JP2009084509A5 - - Google Patents

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Publication number
JP2009084509A5
JP2009084509A5 JP2007258954A JP2007258954A JP2009084509A5 JP 2009084509 A5 JP2009084509 A5 JP 2009084509A5 JP 2007258954 A JP2007258954 A JP 2007258954A JP 2007258954 A JP2007258954 A JP 2007258954A JP 2009084509 A5 JP2009084509 A5 JP 2009084509A5
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JP
Japan
Prior art keywords
cleaning composition
group
carbon atoms
nonionic surfactant
amine compound
Prior art date
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Application number
JP2007258954A
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English (en)
Japanese (ja)
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JP5403890B2 (ja
JP2009084509A (ja
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Priority to JP2007258954A priority Critical patent/JP5403890B2/ja
Priority claimed from JP2007258954A external-priority patent/JP5403890B2/ja
Publication of JP2009084509A publication Critical patent/JP2009084509A/ja
Publication of JP2009084509A5 publication Critical patent/JP2009084509A5/ja
Application granted granted Critical
Publication of JP5403890B2 publication Critical patent/JP5403890B2/ja
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JP2007258954A 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物 Active JP5403890B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007258954A JP5403890B2 (ja) 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007258954A JP5403890B2 (ja) 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物

Publications (3)

Publication Number Publication Date
JP2009084509A JP2009084509A (ja) 2009-04-23
JP2009084509A5 true JP2009084509A5 (enrdf_load_stackoverflow) 2010-11-11
JP5403890B2 JP5403890B2 (ja) 2014-01-29

Family

ID=40658347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007258954A Active JP5403890B2 (ja) 2007-10-02 2007-10-02 ハードディスク用基板用の洗浄剤組成物

Country Status (1)

Country Link
JP (1) JP5403890B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011105824A (ja) * 2009-11-16 2011-06-02 Dai Ichi Kogyo Seiyaku Co Ltd 硬質表面用洗浄剤組成物
JP5086450B2 (ja) * 2010-01-21 2012-11-28 三洋化成工業株式会社 磁気ディスク基板用洗浄剤
JP5711589B2 (ja) * 2010-03-31 2015-05-07 三洋化成工業株式会社 磁気ディスク基板用洗浄剤
JP5801051B2 (ja) * 2010-12-28 2015-10-28 花王株式会社 ハードディスク用ガラス基板用のアルカリ洗浄剤組成物
SG11202006025YA (en) 2017-12-27 2020-07-29 Kao Corp Method for producing aluminum platter
JP7399554B2 (ja) * 2019-02-26 2023-12-18 日本化薬株式会社 洗浄液及び洗浄方法
JP7294910B2 (ja) * 2019-06-21 2023-06-20 花王株式会社 磁気ディスク基板用洗浄剤組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3962468B2 (ja) * 1997-12-25 2007-08-22 花王株式会社 洗浄剤組成物
JP4283952B2 (ja) * 1999-10-12 2009-06-24 多摩化学工業株式会社 非鉄金属洗浄用洗浄液組成物
JP2002212597A (ja) * 2001-01-18 2002-07-31 Lion Corp 精密部品用水系洗浄剤組成物
JP2002224948A (ja) * 2001-01-26 2002-08-13 Daido Chem Ind Co Ltd 磁気ディスクＮｉ−Ｐ基板の研磨液用洗浄剤組成物及び該洗浄剤組成物を使用する磁気ディスクＮｉ−Ｐ基板の製造方法
JP4304988B2 (ja) * 2002-01-28 2009-07-29 三菱化学株式会社 半導体デバイス用基板の洗浄方法
JP4350364B2 (ja) * 2002-12-12 2009-10-21 昭和電工株式会社 洗浄剤組成物、半導体ウェーハの洗浄方法および製造方法

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