JPS6415703A - Optical thin film for infra red ray - Google Patents

Optical thin film for infra red ray

Info

Publication number
JPS6415703A
JPS6415703A JP62171878A JP17187887A JPS6415703A JP S6415703 A JPS6415703 A JP S6415703A JP 62171878 A JP62171878 A JP 62171878A JP 17187887 A JP17187887 A JP 17187887A JP S6415703 A JPS6415703 A JP S6415703A
Authority
JP
Japan
Prior art keywords
film
refractive index
red ray
layer
infra
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62171878A
Other languages
Japanese (ja)
Inventor
Teruo Hashimoto
Takaaki Kato
Mikio Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62171878A priority Critical patent/JPS6415703A/en
Publication of JPS6415703A publication Critical patent/JPS6415703A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the titled film having the excellent optical and nonoptical properties and the prescribed functions by constituting of at least two layers of a film having a low refractive index and a film having a high refractive index, and said films are composed of a specified material which is not composed of a radioactive material, and is mounted on a substrate. CONSTITUTION:The layer which has the low refractive index and is composed of YF3, and the layer which has the high refractive index and is composed of Ge, ZnS, ZnSe and As2Se3 or the alternative layer of said layers are formed on the substrate which has good transparency against the infra-red ray, and is composed of Ge, ZnSe, As2Se3 or a chalcogenide glass, by vacuum-deposition, ion plating and spattering, etc. Thus, the titled film with the excellent optical characteristic such as less loss of absorption and scattering, etc. against the infra-red ray, and the excellent nonoptical characteristics such as water resistance, anti-scratching and solvent resistance, etc., is obtd., and said film is usable for an antireflection film, an interference filter and a beam splitter, etc.
JP62171878A 1987-07-09 1987-07-09 Optical thin film for infra red ray Pending JPS6415703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62171878A JPS6415703A (en) 1987-07-09 1987-07-09 Optical thin film for infra red ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62171878A JPS6415703A (en) 1987-07-09 1987-07-09 Optical thin film for infra red ray

Publications (1)

Publication Number Publication Date
JPS6415703A true JPS6415703A (en) 1989-01-19

Family

ID=15931469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62171878A Pending JPS6415703A (en) 1987-07-09 1987-07-09 Optical thin film for infra red ray

Country Status (1)

Country Link
JP (1) JPS6415703A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03237401A (en) * 1990-02-15 1991-10-23 Hisankabutsu Glass Kenkyu Kaihatsu Kk Antireflecting film of chalcogenide glass
JPH04109151A (en) * 1990-08-29 1992-04-10 Susumu Sato Sensor
US5243458A (en) * 1990-12-25 1993-09-07 Minolta Camera Kabushiki Kaisha Antireflection coating for infrared light
JP2003149406A (en) * 2002-07-12 2003-05-21 Topcon Corp Ir antireflection film
JP2010512655A (en) * 2006-12-11 2010-04-22 アルプ ラゼール ソスィエテ アノニム Quantum cascade laser amplifier with antireflective coating containing yttrium fluoride layer
JP2010181514A (en) * 2009-02-04 2010-08-19 Sumitomo Electric Hardmetal Corp Optical component and protective member for laser beam machining apparatus
US20110244224A1 (en) * 2010-04-02 2011-10-06 Fujifilm Corporation Anti-reflection film and infrared optical element
JP2013015562A (en) * 2011-06-30 2013-01-24 Nitto Kogaku Kk Optical element and antireflection film transmitting carbon dioxide gas laser beam
US9575216B2 (en) 2011-05-24 2017-02-21 National Institute Of Advanced Industrial Science And Technology Infrared-transmitting film, method for producing infrared-transmitting film, infrared optical component, and infrared device
CN109991691A (en) * 2019-04-15 2019-07-09 南京波长光电科技股份有限公司 Three wave band of laser anti-reflection films of one kind and preparation method thereof
CN110879430A (en) * 2019-11-04 2020-03-13 广东先导先进材料股份有限公司 Infrared chalcogenide glass lens and preparation method thereof
WO2023008123A1 (en) * 2021-07-30 2023-02-02 日本電気硝子株式会社 Film-equipped base material and manufacturing method for same

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03237401A (en) * 1990-02-15 1991-10-23 Hisankabutsu Glass Kenkyu Kaihatsu Kk Antireflecting film of chalcogenide glass
JPH04109151A (en) * 1990-08-29 1992-04-10 Susumu Sato Sensor
US5243458A (en) * 1990-12-25 1993-09-07 Minolta Camera Kabushiki Kaisha Antireflection coating for infrared light
JP2003149406A (en) * 2002-07-12 2003-05-21 Topcon Corp Ir antireflection film
JP2010512655A (en) * 2006-12-11 2010-04-22 アルプ ラゼール ソスィエテ アノニム Quantum cascade laser amplifier with antireflective coating containing yttrium fluoride layer
JP2010181514A (en) * 2009-02-04 2010-08-19 Sumitomo Electric Hardmetal Corp Optical component and protective member for laser beam machining apparatus
US20110244224A1 (en) * 2010-04-02 2011-10-06 Fujifilm Corporation Anti-reflection film and infrared optical element
JP2011221048A (en) * 2010-04-02 2011-11-04 Fujifilm Corp Anti-reflection coating and optical element for infrared ray
US8535807B2 (en) * 2010-04-02 2013-09-17 Fujifilm Corporation Anti-reflection film and infrared optical element
US9575216B2 (en) 2011-05-24 2017-02-21 National Institute Of Advanced Industrial Science And Technology Infrared-transmitting film, method for producing infrared-transmitting film, infrared optical component, and infrared device
JP2013015562A (en) * 2011-06-30 2013-01-24 Nitto Kogaku Kk Optical element and antireflection film transmitting carbon dioxide gas laser beam
CN109991691A (en) * 2019-04-15 2019-07-09 南京波长光电科技股份有限公司 Three wave band of laser anti-reflection films of one kind and preparation method thereof
CN109991691B (en) * 2019-04-15 2024-01-05 南京波长光电科技股份有限公司 Three-band laser antireflection film and preparation method thereof
CN110879430A (en) * 2019-11-04 2020-03-13 广东先导先进材料股份有限公司 Infrared chalcogenide glass lens and preparation method thereof
WO2023008123A1 (en) * 2021-07-30 2023-02-02 日本電気硝子株式会社 Film-equipped base material and manufacturing method for same

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