JP5403890B2 - ハードディスク用基板用の洗浄剤組成物 - Google Patents

ハードディスク用基板用の洗浄剤組成物 Download PDF

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Publication number
JP5403890B2
JP5403890B2 JP2007258954A JP2007258954A JP5403890B2 JP 5403890 B2 JP5403890 B2 JP 5403890B2 JP 2007258954 A JP2007258954 A JP 2007258954A JP 2007258954 A JP2007258954 A JP 2007258954A JP 5403890 B2 JP5403890 B2 JP 5403890B2
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substrate
cleaning
water
polishing
composition
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Japanese (ja)
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JP2009084509A5 (enrdf_load_stackoverflow
JP2009084509A (ja
Inventor
定治 宮本
敦司 田村
安則 堀尾
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Kao Corp
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Kao Corp
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  • Detergent Compositions (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP2007258954A 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物 Active JP5403890B2 (ja)

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JP2007258954A JP5403890B2 (ja) 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物

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JP2007258954A JP5403890B2 (ja) 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物

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JP2009084509A JP2009084509A (ja) 2009-04-23
JP2009084509A5 JP2009084509A5 (enrdf_load_stackoverflow) 2010-11-11
JP5403890B2 true JP5403890B2 (ja) 2014-01-29

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JP2007258954A Active JP5403890B2 (ja) 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11447661B2 (en) 2017-12-27 2022-09-20 Kao Corporation Method for producing aluminum platter

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011105824A (ja) * 2009-11-16 2011-06-02 Dai Ichi Kogyo Seiyaku Co Ltd 硬質表面用洗浄剤組成物
JP5086450B2 (ja) * 2010-01-21 2012-11-28 三洋化成工業株式会社 磁気ディスク基板用洗浄剤
JP5711589B2 (ja) * 2010-03-31 2015-05-07 三洋化成工業株式会社 磁気ディスク基板用洗浄剤
JP5801051B2 (ja) * 2010-12-28 2015-10-28 花王株式会社 ハードディスク用ガラス基板用のアルカリ洗浄剤組成物
JP7399554B2 (ja) * 2019-02-26 2023-12-18 日本化薬株式会社 洗浄液及び洗浄方法
JP7294910B2 (ja) * 2019-06-21 2023-06-20 花王株式会社 磁気ディスク基板用洗浄剤組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3962468B2 (ja) * 1997-12-25 2007-08-22 花王株式会社 洗浄剤組成物
JP4283952B2 (ja) * 1999-10-12 2009-06-24 多摩化学工業株式会社 非鉄金属洗浄用洗浄液組成物
JP2002212597A (ja) * 2001-01-18 2002-07-31 Lion Corp 精密部品用水系洗浄剤組成物
JP2002224948A (ja) * 2001-01-26 2002-08-13 Daido Chem Ind Co Ltd 磁気ディスクＮｉ−Ｐ基板の研磨液用洗浄剤組成物及び該洗浄剤組成物を使用する磁気ディスクＮｉ−Ｐ基板の製造方法
JP4304988B2 (ja) * 2002-01-28 2009-07-29 三菱化学株式会社 半導体デバイス用基板の洗浄方法
JP4350364B2 (ja) * 2002-12-12 2009-10-21 昭和電工株式会社 洗浄剤組成物、半導体ウェーハの洗浄方法および製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11447661B2 (en) 2017-12-27 2022-09-20 Kao Corporation Method for producing aluminum platter

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