JP5363100B2 - 高純度パーフルオロエラストマー複合材およびその製造方法 - Google Patents

高純度パーフルオロエラストマー複合材およびその製造方法 Download PDF

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JP5363100B2
JP5363100B2 JP2008513504A JP2008513504A JP5363100B2 JP 5363100 B2 JP5363100 B2 JP 5363100B2 JP 2008513504 A JP2008513504 A JP 2008513504A JP 2008513504 A JP2008513504 A JP 2008513504A JP 5363100 B2 JP5363100 B2 JP 5363100B2
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composite
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ppb
emulsion mixture
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JP2009500459A (ja
JP2009500459A5 (enExample
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シュー，ピン
ヘゲンバルス，ジャック
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ゴア エンタープライズ ホールディングス，インコーポレイティド
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/10—Homopolymers or copolymers of unsaturated ethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08L27/18—Homopolymers or copolymers or tetrafluoroethene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/18—Homopolymers or copolymers of nitriles
    • C08L33/22—Homopolymers or copolymers of nitriles containing four or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
JP2008513504A 2005-05-25 2006-05-01 高純度パーフルオロエラストマー複合材およびその製造方法 Expired - Fee Related JP5363100B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/136,744 US20060270780A1 (en) 2005-05-25 2005-05-25 High purity perfluoroelastomer composites and a processes to produce the same
US11/136,744 2005-05-25
PCT/US2006/017043 WO2006127226A1 (en) 2005-05-25 2006-05-01 High purity perfluoroelastomer composites and a process to produce the same

Related Child Applications (1)

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JP2013121611A Division JP5658314B2 (ja) 2005-05-25 2013-06-10 高純度パーフルオロエラストマー複合材およびその製造方法

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JP2009500459A JP2009500459A (ja) 2009-01-08
JP2009500459A5 JP2009500459A5 (enExample) 2012-11-29
JP5363100B2 true JP5363100B2 (ja) 2013-12-11

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JP2008513504A Expired - Fee Related JP5363100B2 (ja) 2005-05-25 2006-05-01 高純度パーフルオロエラストマー複合材およびその製造方法
JP2013121611A Expired - Fee Related JP5658314B2 (ja) 2005-05-25 2013-06-10 高純度パーフルオロエラストマー複合材およびその製造方法

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US (4) US20060270780A1 (enExample)
EP (1) EP1885796B1 (enExample)
JP (2) JP5363100B2 (enExample)
CA (3) CA2608562C (enExample)
WO (1) WO2006127226A1 (enExample)

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KR20240169653A (ko) 2022-03-30 2024-12-03 주식회사 발카 환상 시일재 및 제조 방법
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Publication number Publication date
CA2776040C (en) 2015-10-20
CA2776040A1 (en) 2006-11-30
US20140088238A1 (en) 2014-03-27
CA2608562A1 (en) 2006-11-30
US20090253854A1 (en) 2009-10-08
CA2775760A1 (en) 2006-11-30
JP2009500459A (ja) 2009-01-08
US8623963B2 (en) 2014-01-07
EP1885796B1 (en) 2015-04-15
HK1108708A1 (en) 2008-05-16
JP5658314B2 (ja) 2015-01-21
CA2775760C (en) 2016-07-05
CA2608562C (en) 2012-07-17
EP1885796A1 (en) 2008-02-13
WO2006127226A1 (en) 2006-11-30
JP2013177631A (ja) 2013-09-09
US20140088235A1 (en) 2014-03-27
US20060270780A1 (en) 2006-11-30

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