JP5419410B2 - エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク - Google Patents

エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク Download PDF

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Publication number
JP5419410B2
JP5419410B2 JP2008253094A JP2008253094A JP5419410B2 JP 5419410 B2 JP5419410 B2 JP 5419410B2 JP 2008253094 A JP2008253094 A JP 2008253094A JP 2008253094 A JP2008253094 A JP 2008253094A JP 5419410 B2 JP5419410 B2 JP 5419410B2
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Prior art keywords
emulsion mask
meth
protective film
emulsion
ionizing radiation
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JP2008253094A
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English (en)
Japanese (ja)
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JP2010085597A5 (enExample
JP2010085597A (ja
Inventor
朋子 根岸
剛 長谷川
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Kimoto Co Ltd
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Kimoto Co Ltd
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Priority to JP2008253094A priority Critical patent/JP5419410B2/ja
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Publication of JP2010085597A5 publication Critical patent/JP2010085597A5/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Paints Or Removers (AREA)
JP2008253094A 2008-09-30 2008-09-30 エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク Active JP5419410B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008253094A JP5419410B2 (ja) 2008-09-30 2008-09-30 エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク

Applications Claiming Priority (1)

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JP2008253094A JP5419410B2 (ja) 2008-09-30 2008-09-30 エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク

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JP2010085597A JP2010085597A (ja) 2010-04-15
JP2010085597A5 JP2010085597A5 (enExample) 2011-10-27
JP5419410B2 true JP5419410B2 (ja) 2014-02-19

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JP2008253094A Active JP5419410B2 (ja) 2008-09-30 2008-09-30 エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2686459B2 (ja) 1989-09-21 1997-12-08 日本セメント株式会社 コンクリート構造物の補修用注入材

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101676074B1 (ko) * 2010-02-08 2016-11-14 키모토 컴파니 리미티드 에멀젼 마스크용 전리방사선 경화형 보호액 및 그것을 사용한 에멀젼 마스크
JP6347694B2 (ja) * 2014-08-22 2018-06-27 株式会社きもと 電離放射線硬化型保護液及びフォトマスク
CN109988472A (zh) * 2019-03-04 2019-07-09 江西赛宝莉实业有限公司 一种5d的岗石漆及其制备方法
KR20210121569A (ko) 2020-03-30 2021-10-08 (주)네프코 향상된 표면경도와 방오 기능성이 부여된 에멀전 포토마스크의 형성방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1180594A (ja) * 1997-08-29 1999-03-26 Toagosei Co Ltd 被覆用樹脂組成物およびこれを被覆してなるフォトマスク
JP2002012796A (ja) * 2000-06-27 2002-01-15 Toagosei Co Ltd 被覆用樹脂組成物及びこれを被覆して成るフォトマスク
JP4716557B2 (ja) * 2000-12-05 2011-07-06 株式会社きもと 表面保護フィルム
JP2004077690A (ja) * 2002-08-14 2004-03-11 Tokyo Process Service Kk ゼラチン硬化液、ハードコート液、フォトマスクおよびその製造方法
JP4376610B2 (ja) * 2003-12-18 2009-12-02 株式会社きもと 表面保護膜およびこれを用いた表面保護フィルム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2686459B2 (ja) 1989-09-21 1997-12-08 日本セメント株式会社 コンクリート構造物の補修用注入材

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JP2010085597A (ja) 2010-04-15

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