JP5398185B2 - 投影光学系、露光装置およびデバイス製造方法 - Google Patents

投影光学系、露光装置およびデバイス製造方法 Download PDF

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Publication number
JP5398185B2
JP5398185B2 JP2008179465A JP2008179465A JP5398185B2 JP 5398185 B2 JP5398185 B2 JP 5398185B2 JP 2008179465 A JP2008179465 A JP 2008179465A JP 2008179465 A JP2008179465 A JP 2008179465A JP 5398185 B2 JP5398185 B2 JP 5398185B2
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Japan
Prior art keywords
projection
optical system
refractive optical
optical unit
refractive
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JP2008179465A
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English (en)
Japanese (ja)
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JP2010020017A5 (zh
JP2010020017A (ja
Inventor
亮介 福岡
清司 深見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008179465A priority Critical patent/JP5398185B2/ja
Priority to TW098121396A priority patent/TWI414822B/zh
Priority to KR1020090059611A priority patent/KR101121029B1/ko
Priority to CN200910140242XA priority patent/CN101625455B/zh
Publication of JP2010020017A publication Critical patent/JP2010020017A/ja
Publication of JP2010020017A5 publication Critical patent/JP2010020017A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008179465A 2008-07-09 2008-07-09 投影光学系、露光装置およびデバイス製造方法 Active JP5398185B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008179465A JP5398185B2 (ja) 2008-07-09 2008-07-09 投影光学系、露光装置およびデバイス製造方法
TW098121396A TWI414822B (zh) 2008-07-09 2009-06-25 Projection optics, exposure apparatus and component manufacturing method
KR1020090059611A KR101121029B1 (ko) 2008-07-09 2009-07-01 투영 광학계, 노광 장치 및 디바이스 제조 방법
CN200910140242XA CN101625455B (zh) 2008-07-09 2009-07-09 投影光学系统、曝光装置以及器件制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008179465A JP5398185B2 (ja) 2008-07-09 2008-07-09 投影光学系、露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010020017A JP2010020017A (ja) 2010-01-28
JP2010020017A5 JP2010020017A5 (zh) 2011-09-22
JP5398185B2 true JP5398185B2 (ja) 2014-01-29

Family

ID=41521356

Family Applications (1)

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JP2008179465A Active JP5398185B2 (ja) 2008-07-09 2008-07-09 投影光学系、露光装置およびデバイス製造方法

Country Status (4)

Country Link
JP (1) JP5398185B2 (zh)
KR (1) KR101121029B1 (zh)
CN (1) CN101625455B (zh)
TW (1) TWI414822B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5220136B2 (ja) * 2011-01-01 2013-06-26 キヤノン株式会社 照明光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP6410406B2 (ja) * 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法
JP6386896B2 (ja) * 2014-12-02 2018-09-05 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP7357488B2 (ja) * 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US555629A (en) * 1896-03-03 Scourer and polisher
JPH06331932A (ja) * 1993-05-19 1994-12-02 Topcon Corp 投影光学装置
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
JP3445021B2 (ja) * 1995-04-28 2003-09-08 キヤノン株式会社 光学装置
WO1999049366A1 (fr) * 1998-03-20 1999-09-30 Nikon Corporation Photomasque et systeme d'exposition par projection
JP2003222795A (ja) * 2001-11-21 2003-08-08 Adtec Engineeng Co Ltd 倍率補正光学系
TWI232347B (en) 2001-12-26 2005-05-11 Pentax Corp Projection aligner
JP2003178971A (ja) * 2002-10-24 2003-06-27 Nikon Corp 投影露光装置及び投影露光方法
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP3728301B2 (ja) * 2003-05-30 2005-12-21 株式会社オーク製作所 投影光学系
SG145780A1 (en) * 2003-08-29 2008-09-29 Nikon Corp Exposure apparatus and device fabricating method
KR20060120660A (ko) * 2004-01-06 2006-11-27 가부시키가이샤 니콘 노광 방법 및 장치와, 디바이스 제조 방법
JP2005345582A (ja) * 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
JPWO2007138805A1 (ja) * 2006-05-25 2009-10-01 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
KR20100006533A (ko) 2010-01-19
JP2010020017A (ja) 2010-01-28
TW201003119A (en) 2010-01-16
CN101625455A (zh) 2010-01-13
TWI414822B (zh) 2013-11-11
KR101121029B1 (ko) 2012-03-19
CN101625455B (zh) 2011-11-02

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