JP5434719B2 - 光フィルターおよび分析機器 - Google Patents

光フィルターおよび分析機器 Download PDF

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Publication number
JP5434719B2
JP5434719B2 JP2010063923A JP2010063923A JP5434719B2 JP 5434719 B2 JP5434719 B2 JP 5434719B2 JP 2010063923 A JP2010063923 A JP 2010063923A JP 2010063923 A JP2010063923 A JP 2010063923A JP 5434719 B2 JP5434719 B2 JP 5434719B2
Authority
JP
Japan
Prior art keywords
substrate
optical filter
mirror
surface portion
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010063923A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011197386A5 (enExample
JP2011197386A (ja
Inventor
晋 新東
成二 山▲崎▼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2010063923A priority Critical patent/JP5434719B2/ja
Priority to US13/038,587 priority patent/US20110228396A1/en
Priority to KR1020110022649A priority patent/KR20110105713A/ko
Priority to TW100108982A priority patent/TWI528050B/zh
Priority to EP15185426.2A priority patent/EP2985657B1/en
Priority to EP11158638.4A priority patent/EP2367057B1/en
Priority to EP13157163.0A priority patent/EP2600193A3/en
Priority to EP13157161.4A priority patent/EP2600192B1/en
Priority to EP13157164.8A priority patent/EP2600194B1/en
Priority to CN201110069658.4A priority patent/CN102193187B/zh
Priority to EP13157159.8A priority patent/EP2600191A3/en
Publication of JP2011197386A publication Critical patent/JP2011197386A/ja
Publication of JP2011197386A5 publication Critical patent/JP2011197386A5/ja
Application granted granted Critical
Publication of JP5434719B2 publication Critical patent/JP5434719B2/ja
Priority to US15/084,637 priority patent/US9703092B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G02F1/213—Fabry-Perot type
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H10P76/2041—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Filters (AREA)
  • Micromachines (AREA)
JP2010063923A 2010-03-19 2010-03-19 光フィルターおよび分析機器 Active JP5434719B2 (ja)

Priority Applications (12)

Application Number Priority Date Filing Date Title
JP2010063923A JP5434719B2 (ja) 2010-03-19 2010-03-19 光フィルターおよび分析機器
US13/038,587 US20110228396A1 (en) 2010-03-19 2011-03-02 Optical filter and analytical instrument
KR1020110022649A KR20110105713A (ko) 2010-03-19 2011-03-15 광 필터 및 분석 기기
TW100108982A TWI528050B (zh) 2010-03-19 2011-03-16 濾光器及分析機器
EP13157161.4A EP2600192B1 (en) 2010-03-19 2011-03-17 Optical filter and analytical instrument
EP13157163.0A EP2600193A3 (en) 2010-03-19 2011-03-17 Optical filter and analytical instrument
EP15185426.2A EP2985657B1 (en) 2010-03-19 2011-03-17 Optical filter and analytical instrument
EP13157164.8A EP2600194B1 (en) 2010-03-19 2011-03-17 Optical filter and analytical instrument
CN201110069658.4A CN102193187B (zh) 2010-03-19 2011-03-17 光滤波器及其分析设备
EP13157159.8A EP2600191A3 (en) 2010-03-19 2011-03-17 Optical filter and analytical instrument
EP11158638.4A EP2367057B1 (en) 2010-03-19 2011-03-17 Optical filter and analytical instrument
US15/084,637 US9703092B2 (en) 2010-03-19 2016-03-30 Optical filter including a substrate having a groove with a pair of curved surfaces and analytical instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010063923A JP5434719B2 (ja) 2010-03-19 2010-03-19 光フィルターおよび分析機器

Publications (3)

Publication Number Publication Date
JP2011197386A JP2011197386A (ja) 2011-10-06
JP2011197386A5 JP2011197386A5 (enExample) 2012-11-29
JP5434719B2 true JP5434719B2 (ja) 2014-03-05

Family

ID=44260891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010063923A Active JP5434719B2 (ja) 2010-03-19 2010-03-19 光フィルターおよび分析機器

Country Status (5)

Country Link
US (2) US20110228396A1 (enExample)
EP (6) EP2367057B1 (enExample)
JP (1) JP5434719B2 (enExample)
KR (1) KR20110105713A (enExample)
TW (1) TWI528050B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5434719B2 (ja) * 2010-03-19 2014-03-05 セイコーエプソン株式会社 光フィルターおよび分析機器
JP5928992B2 (ja) 2010-10-07 2016-06-01 セイコーエプソン株式会社 波長可変干渉フィルターの製造方法
JP6024086B2 (ja) * 2011-09-29 2016-11-09 セイコーエプソン株式会社 波長可変干渉フィルター、光学フィルターデバイス、光学モジュール、電子機器、及び波長可変干渉フィルターの製造方法
JP5910099B2 (ja) * 2012-01-18 2016-04-27 セイコーエプソン株式会社 干渉フィルター、光学モジュールおよび電子機器
JP6089674B2 (ja) 2012-12-19 2017-03-08 セイコーエプソン株式会社 波長可変干渉フィルター、波長可変干渉フィルターの製造方法、光学フィルターデバイス、光学モジュール、及び電子機器
US20140226988A1 (en) * 2013-02-12 2014-08-14 Avago Technologies General Ip (Singapore) Pte. Ltd Bidirectional optical data communications module having reflective lens
EP3505988B1 (en) * 2016-08-24 2021-05-19 Hamamatsu Photonics K.K. Fabry-perot interference filter
JP7200842B2 (ja) * 2019-06-21 2023-01-10 セイコーエプソン株式会社 波長可変干渉フィルター
JP7517139B2 (ja) * 2020-12-24 2024-07-17 セイコーエプソン株式会社 波長可変光学フィルター

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4944187A (en) * 1988-12-23 1990-07-31 Rosemount Inc. Multimodulus pressure sensor
JP2896725B2 (ja) * 1991-12-26 1999-05-31 株式会社山武 静電容量式圧力センサ
JPH0675248A (ja) * 1992-06-30 1994-03-18 Sony Corp アクティブマトリクス基板
JPH07113708A (ja) * 1993-10-20 1995-05-02 Hitachi Ltd 半導体絶対圧力センサの製造方法
JP3178223B2 (ja) * 1994-03-10 2001-06-18 富士電機株式会社 ダイヤフラムの製造方法
JPH09274860A (ja) * 1996-04-05 1997-10-21 Dainippon Printing Co Ltd プラズマディスプレイパネル
JP2000124117A (ja) * 1998-10-14 2000-04-28 Nikon Corp メンブレンマスク及びその製造方法
JP2002299229A (ja) 2001-04-03 2002-10-11 Nikon Corp 電子線露光用レチクルブランクの作製方法及びマスク
JP2003057438A (ja) 2001-08-09 2003-02-26 Yokogawa Electric Corp ファブリペローフィルタ
JP2003185941A (ja) * 2001-12-20 2003-07-03 Yokogawa Electric Corp ファブリペローフィルタ
JP2004281256A (ja) * 2003-03-17 2004-10-07 Nippon Sheet Glass Co Ltd 表示パネル
JP2006085096A (ja) * 2004-09-17 2006-03-30 Fujitsu Ltd 露光用マスクとその製造方法
JP2006208791A (ja) * 2005-01-28 2006-08-10 Seiko Epson Corp 波長可変フィルタおよび波長可変フィルタの製造方法
EP1869737B1 (en) * 2005-03-16 2021-05-12 Davidson Instruments, Inc. High intensity fabry-perot sensor
JP4548288B2 (ja) * 2005-09-22 2010-09-22 セイコーエプソン株式会社 波長可変フィルタ
US20090022946A1 (en) 2006-02-10 2009-01-22 Tokyo Electron Limited Membrane Structure and Method for Manufacturing the Same
US7734131B2 (en) * 2006-04-18 2010-06-08 Xerox Corporation Fabry-Perot tunable filter using a bonded pair of transparent substrates
US7835061B2 (en) * 2006-06-28 2010-11-16 Qualcomm Mems Technologies, Inc. Support structures for free-standing electromechanical devices
JP5124121B2 (ja) * 2006-10-02 2013-01-23 株式会社アルバック ガラス基板のエッチング方法
JP2008130937A (ja) * 2006-11-22 2008-06-05 Matsushita Electric Works Ltd ダイヤフラムを具備した構造体の製造方法、半導体装置
US7715085B2 (en) * 2007-05-09 2010-05-11 Qualcomm Mems Technologies, Inc. Electromechanical system having a dielectric movable membrane and a mirror
US7542200B1 (en) * 2007-12-21 2009-06-02 Palo Alto Research Center Incorporated Agile beam steering mirror for active raster scan error correction
JP5446110B2 (ja) * 2008-03-31 2014-03-19 セイコーエプソン株式会社 受光装置
JP5564759B2 (ja) * 2008-04-02 2014-08-06 セイコーエプソン株式会社 光学フィルタ装置
JP5369515B2 (ja) * 2008-06-26 2013-12-18 セイコーエプソン株式会社 光フィルタとその製造方法及び光学フィルタ装置モジュール
JP5589459B2 (ja) * 2010-03-15 2014-09-17 セイコーエプソン株式会社 光フィルター及び光フィルターモジュール並びに分析機器及び光機器
JP5434719B2 (ja) * 2010-03-19 2014-03-05 セイコーエプソン株式会社 光フィルターおよび分析機器
JP5928992B2 (ja) * 2010-10-07 2016-06-01 セイコーエプソン株式会社 波長可変干渉フィルターの製造方法
JP6089674B2 (ja) * 2012-12-19 2017-03-08 セイコーエプソン株式会社 波長可変干渉フィルター、波長可変干渉フィルターの製造方法、光学フィルターデバイス、光学モジュール、及び電子機器

Also Published As

Publication number Publication date
EP2600192A2 (en) 2013-06-05
EP2985657A1 (en) 2016-02-17
EP2985657B1 (en) 2017-10-18
EP2600194A3 (en) 2013-12-25
EP2600193A3 (en) 2013-12-25
EP2367057A2 (en) 2011-09-21
EP2367057B1 (en) 2013-05-08
US9703092B2 (en) 2017-07-11
EP2600191A3 (en) 2013-12-25
EP2600194A2 (en) 2013-06-05
EP2367057A3 (en) 2012-01-11
TWI528050B (zh) 2016-04-01
US20110228396A1 (en) 2011-09-22
EP2600191A2 (en) 2013-06-05
TW201202744A (en) 2012-01-16
EP2600192B1 (en) 2015-09-30
EP2600192A3 (en) 2013-12-25
EP2600193A2 (en) 2013-06-05
CN102193187A (zh) 2011-09-21
US20160209638A1 (en) 2016-07-21
EP2600194B1 (en) 2015-09-16
KR20110105713A (ko) 2011-09-27
JP2011197386A (ja) 2011-10-06

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