01 | 日本真空光学株式会社 | テラヘルツ帯光学素子 |
JP6046860B2 (ja) * | 2014-03-13 | 2016-12-21 | 富士フイルム株式会社 | 光学部品,赤外線カメラおよび光学部品の製造方法 |
KR101529955B1 (ko) * | 2014-05-20 | 2015-06-18 | 아이오솔루션(주) | 칼코게나이드 기반의 광학계 모듈 |
US9825073B2 (en) * | 2014-05-23 | 2017-11-21 | Omnivision Technologies, Inc. | Enhanced back side illuminated near infrared image sensor |
CN104035147B (zh) * | 2014-06-12 | 2015-09-30 | 中国科学院上海技术物理研究所 | 以锗为基底的具有太阳光反射功能的长波红外增透膜 |
WO2016052080A1 (ja) * | 2014-09-30 | 2016-04-07 | 富士フイルム株式会社 | 反射防止膜及びレンズ並びに撮像装置 |
JP6155399B2 (ja) * | 2014-09-30 | 2017-06-28 | 富士フイルム株式会社 | 反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置 |
US9685576B2 (en) | 2014-10-03 | 2017-06-20 | Omnivision Technologies, Inc. | Back side illuminated image sensor with guard ring region reflecting structure |
CN107111005A (zh) * | 2014-10-30 | 2017-08-29 | 住友电气工业株式会社 | 透镜和光学部件 |
CN105487155A (zh) * | 2015-12-30 | 2016-04-13 | 杭州麦乐克电子科技有限公司 | 红外检测滤光透镜 |
EP3446377A4 (en) * | 2016-04-19 | 2019-11-27 | Alma Lasers Ltd. | WINDOW FOR SURGICAL LASER |
CN105824061B (zh) * | 2016-04-28 | 2018-01-02 | 西安应用光学研究所 | 一种氟化镁中波红外光学窗口高强度保护膜的膜系结构 |
KR102556516B1 (ko) | 2016-08-11 | 2023-07-17 | 엘지이노텍 주식회사 | 카메라 모듈 |
WO2018062012A1 (ja) * | 2016-09-30 | 2018-04-05 | 富士フイルム株式会社 | 放射冷却装置 |
JP7172024B2 (ja) | 2017-09-12 | 2022-11-16 | 日本電気硝子株式会社 | カルコゲナイドガラス材 |
KR102147373B1 (ko) * | 2018-03-02 | 2020-08-25 | 국방과학연구소 | 적외선 저반사 코팅막 및 이의 제조방법 |
KR102237185B1 (ko) * | 2019-06-20 | 2021-04-07 | 엘지전자 주식회사 | 증착 장치 시스템 |
KR102107446B1 (ko) * | 2019-11-17 | 2020-05-07 | 주식회사 지에스아이 | 코팅장치, 코팅방법, 및 이러한 코팅방법에 따라 제조된 코팅막 |
CN111007584B (zh) * | 2019-11-21 | 2021-05-11 | 天津津航技术物理研究所 | 一种氧化物体系红外增透保护膜的设计方法 |
CN116540332B (zh) * | 2023-04-26 | 2024-05-31 | 云南驰宏国际锗业有限公司 | 一种ar/dlc复合镀膜的红外硫系玻璃镜片及其制备方法 |
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US20100035036A1 (en) * | 2008-08-08 | 2010-02-11 | Mccloy John S | Durable antireflective multispectral infrared coatings |
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2010
- 2010-04-02 JP JP2010086297A patent/JP5489824B2/ja active Active
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2011
- 2011-03-30 TW TW100111055A patent/TW201140128A/zh unknown
- 2011-04-01 KR KR1020110030121A patent/KR20110111249A/ko not_active Application Discontinuation
- 2011-04-02 CN CN201110085972.1A patent/CN102213777B/zh active Active
- 2011-04-04 US US13/079,502 patent/US8535807B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US8535807B2 (en) | 2013-09-17 |
JP2011221048A (ja) | 2011-11-04 |
TW201140128A (en) | 2011-11-16 |
CN102213777B (zh) | 2014-08-27 |
US20110244224A1 (en) | 2011-10-06 |
CN102213777A (zh) | 2011-10-12 |
KR20110111249A (ko) | 2011-10-10 |
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