JP5465701B2 - 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 - Google Patents

液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 Download PDF

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JP5465701B2
JP5465701B2 JP2011177045A JP2011177045A JP5465701B2 JP 5465701 B2 JP5465701 B2 JP 5465701B2 JP 2011177045 A JP2011177045 A JP 2011177045A JP 2011177045 A JP2011177045 A JP 2011177045A JP 5465701 B2 JP5465701 B2 JP 5465701B2
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Japan
Prior art keywords
glass substrate
temperature
substrate surface
temperature control
control device
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JP2011177045A
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Japanese (ja)
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JP2013041053A (ja
Inventor
佳一 上村
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株式会社上村工業
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Priority to JP2011177045A priority Critical patent/JP5465701B2/ja
Priority to KR1020120079551A priority patent/KR101454964B1/ko
Priority to CN201210285765.5A priority patent/CN102955374B/zh
Priority to TW101129071A priority patent/TWI512356B/zh
Publication of JP2013041053A publication Critical patent/JP2013041053A/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Surface Treatment Of Glass (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
JP2011177045A 2011-08-12 2011-08-12 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 Active JP5465701B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011177045A JP5465701B2 (ja) 2011-08-12 2011-08-12 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置
KR1020120079551A KR101454964B1 (ko) 2011-08-12 2012-07-20 액정 디스플레이의 제조공정에 있어서의 유리 기반면의 급속 및 고정밀도 온도조절장치
CN201210285765.5A CN102955374B (zh) 2011-08-12 2012-08-10 玻璃基板面的快速高精度调温装置
TW101129071A TWI512356B (zh) 2011-08-12 2012-08-10 液晶顯示器等製程中對玻璃基板面做高精度調溫的調溫裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011177045A JP5465701B2 (ja) 2011-08-12 2011-08-12 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置

Publications (2)

Publication Number Publication Date
JP2013041053A JP2013041053A (ja) 2013-02-28
JP5465701B2 true JP5465701B2 (ja) 2014-04-09

Family

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JP2011177045A Active JP5465701B2 (ja) 2011-08-12 2011-08-12 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置

Country Status (4)

Country Link
JP (1) JP5465701B2 (zh)
KR (1) KR101454964B1 (zh)
CN (1) CN102955374B (zh)
TW (1) TWI512356B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107885045A (zh) * 2017-11-22 2018-04-06 四川云盾光电科技有限公司 一种负性光刻胶刻蚀装置
CN112882352A (zh) * 2021-01-28 2021-06-01 江苏特纳马智能制造有限公司 一种曝光机玻璃基板表面温度稳定设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0513294A (ja) * 1991-07-04 1993-01-22 Hitachi Ltd 半導体ウエハ冷却方法および装置
JP3259226B2 (ja) * 1994-10-05 2002-02-25 東京エレクトロン株式会社 熱処理方法及び熱処理装置
JP3701007B2 (ja) * 2000-08-31 2005-09-28 株式会社朝日工業社 ガラス基板の温度制御方法及びその装置
CN100521131C (zh) * 2004-03-30 2009-07-29 株式会社田村制作所 加热装置及回流焊装置
JP2008016543A (ja) * 2006-07-04 2008-01-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2010223499A (ja) * 2009-03-24 2010-10-07 Ngk Insulators Ltd 基板冷却装置
JP5290063B2 (ja) * 2009-06-17 2013-09-18 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の基板温度制御方法、及び表示用パネル基板の製造方法

Also Published As

Publication number Publication date
TW201307946A (zh) 2013-02-16
CN102955374B (zh) 2014-12-03
KR101454964B1 (ko) 2014-10-27
CN102955374A (zh) 2013-03-06
TWI512356B (zh) 2015-12-11
JP2013041053A (ja) 2013-02-28
KR20130018396A (ko) 2013-02-21

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