JP5442557B2 - 光活性基を側鎖として有するはしご構造のポリシルセスキオキサン及びその製造方法 - Google Patents
光活性基を側鎖として有するはしご構造のポリシルセスキオキサン及びその製造方法 Download PDFInfo
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- JP5442557B2 JP5442557B2 JP2010174708A JP2010174708A JP5442557B2 JP 5442557 B2 JP5442557 B2 JP 5442557B2 JP 2010174708 A JP2010174708 A JP 2010174708A JP 2010174708 A JP2010174708 A JP 2010174708A JP 5442557 B2 JP5442557 B2 JP 5442557B2
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- photoactive
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- polysilsesquioxane
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- 229920000734 polysilsesquioxane polymer Polymers 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000178 monomer Substances 0.000 claims description 24
- -1 silane compound Chemical class 0.000 claims description 18
- 229910000077 silane Inorganic materials 0.000 claims description 15
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 claims description 13
- 125000000524 functional group Chemical group 0.000 claims description 13
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 6
- 238000012643 polycondensation polymerization Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 5
- 150000004032 porphyrins Chemical class 0.000 claims description 5
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 claims description 4
- 239000000987 azo dye Substances 0.000 claims description 4
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
- 229930192474 thiophene Natural products 0.000 claims description 4
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 claims description 3
- 125000006539 C12 alkyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 230000003301 hydrolyzing effect Effects 0.000 claims description 3
- 125000002950 monocyclic group Chemical group 0.000 claims description 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 claims 2
- 229960000956 coumarin Drugs 0.000 claims 1
- 235000001671 coumarin Nutrition 0.000 claims 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 10
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 7
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- NEKVNWJRLIKKJA-UHFFFAOYSA-N 1-propyl-9h-carbazole Chemical compound C12=CC=CC=C2NC2=C1C=CC=C2CCC NEKVNWJRLIKKJA-UHFFFAOYSA-N 0.000 description 5
- 238000002189 fluorescence spectrum Methods 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000013086 organic photovoltaic Methods 0.000 description 3
- OJDMPNHKKBZHSV-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl.CO[Si](OC)(OC)CCCCl OJDMPNHKKBZHSV-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 150000001716 carbazoles Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 238000006862 quantum yield reaction Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GLISZRPOUBOZDL-UHFFFAOYSA-N 3-bromopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCBr GLISZRPOUBOZDL-UHFFFAOYSA-N 0.000 description 1
- YDBDNCLUKHFVFJ-UHFFFAOYSA-N 3-carbazol-9-ylpropyl(trimethoxy)silane Chemical compound C1=CC=C2N(CCC[Si](OC)(OC)OC)C3=CC=CC=C3C2=C1 YDBDNCLUKHFVFJ-UHFFFAOYSA-N 0.000 description 1
- HXPOXKCKHNPSQD-UHFFFAOYSA-N BrCCCOC[SiH3] Chemical compound BrCCCOC[SiH3] HXPOXKCKHNPSQD-UHFFFAOYSA-N 0.000 description 1
- CUUIYGDZYWTLJA-UHFFFAOYSA-N ICCC[Si](C)(C)C.C(CC)[Si](OC)(OC)OC Chemical compound ICCC[Si](C)(C)C.C(CC)[Si](OC)(OC)OC CUUIYGDZYWTLJA-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 150000004775 coumarins Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 229940030980 inova Drugs 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 150000004893 oxazines Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000103 photoluminescence spectrum Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003220 pyrenes Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003577 thiophenes Chemical class 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
Description
実施例1に従い製造されたPPCSQの重量平均分子量及び分子量分布を、屈折率検出器のRI−2031 plus(製品名)とUV検出器のUV-2075 plus(製品名)(検出波長254nm)が装着されたSECシステムのJASCO PU−2080 plus(製品名)を使用して測定した。40℃、流動率1mL/minでTHFを使用し、サンプルは、4つのコラム(Shodex−GPC KF−802、KF−803、KF−804及びKF−805)によって分離した。その結果、収得されたPPCSQは、SEC分析によって10,200の重量平均分子量を有し、分子量分布が2.16であることを確認した。
実施例1に従い製造されたPPCSQの25℃ CDCl3での1H及び29SiスペクトルをVarian Unity INOVA(1H:300MHz、29Si:99.5MHz)記録し、図1及び図2のそれぞれに1Hスペクトル及び29Siスペクトルを示した。
Perkin−Elmer FT−IR system Spectrum−GXにてKBr pallets上で溶媒キャスティングしたフィルムを使用して、実施例1に従い製造されたPPCSQのフーリエ変換赤外線(FT−IR)スペクトルを測定し、その結果を図3に示した。
実施例1に従い製造されたPPCSQの詳細な構造を知るために、X線回折(X−ray diffraction、XRD)分析を行い、その結果を図4に示した。
実施例1に従い製造されたPPCSQの熱的挙動をTGA(thermal gravimetric analyzer)及びDSC(differential scanning calorimeter)を使用して確認し、その測定結果のそれぞれを図5及び図6に示した。
実施例1に従い製造されたPPCSQの電気光学特性を確認するために、シリコン基盤のPPCSQとこれに相応する炭化水素基盤のポリビニルカルバゾール(PVK)をTHF(1×10−4mol)中に添加して溶液サンプルを調製した後、UV吸光度及び蛍光発光スペクトルを観察し、その結果を図7に示した。
Claims (5)
- (a)三官能性シラン化合物と光活性化合物とをKOH、NaOH、Na 2 CO 3 、及びK 2 CO 3 よりなる群から選択された一種以上の触媒存在下に反応させてモノマーを調製するステップ、及び
(b)前記モノマーを加水分解すると同時に縮合重合するステップ、を含む、光活性基が結合されたはしご構造のポリシルセスキオキサンの製造方法。 - 前記光活性基は、置換または非置換されたフェニレン系、パイレン系、ルブレン系、クマリン系、オキサジン系、カルバゾール系、チオフェン系、イリジウム系、ポルフィリン系、アゾ系染料型官能基を含むフェニル系単環式基、これらの複素環式基または環式基内に二重または三重結合を有することで光活性特性をもつ官能基、及びこれらの誘導体よりなる群から選択された一種以上であることを特徴とする請求項1に記載の製造方法。
- 前記モノマーは、下記一般式1で示されることを特徴とする請求項1に記載の製造方法。
前記式中、Rは、Si原子と直接結合するか、アルキル置換されたフェニレン系、パイレン系、ルブレン系、クマリン系、オキサジン系、カルバゾール系、チオフェン系、イリジウム系、ポルフィリン系、アゾ系染料型官能基を含むフェニル系単環式基、これらの複素環式基、環式基内に二重または三重結合を有することで光活性特性をもつ官能基、及びこれらの誘導体よりなる群から選択された一種以上であり、R'は、置換または非置換されたC1ないしC3のアルキル基である。 - 前記一般式1において、RとSi原子との間にC1ないしC12のアルキル基が存在することを特徴とする請求項3に記載の製造方法。
- 前記製造方法は、常温ないし200℃の温度下で行なわれることを特徴とする請求項1に記載の製造方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020100031862A KR20110112641A (ko) | 2010-04-07 | 2010-04-07 | 광활성 그룹을 측쇄로 가지는 사다리 구조의 폴리실세스퀴옥산 및 이의 제조방법 |
| KR10-2010-0031862 | 2010-04-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011219719A JP2011219719A (ja) | 2011-11-04 |
| JP5442557B2 true JP5442557B2 (ja) | 2014-03-12 |
Family
ID=44743750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010174708A Expired - Fee Related JP5442557B2 (ja) | 2010-04-07 | 2010-08-03 | 光活性基を側鎖として有するはしご構造のポリシルセスキオキサン及びその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20110251369A1 (ja) |
| JP (1) | JP5442557B2 (ja) |
| KR (1) | KR20110112641A (ja) |
| CN (1) | CN102212195A (ja) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102363818B1 (ko) * | 2014-02-28 | 2022-02-17 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
| WO2015130145A1 (ko) * | 2014-02-28 | 2015-09-03 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
| KR102363819B1 (ko) * | 2014-02-28 | 2022-02-17 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
| WO2015130144A1 (ko) * | 2014-02-28 | 2015-09-03 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
| KR101643295B1 (ko) * | 2014-10-30 | 2016-07-28 | 건국대학교 산학협력단 | 폴리실세스퀴옥산을 코어로 하는 수용성 포르피린집합체 광감작제 및 그 제조방법 |
| KR101731495B1 (ko) * | 2015-01-08 | 2017-04-28 | 한국과학기술연구원 | 폴리오르가노―실세스퀴옥산 및 파장변환제를 포함하는 코팅 조성물, 및 이를 이용한 파장변환 시트 |
| US10273329B2 (en) | 2016-03-11 | 2019-04-30 | Lei Fang | Organic semiconductor polymer |
| CN106890341B (zh) * | 2017-03-10 | 2020-09-11 | 东南大学 | 基于化学交联的光疗纳米制剂及其制备方法和应用 |
| CN108440759B (zh) * | 2018-03-20 | 2020-03-24 | 山东大学 | 一种咔唑基poss单体及其制备方法 |
| CN109599538A (zh) * | 2018-10-25 | 2019-04-09 | 北京化工大学 | 一种Si/C复合材料的制备方法及其储能应用 |
| CN111569068B (zh) * | 2020-05-14 | 2022-08-30 | 南京邮电大学 | 一种有机无机杂化光敏剂及杂化纳米诊疗试剂的制备方法 |
| CN112011055B (zh) * | 2020-07-29 | 2021-05-28 | 山东大学 | 一种吸附和光控解吸附蛋白质的功能有机硅树脂及其制备方法 |
| CN112341625B (zh) * | 2020-11-27 | 2022-07-22 | 广州天赐高新材料股份有限公司 | 一种耐高温高相容性梯形硅树脂及其制备方法和应用 |
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| US4670299A (en) * | 1984-11-01 | 1987-06-02 | Fujitsu Limited | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board |
| US4745169A (en) * | 1985-05-10 | 1988-05-17 | Hitachi, Ltd. | Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer |
| JPS63146976A (ja) * | 1986-12-11 | 1988-06-18 | Daikin Ind Ltd | 撥水撥油剤組成物 |
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| JPH08245792A (ja) * | 1995-03-10 | 1996-09-24 | Mitsubishi Electric Corp | シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法 |
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| EP1660564A1 (en) * | 2003-08-20 | 2006-05-31 | Dow Corning Corporation | Carbazolyl-functional linear polysiloxanes, silicone composition, and organic light-emitting diode |
| JP2005100710A (ja) * | 2003-09-22 | 2005-04-14 | Fuji Photo Film Co Ltd | 有機電界発光素子 |
| KR100682859B1 (ko) * | 2004-01-27 | 2007-02-15 | 삼성에스디아이 주식회사 | 폴리실세스퀴옥산계 화합물 및 이를 이용한 유기 전계발광 소자 |
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| CN101946209B (zh) * | 2008-02-18 | 2014-01-22 | 日产化学工业株式会社 | 具有环状氨基的含有硅的形成抗蚀剂下层膜的组合物 |
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2010
- 2010-04-07 KR KR1020100031862A patent/KR20110112641A/ko not_active Ceased
- 2010-08-03 JP JP2010174708A patent/JP5442557B2/ja not_active Expired - Fee Related
- 2010-08-06 US US12/851,708 patent/US20110251369A1/en not_active Abandoned
- 2010-09-10 CN CN2010102834781A patent/CN102212195A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN102212195A (zh) | 2011-10-12 |
| JP2011219719A (ja) | 2011-11-04 |
| KR20110112641A (ko) | 2011-10-13 |
| US20110251369A1 (en) | 2011-10-13 |
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