JP5455620B2 - 放射線検出器および当該検出器を含む装置 - Google Patents
放射線検出器および当該検出器を含む装置 Download PDFInfo
- Publication number
- JP5455620B2 JP5455620B2 JP2009503121A JP2009503121A JP5455620B2 JP 5455620 B2 JP5455620 B2 JP 5455620B2 JP 2009503121 A JP2009503121 A JP 2009503121A JP 2009503121 A JP2009503121 A JP 2009503121A JP 5455620 B2 JP5455620 B2 JP 5455620B2
- Authority
- JP
- Japan
- Prior art keywords
- radiation detector
- radiation
- detector
- contact
- metallization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000005855 radiation Effects 0.000 title claims description 66
- 238000001465 metallisation Methods 0.000 claims description 47
- 238000012545 processing Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 18
- 238000004891 communication Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 238000007689 inspection Methods 0.000 claims 2
- 239000011810 insulating material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 20
- 238000002591 computed tomography Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000003491 array Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 210000003484 anatomy Anatomy 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000002059 diagnostic imaging Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- YIAXEFITNBBEOD-UHFFFAOYSA-N gadolinium(3+) trisulfide Chemical compound [S--].[S--].[S--].[Gd+3].[Gd+3] YIAXEFITNBBEOD-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000035479 physiological effects, processes and functions Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14663—Indirect radiation imagers, e.g. using luminescent members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2018—Scintillation-photodiode combinations
- G01T1/20182—Modular detectors, e.g. tiled scintillators or tiled photodiodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14634—Assemblies, i.e. Hybrid structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14661—X-ray, gamma-ray or corpuscular radiation imagers of the hybrid type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/50—Detectors
- G01N2223/501—Detectors array
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0601—Structure
- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0605—Shape
- H01L2224/06051—Bonding areas having different shapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16135—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/16145—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48145—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3114—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
- H01L2924/143—Digital devices
- H01L2924/1433—Application-specific integrated circuit [ASIC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15192—Resurf arrangement of the internal vias
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16151—Cap comprising an aperture, e.g. for pressure control, encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/162—Disposition
- H01L2924/16235—Connecting to a semiconductor or solid-state bodies, i.e. cap-to-chip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19102—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device
- H01L2924/19104—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device on the semiconductor or solid-state device, i.e. passive-on-chip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Description
Claims (27)
- 放射線受け面を有し且つ該放射線受け面によって受容される放射線を検出する放射線感受性検出器素子の二次元配列を含む半導体基板と、
前記放射線受け面と反対の前記半導体基板の側に形成されるメタライゼーションとを含み、該メタライゼーションは、第一接点と、第二接点とを含み、前記第一接点は、前記放射線感受性検出器素子の二次元配列に電気的に接続され、前記メタライゼーションは、前記第一接点と前記第二接点との間に電気信号を経路指定するよう構成され、
前記第二接点に接続される信号処理電子機器と、
前記放射線受け面と反対の当該放射線検出器の側に配置されるカバーとを含み、該カバーは、第一の比較的断熱性の材料から加工される第一部分と、比較的熱伝導性の材料から加工される第二部分とを含み、該第二部分は、前記信号処理電子機器と熱連絡する、
放射線検出器。 - 前記放射線感受性検出器素子の配列は、第一物理的配列を有し、当該放射線検出器は、前記第一物理的配列とは異なる第二物理的配列を有する信号処理電子機器との使用のために構成され、前記第二接点は、前記第二物理的配列に適合する、請求項1に記載の放射線検出器。
- 当該放射線検出器は、前記第二接点にワイヤボンディングされる信号処理電子機器との使用のために構成される、請求項2に記載の放射線検出器。
- 前記メタライゼーションは、前記第一接点と前記第二接点との間の導電性経路の少なくとも一部を提供する電気導体を含む、請求項1に記載の放射線検出器。
- 前記メタライゼーションは、第一メタライゼーション層と、第二メタライゼーション層とを含む、請求項4に記載の放射線検出器。
- 前記メタライゼーションは、電気コネクタに接続されるよう構成される接点を含む、請求項1に記載の放射線検出器。
- 電気コネクタと、回路板とをさらに含み、前記電気コネクタは、前記電気コネクタと前記回路板との間に電気接続をもたらすために、前記電気コネクタに並びに前記回路板に接続するよう構成される前記接点と接続される、請求項6に記載の放射線検出器。
- 前記光検出器は、CMOS光検出器である、請求項1に記載の放射線検出器。
- 前記信号処理電子機器は、前記第二接点にバンプボンディング又はワイヤボンディングの1つで結合される集積回路を含む、請求項1に記載の放射線検出器。
- 前記信号処理電子機器に動作的に接続され且つ前記メタライゼーションに電気的に接続される電気コネクタを含む、請求項9に記載の放射線検出器。
- 前記放射線受け面と光学的に連絡するシンチレータを含む、請求項10に記載の放射線検出器。
- シンチレータと、
光検出器配列とを含み、該光検出器配列は、
前記シンチレータと光学的に連絡する前記放射線感受性検出器素子の二次元配列を形成する複数の光検出器素子を含む前記半導体基板と、
前記シンチレータと反対の前記半導体基板の側に形成される前記メタライゼーションとを含み、
前記信号処理電子機器は、前記シンチレータと反対の前記光検出器配列の側に支持され、
前記第二接点は、前記信号処理電子機器と電気的に連絡する、
請求項1に記載の放射線検出器。 - 前記メタライゼーションは、第一メタライゼーション層及び第二メタライゼーション層を含む、請求項12に記載の放射線検出器。
- 前記第一接点は、前記第一層内に配置され、前記第二接点は、前記第二層内に配置される、請求項13に記載の放射線検出器。
- 前記信号処理電子機器は、集積回路を含む、請求項12に記載の放射線検出器。
- 前記集積回路は、前記第二接点にバンプボンディングされる、請求項15に記載の放射線検出器。
- 前記メタライゼーションは、前記第一接点と前記第二接点との間の導電性経路の少なくとも一部を形成する導電性回路トレースを含む、請求項12に記載の放射線検出器。
- 当該放射線検出器の外部に電気接続をもたらすよう構成される電気コネクタをさらに含み、前記メタライゼーションは、前記信号処理電子機器と前記コネクタとの間の導電性経路の少なくとも一部を形成する、請求項12に記載の放射線検出器。
- 前記光検出器素子は、背面照射フォトダイオードを含む、請求項12に記載の放射線検出器。
- 前記第一部分は、射出形成ポリマを含む、請求項1に記載の放射線検出器。
- 前記複数の光検出器素子は、境界付き平面を定める配列内に配置され、前記信号処理電子機器は、前記境界付き平面内に配置される、請求項12に記載の放射線検出器。
- 検査領域と、
該検査領域内の物体を支持する物体支持体とを含む装置であって、
当該装置は、請求項1に記載の放射線検出器を含み、該放射線検出器は、二次元配列に配置される複数の放射線検出器モジュールを含み、
該放射線検出器モジュールは、前記半導体基板を含む光検出器配列と、前記メタライゼーションと、前記信号処理電子機器と、前記カバーとを含み、
前記メタライゼーションは、放射線受け面と反対の前記半導体基板の側に形成される少なくとも第一電気信号経路指定層を含み、
前記信号処理電子機器は、前記光検出器配列によって支持され、
前記少なくとも第一信号経路指定層は、前記半導体基板と前記信号処理電子機器との間に物理的に配置され、
前記少なくとも第一電気信号経路指定層は、前記信号処理電子機器に電気的に接続される、
装置。 - 前記放射線検出器の前記信号処理電子機器は、ASICを含む、請求項22に記載の装置。
- 前記検出器モジュールは、前記光検出器配列によって支持され且つ前記信号処理電子機器と電気的に連絡する電気コネクタを含み、前記少なくとも第一経路指定層は、前記信号処理電子機器と前記電気コネクタとの間に導電性経路の少なくとも一部を形成する、請求項22に記載の装置。
- 回路板と、熱伝導性部材とを含み、前記それぞれの検出器モジュールの前記コネクタは、前記回路板に電気的に接続され、前記熱伝導性部材は、前記放射線受け面と反対の検出器モジュールの側に熱的に接続される、請求項24に記載の装置。
- 前記回路板は、無材料領域を含み、前記熱伝導性部材の一部が、前記無材料領域を通じて突出する、請求項25に記載の装置。
- 前記熱伝導性部材は、前記無材料領域を通じて突出する前記熱伝導性部材の前記一部を介して前記カバーと熱接触する、請求項26に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74397606P | 2006-03-30 | 2006-03-30 | |
US60/743,976 | 2006-03-30 | ||
PCT/US2007/063532 WO2007117799A2 (en) | 2006-03-30 | 2007-03-08 | Radiation detector array |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009532676A JP2009532676A (ja) | 2009-09-10 |
JP5455620B2 true JP5455620B2 (ja) | 2014-03-26 |
Family
ID=38268760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009503121A Active JP5455620B2 (ja) | 2006-03-30 | 2007-03-08 | 放射線検出器および当該検出器を含む装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US8710448B2 (ja) |
EP (2) | EP3361507A1 (ja) |
JP (1) | JP5455620B2 (ja) |
KR (1) | KR20080106453A (ja) |
CN (1) | CN101410983B (ja) |
CA (1) | CA2647407A1 (ja) |
RU (1) | RU2408110C2 (ja) |
TW (1) | TW200808270A (ja) |
WO (1) | WO2007117799A2 (ja) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009189801A (ja) * | 2008-01-18 | 2009-08-27 | Toshiba Corp | 放射線検出器、x線ct装置、および放射線検出器の製造方法 |
EP2333585B1 (en) * | 2008-10-03 | 2019-11-20 | Canon Electron Tubes & Devices Co., Ltd. | Radiation detection device and radiation photographing apparatus |
CN102414579B (zh) | 2009-03-26 | 2014-05-07 | 皇家飞利浦电子股份有限公司 | 数据采集 |
CN103323871B (zh) | 2009-03-26 | 2016-01-27 | 皇家飞利浦电子股份有限公司 | 数据采集 |
JP5281484B2 (ja) * | 2009-05-28 | 2013-09-04 | 浜松ホトニクス株式会社 | 放射線検出ユニット |
BR112012014166A2 (pt) | 2009-12-15 | 2016-05-17 | Koninkl Philips Electronics Nv | recorte de imagem do detector de um sistema de geração de imagens e método |
US8610079B2 (en) * | 2009-12-28 | 2013-12-17 | General Electric Company | Robust radiation detector and method of forming the same |
US8575558B2 (en) * | 2010-11-30 | 2013-11-05 | General Electric Company | Detector array with a through-via interposer |
CN103443652B (zh) * | 2011-03-24 | 2017-02-15 | 皇家飞利浦有限公司 | 谱成像探测器 |
JP5844580B2 (ja) * | 2011-09-05 | 2016-01-20 | 浜松ホトニクス株式会社 | 固体撮像素子及び固体撮像素子の実装構造 |
US9168008B2 (en) * | 2011-11-03 | 2015-10-27 | General Electric Company | Coarse segmented detector architecture and method of making same |
RU2605520C2 (ru) * | 2011-11-29 | 2016-12-20 | Конинклейке Филипс Н.В. | Сцинтилляторный блок, содержащий поглощающую рентгеновские лучи оболочку, и рентгеновская детекторная матрица, содержащая такой сцинтилляторный блок |
US8569711B2 (en) * | 2011-12-21 | 2013-10-29 | General Electric Company | HE-3 tube array alignment mount |
BR112014015663A8 (pt) * | 2011-12-27 | 2017-07-04 | Koninklijke Philips Nv | módulo do detector de radiação, digitalizador de pet, e método de montagem de uma matriz do detector de radiação |
US9318524B2 (en) | 2012-04-30 | 2016-04-19 | Koninklijke Philips N.V. | Imaging detector with per pixel analog channel well isolation with decoupling |
CN104285297B (zh) | 2012-04-30 | 2017-08-29 | 皇家飞利浦有限公司 | 在读出电子器件和/或光传感器中具有抗混叠滤波器的成像探测器 |
US9012857B2 (en) * | 2012-05-07 | 2015-04-21 | Koninklijke Philips N.V. | Multi-layer horizontal computed tomography (CT) detector array with at least one thin photosensor array layer disposed between at least two scintillator array layers |
EP2852851A1 (en) * | 2012-05-22 | 2015-04-01 | Analogic Corporation | Detection system and detector array interconnect assemblies |
BR112015012550A2 (pt) | 2012-12-03 | 2018-02-06 | Koninklijke Philips Nv | matriz detectora e método |
US20140321601A1 (en) * | 2013-04-26 | 2014-10-30 | Texas Instruments Incorporated | Active shield for x-ray computed tomography machine |
CN105556673B (zh) * | 2013-07-26 | 2018-11-30 | 模拟技术公司 | 用于辐射成像模式的探测器阵列的探测器单元 |
GB2516872A (en) | 2013-08-02 | 2015-02-11 | Ibm | A method for a logging process in a data storage system |
RU2549565C1 (ru) * | 2013-12-02 | 2015-04-27 | Закрытое акционерное общество "Научно-исследовательская производственная компания "Электрон" (ЗАО НИПК "Электрон") | Способ изготовления матрицы фоточувствительных элементов плоскопанельного детектора рентгеновского изображения |
CN105326523B (zh) * | 2014-07-28 | 2020-07-28 | Ge医疗系统环球技术有限公司 | 医疗用x射线探测器 |
US9526468B2 (en) * | 2014-09-09 | 2016-12-27 | General Electric Company | Multiple frame acquisition for exposure control in X-ray medical imagers |
WO2016064374A1 (en) * | 2014-10-20 | 2016-04-28 | Analogic Corporation | Detector unit for detector array of radiation imaging modality |
CN104605876A (zh) * | 2014-12-12 | 2015-05-13 | 沈阳东软医疗系统有限公司 | 一种ct机检测器模块和检测器系统 |
JP6285577B2 (ja) * | 2015-01-15 | 2018-02-28 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 撮像検出器モジュールアセンブリ |
US9835733B2 (en) * | 2015-04-30 | 2017-12-05 | Zhengrong Ying | Apparatus for detecting X-rays |
US10185043B2 (en) | 2015-07-17 | 2019-01-22 | Analogic Corporation | Detector unit for detector array of radiation imaging modality |
US10261195B2 (en) * | 2015-08-07 | 2019-04-16 | Koninklijke Philips N.V. | Imaging detector with improved spatial accuracy |
US9599723B2 (en) | 2015-08-18 | 2017-03-21 | Carestream Health, Inc. | Method and apparatus with tiled image sensors |
US10192646B2 (en) | 2016-04-25 | 2019-01-29 | General Electric Company | Radiation shielding system |
CN109642957A (zh) | 2016-08-03 | 2019-04-16 | 皇家飞利浦有限公司 | 三维固态成像光电探测器 |
JP6907054B2 (ja) * | 2017-07-07 | 2021-07-21 | キヤノン株式会社 | 放射線撮影装置 |
EP3462494B1 (en) * | 2017-09-29 | 2021-03-24 | Detection Technology OY | Integrated radiation detector device |
CN107874776A (zh) * | 2017-12-05 | 2018-04-06 | 湖北锐世数字医学影像科技有限公司 | 一种pet晶体单元的挂接装置 |
CN108186040B (zh) * | 2017-12-27 | 2021-05-14 | 上海联影医疗科技股份有限公司 | Pet探测模块及具有该模块的pet探测设备 |
JP6555380B2 (ja) * | 2018-04-09 | 2019-08-07 | 大日本印刷株式会社 | ガス増幅を用いた放射線検出器 |
JP7166833B2 (ja) * | 2018-08-03 | 2022-11-08 | キヤノンメディカルシステムズ株式会社 | 放射線検出器及び放射線検出器モジュール |
WO2020118102A1 (en) | 2018-12-06 | 2020-06-11 | Analog Devices, Inc. | Shielded integrated device packages |
KR20210101238A (ko) | 2018-12-06 | 2021-08-18 | 아나로그 디바이시즈 인코포레이티드 | 패시브 디바이스 조립체가 포함된 통합 디바이스 패키지 |
US11282763B2 (en) * | 2019-06-24 | 2022-03-22 | Amkor Technology Singapore Holding Pte. Ltd. | Semiconductor device having a lid with through-holes |
CN110664422A (zh) * | 2019-09-09 | 2020-01-10 | 东软医疗系统股份有限公司 | 探测器模块、探测器及医疗成像设备 |
CN112928106A (zh) * | 2019-12-05 | 2021-06-08 | 同方威视技术股份有限公司 | 探测器装置和阵列面板 |
US11664340B2 (en) | 2020-07-13 | 2023-05-30 | Analog Devices, Inc. | Negative fillet for mounting an integrated device die to a carrier |
CN113327952A (zh) * | 2021-05-28 | 2021-08-31 | 北京京东方传感技术有限公司 | 一种平板探测装置和数字影像诊断设备 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6224174A (ja) * | 1985-07-24 | 1987-02-02 | Hitachi Medical Corp | 放射線検出器 |
JPH01165983A (ja) * | 1987-12-23 | 1989-06-29 | Hitachi Medical Corp | 放射線検出器 |
JPH02306639A (ja) * | 1989-05-22 | 1990-12-20 | Toshiba Corp | 半導体装置の樹脂封入方法 |
DE4017697C2 (de) * | 1990-06-01 | 2003-12-11 | Bosch Gmbh Robert | Elektronisches Bauelement, Verfahren zu dessen Herstellung und Verwendung |
US6426991B1 (en) * | 2000-11-16 | 2002-07-30 | Koninklijke Philips Electronics N.V. | Back-illuminated photodiodes for computed tomography detectors |
JP2003084066A (ja) | 2001-04-11 | 2003-03-19 | Nippon Kessho Kogaku Kk | 放射線検出器用部品、放射線検出器および放射線検出装置 |
FR2824953B1 (fr) * | 2001-05-18 | 2004-07-16 | St Microelectronics Sa | Boitier semi-conducteur optique a lentille incorporee et blindage |
US6800947B2 (en) * | 2001-06-27 | 2004-10-05 | Intel Corporation | Flexible tape electronics packaging |
US6510195B1 (en) * | 2001-07-18 | 2003-01-21 | Koninklijke Philips Electronics, N.V. | Solid state x-radiation detector modules and mosaics thereof, and an imaging method and apparatus employing the same |
DE10142531A1 (de) * | 2001-08-30 | 2003-03-20 | Philips Corp Intellectual Pty | Sensoranordnung aus licht- und/oder röntgenstrahlungsempfindlichen Sensoren |
KR100447867B1 (ko) * | 2001-10-05 | 2004-09-08 | 삼성전자주식회사 | 반도체 패키지 |
US7230247B2 (en) * | 2002-03-08 | 2007-06-12 | Hamamatsu Photonics K.K. | Detector |
JP4237966B2 (ja) * | 2002-03-08 | 2009-03-11 | 浜松ホトニクス株式会社 | 検出器 |
TWI243339B (en) * | 2002-03-19 | 2005-11-11 | Casio Computer Co Ltd | Image reading apparatus and drive control method |
US7117588B2 (en) | 2002-04-23 | 2006-10-10 | Ge Medical Systems Global Technology Company, Llc | Method for assembling tiled detectors for ionizing radiation based image detection |
WO2003103361A1 (en) * | 2002-06-03 | 2003-12-11 | Mendolia, Greg, S. | Combined emi shielding and internal antenna for mobile products |
JP4364514B2 (ja) * | 2003-01-08 | 2009-11-18 | 浜松ホトニクス株式会社 | 配線基板、及びそれを用いた放射線検出器 |
US6984816B2 (en) * | 2003-08-13 | 2006-01-10 | Motorola, Inc. | Vertically integrated photosensor for CMOS imagers |
US7170049B2 (en) | 2003-12-30 | 2007-01-30 | Dxray, Inc. | Pixelated cadmium zinc telluride based photon counting mode detector |
US7075091B2 (en) | 2004-01-29 | 2006-07-11 | Ge Medical Systems Global Technology Company, Llc | Apparatus for detecting ionizing radiation |
US7224047B2 (en) * | 2004-12-18 | 2007-05-29 | Lsi Corporation | Semiconductor device package with reduced leakage |
JP4963349B2 (ja) * | 2005-01-14 | 2012-06-27 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
-
2007
- 2007-03-08 US US12/293,842 patent/US8710448B2/en active Active
- 2007-03-08 CN CN2007800113135A patent/CN101410983B/zh active Active
- 2007-03-08 EP EP18156899.9A patent/EP3361507A1/en not_active Withdrawn
- 2007-03-08 JP JP2009503121A patent/JP5455620B2/ja active Active
- 2007-03-08 KR KR1020087023604A patent/KR20080106453A/ko not_active Application Discontinuation
- 2007-03-08 WO PCT/US2007/063532 patent/WO2007117799A2/en active Application Filing
- 2007-03-08 CA CA002647407A patent/CA2647407A1/en not_active Abandoned
- 2007-03-08 EP EP07758115A patent/EP2005475A2/en not_active Ceased
- 2007-03-08 RU RU2008142998/28A patent/RU2408110C2/ru not_active IP Right Cessation
- 2007-03-27 TW TW096110579A patent/TW200808270A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
EP3361507A1 (en) | 2018-08-15 |
CN101410983B (zh) | 2011-11-09 |
US8710448B2 (en) | 2014-04-29 |
KR20080106453A (ko) | 2008-12-05 |
EP2005475A2 (en) | 2008-12-24 |
WO2007117799A3 (en) | 2007-12-06 |
JP2009532676A (ja) | 2009-09-10 |
CN101410983A (zh) | 2009-04-15 |
WO2007117799A2 (en) | 2007-10-18 |
CA2647407A1 (en) | 2007-10-18 |
RU2408110C2 (ru) | 2010-12-27 |
US20090121146A1 (en) | 2009-05-14 |
RU2008142998A (ru) | 2010-05-10 |
TW200808270A (en) | 2008-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5455620B2 (ja) | 放射線検出器および当該検出器を含む装置 | |
US7582879B2 (en) | Modular x-ray measurement system | |
US10488532B2 (en) | Detector unit for detector array of radiation imaging modality | |
US9835733B2 (en) | Apparatus for detecting X-rays | |
US9599725B2 (en) | Spectral imaging detector | |
US20080253507A1 (en) | Computed Tomography Detector Using Thin Circuits | |
US10598802B2 (en) | Detector unit for detector array of radiation imaging modality | |
JP2008161689A (ja) | 計算機式断層写真法検出器モジュール構成 | |
JP2004536313A (ja) | 固体x線放射検出器モジュールとそのモザイク構造、および撮像方法とそれを用いる撮像装置 | |
EP3143430B1 (en) | Sensor device and imaging system for detecting radiation signals | |
US10488531B2 (en) | Detection system and detector array interconnect assemblies | |
JP2005229110A (ja) | 電離放射線を検出する装置 | |
US10211249B2 (en) | X-ray detector having a capacitance-optimized light-tight pad structure | |
JP7213951B2 (ja) | イメージセンサ、イメージセンサ装置、及び、これらを含むコンピュータ断層撮影装置 | |
US10181493B2 (en) | Radiation detector system of radiation imaging modality | |
WO2022101313A1 (en) | Module assembly for detection of x-ray radiation | |
CN111128991A (zh) | Ct探测器及ct机 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100304 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120605 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120822 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130507 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130723 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131210 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140107 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5455620 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |