JP5486159B2 - 立方晶系窒化硼素成形体 - Google Patents
立方晶系窒化硼素成形体 Download PDFInfo
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- JP5486159B2 JP5486159B2 JP2007538534A JP2007538534A JP5486159B2 JP 5486159 B2 JP5486159 B2 JP 5486159B2 JP 2007538534 A JP2007538534 A JP 2007538534A JP 2007538534 A JP2007538534 A JP 2007538534A JP 5486159 B2 JP5486159 B2 JP 5486159B2
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- 229910052582 BN Inorganic materials 0.000 title description 9
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title description 9
- 239000002245 particle Substances 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 28
- 239000011159 matrix material Substances 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- 239000011230 binding agent Substances 0.000 claims description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 7
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims description 7
- 229910033181 TiB2 Inorganic materials 0.000 claims description 7
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000006104 solid solution Substances 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 238000003705 background correction Methods 0.000 claims description 2
- 239000011135 tin Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 description 33
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 26
- 229910052719 titanium Inorganic materials 0.000 description 26
- 239000000843 powder Substances 0.000 description 25
- 239000000463 material Substances 0.000 description 22
- 238000005520 cutting process Methods 0.000 description 13
- 238000000227 grinding Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 239000002002 slurry Substances 0.000 description 12
- 238000002441 X-ray diffraction Methods 0.000 description 6
- 229910000760 Hardened steel Inorganic materials 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000010191 image analysis Methods 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- OQPDWFJSZHWILH-UHFFFAOYSA-N [Al].[Al].[Al].[Ti] Chemical compound [Al].[Al].[Al].[Ti] OQPDWFJSZHWILH-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910021324 titanium aluminide Inorganic materials 0.000 description 3
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001060 Gray iron Inorganic materials 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003966 growth inhibitor Substances 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WGPCGCOKHWGKJJ-UHFFFAOYSA-N sulfanylidenezinc Chemical group [Zn]=S WGPCGCOKHWGKJJ-UHFFFAOYSA-N 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
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- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
- C22C2026/006—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes with additional metal compounds being carbides
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
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Description
試料片をワイヤーEDMを用いて切断し、次に研磨する。CBN成形体の研磨表面を走査電子顕微鏡を用いて分析した。CBNの推定平均粒径により、適当な倍率、3000、5000、及び7000倍の倍率での後方散乱電子像を選択した。(もし平均粒径が1μmより小さいならば、7000倍の倍率を用いた;もし平均CBN粒径が1μmより大きく、2μmより小さいならば、5000倍の倍率を用いた。もし平均粒径が2μmより大きく、3μmより小さいならば、3000倍の倍率を用いた)。試料を満足に表すためには、少なくとも30の画像を用いた。
平均粒径1.4μmの準化学量論的(sub−stoichiometric)炭窒化チタン粉末、Ti(C0.7N0.3)0.8を、平均粒径5μmのAl粉末と混合した。Ti(C0.7N0.3)0.8とAlとの質量比は、90:10であった。その粉末混合物をチタンカップ中にプレスし、圧粉体を形成し、真空中で1025℃へ30分間加熱し、次に破砕し、粉砕した。その粉末混合物を次に4時間摩擦粉砕した。平均粒径が0.7μmの約30重量%のCBN及び平均粒径が2μmの残余のCBNを含むCBN粉末混合物を、65全体積%のCBNが得られるような或る量でスラリーに添加した。CBN含有スラリーを、摩擦粉砕を用いて1時間粉砕混合した。スラリーを真空中で乾燥し、圧粉体へ成形し、55キロバール(5.5GPa)で約1300℃で焼結し、CBN成形体を形成した。
平均粒径1.4μmの準化学量論的炭窒化チタン粉末、Ti(C0.7N0.3)0.8を、平均粒径5μmのAl粉末と混合した。Ti(C0.7N0.3)0.8とAlとの質量比は、90:10であった。その粉末混合物をチタンカップ中にプレスし、圧粉体を形成し、真空中で1025℃へ30分間加熱し、次に破砕し、粉砕した。その粉末混合物を次に4時間摩擦粉砕した。平均粒径が0.7μmの約30重量%のCBN及び平均粒径が2μmの残余のCBNを含むCBN粉末混合物を、45全体積%のCBNが得られるような或る量でスラリーに添加した。CBN含有スラリーを、摩擦粉砕を用いて1時間粉砕混合した。スラリーを真空中で乾燥し、圧粉体へ成形し、55キロバール(5.5GPa)で約1300℃で焼結し、CBN成形体を形成した。
平均粒径1.4μmの準化学量論的炭窒化チタン粉末、Ti(C0.5N0.5)0.8を、平均粒径5μmのAl粉末とタンブラー混合機を用いて混合した。Ti(C0.5N0.5)0.8とAlとの質量比は、90:10であった。その粉末混合物をチタンカップ中にプレスし、圧粉体を形成し、真空中で1025℃へ30分間加熱し、次に破砕し、粉砕した。その粉末混合物を次に4時間摩擦粉砕した。平均粒径が0.7μmの約30重量%のCBN及び平均粒径が1.4μmの残余のCBNを含むCBN粉末混合物を、55全体積%のCBNが得られるような或る量でスラリーに添加した。CBN含有スラリーを、摩擦粉砕を用いて1時間粉砕混合した。スラリーを真空中で乾燥し、圧粉体へ成形し、55キロバール(5.5GPa)で約1300℃で焼結し、CBN成形体を形成した。
平均粒径1.4μmの準化学量論的炭化チタン粉末、TiC0.8を、平均粒径5μmのAl粉末と混合した。TiC0.8とAlとの質量比は、90:10であった。その粉末混合物をチタンカップ中にプレスし、圧粉体を形成し、真空中で1025℃へ30分間加熱し、次に破砕し、粉砕した。その粉末混合物を次に4時間摩擦粉砕した。平均粒径が1.4μmの約30重量%のCBNを含むCBN粉末混合物を、50全体積%のCBNが得られるような或る量でスラリーに添加した。CBN含有スラリーを、摩擦粉砕を用いて1時間粉砕混合した。スラリーを真空中で乾燥し、圧粉体へ成形し、55キロバール(5.5GPa)で約1300℃で焼結し、CBN成形体を形成した。
Claims (8)
- CBN成形体であって、
CBN粒子と、
TiCN、TiC、TiN、及びそれらの混合物及びそれらの固溶体から選択された第二硬質相、及び二硼化チタンを組込んだマトリックス相と
を含み、
前記CBN成形体が、35〜65体積%のCBNを含有しており、
前記二硼化チタンの(101)ピークのバックグラウンド補正後のXRDピーク高さが、(111)CBNピークのピーク高さの2.52%以上であり、かつ5%よりも小さい、CBN成形体。 - 第二硬質相のXRDピークが、少なくとも0.2°の2θの半値幅を有する、請求項1に記載のCBN成形体。
- 第二硬質相のXRDピークが、少なくとも0.25°の2θの半値幅を有する、請求項2に記載のCBN成形体。
- 第二硬質相のXRDピークが、少なくとも0.3°の2θの半値幅を有する、請求項3に記載のCBN成形体。
- 第二硬質相がTiCNである、請求項1から請求項4までのいずれか1項に記載のCBN成形体。
- マトリックス相が、アルミニウム又はアルミニウム系化合物である結合剤相を更に含む、請求項1から請求項5までのいずれか1項に記載のCBN成形体。
- マトリックス相が、炭化タングステン及び/又はAl2O3を更に含む、請求項1から請求項6までのいずれか1項に記載のCBN成形体。
- 請求項1から請求項7までのいずれか1項に記載のCBN成形体を含む工具挿入体。
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IES2004/0722 | 2004-10-29 | ||
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IES2004/0721 | 2004-10-29 | ||
PCT/IB2005/003221 WO2006046125A1 (en) | 2004-10-29 | 2005-10-28 | Cubic boron nitride compact |
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