JP2013041053A - 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 - Google Patents
液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 Download PDFInfo
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- JP2013041053A JP2013041053A JP2011177045A JP2011177045A JP2013041053A JP 2013041053 A JP2013041053 A JP 2013041053A JP 2011177045 A JP2011177045 A JP 2011177045A JP 2011177045 A JP2011177045 A JP 2011177045A JP 2013041053 A JP2013041053 A JP 2013041053A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Glass (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
Abstract
【解決手段】 本発明はラス基盤面に成膜と露光とエッチングを順に行う流れ工程において、成膜と露光の間に設けるガラス基盤面の調温装置であって、大小のガラス基盤面のすべてをカバーする大きさの調温風循環タンクと、該タンクの下部に平角筒体形でその下面の中間に帯熱した調温風を戻し入れする回収口を設けた複数本の平角筒体を横断渡設し、該タンク下の至近に走行し入ったガラス基盤面に該タンク内の調温風を各平角筒体間の狭い間隙から吹き付けによる吹き付け調温と該回収口にまわり流入するまでガラス基盤面に接面する接面調温とにてガラス基盤面を急速且つ高精度にて調温するようにした調温装置にある。
【選択図】 図2
Description
急速調整によってコンベアの間歇走行を速めて作業能率を向上させることができるという効果を生ずる。
12は成膜乾燥室
13は調温装置
14は露光室
15は循環タンク
16は循環風路
17はファン
18は温度センサ
19は間隙
20は平角筒体
21は回収口
C/Cは冷却空調器
H/Cは加熱空調器
Gはガラス基盤
このようにして急速且つ精度高く調温されたガラス基盤Gは露光室14に入り露光されることなる。
Claims (1)
- ガラス基盤面に成膜と露光とエッチングを順に行う流れ工程において、成膜と露光の間に設けるガラス基盤面の調温装置であって、大小のガラス基盤面のすべてをカバーする大きさの調温風循環タンクと、該タンクの下部に平角筒体形でその下面の中間に調温風を戻し入れする回収口を設けた複数本の平角筒体を横断渡設し、該タンク下の至近に走行し入ったガラス基盤面に該タンク内の調温風を各平角筒体間の狭い間隙からの吹き付け調温と該回収口にまわり流入するまでガラス基盤面に接面することによる接面調温とによりガラス基盤面を急速に調温し、且つ調温後の帯熱風を該回収口から回収し、タンク内の調整風に混入させないようにしたことで23℃±0.05以内という高精度にて調温するようにしたことを特徴とする液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011177045A JP5465701B2 (ja) | 2011-08-12 | 2011-08-12 | 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 |
KR1020120079551A KR101454964B1 (ko) | 2011-08-12 | 2012-07-20 | 액정 디스플레이의 제조공정에 있어서의 유리 기반면의 급속 및 고정밀도 온도조절장치 |
TW101129071A TWI512356B (zh) | 2011-08-12 | 2012-08-10 | 液晶顯示器等製程中對玻璃基板面做高精度調溫的調溫裝置 |
CN201210285765.5A CN102955374B (zh) | 2011-08-12 | 2012-08-10 | 玻璃基板面的快速高精度调温装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011177045A JP5465701B2 (ja) | 2011-08-12 | 2011-08-12 | 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 |
Publications (2)
Publication Number | Publication Date |
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JP2013041053A true JP2013041053A (ja) | 2013-02-28 |
JP5465701B2 JP5465701B2 (ja) | 2014-04-09 |
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JP2011177045A Active JP5465701B2 (ja) | 2011-08-12 | 2011-08-12 | 液晶ディスプレイ等の製造工程におけるガラス基盤面の急速且つ高精度調温装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5465701B2 (ja) |
KR (1) | KR101454964B1 (ja) |
CN (1) | CN102955374B (ja) |
TW (1) | TWI512356B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107885045A (zh) * | 2017-11-22 | 2018-04-06 | 四川云盾光电科技有限公司 | 一种负性光刻胶刻蚀装置 |
CN112882352A (zh) * | 2021-01-28 | 2021-06-01 | 江苏特纳马智能制造有限公司 | 一种曝光机玻璃基板表面温度稳定设备 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0513294A (ja) * | 1991-07-04 | 1993-01-22 | Hitachi Ltd | 半導体ウエハ冷却方法および装置 |
JP2001085323A (ja) * | 1994-10-05 | 2001-03-30 | Tokyo Electron Ltd | 熱処理方法及び熱処理装置 |
JP2002072492A (ja) * | 2000-08-31 | 2002-03-12 | Asahi Kogyosha Co Ltd | 板状のワークの温度制御方法及びその装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101303989B (zh) * | 2004-03-30 | 2012-03-28 | 株式会社田村制作所 | 焊料隆起形成方法及装置 |
JP2008016543A (ja) * | 2006-07-04 | 2008-01-24 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2010223499A (ja) * | 2009-03-24 | 2010-10-07 | Ngk Insulators Ltd | 基板冷却装置 |
JP5290063B2 (ja) * | 2009-06-17 | 2013-09-18 | 株式会社日立ハイテクノロジーズ | プロキシミティ露光装置、プロキシミティ露光装置の基板温度制御方法、及び表示用パネル基板の製造方法 |
-
2011
- 2011-08-12 JP JP2011177045A patent/JP5465701B2/ja active Active
-
2012
- 2012-07-20 KR KR1020120079551A patent/KR101454964B1/ko not_active IP Right Cessation
- 2012-08-10 CN CN201210285765.5A patent/CN102955374B/zh active Active
- 2012-08-10 TW TW101129071A patent/TWI512356B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0513294A (ja) * | 1991-07-04 | 1993-01-22 | Hitachi Ltd | 半導体ウエハ冷却方法および装置 |
JP2001085323A (ja) * | 1994-10-05 | 2001-03-30 | Tokyo Electron Ltd | 熱処理方法及び熱処理装置 |
JP2002072492A (ja) * | 2000-08-31 | 2002-03-12 | Asahi Kogyosha Co Ltd | 板状のワークの温度制御方法及びその装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI512356B (zh) | 2015-12-11 |
KR20130018396A (ko) | 2013-02-21 |
TW201307946A (zh) | 2013-02-16 |
JP5465701B2 (ja) | 2014-04-09 |
CN102955374A (zh) | 2013-03-06 |
CN102955374B (zh) | 2014-12-03 |
KR101454964B1 (ko) | 2014-10-27 |
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