JP5257580B2 - 液体噴射ヘッド及び液体噴射装置並びに圧電素子 - Google Patents
液体噴射ヘッド及び液体噴射装置並びに圧電素子 Download PDFInfo
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- JP5257580B2 JP5257580B2 JP2008074720A JP2008074720A JP5257580B2 JP 5257580 B2 JP5257580 B2 JP 5257580B2 JP 2008074720 A JP2008074720 A JP 2008074720A JP 2008074720 A JP2008074720 A JP 2008074720A JP 5257580 B2 JP5257580 B2 JP 5257580B2
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- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
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- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
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- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
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Description
(実施形態1)
図1は、本発明の実施形態1に係る製造方法によって製造される液体噴射ヘッドの一例であるインクジェット式記録ヘッドの概略構成を示す分解斜視図であり、図2(a)は、インクジェット式記録ヘッドの要部平面図であり、図2(b)は、図2(a)のA−A′断面図であり、図3は、圧電素子の層構造を示す概略図である。
以上、本発明の一実施形態について説明したが、本発明は、上述した実施形態に限定されるものではない。
Claims (4)
- 液滴を噴射するノズルに連通する圧力発生室を有する流路形成基板上に形成された下電極と該下電極上に形成された圧電体層と該圧電体層上に形成された上電極とを有する圧電素子を具備し、
前記圧電体層が、ペロブスカイト結晶構造の強誘電材料からなり、前記圧電体層の表面粗さの前記下電極の表面粗さに対する比が0.58〜1.60の範囲内であることを特徴とする液体噴射ヘッド。 - 前記圧電体層及び前記下電極の表面粗さが、原子間力顕微鏡によって測定された値であることを特徴とする請求項1に記載の液体噴射ヘッド。
- 請求項1又は2に記載の液体噴射ヘッドを具備することを特徴とする液体噴射装置。
- 基板上に形成された下電極と、該下電極上に形成された圧電体層と、該圧電体層上に形成された上電極とを有し、
前記圧電体層が、ペロブスカイト結晶構造の強誘電材料からなり、前記圧電体層の表面粗さの前記下電極の表面粗さに対する比が0.58〜1.60の範囲内であることを特徴とする圧電素子。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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JP2008074720A JP5257580B2 (ja) | 2008-03-21 | 2008-03-21 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
US12/408,492 US7878631B2 (en) | 2008-03-21 | 2009-03-20 | Liquid jet head, a liquid jet apparatus and a piezoelectric element |
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JP2008074720A JP5257580B2 (ja) | 2008-03-21 | 2008-03-21 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
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JP2009231514A JP2009231514A (ja) | 2009-10-08 |
JP5257580B2 true JP5257580B2 (ja) | 2013-08-07 |
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JP5344143B2 (ja) * | 2008-12-11 | 2013-11-20 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
JP5585209B2 (ja) * | 2009-05-28 | 2014-09-10 | 株式会社リコー | 電気機械変換素子の製造方法、該製造方法により製造した電気機械変換素子、液滴吐出ヘッド及び液滴吐出装置 |
JP2011207071A (ja) * | 2010-03-30 | 2011-10-20 | Seiko Epson Corp | 液体噴射ヘッドの製造方法及び圧電素子の形成方法 |
JP5776880B2 (ja) * | 2011-03-22 | 2015-09-09 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置 |
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JP3283386B2 (ja) * | 1993-09-13 | 2002-05-20 | 日本碍子株式会社 | 圧電膜型素子及びその処理方法並びにその駆動方法 |
JP3209082B2 (ja) * | 1996-03-06 | 2001-09-17 | セイコーエプソン株式会社 | 圧電体薄膜素子及びその製造方法、並びにこれを用いたインクジェット式記録ヘッド |
JP3682684B2 (ja) * | 1997-10-20 | 2005-08-10 | セイコーエプソン株式会社 | 圧電体薄膜素子の製造方法 |
JP3567977B2 (ja) | 2000-03-24 | 2004-09-22 | セイコーエプソン株式会社 | 圧電体素子、インクジェット式記録ヘッド、プリンタ、及び圧電体素子の製造方法 |
JP4441843B2 (ja) * | 2001-06-15 | 2010-03-31 | 宇部興産株式会社 | 薄膜音響共振器 |
CN100345320C (zh) * | 2001-12-18 | 2007-10-24 | 松下电器产业株式会社 | 压电元件、喷墨头、角速度传感器及其制法、喷墨式记录装置 |
JP4761106B2 (ja) * | 2004-08-31 | 2011-08-31 | Tdk株式会社 | 積層体ユニットおよび薄膜容量素子 |
JP2006093312A (ja) * | 2004-09-22 | 2006-04-06 | Seiko Epson Corp | 圧電素子、液体噴射ヘッド、液体噴射装置及び圧電素子の製造方法 |
JP5201304B2 (ja) * | 2006-03-28 | 2013-06-05 | セイコーエプソン株式会社 | アクチュエータ装置の製造方法及び液体噴射ヘッドの製造方法 |
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