JP5341049B2 - セラミックス焼結体の製造方法、セラミックス焼結体およびセラミックスヒータ - Google Patents
セラミックス焼結体の製造方法、セラミックス焼結体およびセラミックスヒータ Download PDFInfo
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- JP5341049B2 JP5341049B2 JP2010244498A JP2010244498A JP5341049B2 JP 5341049 B2 JP5341049 B2 JP 5341049B2 JP 2010244498 A JP2010244498 A JP 2010244498A JP 2010244498 A JP2010244498 A JP 2010244498A JP 5341049 B2 JP5341049 B2 JP 5341049B2
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- 239000000919 ceramic Substances 0.000 title claims description 105
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 73
- 239000002184 metal Substances 0.000 claims description 73
- 238000005245 sintering Methods 0.000 claims description 29
- 239000007769 metal material Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 21
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 11
- 238000000465 moulding Methods 0.000 claims description 11
- 239000011733 molybdenum Substances 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 229910052750 molybdenum Inorganic materials 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 229910001182 Mo alloy Inorganic materials 0.000 claims description 7
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical group Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- 239000003870 refractory metal Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 238000010000 carbonizing Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 150000001247 metal acetylides Chemical class 0.000 claims 1
- 238000003763 carbonization Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 4
- 229910039444 MoC Inorganic materials 0.000 description 4
- 229910001257 Nb alloy Inorganic materials 0.000 description 3
- 229910001080 W alloy Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- 229910004205 SiNX Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Description
2 ヒータ線
3 電極端子
4a 金属皮膜
4 金属炭化物皮膜
10 セラミックスヒータ
Claims (7)
- 耐熱性金属材料であるモリブデンまたはモリブデン合金の表面に、金属炭化物の標準生成自由エネルギーが該耐熱性金属材料より小さい金属材料である、チタン、タンタル、またはジルコニムから選択される金属皮膜を、その厚さが0.10〜10.0μmとなるよう形成する皮膜形成ステップと、
前記皮膜形成ステップで皮膜を形成した前記耐熱性金属材料を、セラミックス基体の原材料である粉体中の所定の位置に配設し、加圧成型してセラミックス成型体を成型する成型ステップと、
前記成型ステップで成型したセラミックス成型体を焼結してセラミックス焼結体を生成する焼結ステップと、
を含むことを特徴とするセラミックス焼結体の製造方法。 - 前記セラミックス基体は、窒化アルミニウム、窒化珪素または酸化アルミニウムであることを特徴とする請求項1に記載のセラミックス焼結体の製造方法。
- 前記セラミックス焼結体の焼結温度は、1300〜2000℃であることを特徴とする請求項1または2に記載のセラミックス焼結体の製造方法。
- 耐熱性金属材料としてのモリブデンまたはモリブデン合金と、
前記耐熱性金属材料の表面に形成され、金属炭化物の標準生成自由エネルギーが前記耐熱性金属材料よりも小さい金属材料である、チタン、タンタル、またはジルコニムから選択される、厚さが0.10〜10.0μmの金属皮膜と、
前記金属皮膜が形成された耐熱性金属材料をセラミックス基体の原材料である粉体中の所定の位置に配設し、加圧成型されたセラミックス成型体と、
を備えるプレセラミックスを焼結して形成され、前記焼結時に前記金属皮膜が炭化されて金属炭化物皮膜が形成されることを特徴とするセラミックス焼結体。 - 前記セラミックス基体は、窒化アルミニウム、窒化珪素または酸化アルミニウムであることを特徴とする請求項4に記載のセラミックス焼結体。
- 前記セラミックス焼結体の焼結温度は、1300〜2000℃であることを特徴とする請求項4または5に記載のセラミックス焼結体。
- 請求項4〜6のいずれかひとつに記載のセラミックス焼結体を備えることを特徴とするセラミックスヒータ。
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