JP5465701B2 - Rapid and high-precision temperature control device for glass substrate surface in manufacturing process of liquid crystal display etc. - Google Patents
Rapid and high-precision temperature control device for glass substrate surface in manufacturing process of liquid crystal display etc. Download PDFInfo
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- JP5465701B2 JP5465701B2 JP2011177045A JP2011177045A JP5465701B2 JP 5465701 B2 JP5465701 B2 JP 5465701B2 JP 2011177045 A JP2011177045 A JP 2011177045A JP 2011177045 A JP2011177045 A JP 2011177045A JP 5465701 B2 JP5465701 B2 JP 5465701B2
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- glass substrate
- temperature
- substrate surface
- temperature control
- control device
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Surface Treatment Of Glass (AREA)
- Liquid Crystal (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
Description
この発明は液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置に関するものである。 The present invention relates to a rapid and highly accurate temperature control device for a glass substrate surface in a manufacturing process of a liquid crystal display or the like.
ガラス基盤面に感光膜を成膜をし、これを乾燥するとガラス基盤が高温になり、露光に適した23℃に冷却する必要がある。先に提案されている特許第3701007号公報は多数のノズルにて成膜したガラス基盤面に調温風を垂直に吹き付けしてガラス基盤面を調温するということを記載している。 When a photosensitive film is formed on the glass substrate surface and dried, the glass substrate becomes high temperature, and it is necessary to cool to 23 ° C. suitable for exposure. Japanese Patent No. 3701007 proposed previously describes that the temperature of the glass substrate surface is controlled by blowing the temperature-controlled air vertically onto the glass substrate surface formed by a number of nozzles.
しかしながら、ノズルによる調温風の垂直吹き付けは図4からわかるように調温風がガラス基盤面に当ってはね返る点接触にとどまるため、調温に時間がかかり、しかも帯熱したはね返り風が吹き付け風の抵抗となるとともに、調温風にまざることで、ガラス基盤面の調温に精密さが欠け、公報は23℃±0.1の精度で調温するとしているが、実際はそれより精度が低くなるという課題がある。 However, as shown in Fig. 4, the vertical blowing of the temperature-controlled air by the nozzle stays at the point contact where the temperature-controlled air bounces against the glass substrate surface, so that it takes time to adjust the temperature and the heated rebounding air blows. In addition, the accuracy of the glass substrate surface is lacking in precision by adjusting to the temperature-controlled air, and the publication states that the temperature is adjusted with an accuracy of 23 ° C. ± 0.1, but the accuracy is actually lower than that. There is a problem of becoming.
本発明は、ガラス基盤面に成膜と露光とエッチングを順に行う流れ工程において、成膜と露光の間に設けるガラス基盤面の調温装置であって、大小のガラス基盤面のすべてをカバーする大きさの調温風循環タンクと、該タンク内の下部に調温風を吹付けするように狭い間隙を挟んで並設する複数本の平角筒体と、該各平角筒体の中間に回収口を設けて、該平角筒体下の至近に走行し入ったガラス基盤面を各平角筒体間の狭い間隙からの調温風の吹付けと該吹付調温風の回収口より回収する間の接面調温とにより熱交換により帯熱した風の抵抗と混入なしにガラス基盤面を急速且つ高精度において調温するようにして、かかる課題を解決したのである。 The present invention is a temperature control device for a glass substrate surface provided between film formation and exposure in a flow process in which film formation, exposure, and etching are sequentially performed on a glass substrate surface, and covers all large and small glass substrate surfaces. A large-sized temperature-controlled air circulation tank, a plurality of rectangular cylinders arranged side by side with a narrow gap so that temperature-controlled air is blown to the lower part of the tank , and a collection between the rectangular cylinders During the collection of the temperature-controlled air from the narrow gap between the rectangular cylinders and the collection port of the spray-controlled temperature air, the glass substrate surface that has run near the rectangular cylinder is provided This problem was solved by adjusting the temperature of the glass substrate surface rapidly and with high accuracy without the resistance and mixing of wind heated by heat exchange .
本発明は簡単な装置においてガラス基盤面に23℃±0.05℃以内というきわめて精度の高い調温風を効率的に吹き付けて、従来に比較して極めて短時間にガラス基盤の精密温調を行うことができるという効果を生ずる。 The present invention efficiently blows highly accurate temperature-controlled air within 23 ° C ± 0.05 ° C on a glass substrate surface in a simple device, and achieves precise temperature control of the glass substrate in a very short time compared to the conventional. This produces the effect that it can be performed.
平角筒体を狭い間隔を置いて並設することと、その下面中間に回収口を設けたことで、ガラス基盤面は吹き付け調温と接面調温とにより急速に調温することができるという効果を生ずる。 By arranging parallel rectangular cylinders at narrow intervals and providing a recovery port in the middle of the lower surface, the glass substrate surface can be quickly adjusted by spraying temperature control and contact surface temperature control. Produces an effect.
吹き付け調温風のはね返りが解消することと、帯熱した風が調温風に混入することが防止されることで、きわめて精度の高い調温が行われることになるという効果を生ずる。
急速調整によってコンベアの間歇走行を速めて作業能率を向上させることができるという効果を生ずる。
By eliminating the rebound of the blown temperature-controlled air and preventing the heated air from being mixed into the temperature-controlled air, there is an effect that highly accurate temperature adjustment is performed.
The rapid adjustment can speed up the intermittent running of the conveyor and improve the working efficiency.
11はコンベア
12は成膜乾燥室
13は調温装置
14は露光室
15は循環タンク
16は循環風路
17はファン
18は温度センサ
19は間隙
20は平角筒体
21は回収口
C/Cは冷却空調器
H/Cは加熱空調器
Gはガラス基盤
DESCRIPTION OF
本発明は液晶ディスプレイの製造ラインにおいて、大小のガラス基盤面に成膜と露光とエッチングを順に行う流れ工程において、成膜と露光間に設けるガラス基盤面の調温装置を以下の通りに構成して急速且つ高精度において調温するようにしたのである。 In the liquid crystal display production line, the glass substrate surface temperature control device provided between the film formation and the exposure is configured as follows in the flow process of sequentially performing film formation, exposure and etching on the large and small glass substrate surfaces. Therefore, the temperature is adjusted rapidly and with high accuracy.
その構成は大小すべてのガラス基盤面をカバーする大きさにて調温風の循環タンクを形成し、該タンク内の下部に平角筒体を狭い間隔を置いて複数本横断渡設し、成膜して該タンク下の至近に入るガラス基盤面にタンク内の調温風を下降押しして各平角筒体間の狭い間隙からガラス基盤面に吹き付けすることによるガラス基盤面の吹き付け調温と、この調温風を回収口より回収されるまでガラス基盤面に接面することによる接面調温との合わせによりガラス基盤面を急速に調温し、しかも調温後の帯熱風を回収口から回収してタンク内の調温風に混入しないようにしたことで、設定温度である23℃±0.05℃以内という高い精度をもって調温することを可能にしたのである。 The configuration is to form a temperature-controlled air circulation tank that covers all large and small glass substrate surfaces, and a plurality of flat rectangular cylinders are placed across the bottom of the tank at narrow intervals to form a film. Then, the glass substrate surface spraying temperature control by lowering the temperature-controlled air in the tank to the glass substrate surface entering the vicinity under the tank and spraying the glass substrate surface from the narrow gap between each rectangular tube, The temperature of the glass substrate is rapidly adjusted by combining with the surface temperature control by contacting the glass substrate surface until the temperature-controlled air is collected from the recovery port. By collecting and preventing it from being mixed into the temperature-controlled air in the tank, it is possible to adjust the temperature with high accuracy within a preset temperature of 23 ° C. ± 0.05 ° C.
図1乃至図3は実施例を示すもので、クリーンルーム内にて間歇走行するコンベア11上に成膜乾燥室12、調温装置13、露光室14を順に設け、該コンベア11上に乗って成膜乾燥室12下の至近に走行し入ったガラス基盤Gの面上に感光液を落載し、ガラス基盤Gを回転させる遠心力にて感光液を全面均一の厚みとしてから加熱して感光液を乾燥させる要領にて所定の成膜を行い、調温装置13下の至近に入ったところで温度の上昇したガラス基盤Gを露光に最適な23℃に調温するのである。
1 to 3 show an embodiment. A film forming and
調温のための調温装置13は循環タンク15内の側面に調温風の循環風路16を設け、その上部にタンク15内に向けて調温して供給する冷却空調器C/Cを設け、タンク15内の上部に加熱空調器H/Cとその下に調温風を下方に押圧するファン17を設けている。18は加熱空調器H/Cを制御するための温度センサである。
The
しかしてタンク15内の底面をなす下部には狭い間隔19を置いて長尺の平角筒体20を複数本並設する。各平角筒体20は下面の長手方向中間に回収口21を設け、回収口21に戻り入った調温後の帯熱風を平角筒体20内を通って長手方向の両端より循環空路16内に戻り入れて循環するようにしている。
Accordingly, a plurality of long
さて、成膜したガラス基盤Gがコンベア11の走行により調温装置13下の至近に入るとファン17により下押しされる23℃の調温風が平角筒体20間の狭い間隙19から吹き付けて調温するガラス基盤面Gの吹き付け調温と、次いで吹付け調温風が回収口21に戻り入るまでガラス基盤Gに接面し続ける接面調温とによりガラス基盤面Gは急速に調温されることとなる。
When the formed glass substrate G enters the vicinity of the
しかも従来生じていた調温後の帯熱風のはね返りがなく、すべて回収口21より回収されることでタンク15内の調温風に混じることがないから、23℃±0.05℃以内というすばらしい高精度にて調温されることとなる。
このようにして急速且つ精度高く調温されたガラス基盤Gは露光室14に入り露光されることなる。
Moreover, there is no rebound of the heated air after temperature adjustment, which has occurred in the past, and since it is all recovered from the
The glass substrate G that has been rapidly and accurately adjusted in this way enters the
本発明は、感光膜を成膜したガラス基盤面を露光に適した温度に急速且つ高精度にて調温することで広く利用されるものである。 The present invention is widely used by rapidly and accurately adjusting the temperature of a glass substrate surface on which a photosensitive film is formed to a temperature suitable for exposure.
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2011177045A JP5465701B2 (en) | 2011-08-12 | 2011-08-12 | Rapid and high-precision temperature control device for glass substrate surface in manufacturing process of liquid crystal display etc. |
KR1020120079551A KR101454964B1 (en) | 2011-08-12 | 2012-07-20 | A rapid and precise temperature controlling equipment in the manufacturing process of glass base side for liquid crystal display |
CN201210285765.5A CN102955374B (en) | 2011-08-12 | 2012-08-10 | Rapid and precise temperature controlling equipment of glass substrate surface |
TW101129071A TWI512356B (en) | 2011-08-12 | 2012-08-10 | A precise temperature controlling equipment in the manufacturing process of glass surface for liquid crystal display and other products |
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JP2011177045A JP5465701B2 (en) | 2011-08-12 | 2011-08-12 | Rapid and high-precision temperature control device for glass substrate surface in manufacturing process of liquid crystal display etc. |
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JP2013041053A JP2013041053A (en) | 2013-02-28 |
JP5465701B2 true JP5465701B2 (en) | 2014-04-09 |
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JP2011177045A Active JP5465701B2 (en) | 2011-08-12 | 2011-08-12 | Rapid and high-precision temperature control device for glass substrate surface in manufacturing process of liquid crystal display etc. |
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JP (1) | JP5465701B2 (en) |
KR (1) | KR101454964B1 (en) |
CN (1) | CN102955374B (en) |
TW (1) | TWI512356B (en) |
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CN107885045A (en) * | 2017-11-22 | 2018-04-06 | 四川云盾光电科技有限公司 | A kind of negative photoresist etching device |
CN112882352A (en) * | 2021-01-28 | 2021-06-01 | 江苏特纳马智能制造有限公司 | Exposure machine glass substrate surface temperature stabilizing equipment |
Family Cites Families (7)
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JPH0513294A (en) * | 1991-07-04 | 1993-01-22 | Hitachi Ltd | Method and apparatus for cooling semiconductor wafer |
JP3259226B2 (en) * | 1994-10-05 | 2002-02-25 | 東京エレクトロン株式会社 | Heat treatment method and heat treatment apparatus |
JP3701007B2 (en) * | 2000-08-31 | 2005-09-28 | 株式会社朝日工業社 | Temperature control method and apparatus for glass substrate |
CN101303989B (en) * | 2004-03-30 | 2012-03-28 | 株式会社田村制作所 | Solder bump forming method and apparatus |
JP2008016543A (en) * | 2006-07-04 | 2008-01-24 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
JP2010223499A (en) * | 2009-03-24 | 2010-10-07 | Ngk Insulators Ltd | Substrate cooling device |
JP5290063B2 (en) * | 2009-06-17 | 2013-09-18 | 株式会社日立ハイテクノロジーズ | Proximity exposure apparatus, substrate temperature control method for proximity exposure apparatus, and method for manufacturing display panel substrate |
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2011
- 2011-08-12 JP JP2011177045A patent/JP5465701B2/en active Active
-
2012
- 2012-07-20 KR KR1020120079551A patent/KR101454964B1/en not_active IP Right Cessation
- 2012-08-10 TW TW101129071A patent/TWI512356B/en active
- 2012-08-10 CN CN201210285765.5A patent/CN102955374B/en active Active
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Publication number | Publication date |
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CN102955374B (en) | 2014-12-03 |
TWI512356B (en) | 2015-12-11 |
KR101454964B1 (en) | 2014-10-27 |
CN102955374A (en) | 2013-03-06 |
JP2013041053A (en) | 2013-02-28 |
KR20130018396A (en) | 2013-02-21 |
TW201307946A (en) | 2013-02-16 |
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