JP5344143B2 - 液体噴射ヘッド及び液体噴射装置並びに圧電素子 - Google Patents
液体噴射ヘッド及び液体噴射装置並びに圧電素子 Download PDFInfo
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- 239000007788 liquid Substances 0.000 title claims description 37
- 238000001069 Raman spectroscopy Methods 0.000 claims description 48
- 239000010936 titanium Substances 0.000 claims description 30
- 229910052719 titanium Inorganic materials 0.000 claims description 27
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 16
- 229910052726 zirconium Inorganic materials 0.000 claims description 12
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 7
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- 239000000470 constituent Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 32
- 239000010408 film Substances 0.000 description 22
- 239000000463 material Substances 0.000 description 16
- 230000006866 deterioration Effects 0.000 description 12
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- 238000004891 communication Methods 0.000 description 9
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- 230000015556 catabolic process Effects 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000010304 firing Methods 0.000 description 7
- 239000012212 insulator Substances 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 3
- 229910000457 iridium oxide Inorganic materials 0.000 description 3
- 229910052745 lead Inorganic materials 0.000 description 3
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 3
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- -1 for example Chemical compound 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
- B41J2/055—Devices for absorbing or preventing back-pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/14241—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14419—Manifold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
かかる態様では、圧電変位量などの圧電特性や、破壊電圧及び膜剥がれなどの劣化特性に優れた液体噴射ヘッドを実現できる。
かかる態様では、圧電特性や、破壊電圧及び膜剥がれなどの劣化特性に優れた圧電体層とすることができる。
(実施形態1)
図1は、本発明の実施形態1に係る液体噴射ヘッドの一例であるインクジェット式記録ヘッドの概略構成を示す分解斜視図であり、図2は、図1の平面図及びそのA−A′断面図である。
このようにして得られた圧電体層のうち、ラマン散乱により得られるラマンシフトにおいて、A1(3LO)のピーク位置が710.17cm−1となるものを実施例1とし、711.99cm−1となるものを実施例2とした。また、同様にラマン散乱により得られるラマンシフトにおいて、A1(3LO)のピーク位置が708.35cm−1となるものを比較例1とし、712.44cm−1となるものを比較例2とした。
以上、本発明の一実施形態を説明したが、本発明の基本的構成は上述したものに限定されるものではない。例えば、上述した実施形態1では、第1電極60が、白金、酸化チタン及び酸化イリジウムが合金化又は混合化されたものを例示したが、各材料が主成分となる層が積層された構成であってもよい。このような第1電極60としては、例えば、絶縁体膜55側から、酸化チタンを主成分とする密着層と、白金を主成分とする白金層と、酸化イリジウムを主成分とする拡散防止層と、酸化チタンを主成分とする結晶種層とが積層された構成のものなどが挙げられる。このような構成の場合、例えば、上述した酸化チタンの比誘電率については、圧電体層70側に設けられた結晶種層が大きく影響するものである。
Claims (6)
- 一般式がABO3で示されるペロブスカイト構造を有する圧電体層と、該圧電体層に設けられた電極と、を備えた圧電素子を具備した液体噴射ヘッドであって、
前記圧電体層のBサイトには鉛が存在し、Bサイト構成元素中に含まれる鉛の割合が0.25%以上2.7%未満であり、
前記圧電体層のラマン散乱により得られるラマンシフトにおいて、A1(3LO)のピーク位置が、710cm−1〜712cm−1であることを特徴とする液体噴射ヘッド。 - 前記圧電体層は、ジルコニウム及びチタンを含むことを特徴とする請求項1記載の液体噴射ヘッド。
- 前記圧電体層のチタンとジルコニウムとの合計に対するチタンの比率が、0.464〜0.6であることを特徴とする請求項2記載の液体噴射ヘッド。
- 前記第1電極は白金を含むことを特徴とする請求項1〜3の何れか一項に記載の液体噴射ヘッド。
- 請求項1〜4の何れか一項に記載の液体噴射ヘッドを具備することを特徴とする液体噴射装置。
- 一般式がABO3で示されるペロブスカイト構造を有する圧電体層と、該圧電体層に設けられた電極と、を備えた圧電素子であって、
前記圧電体層のBサイトには鉛が存在し、Bサイト構成元素中に含まれる鉛の割合が0.25%以上2.7%未満であり、
前記圧電体層のラマン散乱により得られるラマンシフトにおいて、A1(3LO)のピーク位置が、710cm−1〜712cm−1であることを特徴とする圧電素子。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008316299A JP5344143B2 (ja) | 2008-12-11 | 2008-12-11 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
CN2009102529451A CN101746137B (zh) | 2008-12-11 | 2009-12-04 | 液体喷射头及液体喷射装置以及压电致动器 |
US12/635,199 US8141991B2 (en) | 2008-12-11 | 2009-12-10 | Liquid ejecting head, liquid ejecting apparatus, and piezoelectric actuator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008316299A JP5344143B2 (ja) | 2008-12-11 | 2008-12-11 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
Publications (2)
Publication Number | Publication Date |
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JP2010137444A JP2010137444A (ja) | 2010-06-24 |
JP5344143B2 true JP5344143B2 (ja) | 2013-11-20 |
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JP2008316299A Active JP5344143B2 (ja) | 2008-12-11 | 2008-12-11 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
Country Status (3)
Country | Link |
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US (1) | US8141991B2 (ja) |
JP (1) | JP5344143B2 (ja) |
CN (1) | CN101746137B (ja) |
Families Citing this family (3)
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JP5458896B2 (ja) | 2010-01-08 | 2014-04-02 | セイコーエプソン株式会社 | 液体噴射ヘッド、液体噴射装置及び圧電素子 |
JP5928675B2 (ja) * | 2011-01-21 | 2016-06-01 | セイコーエプソン株式会社 | 液体噴射ヘッド、液体噴射装置、圧電素子、超音波センサー及び赤外線センサー |
JP6690193B2 (ja) * | 2014-11-12 | 2020-04-28 | Tdk株式会社 | 圧電体層、圧電素子、圧電アクチュエータ、及び圧電センサ、並びにハードディスクドライブ、及びインクジェットプリンタ装置 |
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JP3750446B2 (ja) * | 1999-11-15 | 2006-03-01 | セイコーエプソン株式会社 | 圧電体膜及び圧電体膜の製造方法 |
JP3796394B2 (ja) * | 2000-06-21 | 2006-07-12 | キヤノン株式会社 | 圧電素子の製造方法および液体噴射記録ヘッドの製造方法 |
US7001014B2 (en) * | 2000-10-03 | 2006-02-21 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric thin film and method for preparation theof, and piezoelectric element having the piezoelectric thin film, ink-jet head using the piezoelectric element, and ink-jet recording device having the ink-jet head |
JP2003127366A (ja) | 2001-10-26 | 2003-05-08 | Seiko Epson Corp | インクジェット式記録ヘッド及びその製造方法並びにインクジェット式記録装置 |
WO2003052840A1 (fr) * | 2001-12-18 | 2003-06-26 | Matsushita Electric Industrial Co., Ltd. | Element piezoelectrique, tete d'impression a jet d'encre, capteur de vitesse angulaire, procede de fabrication, et appareil d'enregistrement a jet d'encre |
US7048360B2 (en) * | 2002-02-19 | 2006-05-23 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric body, manufacturing method thereof, piezoelectric element having the piezoelectric body, inject head, and inject type recording device |
US7083270B2 (en) * | 2002-06-20 | 2006-08-01 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric element, ink jet head, angular velocity sensor, method for manufacturing the same, and ink jet recording apparatus |
JP3974096B2 (ja) * | 2002-09-20 | 2007-09-12 | キヤノン株式会社 | 圧電体素子及びインクジェット記録ヘッド |
CN101070005B (zh) * | 2002-10-17 | 2010-06-02 | 京瓷株式会社 | 促动器及其制造方法以及打印头 |
JP4221576B2 (ja) * | 2003-03-10 | 2009-02-12 | セイコーエプソン株式会社 | セラミックス膜の製造方法および強誘電体キャパシタの製造方法、ならびにセラミックス膜、強誘電体キャパシタおよび半導体装置 |
JP4171908B2 (ja) | 2004-01-20 | 2008-10-29 | セイコーエプソン株式会社 | 強誘電体膜、強誘電体メモリ、及び圧電素子 |
JP4984018B2 (ja) * | 2005-03-30 | 2012-07-25 | セイコーエプソン株式会社 | 圧電素子及び液体噴射ヘッド並びに液体噴射装置 |
JP5190833B2 (ja) * | 2006-03-10 | 2013-04-24 | キヤノン株式会社 | 圧電体素子、それを用いた液体吐出ヘッド、及び、光学素子 |
JP2008258575A (ja) * | 2007-03-15 | 2008-10-23 | Seiko Epson Corp | 圧電素子、液体噴射ヘッド、および、プリンタ |
JP5257580B2 (ja) * | 2008-03-21 | 2013-08-07 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
JP2009286118A (ja) * | 2008-04-30 | 2009-12-10 | Seiko Epson Corp | 液体噴射ヘッド及びアクチュエーター装置 |
JP2009286119A (ja) * | 2008-04-30 | 2009-12-10 | Seiko Epson Corp | 液体噴射ヘッド及び圧電素子 |
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Publication number | Publication date |
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US8141991B2 (en) | 2012-03-27 |
US20100149285A1 (en) | 2010-06-17 |
JP2010137444A (ja) | 2010-06-24 |
CN101746137B (zh) | 2012-06-20 |
CN101746137A (zh) | 2010-06-23 |
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